KR100991584B1 - 반사굴절식 투영 대물렌즈 - Google Patents

반사굴절식 투영 대물렌즈 Download PDF

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Publication number
KR100991584B1
KR100991584B1 KR1020067023338A KR20067023338A KR100991584B1 KR 100991584 B1 KR100991584 B1 KR 100991584B1 KR 1020067023338 A KR1020067023338 A KR 1020067023338A KR 20067023338 A KR20067023338 A KR 20067023338A KR 100991584 B1 KR100991584 B1 KR 100991584B1
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KR
South Korea
Prior art keywords
mirror
projection objective
mirror group
optical axis
objective lens
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020067023338A
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English (en)
Korean (ko)
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KR20070012460A (ko
Inventor
알렉산더 에플레
Original Assignee
칼 짜이스 에스엠티 아게
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0816—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0848—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G02B17/086—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors wherein the system is made of a single block of optical material, e.g. solid catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020067023338A 2004-04-08 2005-04-07 반사굴절식 투영 대물렌즈 Expired - Fee Related KR100991584B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56026704P 2004-04-08 2004-04-08
US60/560,267 2004-04-08

Publications (2)

Publication Number Publication Date
KR20070012460A KR20070012460A (ko) 2007-01-25
KR100991584B1 true KR100991584B1 (ko) 2010-11-04

Family

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Family Applications (1)

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KR1020067023338A Expired - Fee Related KR100991584B1 (ko) 2004-04-08 2005-04-07 반사굴절식 투영 대물렌즈

Country Status (6)

Country Link
US (4) US7712905B2 (https=)
EP (2) EP1733271A1 (https=)
JP (2) JP4801047B2 (https=)
KR (1) KR100991584B1 (https=)
CN (1) CN1965259B (https=)
WO (3) WO2005098504A1 (https=)

Families Citing this family (109)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121819A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101643112B1 (ko) 2003-02-26 2016-07-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101289959B1 (ko) 2003-04-11 2013-07-26 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
SG139733A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
KR20050122269A (ko) 2003-04-17 2005-12-28 가부시키가이샤 니콘 액침 리소그래피를 이용하기 위한 오토포커스 소자의광학적 배열
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
KR101790914B1 (ko) 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
WO2004102646A1 (ja) 2003-05-15 2004-11-25 Nikon Corporation 露光装置及びデバイス製造方法
TW201515064A (zh) 2003-05-23 2015-04-16 尼康股份有限公司 曝光方法及曝光裝置以及元件製造方法
TWI474380B (zh) 2003-05-23 2015-02-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
WO2004107417A1 (ja) 2003-05-28 2004-12-09 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP3104396B1 (en) 2003-06-13 2018-03-21 Nikon Corporation Exposure method, substrate stage, exposure apparatus, and device manufacturing method
KR101476087B1 (ko) 2003-06-19 2014-12-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
WO2005006026A2 (en) 2003-07-01 2005-01-20 Nikon Corporation Using isotopically specified fluids as optical elements
EP2843472B1 (en) 2003-07-08 2016-12-07 Nikon Corporation Wafer table for immersion lithography
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
EP2264531B1 (en) 2003-07-09 2013-01-16 Nikon Corporation Exposure apparatus and device manufacturing method
EP1643543B1 (en) 2003-07-09 2010-11-24 Nikon Corporation Exposure apparatus and method for manufacturing device
JP4524669B2 (ja) 2003-07-25 2010-08-18 株式会社ニコン 投影光学系の検査方法および検査装置
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR20190002749A (ko) 2003-07-28 2019-01-08 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101419192B1 (ko) 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1660925B1 (en) 2003-09-03 2015-04-29 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
JP4444920B2 (ja) 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101498437B1 (ko) 2003-09-29 2015-03-03 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP2005136364A (ja) 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
KR20060126949A (ko) 2003-10-08 2006-12-11 가부시키가이샤 니콘 기판 반송 장치와 기판 반송 방법, 노광 장치와 노광 방법,및 디바이스 제조 방법
EP1672681B8 (en) 2003-10-08 2011-09-21 Miyagi Nikon Precision Co., Ltd. Exposure apparatus, substrate carrying method, exposure method, and method for producing device
TW200514138A (en) 2003-10-09 2005-04-16 Nippon Kogaku Kk Exposure equipment and exposure method, manufacture method of component
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
EP3370115A1 (en) 2003-12-03 2018-09-05 Nikon Corporation Exposure apparatus, exposure method and method for producing a device
KR101281397B1 (ko) 2003-12-15 2013-07-02 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4506674B2 (ja) 2004-02-03 2010-07-21 株式会社ニコン 露光装置及びデバイス製造方法
EP1747499A2 (en) 2004-05-04 2007-01-31 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100594430C (zh) 2004-06-04 2010-03-17 卡尔蔡司Smt股份公司 用于测量光学成像系统的图像质量的系统
KR101421915B1 (ko) 2004-06-09 2014-07-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1780772B1 (en) 2004-07-12 2009-09-02 Nikon Corporation Exposure equipment and device manufacturing method
US8305553B2 (en) 2004-08-18 2012-11-06 Nikon Corporation Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
KR20180125636A (ko) 2005-01-31 2018-11-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
WO2007071569A1 (en) * 2005-12-23 2007-06-28 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7649612B2 (en) * 2006-01-27 2010-01-19 Chartered Semiconductor Manufacturing Ltd. Phase shifting photolithography system
WO2007086220A1 (ja) * 2006-01-30 2007-08-02 Nikon Corporation 反射屈折結像光学系、露光装置、およびデバイスの製造方法
EP1852745A1 (en) 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
DE102006028222A1 (de) * 2006-06-14 2007-12-27 Carl Zeiss Smt Ag Verfahren zum Betreiben von Projektionsbelichtungsanlagen und Verwendung eines Projektionsobjektivs
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
EP1906251A1 (en) 2006-09-26 2008-04-02 Carl Zeiss SMT AG Projection exposure method and projection exposure system
EP1950594A1 (de) * 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102007033967A1 (de) * 2007-07-19 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
DE102008040819A1 (de) 2007-09-14 2009-03-26 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Elements für ein Objektiv einer Projektionsbelichtungsanlage der Mikrolithographie
US8077401B2 (en) * 2007-10-03 2011-12-13 Ricoh Co., Ltd. Catadioptric imaging system
EP2203787B1 (en) 2007-10-26 2014-05-14 Carl Zeiss SMT GmbH Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
WO2009053023A2 (en) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type
US7978389B2 (en) * 2007-11-28 2011-07-12 Nec Corporation Optical scanning device and image output apparatus
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
DE102008049589A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
US8600186B2 (en) * 2010-04-26 2013-12-03 City University Of Hong Kong Well focused catadioptric image acquisition
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems
US9205734B1 (en) 2011-10-06 2015-12-08 XL Hybrids Motor integration assembly
US9390062B1 (en) 2012-02-01 2016-07-12 XL Hybrids Managing vehicle information
JP6028350B2 (ja) * 2012-03-16 2016-11-16 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
TWI486454B (zh) * 2012-03-19 2015-06-01 Jfe Steel Corp Steel manufacturing method
US9329373B2 (en) * 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging
DE102013204391B3 (de) 2013-03-13 2014-05-28 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator
US9651872B2 (en) 2013-03-13 2017-05-16 Carl Zeiss Smt Gmbh Projection lens with wavefront manipulator
US9298102B2 (en) 2013-03-13 2016-03-29 Carl Zeiss Smt Gmbh Projection lens with wavefront manipulator
US10365152B1 (en) * 2013-03-14 2019-07-30 Wavefront Research, Inc. Compact annular field imager and method for imaging electromagnetic radiation
US8670888B1 (en) * 2013-06-18 2014-03-11 XL Hybrids Dynamically assisting hybrid vehicles
US9818240B1 (en) 2013-09-06 2017-11-14 XL Hybrids Comparing vehicle performance
US9922469B1 (en) 2013-11-07 2018-03-20 XL Hybrids Route-based vehicle selection
CN104062746B (zh) * 2014-06-23 2016-08-24 中国科学院光电技术研究所 一种大数值孔径的折反射浸没投影光学系统
CN105807410B (zh) * 2014-12-31 2018-11-09 上海微电子装备（集团）股份有限公司 一种基于高数值孔径的折反射式投影物镜
KR20160091085A (ko) * 2015-01-23 2016-08-02 삼성전자주식회사 반사 굴절 광학계 및 이미지 촬영 장치
DE102015226531A1 (de) * 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
US10527830B2 (en) * 2016-08-12 2020-01-07 Kla-Tencor Corporation Off-axis reflective afocal optical relay
DE102017207542A1 (de) 2017-05-04 2017-06-29 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102018207277A1 (de) 2018-05-09 2019-11-14 Carl Zeiss Smt Gmbh Lithografiemaske, optisches System zur Übertragung von Original Strukturabschnitten der Lithografiemaske sowie Projektionsoptik zur Abbildung eines Objektfeldes, in dem mindestens ein Original-Strukturabschnitt einer Lithografiemaske anordenbar ist
TWI831849B (zh) * 2018-12-07 2024-02-11 日商索尼股份有限公司 圖像顯示裝置及投射光學系統
DE102021202847A1 (de) 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie
US12192606B2 (en) * 2021-10-07 2025-01-07 Samsung Electro-Mechanics Co., Ltd. Imaging lens system and camera module
CN116263565A (zh) * 2021-12-13 2023-06-16 长鑫存储技术有限公司 光刻胶图案的形成方法和投影式曝光装置
US12253804B2 (en) 2021-12-13 2025-03-18 Changxin Memory Technologies, Inc. Method of forming photoresist pattern and projection exposure apparatus
DE102022205272A1 (de) * 2022-05-25 2023-11-30 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
DE102024203605A1 (de) * 2024-04-18 2025-10-23 Carl Zeiss Smt Gmbh Abbildende Optik für die Projektionslithographie
WO2025220275A1 (ja) * 2024-04-18 2025-10-23 パナソニックＩｐマネジメント株式会社 光学系、画像投写装置および撮像装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001141995A (ja) 1999-10-21 2001-05-25 Carl Zeiss:Fa 光学的投影レンズ系
JP2002090626A (ja) 2000-07-21 2002-03-27 Svg Lithography Syst Inc 反射屈折投影光学系

Family Cites Families (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2380887A (en) 1941-05-22 1945-07-31 Taylor Taylor & Hobson Ltd Optical system
DE1064734B (de) 1953-09-23 1959-09-03 Optische Ind De Oude Delft Nv Optisches Abbildungssystem
SU124665A1 (ru) 1959-03-30 1959-11-30 В.А. Панов Безиммерсионный зеркально-линзовый ахроматический объектив микроскопа
NL269391A (https=) 1961-09-19
JPS6019484B2 (ja) 1975-11-07 1985-05-16 キヤノン株式会社 複写用レンズ
US4293186A (en) 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
CH624776A5 (https=) 1977-12-08 1981-08-14 Kern & Co Ag
US4241390A (en) 1978-02-06 1980-12-23 The Perkin-Elmer Corporation System for illuminating an annular field
CH651943A5 (de) 1980-08-16 1985-10-15 Ludvik Dr Canzek Katadioptrisches objektiv hoher oeffnung.
JPS5744115A (en) 1980-08-30 1982-03-12 Asahi Optical Co Ltd Reflex telephoto zoom lens system
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4469414A (en) 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
JPS60184223A (ja) 1984-03-01 1985-09-19 Nippon Kogaku Kk <Nikon> 反射屈折式望遠レンズ
US4812028A (en) 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US4701035A (en) 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
US4834515A (en) 1984-11-29 1989-05-30 Lockheed Missiles & Space Company, Inc. Catadioptric imaging system with dioptric assembly of the petzval type
US4779966A (en) 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
JPS61156737A (ja) 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US4711535A (en) 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
EP0237041B1 (en) 1986-03-12 1993-08-18 Matsushita Electric Industrial Co., Ltd. Projection optical system for use in precise copy
US4757354A (en) 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
EP0947882B1 (en) 1986-07-11 2006-03-29 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
GB2197962A (en) 1986-11-10 1988-06-02 Compact Spindle Bearing Corp Catoptric reduction imaging apparatus
US4951078A (en) 1988-05-16 1990-08-21 Minolta Camera Kabushiki Kaisha Camera system including catadioptric lens and catadioptric lens system used therein
US5004331A (en) 1989-05-03 1991-04-02 Hughes Aircraft Company Catadioptric projector, catadioptric projection system and process
US5063586A (en) 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5114238A (en) 1990-06-28 1992-05-19 Lockheed Missiles & Space Company, Inc. Infrared catadioptric zoom relay telescope
US5031976A (en) 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
GB9020902D0 (en) 1990-09-26 1990-11-07 Optics & Vision Ltd Optical systems,telescopes and binoculars
US5315629A (en) 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5734496A (en) 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
US5212588A (en) 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
US5353322A (en) 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5220590A (en) 1992-05-05 1993-06-15 General Signal Corporation X-ray projection lithography camera
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3635684B2 (ja) 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5410434A (en) 1993-09-09 1995-04-25 Ultratech Stepper, Inc. Reflective projection system comprising four spherical mirrors
US5515207A (en) 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5488229A (en) 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
IL113350A (en) 1995-04-12 1998-06-15 State Rafaelel Ministry Of Def Catadioptric optics working staring detector system
US5650877A (en) 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
US5805365A (en) 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
JP3456323B2 (ja) 1995-11-01 2003-10-14 株式会社ニコン 顕微鏡対物レンズ
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH09251097A (ja) 1996-03-15 1997-09-22 Nikon Corp Ｘ線リソグラフィー用反射縮小結像光学系
US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US5729376A (en) 1996-07-01 1998-03-17 The United States Of America As Represented By The Secretary Of The Army Catadioptric multi-functional optical assembly
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
US6169627B1 (en) 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
US5825043A (en) 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
EP1944654A3 (en) 1996-11-28 2010-06-02 Nikon Corporation An exposure apparatus and an exposure method
US5956192A (en) 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US5920380A (en) 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
US6097537A (en) 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
JPH11316343A (ja) 1998-05-01 1999-11-16 Nikon Corp カタディオプトリックレンズ
EP0964307A3 (en) 1998-06-08 2001-09-05 Nikon Corporation Projection exposure apparatus and method
US6213610B1 (en) 1998-09-21 2001-04-10 Nikon Corporation Catoptric reduction projection optical system and exposure apparatus and method using same
JP2000100694A (ja) 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
EP1059550A4 (en) 1998-12-25 2003-03-19 Nikon Corp REFRACTION REFLECTION IMAGE FORMING SYSTEM AND PROJECTION EXPOSURE APPARATUS INCLUDING THE OPTICAL SYSTEM
EP1035445B1 (de) 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
US6188513B1 (en) 1999-03-15 2001-02-13 Russell Hudyma High numerical aperture ring field projection system for extreme ultraviolet lithography
US6426506B1 (en) 1999-05-27 2002-07-30 The Regents Of The University Of California Compact multi-bounce projection system for extreme ultraviolet projection lithography
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1093021A3 (en) 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7187503B2 (en) 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
US6285737B1 (en) 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001343589A (ja) 2000-03-31 2001-12-14 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
WO2002033467A1 (de) 2000-10-20 2002-04-25 Carl Zeiss 8-spiegel-mikrolithographie-projektionsobjektiv
JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002217095A (ja) * 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002208551A (ja) 2001-01-10 2002-07-26 Nikon Corp 反射屈折光学系及び投影露光装置
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
EP1405309A1 (en) 2001-06-21 2004-04-07 Koninklijke Philips Electronics N.V. Optical scanning device
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2003114387A (ja) 2001-10-04 2003-04-18 Nikon Corp 反射屈折光学系および該光学系を備える投影露光装置
JP2003233005A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2003233002A (ja) 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
DE10332112A1 (de) 2003-07-09 2005-01-27 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
US6912042B2 (en) * 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
JP2003309059A (ja) 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
KR20050035890A (ko) 2002-08-23 2005-04-19 가부시키가이샤 니콘 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
US8675276B2 (en) 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
JP2004335575A (ja) 2003-05-01 2004-11-25 Canon Inc 露光装置
KR101790914B1 (ko) 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2005003982A (ja) 2003-06-12 2005-01-06 Nikon Corp 投影光学系、露光装置および露光方法
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP1700163A1 (en) 2003-12-15 2006-09-13 Carl Zeiss SMT AG Objective as a microlithography projection objective with at least one liquid lens
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US20050185269A1 (en) 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN101727021A (zh) 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
EP1721201A1 (en) 2004-02-18 2006-11-15 Corning Incorporated Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
US20060244938A1 (en) 2004-05-04 2006-11-02 Karl-Heinz Schuster Microlitographic projection exposure apparatus and immersion liquid therefore
US7224520B2 (en) 2004-09-28 2007-05-29 Wavefront Research, Inc. Compact fast catadioptric imager
US20060082905A1 (en) 2004-10-14 2006-04-20 Shafer David R Catadioptric projection objective with an in-line, single-axis configuration
DE102005045862A1 (de) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US20060198018A1 (en) 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
DE102005056721A1 (de) 2005-04-28 2006-11-09 Carl Zeiss Smt Ag Projektionsbelichtungsobjektiv mit zentraler Obskuration und Zwischenbildern zwischen den Spiegeln
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001141995A (ja) 1999-10-21 2001-05-25 Carl Zeiss:Fa 光学的投影レンズ系
JP2002090626A (ja) 2000-07-21 2002-03-27 Svg Lithography Syst Inc 反射屈折投影光学系

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