KR100938324B1 - 결함 검사 장치, 도형 묘화 장치, 도형 묘화 시스템 및결함 검사 프로그램을 기억한 기록 매체 - Google Patents

결함 검사 장치, 도형 묘화 장치, 도형 묘화 시스템 및결함 검사 프로그램을 기억한 기록 매체 Download PDF

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KR100938324B1
KR100938324B1 KR1020080021639A KR20080021639A KR100938324B1 KR 100938324 B1 KR100938324 B1 KR 100938324B1 KR 1020080021639 A KR1020080021639 A KR 1020080021639A KR 20080021639 A KR20080021639 A KR 20080021639A KR 100938324 B1 KR100938324 B1 KR 100938324B1
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KR20080089175A (ko
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료 야마다
이타루 후루카와
기요시 기타무라
가즈히로 나카이
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다이니폰 스크린 세이조우 가부시키가이샤
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KR1020080021639A 2007-03-30 2008-03-07 결함 검사 장치, 도형 묘화 장치, 도형 묘화 시스템 및결함 검사 프로그램을 기억한 기록 매체 Active KR100938324B1 (ko)

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JP2007090093 2007-03-30
JPJP-P-2007-00090093 2007-03-30
JP2007276775A JP5015721B2 (ja) 2007-03-30 2007-10-24 欠陥検査装置、欠陥検査プログラム、図形描画装置および図形描画システム
JPJP-P-2007-00276775 2007-10-24

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KR20080089175A KR20080089175A (ko) 2008-10-06
KR100938324B1 true KR100938324B1 (ko) 2010-01-22

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JP (1) JP5015721B2 (enrdf_load_stackoverflow)
KR (1) KR100938324B1 (enrdf_load_stackoverflow)
CN (1) CN101275917B (enrdf_load_stackoverflow)
TW (1) TWI361889B (enrdf_load_stackoverflow)

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JP5373518B2 (ja) * 2009-09-15 2013-12-18 大日本スクリーン製造株式会社 データ変換方法、描画システムおよびプログラム
JP5371658B2 (ja) * 2009-09-25 2013-12-18 大日本スクリーン製造株式会社 パターン描画装置およびパターン描画方法
TW201314376A (zh) 2011-09-30 2013-04-01 Dainippon Screen Mfg 直接描繪裝置用之圖像顯示裝置及記錄媒體
JP6034112B2 (ja) * 2012-09-28 2016-11-30 株式会社Ｓｃｒｅｅｎホールディングス 支援装置、描画システム、および、支援方法
JP2015103226A (ja) * 2013-11-28 2015-06-04 株式会社Ｓｃｒｅｅｎホールディングス データ演算方法、データ演算装置および欠陥検査装置
JP6460660B2 (ja) * 2014-07-01 2019-01-30 株式会社Ｓｃｒｅｅｎホールディングス データ演算装置、データ演算方法および欠陥検査装置
JP6350204B2 (ja) 2014-10-21 2018-07-04 株式会社ニューフレアテクノロジー 描画データ検証方法、プログラム、及びマルチ荷電粒子ビーム描画装置
CN104463928B (zh) * 2014-12-15 2018-01-05 重庆市勘测院 利用Region类代替AutoCAD面域进行图形计算的方法
KR102536331B1 (ko) * 2017-12-31 2023-05-26 에이에스엠엘 네델란즈 비.브이. 결함 검사 및 검토를 위한 시스템들 및 방법들
TWI764770B (zh) * 2021-06-29 2022-05-11 倍利科技股份有限公司 用於判定電路之線路區域的方法
JP7685395B2 (ja) * 2021-08-27 2025-05-29 株式会社Ｓｃｒｅｅｎホールディングス 描画装置、描画方法およびプログラム

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KR100268777B1 (ko) 1993-11-12 2000-11-01 김영환 반도체소자의 패턴결함 검사방법
KR20020016542A (ko) * 2000-08-25 2002-03-04 핫토리 쥰이치 패턴결함 검사방법 및 장치
JP2007081326A (ja) 2005-09-16 2007-03-29 Dainippon Screen Mfg Co Ltd 配線形成システムおよびその方法

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JPH1083452A (ja) * 1996-09-09 1998-03-31 Kokusai Gijutsu Kaihatsu Kk パターン欠陥検出装置
JPH10171093A (ja) * 1996-12-10 1998-06-26 Dainippon Screen Mfg Co Ltd 検版装置
JP2000155408A (ja) * 1998-09-14 2000-06-06 Matsushita Electronics Industry Corp パタ―ンデ―タ検証方法およびパタ―ンデ―タ補正方法
JP2000250960A (ja) * 1999-03-02 2000-09-14 Sony Corp 描画装置用データの検証方法およびフォトマスクの製造方法
JP4538135B2 (ja) * 2000-05-30 2010-09-08 株式会社メック 欠陥検査装置
JP2001344302A (ja) * 2000-06-02 2001-12-14 Nec Corp 電子線露光装置用データの検証方法およびその検証装置
JP3952358B2 (ja) * 2001-09-25 2007-08-01 大日本スクリーン製造株式会社 データ変換装置およびその方法、並びに当該方法を用いたプログラム
JP2003099771A (ja) * 2001-09-26 2003-04-04 Dainippon Screen Mfg Co Ltd データ変換装置およびその方法、並びに当該方法を用いたプログラム
JP4281314B2 (ja) * 2002-09-02 2009-06-17 日本電気株式会社 レチクル製造方法
US6878495B1 (en) * 2003-10-15 2005-04-12 Eastman Kodak Company Producing an image data to be used by a laser thermal transfer apparatus for use in making color emissive sites
JP4518835B2 (ja) * 2004-05-13 2010-08-04 大日本スクリーン製造株式会社 欠陥検出装置、配線領域抽出装置、欠陥検出方法および配線領域抽出方法
JP4648660B2 (ja) * 2004-07-21 2011-03-09 大日本スクリーン製造株式会社 画像の領域分割による物体の表面領域配置の取得
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JP4695942B2 (ja) * 2005-08-22 2011-06-08 株式会社ニューフレアテクノロジー データの検証方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100268777B1 (ko) 1993-11-12 2000-11-01 김영환 반도체소자의 패턴결함 검사방법
KR20020016542A (ko) * 2000-08-25 2002-03-04 핫토리 쥰이치 패턴결함 검사방법 및 장치
JP2007081326A (ja) 2005-09-16 2007-03-29 Dainippon Screen Mfg Co Ltd 配線形成システムおよびその方法

Also Published As

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TWI361889B (en) 2012-04-11
CN101275917A (zh) 2008-10-01
JP2008277730A (ja) 2008-11-13
CN101275917B (zh) 2013-03-06
KR20080089175A (ko) 2008-10-06
TW200900684A (en) 2009-01-01
JP5015721B2 (ja) 2012-08-29

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