KR100906593B1 - 반사 방지층용 경화성 수지 조성물, 반사방지층, 반사방지 필름, 광학 소자 및 화상 표시 장치 - Google Patents
반사 방지층용 경화성 수지 조성물, 반사방지층, 반사방지 필름, 광학 소자 및 화상 표시 장치 Download PDFInfo
- Publication number
- KR100906593B1 KR100906593B1 KR1020057009010A KR20057009010A KR100906593B1 KR 100906593 B1 KR100906593 B1 KR 100906593B1 KR 1020057009010 A KR1020057009010 A KR 1020057009010A KR 20057009010 A KR20057009010 A KR 20057009010A KR 100906593 B1 KR100906593 B1 KR 100906593B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- antireflection
- film
- resin composition
- antireflection layer
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Liquid Crystal (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Polarising Elements (AREA)
Abstract
Description
즉, 본 발명은 가수분해성 알콕시실란인 테트라메톡시실란, 테트라에톡시실란, 테트라프로폭시실란, 테트라부톡시실란, 메틸트리메톡시실란, 메틸트리에톡시실란, 에틸트리메톡시실란, 에틸트리에톡시실란, 프로필트리메톡시실란, 프로필트리에톡시실란, 부틸트리메톡시실란, 부틸트리에톡시실란, 펜틸트리메톡시실란, 펜틸트리에톡시실란, 헵틸트리메톡시실란, 헵틸트리에톡시실란, 옥틸트리메톡시실란, 옥틸트리에톡시실란, 도데실트리메톡시실란, 도데실트리에톡시실란, 헥사데실트리메톡시실란, 헥사데실트리에톡시실란, 옥타데실트리메톡시실란, 옥타데실트리에톡시실란, 페닐트리메톡시실란, 페닐트리에톡시실란, 비닐트리메톡시실란, 비닐트리에톡시실란, γ-아미노프로필트리메톡시실란, γ-아미노프로필트리에톡시실란, γ-글리시독시프로필트리메톡시실란, γ-글리시독시프로필트리에톡시실란, γ-메타크릴록시프로필트리메톡시실란, γ-메타크릴록시프로필트리에톡시실란, 디메틸디메톡시실란 또는 디메틸디에톡시실란의 축중합체로서, 또한 에틸렌글리콜 환산에 의한 평균 분자량이 500∼10000 인 축합 경화성 실록산올리고머 (A),
가교성 화합물인 멜라민 수지, 및
유기산인 p-톨루엔술폰산 또는 벤조산, 또는 광산발생제인 트리아진계 화합물을 함유하는 반사방지층용 경화성 수지 조성물에 관한 것이다.
전반사율 (%) | Si/F 비 | 내스크래치성 (%) | |
실시예 1 실시예 2 실시예 3 실시예 4 실시예 5 실시예 6 | 2.4 2.2 2.2 2.5 2.4 2.1 | 0.55 0.55 0.41 0.83 0.54 0.36 | +0.05 +0.06 +0.1 +0.04 +0.06 +1.0 |
비교예 1 | 2.1 | 0.28 | +1.9 |
Claims (20)
- 가수분해성 알콕시실란인 테트라메톡시실란, 테트라에톡시실란, 테트라프로폭시실란, 테트라부톡시실란, 메틸트리메톡시실란, 메틸트리에톡시실란, 에틸트리메톡시실란, 에틸트리에톡시실란, 프로필트리메톡시실란, 프로필트리에톡시실란, 부틸트리메톡시실란, 부틸트리에톡시실란, 펜틸트리메톡시실란, 펜틸트리에톡시실란, 헵틸트리메톡시실란, 헵틸트리에톡시실란, 옥틸트리메톡시실란, 옥틸트리에톡시실란, 도데실트리메톡시실란, 도데실트리에톡시실란, 헥사데실트리메톡시실란, 헥사데실트리에톡시실란, 옥타데실트리메톡시실란, 옥타데실트리에톡시실란, 페닐트리메톡시실란, 페닐트리에톡시실란, 비닐트리메톡시실란, 비닐트리에톡시실란, γ-아미노프로필트리메톡시실란, γ-아미노프로필트리에톡시실란, γ-글리시독시프로필트리메톡시실란, γ-글리시독시프로필트리에톡시실란, γ-메타크릴록시프로필트리메톡시실란, γ-메타크릴록시프로필트리에톡시실란, 디메틸디메톡시실란 또는 디메틸디에톡시실란의 축중합체로서, 또한 에틸렌글리콜 환산에 의한 평균 분자량이 500∼10000 인 축합 경화성 실록산올리고머 (A),졸-겔 반응에 의해 축합 가능한 알콕시실릴기를 갖는 퍼플루오로알킬알콕시실란과 가수분해성 알콕시실란의 축중합체로서, 또한 폴리스티렌 환산에 의한 수평균 분자량이 5000 이상인, 플루오로알킬 구조 및 폴리실록산 구조를 갖는 축합 경화성 불소 화합물 (B),가교성 화합물인 멜라민 수지, 및유기산인 p-톨루엔술폰산 또는 벤조산, 또는 광산발생제인 트리아진계 화합물을 함유하는 반사방지층용 경화성 수지 조성물.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 제 1 항에 따른 반사방지층용 경화성 수지 조성물을 경화시켜 얻어지는 반사방지층.
- 제 11 항에 있어서, 반사 방지층 중의 불소 원자 함유량이 20 중량% 이상인 반사방지층.
- 제 11 항 또는 제 12 항에 있어서, X 선 광전자 분광법에 의해 측정한, 반사 방지층 표면의 규소 원자 (Si) 와 불소 원자 (F) 의 피크 강도비 (Si/F) 가 0.4~2 인 반사방지층.
- 투명 기판의 편면에 직접 또는 다른 층을 통하여 하드 코트층이 형성되어 있고, 추가로 당해 하드코트층의 표면에 제 11 항 또는 제 12 항에 따른 반사방지층이 형성되어 있는 반사방지 필름.
- 제 14 항에 있어서, 하드코트층의 표면이 요철 형상으로 되어 있고 광방현성(antiglareness)을 갖는 반사방지 필름.
- 제 14 항에 따른 반사방지 필름이 광학 소자의 편면 또는 양면에 형성되어 있는 광학 소자.
- 제 14 항에 따른 반사방지 필름을 장착한 화상 표시 장치.
- 제 15 항에 따른 반사방지 필름이 광학 소자의 편면 또는 양면에 형성되어 있는 광학 소자.
- 제 15 항에 따른 반사방지 필름을 장착한 화상 표시 장치.
- 제 16 항에 따른 광학 소자를 장착한 화상 표시 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00336093 | 2002-11-20 | ||
JP2002336093A JP3879657B2 (ja) | 2002-11-20 | 2002-11-20 | 反射防止層用硬化性樹脂組成物、反射防止層、反射防止フィルム、光学素子および画像表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050083890A KR20050083890A (ko) | 2005-08-26 |
KR100906593B1 true KR100906593B1 (ko) | 2009-07-09 |
Family
ID=32321792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057009010A KR100906593B1 (ko) | 2002-11-20 | 2003-11-17 | 반사 방지층용 경화성 수지 조성물, 반사방지층, 반사방지 필름, 광학 소자 및 화상 표시 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7651776B2 (ko) |
JP (1) | JP3879657B2 (ko) |
KR (1) | KR100906593B1 (ko) |
CN (1) | CN100336868C (ko) |
AU (1) | AU2003280815A1 (ko) |
WO (1) | WO2004046247A1 (ko) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4640762B2 (ja) * | 2004-06-21 | 2011-03-02 | 日本化薬株式会社 | ハードコートフィルム |
US7390099B2 (en) | 2004-12-22 | 2008-06-24 | Nitto Denko Corporation | Hard-coated antiglare film and method of manufacturing the same |
JP4855781B2 (ja) * | 2005-02-01 | 2012-01-18 | 日東電工株式会社 | 反射防止ハードコートフィルム、光学素子および画像表示装置 |
JP2006257407A (ja) * | 2005-02-16 | 2006-09-28 | Fuji Photo Film Co Ltd | 硬化性樹脂組成物、硬化膜、反射防止フィルム、偏光板、及び液晶表示装置 |
US7601427B2 (en) | 2005-04-26 | 2009-10-13 | Fujifilm Corporation | Curable composition, cured film, antireflection film, polarizing plate and liquid crystal display |
JP2007046008A (ja) * | 2005-08-12 | 2007-02-22 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性低屈折率コーティング用組成物および成形品 |
JP2007062102A (ja) * | 2005-08-30 | 2007-03-15 | Nippon Zeon Co Ltd | 防眩性フィルム及びその製造方法 |
JP2007062101A (ja) * | 2005-08-30 | 2007-03-15 | Nippon Zeon Co Ltd | 反射防止積層体 |
WO2007053772A1 (en) * | 2005-11-05 | 2007-05-10 | 3M Innovative Properties Company | Optical films comprising high refractive index and antireflective coatings |
JP5201994B2 (ja) * | 2005-12-27 | 2013-06-05 | 日本化薬株式会社 | 減反射性光学フィルム及びその製造法 |
CN101395238B (zh) * | 2006-03-07 | 2014-01-22 | 日产化学工业株式会社 | 被膜形成用涂布液,其制造方法,其被膜及反射防止材料 |
KR101334496B1 (ko) | 2006-03-07 | 2013-11-29 | 닛산 가가쿠 고교 가부시키 가이샤 | 피막 형성용 도포액, 그 제조 방법, 그 피막 및 반사 방지재 |
US8124215B2 (en) | 2006-03-28 | 2012-02-28 | Nitto Denko Corporation | Hard-coated antiglare film, method of manufacturing the same, optical device, polarizing plate, and image display |
JP4145332B2 (ja) | 2006-03-28 | 2008-09-03 | 日東電工株式会社 | ハードコートフィルム、ハードコートフィルムの製造方法、光学素子および画像表示装置 |
JP5252811B2 (ja) | 2006-05-16 | 2013-07-31 | 日東電工株式会社 | 防眩性ハードコートフィルム、偏光板および画像表示装置 |
US20070285779A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
US20070285778A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
JP2008032763A (ja) * | 2006-07-26 | 2008-02-14 | Nitto Denko Corp | ハードコートフィルム、それを用いた偏光板および画像表示装置 |
US7722945B2 (en) * | 2006-10-10 | 2010-05-25 | Koch-Glitsch, Lp | Random packing elements and column containing same |
KR100834729B1 (ko) * | 2006-11-30 | 2008-06-09 | 포항공과대학교 산학협력단 | 반사 방지용 나노 다공성 필름 및 블록 공중합체를 이용한그 제조방법 |
JP5353011B2 (ja) * | 2007-01-26 | 2013-11-27 | 東レ株式会社 | シロキサン系樹脂組成物、これを用いた光学デバイスおよびシロキサン系樹脂組成物の製造方法 |
US8642246B2 (en) * | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8203983B2 (en) * | 2007-03-15 | 2012-06-19 | Lantiq Deutschland Gmbh | Multi-domain network with centralized management |
KR20090102653A (ko) * | 2008-03-25 | 2009-09-30 | 스미또모 가가꾸 가부시끼가이샤 | 내찰상성 수지판 및 그 용도 |
KR100974625B1 (ko) * | 2008-08-21 | 2010-08-09 | 국민대학교산학협력단 | 다층박막 제조방법 및 이에 의하여 제조된 다층박막 |
JP5114348B2 (ja) | 2008-09-08 | 2013-01-09 | 日東電工株式会社 | 光拡散フィルムの製造方法 |
US8419955B2 (en) * | 2009-01-07 | 2013-04-16 | Panasonic Corporation | Antireflection structure, lens barrel including antireflection structure, method for manufacturing antireflection structure |
CN102414278B (zh) * | 2009-05-01 | 2014-06-11 | 木本股份有限公司 | 脱模性组合物及表面保护膜 |
KR101133695B1 (ko) * | 2009-11-20 | 2012-04-06 | 주식회사 에이피엠 | 기계적 성질이 향상된 반사 방지 피막용 조성물 |
KR101045782B1 (ko) * | 2010-04-12 | 2011-07-04 | 국민대학교산학협력단 | 다층박막 제조방법 및 이에 의하여 제조된 다층박막 |
JP2012179892A (ja) | 2010-10-19 | 2012-09-20 | Nitto Denko Corp | 高難燃ポリマー部材、難燃性物品及び難燃化方法 |
WO2012121374A1 (ja) | 2011-03-09 | 2012-09-13 | 日東電工株式会社 | 粘接着剤層付飛散防止部材 |
US9167240B1 (en) * | 2012-12-12 | 2015-10-20 | Board Of Regents Of The University Of Texas System | Methods and compositions for validation of fluorescence imaging and tomography devices |
JP6625987B2 (ja) * | 2013-09-16 | 2019-12-25 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | ポリフッ素含有シロキサン被覆 |
JP6187115B2 (ja) * | 2013-10-04 | 2017-08-30 | 三菱ケミカル株式会社 | シリカ多孔質膜 |
JP2015099230A (ja) * | 2013-11-18 | 2015-05-28 | 住友ベークライト株式会社 | 反射防止層用樹脂組成物、反射防止層、透光性基板、光学素子、電子装置および光学装置 |
JP2017507803A (ja) | 2013-12-19 | 2017-03-23 | スリーエム イノベイティブ プロパティズ カンパニー | 多層複合材料物品 |
TWI629312B (zh) * | 2014-03-28 | 2018-07-11 | 奇美實業股份有限公司 | 硬化性樹脂組成物及其應用 |
US9982967B2 (en) * | 2015-02-18 | 2018-05-29 | E I Du Pont De Nemours And Company | Composite ballistic resistant laminate |
JP7428468B2 (ja) * | 2018-08-23 | 2024-02-06 | 日東電工株式会社 | 反射防止フィルム、反射防止フィルムの製造方法、光学部材および画像表示装置 |
CN112219142B (zh) * | 2018-10-17 | 2022-11-04 | 株式会社Lg化学 | 抗反射膜、偏光板和显示装置 |
KR102371580B1 (ko) * | 2019-05-28 | 2022-03-07 | 주식회사 엘지화학 | 반사 방지 필름, 편광판 및 디스플레이 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6258347B1 (en) * | 1997-06-02 | 2001-07-10 | Shin-Etsu Chemical Co., Ltd. | Film-forming silicone composition and toiletry composition containing same |
JP2001194505A (ja) * | 1999-10-29 | 2001-07-19 | Tomoegawa Paper Co Ltd | 低反射部材 |
JP2002235036A (ja) * | 2001-02-13 | 2002-08-23 | Toppan Printing Co Ltd | 反射防止積層体 |
JP2002265866A (ja) * | 2001-03-13 | 2002-09-18 | Toppan Printing Co Ltd | 低屈折率コーティング剤及び反射防止フィルム |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6140845A (ja) | 1984-07-31 | 1986-02-27 | Asahi Glass Co Ltd | 低反射率ガラス |
US5783299A (en) | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
US5674625A (en) | 1993-11-10 | 1997-10-07 | Central Glass Company, Limited | Multilayered water-repellent film and method of forming same on glass substrate |
CN1069665C (zh) * | 1994-05-30 | 2001-08-15 | 大金工业株式会社 | 氟硅氧烷化合物及含有该化合物的组合物 |
US5585186A (en) * | 1994-12-12 | 1996-12-17 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective, and anti-fogging properties |
JP4032185B2 (ja) * | 1995-12-01 | 2008-01-16 | 日産化学工業株式会社 | 低屈折率及び撥水性を有する被膜 |
TW376408B (en) | 1995-12-01 | 1999-12-11 | Nissan Chemical Ind Ltd | Coating film having water repellency and low refractive index |
JPH09220791A (ja) * | 1996-02-16 | 1997-08-26 | Dainippon Printing Co Ltd | 反射防止フイルム |
JPH09272169A (ja) * | 1996-04-04 | 1997-10-21 | Nippon Synthetic Chem Ind Co Ltd:The | 光学積層体 |
US6129980A (en) * | 1997-07-11 | 2000-10-10 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
JP2000144056A (ja) | 1998-11-10 | 2000-05-26 | Ikuo Narisawa | 水滴滑落性に優れた表面処理基材及びその製造方法 |
JP2000230052A (ja) * | 1999-02-12 | 2000-08-22 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光学材料およびそれを用いた光導波路 |
JP2000248183A (ja) | 1999-02-26 | 2000-09-12 | Dow Corning Toray Silicone Co Ltd | シリコーンゴム組成物 |
JP2000352620A (ja) * | 1999-03-31 | 2000-12-19 | Konica Corp | 光学フィルム、偏光板及び液晶表示装置 |
JP3611018B2 (ja) * | 1999-06-23 | 2005-01-19 | 信越化学工業株式会社 | フロロシリコーンゴム組成物 |
JP2001091705A (ja) * | 1999-07-22 | 2001-04-06 | Konica Corp | 光学用フィルム及びその製造方法 |
CN1161628C (zh) | 1999-11-12 | 2004-08-11 | 钟渊化学工业株式会社 | 透明薄膜及其制造方法和包含该透明薄膜的椭圆形偏振片 |
TW468053B (en) | 1999-12-14 | 2001-12-11 | Nissan Chemical Ind Ltd | Antireflection film, process for forming the antireflection film, and antireflection glass |
US6778240B2 (en) * | 2000-03-28 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Anti-glare and anti-reflection film, polarizing plate, and image display device |
JP2001343529A (ja) | 2000-03-30 | 2001-12-14 | Kanegafuchi Chem Ind Co Ltd | 偏光子保護フィルムおよびその製造方法 |
DE60143654D1 (de) * | 2000-06-20 | 2011-01-27 | Asahi Glass Co Ltd | Schichtungsflüssigkeit zur herstellung einer transparenten folie und anzeigevorrichtung |
JP3862941B2 (ja) * | 2000-07-21 | 2006-12-27 | リンテック株式会社 | 高精細防眩性ハードコートフィルム |
JP4062392B2 (ja) | 2000-08-04 | 2008-03-19 | 信越化学工業株式会社 | コーティング組成物用シリコーン樹脂、その製造方法、コーティング組成物及びこの硬化被膜を有する物品 |
JP2002077680A (ja) | 2000-08-29 | 2002-03-15 | Silitek Corp | デジタルイメージキャプチャ装置 |
JP2002107932A (ja) * | 2000-10-03 | 2002-04-10 | Toray Ind Inc | 感放射線性組成物 |
JP4117871B2 (ja) * | 2000-11-09 | 2008-07-16 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
JP2002200690A (ja) * | 2000-12-28 | 2002-07-16 | Bridgestone Corp | 反射防止フィルム |
DE60200529T2 (de) | 2001-03-30 | 2005-06-02 | Central Glass Co., Ltd., Ube | Hydrophober Gegenstand |
TWI300382B (ko) * | 2001-03-30 | 2008-09-01 | Jsr Corp | |
JP3953922B2 (ja) * | 2001-10-18 | 2007-08-08 | 日東電工株式会社 | 反射防止フィルム、光学素子および表示装置 |
JP2003215306A (ja) * | 2002-01-25 | 2003-07-30 | Nitto Denko Corp | 反射防止フィルム、光学素子および画像表示装置 |
JP4212020B2 (ja) * | 2002-01-25 | 2009-01-21 | 日東電工株式会社 | 反射防止フィルム、光学素子および画像表示装置 |
JP4236237B2 (ja) * | 2002-03-15 | 2009-03-11 | 日東電工株式会社 | 反射防止フィルムの製造方法 |
JP4174344B2 (ja) * | 2002-03-15 | 2008-10-29 | 日東電工株式会社 | 反射防止フィルム、その製造方法、光学素子および画像表示装置 |
JP2003344608A (ja) * | 2002-03-20 | 2003-12-03 | Nitto Denko Corp | 反射防止フィルム、光学素子および表示装置 |
JP2003307601A (ja) * | 2002-04-18 | 2003-10-31 | Nitto Denko Corp | 反射防止フィルム、光学素子および画像表示装置 |
JP2004045486A (ja) * | 2002-07-09 | 2004-02-12 | Nitto Denko Corp | 反射防止フィルム、光学素子および画像表示装置 |
JP4082501B2 (ja) * | 2002-11-11 | 2008-04-30 | 日東電工株式会社 | 反射防止フィルム、光学素子および画像表示装置 |
-
2002
- 2002-11-20 JP JP2002336093A patent/JP3879657B2/ja not_active Expired - Fee Related
-
2003
- 2003-11-17 KR KR1020057009010A patent/KR100906593B1/ko active IP Right Grant
- 2003-11-17 CN CNB2003801032423A patent/CN100336868C/zh not_active Expired - Fee Related
- 2003-11-17 US US10/535,681 patent/US7651776B2/en not_active Expired - Fee Related
- 2003-11-17 AU AU2003280815A patent/AU2003280815A1/en not_active Abandoned
- 2003-11-17 WO PCT/JP2003/014570 patent/WO2004046247A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6258347B1 (en) * | 1997-06-02 | 2001-07-10 | Shin-Etsu Chemical Co., Ltd. | Film-forming silicone composition and toiletry composition containing same |
JP2001194505A (ja) * | 1999-10-29 | 2001-07-19 | Tomoegawa Paper Co Ltd | 低反射部材 |
JP2002235036A (ja) * | 2001-02-13 | 2002-08-23 | Toppan Printing Co Ltd | 反射防止積層体 |
JP2002265866A (ja) * | 2001-03-13 | 2002-09-18 | Toppan Printing Co Ltd | 低屈折率コーティング剤及び反射防止フィルム |
Also Published As
Publication number | Publication date |
---|---|
JP3879657B2 (ja) | 2007-02-14 |
KR20050083890A (ko) | 2005-08-26 |
US20060052565A1 (en) | 2006-03-09 |
CN100336868C (zh) | 2007-09-12 |
JP2004167827A (ja) | 2004-06-17 |
CN1711318A (zh) | 2005-12-21 |
AU2003280815A1 (en) | 2004-06-15 |
WO2004046247A1 (ja) | 2004-06-03 |
US7651776B2 (en) | 2010-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100906593B1 (ko) | 반사 방지층용 경화성 수지 조성물, 반사방지층, 반사방지 필름, 광학 소자 및 화상 표시 장치 | |
JP3953922B2 (ja) | 反射防止フィルム、光学素子および表示装置 | |
JP4174344B2 (ja) | 反射防止フィルム、その製造方法、光学素子および画像表示装置 | |
JP3980423B2 (ja) | ハードコートフィルム、その製造方法、光学素子および画像表示装置 | |
KR100816700B1 (ko) | 하드코트 필름, 반사방지 하드코트 필름, 광학소자 및화상표시장치 | |
KR20070087003A (ko) | 반사 방지 하드코트 필름, 광학 소자 및 화상 표시 장치 | |
JP2004294601A (ja) | 反射防止フィルム、光学素子および画像表示装置 | |
JP2003344608A (ja) | 反射防止フィルム、光学素子および表示装置 | |
JP2005292646A (ja) | 反射防止フィルムの製造方法及び反射防止フィルム | |
JP4212020B2 (ja) | 反射防止フィルム、光学素子および画像表示装置 | |
KR20050004139A (ko) | 전기전도성 셀룰로오스계 필름, 이의 제조 방법, 반사방지필름, 광학 소자 및 화상 표시장치 | |
JP2003311911A (ja) | 複層フィルムの製造方法、反射防止フィルム、光学素子および画像表示装置 | |
JP2005313027A (ja) | 導電性フィルムの製造方法、導電性フィルム、光学素子および画像表示装置 | |
JP4553237B2 (ja) | 防眩性反射防止フィルム、光学素子および画像表示装置 | |
JP2004061601A (ja) | 被膜シートの製造方法、反射防止シートの製造方法、反射防止シート、光学素子および画像表示装置 | |
JP4236237B2 (ja) | 反射防止フィルムの製造方法 | |
JP2003307601A (ja) | 反射防止フィルム、光学素子および画像表示装置 | |
JP3976252B2 (ja) | 被膜シートの製造方法、および塗工装置 | |
JP2004277596A (ja) | 硬化膜、反射防止フィルム、光学素子、及び画像表示装置 | |
JP4082501B2 (ja) | 反射防止フィルム、光学素子および画像表示装置 | |
JP2004024967A (ja) | 被膜シートの製造方法、反射防止シートの製造方法、反射防止シート、光学素子および画像表示装置 | |
JP2004008840A (ja) | 被膜シートの製造方法、反射防止シートの製造方法、反射防止シート、光学素子および画像表示装置 | |
JP2004029505A (ja) | 偏光板、光学素子および画像表示装置 | |
JP2003270441A (ja) | 偏光板、光学素子および画像表示装置 | |
JP2003322704A (ja) | 反射防止シートの製造方法、反射防止シート、光学素子および画像表示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130621 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20140626 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20150618 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20160617 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20170616 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20180618 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20190618 Year of fee payment: 11 |