KR100869553B1 - 기판처리장치, 액처리장치 및 액처리방법 - Google Patents

기판처리장치, 액처리장치 및 액처리방법 Download PDF

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Publication number
KR100869553B1
KR100869553B1 KR1020020034344A KR20020034344A KR100869553B1 KR 100869553 B1 KR100869553 B1 KR 100869553B1 KR 1020020034344 A KR1020020034344 A KR 1020020034344A KR 20020034344 A KR20020034344 A KR 20020034344A KR 100869553 B1 KR100869553 B1 KR 100869553B1
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KR
South Korea
Prior art keywords
substrate
liquid
processing
developer
conveying
Prior art date
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KR1020020034344A
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English (en)
Korean (ko)
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KR20020097004A (ko
Inventor
타테야마키요히사
모토다키미오
사다테츠야
미야자키카즈히토
시노기타케토라
Original Assignee
도쿄엘렉트론가부시키가이샤
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Publication date
Priority claimed from JP2001184717A external-priority patent/JP3916891B2/ja
Priority claimed from JP2001204170A external-priority patent/JP3704064B2/ja
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20020097004A publication Critical patent/KR20020097004A/ko
Application granted granted Critical
Publication of KR100869553B1 publication Critical patent/KR100869553B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR1020020034344A 2001-06-19 2002-06-19 기판처리장치, 액처리장치 및 액처리방법 KR100869553B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00184717 2001-06-19
JP2001184717A JP3916891B2 (ja) 2001-06-19 2001-06-19 基板処理装置及び現像処理装置
JP2001204170A JP3704064B2 (ja) 2001-07-05 2001-07-05 液処理装置および液処理方法
JPJP-P-2001-00204170 2001-07-05

Publications (2)

Publication Number Publication Date
KR20020097004A KR20020097004A (ko) 2002-12-31
KR100869553B1 true KR100869553B1 (ko) 2008-11-19

Family

ID=26617183

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020034344A KR100869553B1 (ko) 2001-06-19 2002-06-19 기판처리장치, 액처리장치 및 액처리방법

Country Status (3)

Country Link
KR (1) KR100869553B1 (zh)
CN (1) CN1262888C (zh)
TW (1) TW569288B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2264534B1 (en) * 2003-07-28 2013-07-17 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
JP2006019525A (ja) * 2004-07-01 2006-01-19 Future Vision:Kk 基板処理装置
JP4410063B2 (ja) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 基板処理装置
JP4634265B2 (ja) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 塗布方法及び塗布装置
JP2007134487A (ja) * 2005-11-10 2007-05-31 Tokyo Ohka Kogyo Co Ltd 塗布装置
KR100701082B1 (ko) * 2005-12-02 2007-03-29 세메스 주식회사 기판 처리 장치 및 방법
JP4820705B2 (ja) * 2006-07-24 2011-11-24 芝浦メカトロニクス株式会社 基板の処理装置
KR101335302B1 (ko) * 2006-11-10 2013-12-03 엘아이지에이디피 주식회사 리프트 핀 구동장치 및 이를 구비한 평판표시소자 제조장치
TWI462215B (zh) * 2010-03-29 2014-11-21 Dainippon Screen Mfg 基板處理裝置、轉換方法、及轉移方法
TWI590365B (zh) * 2011-05-13 2017-07-01 尼康股份有限公司 物體更換系統、物體更換方法、物體搬出方法、物體保持裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法
CN103206591B (zh) * 2012-01-11 2016-10-05 昆山允升吉光电科技有限公司 电动载物台定位方法
CN103324038A (zh) 2013-06-25 2013-09-25 京东方科技集团股份有限公司 一种显影装置及显影方法
TWI479166B (zh) * 2013-07-19 2015-04-01 Hon Hai Prec Ind Co Ltd 產品斷差檢測系統、裝置及方法
CN104347352B (zh) * 2013-07-31 2018-05-29 细美事有限公司 一种基板处理装置及基板处理方法
CN111897192B (zh) * 2020-08-25 2024-05-31 武汉市天胤机电设备有限公司 一种新型冲版机传动系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1187210A (ja) * 1997-09-02 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JPH11145109A (ja) * 1997-11-07 1999-05-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11216433A (ja) * 1998-01-29 1999-08-10 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001102283A (ja) * 1999-09-28 2001-04-13 Dainippon Screen Mfg Co Ltd 基板処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1187210A (ja) * 1997-09-02 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JPH11145109A (ja) * 1997-11-07 1999-05-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11216433A (ja) * 1998-01-29 1999-08-10 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001102283A (ja) * 1999-09-28 2001-04-13 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
TW569288B (en) 2004-01-01
KR20020097004A (ko) 2002-12-31
CN1262888C (zh) 2006-07-05
CN1392454A (zh) 2003-01-22

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