JP4410063B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP4410063B2 JP4410063B2 JP2004258243A JP2004258243A JP4410063B2 JP 4410063 B2 JP4410063 B2 JP 4410063B2 JP 2004258243 A JP2004258243 A JP 2004258243A JP 2004258243 A JP2004258243 A JP 2004258243A JP 4410063 B2 JP4410063 B2 JP 4410063B2
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- Expired - Fee Related
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- 239000000758 substrate Substances 0.000 title claims description 273
- 238000012545 processing Methods 0.000 title claims description 68
- 238000000576 coating method Methods 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 54
- 239000011248 coating agent Substances 0.000 claims description 50
- 230000008569 process Effects 0.000 claims description 46
- 230000007246 mechanism Effects 0.000 claims description 18
- 230000003028 elevating effect Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 3
- 238000012546 transfer Methods 0.000 description 22
- 238000004140 cleaning Methods 0.000 description 21
- 238000001816 cooling Methods 0.000 description 17
- 230000032258 transport Effects 0.000 description 17
- 238000011161 development Methods 0.000 description 16
- 230000007723 transport mechanism Effects 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 12
- 230000002093 peripheral effect Effects 0.000 description 11
- 238000011144 upstream manufacturing Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- 230000009471 action Effects 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 5
- 238000004042 decolorization Methods 0.000 description 4
- 238000011143 downstream manufacturing Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/46—Machines having sequentially arranged operating stations
- H01J9/48—Machines having sequentially arranged operating stations with automatic transfer of workpieces between operating stations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Jigs For Machine Tools (AREA)
Description
112 ステージ
114 レジストノズル
116 塗布処理部
130 真空吸着口
132 リフトピン
138 貫通孔
144 昇降台
144 昇降駆動部
148(148A〜148D) 固定アライメントピン
150(150A〜150D) 可動アライメントピン
150a ピン本体
150b カラー
150c アーム部
150d 当接部材
151 貫通孔
152 回転駆動部
154 回転駆動軸
160 パーティクル吸い込み口
Claims (4)
- 四角形の基板に所定の処理を施すための四角形領域の載置位置が設定されているステージと、
前記ステージの前記設定載置位置の内側に形成された貫通孔に昇降移動可能に挿入され、ピン先端を前記ステージの上方に突出させることも前記貫通孔の中に退避させることも可能な基板昇降支持用の複数のリフトピンを有する昇降支持部と、
前記ステージの前記設定載置位置の外側に形成された貫通孔に昇降移動可能に挿入され、ピン先端を前記ステージの上方に突出させることも前記貫通孔の中に退避させることも可能な複数のアライメントピンを有し、前記基板を前記設定載置位置に位置決めするために前記アライメントピンの側面を前記基板の側面に接触させて前記基板を四方から挟み込む基板位置決め部と、
前記リフトピンと前記アライメントピンとを一緒に昇降移動させる昇降機構と、
前記ステージ上に載置される前記基板に対して、処理液を吐出する塗布ノズルを前記ステージと平行な方向で走査させて、前記基板上に処理液を塗布する塗布処理部と、
を有し、
前記ステージの上面よりも高い第1の位置で前記リフトピンのピン先端に前記基板を受け取り、前記基板を前記ステージ上に載置するために前記リフトピンを前記ステージの上面よりもピン先端が低くなる位置まで下降させ、前記第1の位置または前記第1の位置と前記ステージの上面との間の第2の位置で前記基板位置決め部により前記基板の位置決めを行い、前記基板を前記設定載置位置に載置した後に、前記アライメントピンを前記基板から離して前記ステージの上面よりもピン先端が低くなる位置まで下降させる、
基板処理装置。 - 前記アライメントピンが、前記リフトピンと比較して、前記設定載置位置の角部に近い位置に配置されている、請求項1に記載の基板処理装置。
- 前記アライメントピンが、前記基板を鉛直方向で案内するために上端に向かって径が次第に小さくなるテーパ部を有する、請求項1または請求項2に記載の基板処理装置。
- 前記ステージ上で前記基板を吸着固定するために、前記ステージの前記設定載置位置の内側に形成された真空吸着口を有する、請求項1〜3のいずれか一項に記載の基板処理装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004258243A JP4410063B2 (ja) | 2004-09-06 | 2004-09-06 | 基板処理装置 |
TW094128638A TWI327655B (en) | 2004-09-06 | 2005-08-22 | Substrate processing apparatus and substrate positioning apparatus |
TW101102010A TW201229621A (en) | 2004-09-06 | 2005-08-22 | Substrate processing apparatus |
TW099100305A TWI412822B (zh) | 2004-09-06 | 2005-08-22 | 基板處理裝置 |
CNB2005100929004A CN100449408C (zh) | 2004-09-06 | 2005-08-23 | 基板处理装置和基板定位装置 |
KR1020050081852A KR100997829B1 (ko) | 2004-09-06 | 2005-09-02 | 기판 처리 장치 및 기판 위치 결정 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004258243A JP4410063B2 (ja) | 2004-09-06 | 2004-09-06 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006073931A JP2006073931A (ja) | 2006-03-16 |
JP4410063B2 true JP4410063B2 (ja) | 2010-02-03 |
Family
ID=36154190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004258243A Expired - Fee Related JP4410063B2 (ja) | 2004-09-06 | 2004-09-06 | 基板処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4410063B2 (ja) |
KR (1) | KR100997829B1 (ja) |
CN (1) | CN100449408C (ja) |
TW (3) | TWI412822B (ja) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007207807A (ja) * | 2006-01-31 | 2007-08-16 | Hitachi Kokusai Electric Inc | 試料位置決め装置 |
JP5073375B2 (ja) * | 2007-06-13 | 2012-11-14 | Hoya株式会社 | マスクブランクの製造方法及びフォトマスクの製造方法 |
JP2009206315A (ja) * | 2008-02-28 | 2009-09-10 | Chugai Ro Co Ltd | テーブルへの基板搭載装置 |
JP2009224544A (ja) * | 2008-03-17 | 2009-10-01 | Toray Eng Co Ltd | 基板位置決め装置、基板位置決め方法、及び塗布装置 |
KR100942066B1 (ko) * | 2008-04-30 | 2010-02-11 | 주식회사 테라세미콘 | 홀더 스테이지 |
US11975546B2 (en) | 2008-06-13 | 2024-05-07 | Kateeva, Inc. | Gas enclosure assembly and system |
US12064979B2 (en) | 2008-06-13 | 2024-08-20 | Kateeva, Inc. | Low-particle gas enclosure systems and methods |
CN102134004B (zh) * | 2011-01-18 | 2012-11-21 | 东莞宏威数码机械有限公司 | 丝杆定位机构 |
CN202257028U (zh) * | 2011-09-13 | 2012-05-30 | 深圳市华星光电技术有限公司 | Lcd曝光平台装置及曝光系统 |
CN103206974B (zh) * | 2012-01-11 | 2017-06-13 | 昆山允升吉光电科技有限公司 | 电动控制载物台定位方法 |
CN103203726B (zh) * | 2012-01-11 | 2016-08-10 | 昆山允升吉光电科技有限公司 | 精确控制位置的载物台 |
CN103206973B (zh) * | 2012-01-11 | 2017-04-12 | 昆山允升吉光电科技有限公司 | 电动控制的载物台 |
CN103206976B (zh) * | 2012-01-11 | 2017-03-15 | 昆山允升吉光电科技有限公司 | 电动控制载物台的定位方法 |
CN103206977B (zh) * | 2012-01-11 | 2016-12-14 | 昆山允升吉光电科技有限公司 | 电动控制位置的载物台 |
CN103206978B (zh) * | 2012-01-11 | 2016-12-14 | 昆山允升吉光电科技有限公司 | 载物台定位方法 |
CN103206975B (zh) * | 2012-01-11 | 2017-06-06 | 昆山允升吉光电科技有限公司 | 电动控制载物台 |
CN103206971B (zh) * | 2012-01-11 | 2017-02-01 | 昆山允升吉光电科技有限公司 | 电动载物台的定位方法 |
CN103206972B (zh) * | 2012-01-11 | 2016-10-05 | 昆山允升吉光电科技有限公司 | 多方位控制支撑台 |
CN103203725B (zh) * | 2012-01-11 | 2016-08-10 | 昆山允升吉光电科技有限公司 | 精确控制位置的载物台 |
CN102720918A (zh) * | 2012-06-07 | 2012-10-10 | 中国海洋石油总公司 | 一种海洋隔水管外部密封装置 |
US9082799B2 (en) * | 2012-09-20 | 2015-07-14 | Varian Semiconductor Equipment Associates, Inc. | System and method for 2D workpiece alignment |
JP5943855B2 (ja) * | 2013-02-15 | 2016-07-05 | 中外炉工業株式会社 | ロール搬送式コータ |
TWI692414B (zh) * | 2013-03-13 | 2020-05-01 | 美商凱特伊夫公司 | 用於維護列印系統的方法 |
KR102029841B1 (ko) * | 2013-11-22 | 2019-10-08 | 현대자동차 주식회사 | 연료전지 적층 장치 |
WO2015100375A1 (en) | 2013-12-26 | 2015-07-02 | Kateeva, Inc. | Thermal treatment of electronic devices |
JP6596371B2 (ja) * | 2016-03-18 | 2019-10-23 | 株式会社Screenホールディングス | 基板保持装置および基板処理装置 |
CN105643349B (zh) * | 2016-03-29 | 2018-09-21 | 广州弘亚数控机械股份有限公司 | 数控钻孔机用抓手装置及其双模式工作的方法 |
CN106449500A (zh) * | 2016-09-27 | 2017-02-22 | 天津华海清科机电科技有限公司 | 定位组件 |
CN106827832B (zh) * | 2017-02-13 | 2023-08-29 | 深圳市汉拓数码有限公司 | 一种定位装置 |
CN107170703B (zh) * | 2017-06-19 | 2019-11-05 | 武汉华星光电技术有限公司 | 一种玻璃基板位置矫正装置及方法 |
CN107475679B (zh) * | 2017-08-18 | 2019-11-26 | 武汉华星光电半导体显示技术有限公司 | 夹持对位装置及方法 |
CN108176561A (zh) * | 2018-02-08 | 2018-06-19 | 深圳市鑫三力自动化设备有限公司 | 一种三边连续不间断点胶装置 |
KR20200021818A (ko) * | 2018-08-21 | 2020-03-02 | 세메스 주식회사 | 가열 플레이트, 이를 구비하는 기판 열처리 장치 및 가열 플레이트의 제조 방법 |
JP7148373B2 (ja) * | 2018-11-20 | 2022-10-05 | 株式会社東京精密 | ウエハ受け渡し装置 |
CN111276428B (zh) * | 2020-01-02 | 2021-07-06 | 长江存储科技有限责任公司 | 晶圆承载装置 |
CN113289819B (zh) * | 2021-04-10 | 2023-05-23 | 深圳市衡亿安科技有限公司 | 一种塑料手机后壳的表面陶瓷效果化装置 |
CN117696367A (zh) * | 2022-09-15 | 2024-03-15 | 株式会社斯库林集团 | 基板处理装置 |
Family Cites Families (9)
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JP2941505B2 (ja) * | 1991-08-08 | 1999-08-25 | 株式会社東芝 | 基板位置決め方法 |
JPH0774143A (ja) * | 1993-08-31 | 1995-03-17 | Dainippon Screen Mfg Co Ltd | 基板保持装置 |
JPH07122624A (ja) * | 1993-10-28 | 1995-05-12 | Nec Corp | ウェハのプリアライメント装置 |
JPH1092912A (ja) * | 1996-09-11 | 1998-04-10 | Dainippon Screen Mfg Co Ltd | 基板回転保持装置および回転式基板処理装置 |
JP3245813B2 (ja) * | 1996-11-27 | 2002-01-15 | 東京エレクトロン株式会社 | 塗布膜形成装置 |
JP3822745B2 (ja) * | 1998-03-23 | 2006-09-20 | 東京エレクトロン株式会社 | 洗浄装置 |
JP3245833B2 (ja) * | 1999-07-08 | 2002-01-15 | 日本エー・エス・エム株式会社 | 半導体基板アライナー装置および方法 |
JP3870066B2 (ja) | 2000-12-27 | 2007-01-17 | サンエー技研株式会社 | 基板位置決め装置および露光装置 |
TW569288B (en) * | 2001-06-19 | 2004-01-01 | Tokyo Electron Ltd | Substrate processing apparatus, liquid processing apparatus and liquid processing method |
-
2004
- 2004-09-06 JP JP2004258243A patent/JP4410063B2/ja not_active Expired - Fee Related
-
2005
- 2005-08-22 TW TW099100305A patent/TWI412822B/zh not_active IP Right Cessation
- 2005-08-22 TW TW101102010A patent/TW201229621A/zh unknown
- 2005-08-22 TW TW094128638A patent/TWI327655B/zh not_active IP Right Cessation
- 2005-08-23 CN CNB2005100929004A patent/CN100449408C/zh not_active Expired - Fee Related
- 2005-09-02 KR KR1020050081852A patent/KR100997829B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR100997829B1 (ko) | 2010-12-01 |
CN1746776A (zh) | 2006-03-15 |
KR20060050987A (ko) | 2006-05-19 |
TWI327655B (en) | 2010-07-21 |
TW201020614A (en) | 2010-06-01 |
TW201229621A (en) | 2012-07-16 |
TW200613823A (en) | 2006-05-01 |
JP2006073931A (ja) | 2006-03-16 |
CN100449408C (zh) | 2009-01-07 |
TWI412822B (zh) | 2013-10-21 |
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