KR100817980B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

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Publication number
KR100817980B1
KR100817980B1 KR1020060083495A KR20060083495A KR100817980B1 KR 100817980 B1 KR100817980 B1 KR 100817980B1 KR 1020060083495 A KR1020060083495 A KR 1020060083495A KR 20060083495 A KR20060083495 A KR 20060083495A KR 100817980 B1 KR100817980 B1 KR 100817980B1
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KR
South Korea
Prior art keywords
substrate
liquid
curtain
processing
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020060083495A
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English (en)
Korean (ko)
Other versions
KR20070041320A (ko
Inventor
사토시 야마모토
다카오 마츠모토
Original Assignee
다이니폰 스크린 세이조우 가부시키가이샤
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Application filed by 다이니폰 스크린 세이조우 가부시키가이샤 filed Critical 다이니폰 스크린 세이조우 가부시키가이샤
Publication of KR20070041320A publication Critical patent/KR20070041320A/ko
Application granted granted Critical
Publication of KR100817980B1 publication Critical patent/KR100817980B1/ko
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020060083495A 2005-10-14 2006-08-31 기판 처리 장치 Expired - Fee Related KR100817980B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005300616 2005-10-14
JPJP-P-2005-00300616 2005-10-14
JPJP-P-2006-00054644 2006-03-01
JP2006054644A JP4668088B2 (ja) 2005-10-14 2006-03-01 基板処理装置

Publications (2)

Publication Number Publication Date
KR20070041320A KR20070041320A (ko) 2007-04-18
KR100817980B1 true KR100817980B1 (ko) 2008-03-31

Family

ID=38156040

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060083495A Expired - Fee Related KR100817980B1 (ko) 2005-10-14 2006-08-31 기판 처리 장치

Country Status (4)

Country Link
JP (1) JP4668088B2 (enExample)
KR (1) KR100817980B1 (enExample)
CN (1) CN1947871B (enExample)
TW (1) TW200715389A (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100883298B1 (ko) * 2007-06-08 2009-02-11 아프로시스템 주식회사 상하 분리가능한 평판 디스플레이 세정장치
JP2009147260A (ja) * 2007-12-18 2009-07-02 Dainippon Screen Mfg Co Ltd 基板処理装置
KR101296659B1 (ko) * 2008-11-14 2013-08-14 엘지디스플레이 주식회사 세정 장치
KR101034374B1 (ko) * 2008-11-28 2011-05-16 세메스 주식회사 기판 세정 장치 및 방법
KR200451730Y1 (ko) 2008-12-29 2011-01-11 주식회사 케이씨텍 세정장치의 오토셔터
CN101847567B (zh) * 2009-03-26 2012-02-29 北京京东方光电科技有限公司 清洗基板的装置
CN101954358B (zh) * 2010-05-06 2012-07-04 东莞宏威数码机械有限公司 平移式基板清洗装置
DE102010024840B4 (de) * 2010-06-23 2016-09-22 Eisenmann Se Trockner
CN102357479A (zh) * 2011-07-19 2012-02-22 廖启明 应用于线路板生产的环保节水处理系统、装置及处理方法
CN102626695B (zh) * 2011-09-28 2015-04-08 北京京东方光电科技有限公司 基板清洗系统
TWI612568B (zh) * 2012-05-17 2018-01-21 Ebara Corp 基板洗淨裝置
JP6133120B2 (ja) 2012-05-17 2017-05-24 株式会社荏原製作所 基板洗浄装置
CN103406302B (zh) * 2013-08-23 2015-08-12 深圳市华星光电技术有限公司 基于紫外线的清洗方法及清洗装置
CN105665397A (zh) * 2016-03-17 2016-06-15 东旭科技集团有限公司 液晶玻璃基板清洗设备和方法
CN205692805U (zh) * 2016-05-09 2016-11-16 合肥鑫晟光电科技有限公司 基板处理设备
CN108239736B (zh) * 2016-12-23 2024-02-23 无锡市斯威克科技有限公司 一种光伏用反光焊带的脉冲风刀
CN108993960A (zh) * 2017-06-07 2018-12-14 丁保粮 一种气液喷淋清洗机
CN108325900B (zh) * 2017-09-19 2021-02-02 福建晟哲自动化科技有限公司 一种液晶面板清洗设备
CN207793414U (zh) * 2017-12-06 2018-08-31 北京铂阳顶荣光伏科技有限公司 具有防气体飘逸功能的板材镀膜设备
CN109047074B (zh) * 2018-08-26 2021-02-26 东莞市金盘模具配件有限公司 一种精密模具加工用表面清洗装置
CN109248878B (zh) * 2018-08-31 2020-10-13 深圳市华星光电技术有限公司 一种清洗平台以及清洗方法
CN110681666A (zh) * 2019-08-09 2020-01-14 江苏迪佳电子有限公司 一种电容触摸屏加工装置
JP7312738B2 (ja) * 2020-12-11 2023-07-21 芝浦メカトロニクス株式会社 基板処理装置
CN113154862B (zh) * 2021-02-26 2022-07-15 东莞汇和电子有限公司 一种电子线路板装配活塞干燥风刀
CN113020080A (zh) * 2021-03-30 2021-06-25 苏州阿洛斯环境发生器有限公司 一种定向线性双流体清洗方法及装置
CN113020079A (zh) * 2021-03-30 2021-06-25 苏州阿洛斯环境发生器有限公司 一种定向双流体清洗方法
CN116000042A (zh) * 2022-12-21 2023-04-25 芜湖东旭光电科技有限公司 玻璃基板预清洗装置
CN115947119B (zh) * 2023-03-14 2023-05-23 合肥光微光电科技有限公司 一种光学玻璃生产自动化输送设备
CN116765015A (zh) * 2023-05-19 2023-09-19 上海新阳半导体材料股份有限公司 电子元件处理装置
CN117772739A (zh) * 2023-12-05 2024-03-29 湖南邵虹特种玻璃股份有限公司 一种基板玻璃预湿机的防水汽向外泄漏设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980066508A (ko) * 1997-01-24 1998-10-15 구자홍 PDP(Plasma Display Panel)용 박리장치 및 그 방법
KR19990011149A (ko) * 1997-07-22 1999-02-18 구자홍 플라스마 디스플레이 패널용 세정 시스템
KR19990080885A (ko) * 1998-04-23 1999-11-15 김영환 포토레지스트의 에지부 제거 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5564159A (en) * 1994-05-26 1996-10-15 The John Treiber Company Closed-loop multistage system for cleaning printed circuit boards
JP3171807B2 (ja) * 1997-01-24 2001-06-04 東京エレクトロン株式会社 洗浄装置及び洗浄方法
JPH11121427A (ja) * 1997-10-13 1999-04-30 Dainippon Screen Mfg Co Ltd 基板処理装置
DE10130999A1 (de) * 2000-06-29 2002-04-18 D M S Co Multifunktions-Reinigungsmodul einer Herstellungseinrichtung für Flachbildschirme und Reinigungsgerät mit Verwendung desselben
JP2004074021A (ja) * 2002-08-19 2004-03-11 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板洗浄ユニット
JP2004273984A (ja) * 2003-03-12 2004-09-30 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP2004335838A (ja) * 2003-05-09 2004-11-25 Shin Etsu Handotai Co Ltd 洗浄装置、洗浄システム及び洗浄方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980066508A (ko) * 1997-01-24 1998-10-15 구자홍 PDP(Plasma Display Panel)용 박리장치 및 그 방법
KR19990011149A (ko) * 1997-07-22 1999-02-18 구자홍 플라스마 디스플레이 패널용 세정 시스템
KR19990080885A (ko) * 1998-04-23 1999-11-15 김영환 포토레지스트의 에지부 제거 장치

Also Published As

Publication number Publication date
JP2007134665A (ja) 2007-05-31
CN1947871A (zh) 2007-04-18
JP4668088B2 (ja) 2011-04-13
TWI303849B (enExample) 2008-12-01
KR20070041320A (ko) 2007-04-18
CN1947871B (zh) 2010-12-08
TW200715389A (en) 2007-04-16

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