KR100800397B1 - 탑 코트 조성물 - Google Patents
탑 코트 조성물 Download PDFInfo
- Publication number
- KR100800397B1 KR100800397B1 KR1020067017757A KR20067017757A KR100800397B1 KR 100800397 B1 KR100800397 B1 KR 100800397B1 KR 1020067017757 A KR1020067017757 A KR 1020067017757A KR 20067017757 A KR20067017757 A KR 20067017757A KR 100800397 B1 KR100800397 B1 KR 100800397B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- top coat
- coat composition
- compound
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004104885 | 2004-03-31 | ||
| JPJP-P-2004-00104885 | 2004-03-31 | ||
| JP2004201439A JP4484603B2 (ja) | 2004-03-31 | 2004-07-08 | トップコート組成物 |
| JPJP-P-2004-00201439 | 2004-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20070007093A KR20070007093A (ko) | 2007-01-12 |
| KR100800397B1 true KR100800397B1 (ko) | 2008-02-01 |
Family
ID=35125235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020067017757A Expired - Fee Related KR100800397B1 (ko) | 2004-03-31 | 2005-03-22 | 탑 코트 조성물 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7402626B2 (enExample) |
| EP (1) | EP1720067A4 (enExample) |
| JP (1) | JP4484603B2 (enExample) |
| KR (1) | KR100800397B1 (enExample) |
| TW (1) | TW200604749A (enExample) |
| WO (1) | WO2005098541A1 (enExample) |
Families Citing this family (85)
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| JP4621451B2 (ja) * | 2004-08-11 | 2011-01-26 | 富士フイルム株式会社 | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
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| JP4322205B2 (ja) | 2004-12-27 | 2009-08-26 | 東京応化工業株式会社 | レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法 |
| JP4510644B2 (ja) * | 2005-01-11 | 2010-07-28 | 東京応化工業株式会社 | 保護膜形成用材料、積層体およびレジストパターン形成方法 |
| US7799883B2 (en) * | 2005-02-22 | 2010-09-21 | Promerus Llc | Norbornene-type polymers, compositions thereof and lithographic process using such compositions |
| US7288362B2 (en) * | 2005-02-23 | 2007-10-30 | International Business Machines Corporation | Immersion topcoat materials with improved performance |
| JP4600112B2 (ja) * | 2005-03-24 | 2010-12-15 | Jsr株式会社 | 液浸用上層膜形成組成物およびフォトレジストパターン形成方法 |
| US7223527B2 (en) * | 2005-04-21 | 2007-05-29 | Winbond Electronics Corp. | Immersion lithography process, and structure used for the same and patterning process |
| JP2006301524A (ja) * | 2005-04-25 | 2006-11-02 | Tokyo Ohka Kogyo Co Ltd | 保護膜形成用材料およびこれを用いたレジストパターン形成方法 |
| JP5203575B2 (ja) * | 2005-05-04 | 2013-06-05 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | コーティング組成物 |
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| JP4484603B2 (ja) * | 2004-03-31 | 2010-06-16 | セントラル硝子株式会社 | トップコート組成物 |
| JP4697406B2 (ja) * | 2004-08-05 | 2011-06-08 | 信越化学工業株式会社 | 高分子化合物,レジスト保護膜材料及びパターン形成方法 |
-
2004
- 2004-07-08 JP JP2004201439A patent/JP4484603B2/ja not_active Expired - Fee Related
- 2004-11-04 US US10/980,769 patent/US7402626B2/en not_active Expired - Lifetime
-
2005
- 2005-03-22 WO PCT/JP2005/005113 patent/WO2005098541A1/ja not_active Ceased
- 2005-03-22 EP EP05727061A patent/EP1720067A4/en not_active Withdrawn
- 2005-03-22 KR KR1020067017757A patent/KR100800397B1/ko not_active Expired - Fee Related
- 2005-03-25 TW TW094109450A patent/TW200604749A/zh not_active IP Right Cessation
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| JPH08305024A (ja) * | 1995-05-08 | 1996-11-22 | Mitsubishi Chem Corp | リソグラフィーにおける性能向上用塗布組成物および当該塗布組成物を使用したパターン形成方法 |
| JPH09325500A (ja) * | 1996-06-07 | 1997-12-16 | Mitsubishi Chem Corp | 表面反射防止塗布組成物及びパターン形成方法 |
| WO2002066526A1 (en) * | 2001-02-23 | 2002-08-29 | Daikin Industries, Ltd. | Ethylenic fluoromonomer containing hydroxyl or fluoroalkylcarbonyl group and fluoropolymer obtained by polymerizing the same |
| JP2003040840A (ja) * | 2001-07-24 | 2003-02-13 | Central Glass Co Ltd | 含フッ素重合性単量体およびそれを用いた高分子化合物 |
| JP2004083900A (ja) * | 2002-08-07 | 2004-03-18 | Central Glass Co Ltd | 含フッ素化合物とその高分子化合物 |
| JP2005029539A (ja) * | 2003-07-10 | 2005-02-03 | Central Glass Co Ltd | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1720067A4 (en) | 2010-04-28 |
| WO2005098541A1 (ja) | 2005-10-20 |
| EP1720067A1 (en) | 2006-11-08 |
| TWI305871B (enExample) | 2009-02-01 |
| US7402626B2 (en) | 2008-07-22 |
| JP4484603B2 (ja) | 2010-06-16 |
| US20050250898A1 (en) | 2005-11-10 |
| TW200604749A (en) | 2006-02-01 |
| JP2005316352A (ja) | 2005-11-10 |
| KR20070007093A (ko) | 2007-01-12 |
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