KR100635693B1 - 플라즈마 처리 챔버 포커스 링 - Google Patents

플라즈마 처리 챔버 포커스 링 Download PDF

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Publication number
KR100635693B1
KR100635693B1 KR1020007006568A KR20007006568A KR100635693B1 KR 100635693 B1 KR100635693 B1 KR 100635693B1 KR 1020007006568 A KR1020007006568 A KR 1020007006568A KR 20007006568 A KR20007006568 A KR 20007006568A KR 100635693 B1 KR100635693 B1 KR 100635693B1
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South Korea
Prior art keywords
focus ring
chuck
plasma
plasma processing
processing chamber
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Expired - Lifetime
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KR1020007006568A
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Korean (ko)
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KR20010033185A (ko
Inventor
라진더 딘사
켄 토쿠나가
비크람 싱
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램 리서치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/915—Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Special Wing (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Glass Compositions (AREA)
  • Adornments (AREA)
KR1020007006568A 1997-12-19 1998-12-11 플라즈마 처리 챔버 포커스 링 Expired - Lifetime KR100635693B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US8/993,791 1997-12-19
US08/993,791 1997-12-19
US08/993,791 US6039836A (en) 1997-12-19 1997-12-19 Focus rings
PCT/US1998/026412 WO1999033087A1 (en) 1997-12-19 1998-12-11 Focus rings and methods therefor

Publications (2)

Publication Number Publication Date
KR20010033185A KR20010033185A (ko) 2001-04-25
KR100635693B1 true KR100635693B1 (ko) 2006-10-17

Family

ID=25539940

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007006568A Expired - Lifetime KR100635693B1 (ko) 1997-12-19 1998-12-11 플라즈마 처리 챔버 포커스 링

Country Status (8)

Country Link
US (1) US6039836A (https=)
EP (1) EP1042783B1 (https=)
JP (1) JP4548560B2 (https=)
KR (1) KR100635693B1 (https=)
AT (1) ATE273562T1 (https=)
DE (1) DE69825630T2 (https=)
IL (1) IL136874A (https=)
WO (1) WO1999033087A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108281342A (zh) * 2017-01-05 2018-07-13 东京毅力科创株式会社 等离子体处理装置

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Cited By (2)

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CN108281342A (zh) * 2017-01-05 2018-07-13 东京毅力科创株式会社 等离子体处理装置
CN108281342B (zh) * 2017-01-05 2020-01-21 东京毅力科创株式会社 等离子体处理装置

Also Published As

Publication number Publication date
IL136874A (en) 2003-07-31
EP1042783B1 (en) 2004-08-11
WO1999033087A1 (en) 1999-07-01
JP4548560B2 (ja) 2010-09-22
KR20010033185A (ko) 2001-04-25
ATE273562T1 (de) 2004-08-15
IL136874A0 (en) 2001-06-14
JP2001527285A (ja) 2001-12-25
DE69825630D1 (de) 2004-09-16
DE69825630T2 (de) 2005-09-15
US6039836A (en) 2000-03-21
EP1042783A1 (en) 2000-10-11

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