KR100547959B1 - 투명한 금속 산화물 콜로이드 및 세라머를 제조하기 위한 나노크기 금속 산화물 입자 - Google Patents

투명한 금속 산화물 콜로이드 및 세라머를 제조하기 위한 나노크기 금속 산화물 입자 Download PDF

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KR100547959B1
KR100547959B1 KR1020017001211A KR20017001211A KR100547959B1 KR 100547959 B1 KR100547959 B1 KR 100547959B1 KR 1020017001211 A KR1020017001211 A KR 1020017001211A KR 20017001211 A KR20017001211 A KR 20017001211A KR 100547959 B1 KR100547959 B1 KR 100547959B1
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metal oxide
oxide particles
particles
ceramer
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Korean (ko)
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KR20010106425A (ko
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아니데이비드에스
우드토마스이
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미네소타 마이닝 앤드 매뉴팩춰링 캄파니
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3692—Combinations of treatments provided for in groups C09C1/3615 - C09C1/3684
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/003—Titanates
    • C01G23/006—Alkaline earth titanates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/16—Solid spheres
    • C08K7/18—Solid spheres inorganic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3607—Titanium dioxide
    • C09C1/3684—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Geology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Colloid Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020017001211A 1998-07-30 1998-07-30 투명한 금속 산화물 콜로이드 및 세라머를 제조하기 위한 나노크기 금속 산화물 입자 Expired - Fee Related KR100547959B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1998/015843 WO2000006495A1 (en) 1998-07-30 1998-07-30 Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers

Publications (2)

Publication Number Publication Date
KR20010106425A KR20010106425A (ko) 2001-11-29
KR100547959B1 true KR100547959B1 (ko) 2006-02-02

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KR1020017001211A Expired - Fee Related KR100547959B1 (ko) 1998-07-30 1998-07-30 투명한 금속 산화물 콜로이드 및 세라머를 제조하기 위한 나노크기 금속 산화물 입자
KR1020017001623A Expired - Fee Related KR100588324B1 (ko) 1998-07-30 1998-12-30 브롬화된 중합체 및 무기 산화물 입자를 함유하는 세라머

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KR1020017001623A Expired - Fee Related KR100588324B1 (ko) 1998-07-30 1998-12-30 브롬화된 중합체 및 무기 산화물 입자를 함유하는 세라머

Country Status (8)

Country Link
EP (2) EP1112228B1 (https=)
JP (2) JP4279465B2 (https=)
KR (2) KR100547959B1 (https=)
CN (1) CN1202015C (https=)
AU (2) AU8761498A (https=)
CA (2) CA2338917A1 (https=)
DE (1) DE69827166T2 (https=)
WO (2) WO2000006495A1 (https=)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003513122A (ja) 1999-10-28 2003-04-08 スリーエム イノベイティブ プロパティズ カンパニー 組成物およびそれらから製造された物品
JP3517698B2 (ja) * 2000-03-03 2004-04-12 独立行政法人産業技術総合研究所 ナノ粒子分散構造体及びその積層体
JP4627355B2 (ja) * 2000-06-23 2011-02-09 大日本印刷株式会社 高屈折率コーティング組成物、高屈折率塗膜、画像表示装置、及び、反射防止フィルム
US8129443B2 (en) * 2000-08-11 2012-03-06 Sun Medical Co., Ltd. Polymerizable composition, cured object obtained therefrom, and composite material
US6497957B1 (en) * 2000-10-04 2002-12-24 Eastman Kodak Company Antireflection article of manufacture
TW528878B (en) * 2000-10-04 2003-04-21 Eastman Kodak Co Method of making an antireflection polymeric material
TW554176B (en) * 2000-10-04 2003-09-21 Eastman Kodak Co Method of optically modifying a polymeric material
EP1195623A1 (en) * 2000-10-04 2002-04-10 Eastman Kodak Company Method of making an antireflection article of manufacture
US6896958B1 (en) * 2000-11-29 2005-05-24 Nanophase Technologies Corporation Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles
JP4109117B2 (ja) * 2001-03-01 2008-07-02 シーメンス アクチエンゲゼルシヤフト 表面層および接着フィルムがカバーされて成る固体
KR100435314B1 (ko) * 2001-04-13 2004-06-10 (주)나노닉스 무기 나노 입자의 제조방법
US6962946B2 (en) 2001-11-21 2005-11-08 3M Innovative Properties Company Nanoparticles having a rutile-like crystalline phase and method of preparing same
DE10205920A1 (de) 2002-02-12 2003-08-21 Itn Nanovation Gmbh Nanoskaliger Rutil, sowie Verfahren zu dessen Herstellung
KR100476557B1 (ko) * 2002-04-24 2005-03-17 삼성전기주식회사 나노크기의 금속입자 형성방법 및 이를 이용한 전도층형성방법
JP2005526887A (ja) 2002-05-24 2005-09-08 スリーエム イノベイティブ プロパティズ カンパニー 油回収のための表面改質ナノ粒子の使用
US7141612B2 (en) 2002-12-31 2006-11-28 3M Innovative Properties Company Stabilized foams including surface-modified organic molecules
US7129277B2 (en) 2002-12-31 2006-10-31 3M Innovative Properties Company Emulsions including surface-modified inorganic nanoparticles
US7001580B2 (en) 2002-12-31 2006-02-21 3M Innovative Properties Company Emulsions including surface-modified organic molecules
EP1606670A4 (en) * 2003-03-04 2009-08-05 Pixelligent Technologies Llc APPLICATIONS OF SEMICONDUCTOR PARTICLES WITH NANOGROSIS FOR PHOTOLITHOGRAPHY
US8993221B2 (en) 2012-02-10 2015-03-31 Pixelligent Technologies, Llc Block co-polymer photoresist
US7459146B2 (en) 2003-05-30 2008-12-02 3M Innovative Properties Company Stabilized aerosol dispersions
US7109247B2 (en) 2003-05-30 2006-09-19 3M Innovative Properties Company Stabilized particle dispersions containing nanoparticles
US7169375B2 (en) 2003-08-29 2007-01-30 General Electric Company Metal oxide nanoparticles, methods of making, and methods of use
US7074463B2 (en) 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
US7289202B2 (en) 2004-09-10 2007-10-30 3M Innovative Properties Company Methods for testing durable optical elements
US7282272B2 (en) 2003-09-12 2007-10-16 3M Innovative Properties Company Polymerizable compositions comprising nanoparticles
US6842288B1 (en) 2003-10-30 2005-01-11 3M Innovative Properties Company Multilayer optical adhesives and articles
EP1685446A2 (en) * 2003-11-05 2006-08-02 DSM IP Assets B.V. A method and apparatus for producing microchips
EP1530086A1 (en) * 2003-11-05 2005-05-11 DSM IP Assets B.V. A method and an apparatus for producing micro-chips
US7189768B2 (en) 2003-11-25 2007-03-13 3M Innovative Properties Company Solution containing surface-modified nanoparticles
EP1740663A1 (en) * 2004-04-22 2007-01-10 JSR Corporation Low refractive index coating composition
JP5173119B2 (ja) * 2004-04-30 2013-03-27 学校法人日本大学 硬質膜、及び硬質膜製造方法
US7491661B2 (en) * 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
JP5231022B2 (ja) 2004-12-30 2013-07-10 スリーエム イノベイティブ プロパティズ カンパニー 表面改質ナノ粒子を含むポリマーブレンドおよびその製造方法
US7326448B2 (en) 2005-02-17 2008-02-05 3M Innovative Properties Company Polymerizable oligomeric urethane compositions comprising nanoparticles
JP2006273709A (ja) * 2005-03-03 2006-10-12 Mitsubishi Chemicals Corp 高屈折率を有するナノ粒子
US7274458B2 (en) 2005-03-07 2007-09-25 3M Innovative Properties Company Thermoplastic film having metallic nanoparticle coating
US20060204676A1 (en) * 2005-03-11 2006-09-14 Jones Clinton L Polymerizable composition comprising low molecular weight organic component
US7666494B2 (en) 2005-05-04 2010-02-23 3M Innovative Properties Company Microporous article having metallic nanoparticle coating
US20080003373A1 (en) 2005-05-11 2008-01-03 Yazaki Corporation Antireflective coating compositions and methods for depositing such coatings
US7400445B2 (en) 2005-05-31 2008-07-15 3M Innovative Properties Company Optical filters for accelerated weathering devices
JP4142734B2 (ja) 2005-09-16 2008-09-03 松下電器産業株式会社 回折光学素子
US7547467B2 (en) 2005-11-15 2009-06-16 3M Innovative Properties Company Brightness enhancing film and methods of surface treating inorganic nanoparticles
GB0602678D0 (en) * 2006-02-09 2006-03-22 Dupont Teijin Films Us Ltd Polyester film and manufacturing process
JP2007292883A (ja) * 2006-04-21 2007-11-08 Dainippon Printing Co Ltd 光学積層体
US7491287B2 (en) 2006-06-09 2009-02-17 3M Innovative Properties Company Bonding method with flowable adhesive composition
JP5186144B2 (ja) * 2006-07-18 2013-04-17 昭和電工株式会社 透明反射防止板
CN101563414A (zh) * 2006-12-20 2009-10-21 Hoya株式会社 金属氧化物系纳米粒子、其制造方法、纳米粒子分散树脂及其制造方法
EP1939689A1 (en) * 2006-12-28 2008-07-02 DSM IP Assets B.V. Immersion fluid and method for producing microchips
JP5309447B2 (ja) * 2007-01-25 2013-10-09 住友大阪セメント株式会社 表面被覆ナノ粒子及びその製造方法並びに表面被覆ナノ粒子分散液
JP2009091448A (ja) * 2007-10-09 2009-04-30 Momentive Performance Materials Japan Kk ハードコート用樹脂組成物
US7981986B2 (en) 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
CN105931696B (zh) 2010-04-23 2017-07-07 皮瑟莱根特科技有限责任公司 纳米晶体的合成、盖帽和分散
KR20130088037A (ko) * 2010-06-23 2013-08-07 니폰 가세이 가부시키가이샤 무기 유기 하이브리드 재료 및 그것을 사용한 광학 재료 그리고 무기 유기 복합재 조성물
EP2588626A4 (en) 2010-06-30 2014-02-12 3M Innovative Properties Co DEVICE FOR FAST DETECTION OF MICROORGANISMS
US8920675B2 (en) 2010-10-27 2014-12-30 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
EP2718766A1 (en) 2011-06-08 2014-04-16 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
US9359689B2 (en) 2011-10-26 2016-06-07 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
WO2013078190A1 (en) * 2011-11-21 2013-05-30 3M Innovative Properties Company A paint protective film comprising nanoparticles
JP5895583B2 (ja) * 2012-02-21 2016-03-30 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子、照明装置および表示装置ならびに有機エレクトロルミネッセンス素子の製造方法
JP6022866B2 (ja) * 2012-09-14 2016-11-09 旭化成株式会社 アルカリ土類金属原子チタン酸化物分散液の製造方法
JP5846322B2 (ja) * 2013-09-30 2016-01-20 住友大阪セメント株式会社 無機粒子分散液、無機粒子含有組成物、塗膜、塗膜付きプラスチック基材、表示装置
CN105593169A (zh) 2013-09-30 2016-05-18 富士胶片株式会社 金属氧化物粒子的制造方法、金属氧化物粉末及磁记录介质
CN106604992B (zh) * 2014-09-10 2021-06-18 康特姆斯集团有限公司 用于分离生物大分子的吸附剂材料
EP3568377A1 (en) * 2017-01-11 2019-11-20 Basf Se Process for producing nanoparticles
JP6564551B1 (ja) * 2018-11-27 2019-08-21 株式会社アドマテックス 表面改質チタン酸バリウム粒子材料、チタン酸バリウム含有樹脂組成物、及びチタン酸バリウム分散液
WO2021260601A1 (en) * 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793293A (en) * 1971-08-04 1974-02-19 Nat Starch Chem Corp Electrophotographic coating compositions having bromine-containing polymer binders
GB2089826B (en) * 1980-12-18 1985-01-03 Gen Electric Abrasion resistant ultraviolet light curable hard coating compositions
US4478876A (en) * 1980-12-18 1984-10-23 General Electric Company Process of coating a substrate with an abrasion resistant ultraviolet curable composition
US4438190A (en) * 1981-03-04 1984-03-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates
US4487904A (en) * 1983-09-21 1984-12-11 Toray Industries, Inc. Urethanized acrylic resin material for plastic lens and lens composed thereof
JPS63279201A (ja) * 1987-05-12 1988-11-16 Kureha Chem Ind Co Ltd 樹脂レンズ
DE3736686A1 (de) * 1987-10-29 1989-05-11 Fraunhofer Ges Forschung Verfahren zur herstellung von monodispersen keramischen pulvern
IL89696A0 (en) * 1988-04-11 1989-09-28 Minnesota Mining & Mfg Abrasion resistant coatings comprising silicon dioxide dispersions
US5002795A (en) * 1988-04-29 1991-03-26 Metallized Products, Inc. Method of making a fire retardant and antistatic film
JPH02278125A (ja) * 1989-04-19 1990-11-14 Mitsubishi Pencil Co Ltd 筆記具のインキ吸蔵体のインキ検知方法
JPH03153715A (ja) * 1989-11-10 1991-07-01 Kuraray Co Ltd 光学用メタクリル系樹脂
DE4233396A1 (de) * 1992-10-05 1994-04-07 Merck Patent Gmbh Oberflächenmodifizierte Oxidpartikel und ihre Anwendung als Füll- und Modifizierungsmittel in Polymermaterialien
US5372796A (en) * 1993-04-13 1994-12-13 Southwest Research Institute Metal oxide-polymer composites
US5391210A (en) * 1993-12-16 1995-02-21 Minnesota Mining And Manufacturing Company Abrasive article
JP3536067B2 (ja) * 1995-09-11 2004-06-07 日本エーアールシー株式会社 プライマー組成物
US6355754B1 (en) * 1997-05-09 2002-03-12 3M Innovative Properties Company High refractive index chemical composition and polymers and polymeric material derived therefrom
US5932626A (en) * 1997-05-09 1999-08-03 Minnesota Mining And Manufacturing Company Optical product prepared from high index of refraction brominated monomers
WO2000014050A1 (en) * 1998-09-02 2000-03-16 Minnesota Mining And Manufacturing Company Brominated materials

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CN1303351A (zh) 2001-07-11
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AU8761498A (en) 2000-02-21
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EP1112228B1 (en) 2004-10-20
CA2338917A1 (en) 2000-02-10
EP1105430A1 (en) 2001-06-13
AU744976B2 (en) 2002-03-07
WO2000006495A1 (en) 2000-02-10
CA2338920A1 (en) 2000-02-10
KR100588324B1 (ko) 2006-06-12
CN1202015C (zh) 2005-05-18
EP1112228A1 (en) 2001-07-04
JP2003521556A (ja) 2003-07-15
JP4279465B2 (ja) 2009-06-17
JP2002521305A (ja) 2002-07-16
JP4223686B2 (ja) 2009-02-12
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WO2000006622A1 (en) 2000-02-10
DE69827166D1 (de) 2004-11-25

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