KR100524353B1 - 엑스선 노광장치, 엑스선 노광방법, 엑스선 마스크,엑스선 미러, 싱크로트론 방사장치, 싱크로트론 방사방법및 반도체 장치 - Google Patents

엑스선 노광장치, 엑스선 노광방법, 엑스선 마스크,엑스선 미러, 싱크로트론 방사장치, 싱크로트론 방사방법및 반도체 장치

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Publication number
KR100524353B1
KR100524353B1 KR10-2001-7001083A KR20017001083A KR100524353B1 KR 100524353 B1 KR100524353 B1 KR 100524353B1 KR 20017001083 A KR20017001083 A KR 20017001083A KR 100524353 B1 KR100524353 B1 KR 100524353B1
Authority
KR
South Korea
Prior art keywords
ray
synchrotron
semiconductor device
exposure apparatus
mirror
Prior art date
Application number
KR10-2001-7001083A
Other languages
English (en)
Other versions
KR20010085303A (ko
Inventor
이토가켄지
키타야마토요키
와타나베유타카
우자와순이치
Original Assignee
미쓰비시덴키 가부시키가이샤
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쓰비시덴키 가부시키가이샤, 캐논 가부시끼가이샤 filed Critical 미쓰비시덴키 가부시키가이샤
Publication of KR20010085303A publication Critical patent/KR20010085303A/ko
Application granted granted Critical
Publication of KR100524353B1 publication Critical patent/KR100524353B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Particle Accelerators (AREA)
KR10-2001-7001083A 1999-05-28 2001-01-26 엑스선 노광장치, 엑스선 노광방법, 엑스선 마스크,엑스선 미러, 싱크로트론 방사장치, 싱크로트론 방사방법및 반도체 장치 KR100524353B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11/149621 1999-05-28
JP11149621A JP2000338299A (ja) 1999-05-28 1999-05-28 Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置

Publications (2)

Publication Number Publication Date
KR20010085303A KR20010085303A (ko) 2001-09-07
KR100524353B1 true KR100524353B1 (ko) 2005-11-08

Family

ID=15479231

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-7001083A KR100524353B1 (ko) 1999-05-28 2001-01-26 엑스선 노광장치, 엑스선 노광방법, 엑스선 마스크,엑스선 미러, 싱크로트론 방사장치, 싱크로트론 방사방법및 반도체 장치

Country Status (6)

Country Link
US (1) US6947518B2 (ko)
EP (1) EP1107293A4 (ko)
JP (1) JP2000338299A (ko)
KR (1) KR100524353B1 (ko)
TW (1) TW454208B (ko)
WO (1) WO2000074119A1 (ko)

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KR100949141B1 (ko) 2007-11-06 2010-03-25 원광대학교산학협력단 Ｘ-선 튜브 광원에서의 특성방사선 획득 장치
US7978822B2 (en) * 2008-01-30 2011-07-12 Reflective X-Ray Optics Llc Mirror mounting, alignment, and scanning mechanism and scanning method for radiographic X-ray imaging, and X-ray imaging device having same
US20120085747A1 (en) * 2010-10-07 2012-04-12 Benson Chao Heater assembly and wafer processing apparatus using the same
US9966161B2 (en) * 2015-09-21 2018-05-08 Uchicago Argonne, Llc Mechanical design of thin-film diamond crystal mounting apparatus with optimized thermal contact and crystal strain for coherence preservation x-ray optics
KR102035949B1 (ko) * 2015-09-25 2019-10-23 고꾸리쯔 다이가꾸 호우징 오사까 다이가꾸 X선 현미경
US10649209B2 (en) 2016-07-08 2020-05-12 Daqri Llc Optical combiner apparatus
US10804063B2 (en) * 2016-09-15 2020-10-13 Baker Hughes, A Ge Company, Llc Multi-layer X-ray source fabrication
US10481678B2 (en) 2017-01-11 2019-11-19 Daqri Llc Interface-based modeling and design of three dimensional spaces using two dimensional representations
DE102017202312B4 (de) * 2017-02-14 2018-10-04 Siemens Healthcare Gmbh Verfahren zur Herstellung eines Röntgen-Streustrahlenrasters
US11125993B2 (en) 2018-12-10 2021-09-21 Facebook Technologies, Llc Optical hyperfocal reflective systems and methods, and augmented reality and/or virtual reality displays incorporating same
US11221494B2 (en) 2018-12-10 2022-01-11 Facebook Technologies, Llc Adaptive viewport optical display systems and methods
JP2022516730A (ja) 2019-01-09 2022-03-02 フェイスブック・テクノロジーズ・リミテッド・ライアビリティ・カンパニー Ａｒ、ｈｍｄ、およびｈｕｄ用途向けの光導波路における不均一な副瞳リフレクタおよび方法
CN118076920A (zh) 2021-10-20 2024-05-24 日本碍子株式会社 Euv透过膜
US11863730B2 (en) 2021-12-07 2024-01-02 Snap Inc. Optical waveguide combiner systems and methods

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Also Published As

Publication number Publication date
TW454208B (en) 2001-09-11
EP1107293A1 (en) 2001-06-13
JP2000338299A (ja) 2000-12-08
EP1107293A4 (en) 2001-11-28
US6947518B2 (en) 2005-09-20
WO2000074119A1 (fr) 2000-12-07
US20010021239A1 (en) 2001-09-13
KR20010085303A (ko) 2001-09-07

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