SG83821A1 - Stage device and exposure apparatus - Google Patents

Stage device and exposure apparatus

Info

Publication number
SG83821A1
SG83821A1 SG200005968A SG200005968A SG83821A1 SG 83821 A1 SG83821 A1 SG 83821A1 SG 200005968 A SG200005968 A SG 200005968A SG 200005968 A SG200005968 A SG 200005968A SG 83821 A1 SG83821 A1 SG 83821A1
Authority
SG
Singapore
Prior art keywords
exposure apparatus
stage device
stage
exposure
Prior art date
Application number
SG200005968A
Inventor
Shiwen Li
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG83821A1 publication Critical patent/SG83821A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200005968A 1999-10-18 2000-10-17 Stage device and exposure apparatus SG83821A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29489099A JP2001118773A (en) 1999-10-18 1999-10-18 Stage device and exposure system

Publications (1)

Publication Number Publication Date
SG83821A1 true SG83821A1 (en) 2001-10-16

Family

ID=17813585

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200005968A SG83821A1 (en) 1999-10-18 2000-10-17 Stage device and exposure apparatus

Country Status (5)

Country Link
US (1) US6417914B1 (en)
JP (1) JP2001118773A (en)
KR (1) KR20010040094A (en)
SG (1) SG83821A1 (en)
TW (1) TW511144B (en)

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JP4689058B2 (en) * 2001-02-16 2011-05-25 キヤノン株式会社 Linear motor, stage apparatus, exposure apparatus, and device manufacturing method
US6927838B2 (en) * 2001-02-27 2005-08-09 Nikon Corporation Multiple stage, stage assembly having independent stage bases
JP2002280283A (en) * 2001-03-16 2002-09-27 Canon Inc Substrate treating device
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
US6674512B2 (en) 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
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US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) * 2001-10-22 2003-12-16 Nikon Corporation Two stage method
US6756706B2 (en) * 2002-01-18 2004-06-29 Nikon Corporation Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines
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JP3862639B2 (en) * 2002-08-30 2006-12-27 キヤノン株式会社 Exposure equipment
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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JP3953460B2 (en) 2002-11-12 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic projection apparatus
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US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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KR101419663B1 (en) * 2003-06-19 2014-07-15 가부시키가이샤 니콘 Exposure device and device producing method
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI519819B (en) 2003-11-20 2016-02-01 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
US7221433B2 (en) 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
TWI511182B (en) 2004-02-06 2015-12-01 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
JP2005253179A (en) * 2004-03-03 2005-09-15 Canon Inc Positioning device, aligner and device manufacturing method
KR101441777B1 (en) * 2004-03-25 2014-09-22 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
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WO2005110898A2 (en) 2004-05-07 2005-11-24 Magnemotion, Inc. Three-dimensional motion using single-pathway based actuators
US7463330B2 (en) * 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2006006730A1 (en) * 2004-07-15 2008-05-01 株式会社ニコン Planar motor apparatus, stage apparatus, exposure apparatus, and device manufacturing method
US7388663B2 (en) * 2004-10-28 2008-06-17 Asml Netherlands B.V. Optical position assessment apparatus and method
US7515281B2 (en) 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161659B2 (en) 2005-04-08 2007-01-09 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
KR101455551B1 (en) 2005-05-12 2014-10-27 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
JP4410216B2 (en) * 2005-05-24 2010-02-03 エーエスエムエル ネザーランズ ビー．ブイ． Two-stage lithography apparatus and device manufacturing method
JP4834439B2 (en) * 2006-03-30 2011-12-14 キヤノン株式会社 Stage apparatus and control method thereof, exposure apparatus and device manufacturing method
TWI454859B (en) * 2006-03-30 2014-10-01 尼康股份有限公司 Mobile device, exposure device and exposure method, and component manufacturing method
US7483120B2 (en) * 2006-05-09 2009-01-27 Asml Netherlands B.V. Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
JP2007312516A (en) * 2006-05-18 2007-11-29 Canon Inc Drive device, aligner, and method for manufacturing device
US7502103B2 (en) 2006-05-31 2009-03-10 Asml Netherlands B.V. Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
KR100745371B1 (en) * 2006-10-23 2007-08-02 삼성전자주식회사 Device for cleaning wafer chuck of semiconductor stepper
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9176393B2 (en) * 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US20100053588A1 (en) * 2008-08-29 2010-03-04 Nikon Corporation Substrate Stage movement patterns for high throughput While Imaging a Reticle to a pair of Imaging Locations
US20100090545A1 (en) * 2008-10-09 2010-04-15 Binnard Michael B Planar motor with wedge shaped magnets and diagonal magnetization directions
US8616134B2 (en) 2009-01-23 2013-12-31 Magnemotion, Inc. Transport system powered by short block linear synchronous motors
US9032880B2 (en) 2009-01-23 2015-05-19 Magnemotion, Inc. Transport system powered by short block linear synchronous motors and switching mechanism
US8553204B2 (en) * 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8355114B2 (en) * 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
CN103246170B (en) * 2012-02-09 2015-07-08 中芯国际集成电路制造(上海)有限公司 Exposure device and exposure method
NL2010934A (en) * 2012-06-11 2013-12-12 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR102126664B1 (en) 2012-10-02 2020-06-25 가부시키가이샤 니콘 Mobile body device, exposure device, and device-manufacturing method
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CN104950598B (en) * 2015-07-07 2017-05-24 合肥芯硕半导体有限公司 Up-and-down distributed double-workpiece-stage device
CN105511234A (en) * 2016-01-14 2016-04-20 哈尔滨工业大学 Dynamic magnetic steel magnetic levitation two-workpiece-stage vector arc replacement method and device based on wireless energy transmission
JP7364323B2 (en) * 2017-07-14 2023-10-18 エーエスエムエル ネザーランズ ビー．ブイ． Measurement equipment and substrate stage handler system
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US4993696A (en) * 1986-12-01 1991-02-19 Canon Kabushiki Kaisha Movable stage mechanism
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
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Patent Citations (6)

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US4699515A (en) * 1984-02-28 1987-10-13 Nippon Kogaku K. K. Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
US4993696A (en) * 1986-12-01 1991-02-19 Canon Kabushiki Kaisha Movable stage mechanism
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
US5850280A (en) * 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
WO1999031462A1 (en) * 1997-12-18 1999-06-24 Nikon Corporation Stage device and exposure apparatus
WO2000052744A1 (en) * 1999-02-26 2000-09-08 Nikon Corporation Stage device and production method thereof, position control method, exposure system and production method thereof, and device and production method thereof

Also Published As

Publication number Publication date
JP2001118773A (en) 2001-04-27
US6417914B1 (en) 2002-07-09
TW511144B (en) 2002-11-21
KR20010040094A (en) 2001-05-15

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