AU2944500A - Exposure method and apparatus - Google Patents

Exposure method and apparatus

Info

Publication number
AU2944500A
AU2944500A AU29445/00A AU2944500A AU2944500A AU 2944500 A AU2944500 A AU 2944500A AU 29445/00 A AU29445/00 A AU 29445/00A AU 2944500 A AU2944500 A AU 2944500A AU 2944500 A AU2944500 A AU 2944500A
Authority
AU
Australia
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU29445/00A
Inventor
Makoto Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2944500A publication Critical patent/AU2944500A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
AU29445/00A 1999-03-26 2000-03-14 Exposure method and apparatus Abandoned AU2944500A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8317899 1999-03-26
JP11/83178 1999-03-26
PCT/JP2000/001540 WO2000059012A1 (en) 1999-03-26 2000-03-14 Exposure method and apparatus

Publications (1)

Publication Number Publication Date
AU2944500A true AU2944500A (en) 2000-10-16

Family

ID=13795052

Family Applications (1)

Application Number Title Priority Date Filing Date
AU29445/00A Abandoned AU2944500A (en) 1999-03-26 2000-03-14 Exposure method and apparatus

Country Status (3)

Country Link
KR (1) KR20010112286A (en)
AU (1) AU2944500A (en)
WO (1) WO2000059012A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001319871A (en) 2000-02-29 2001-11-16 Nikon Corp Exposing method, method of manufacturing gray filter and aligner
KR101096478B1 (en) * 2003-01-23 2011-12-20 가부시키가이샤 니콘 Exposure device
JP2006203032A (en) * 2005-01-21 2006-08-03 Victor Co Of Japan Ltd Method of manufacturing element
JP5190860B2 (en) 2007-01-22 2013-04-24 学校法人東京電機大学 Projection exposure apparatus and projection exposure method
WO2008120785A1 (en) * 2007-04-03 2008-10-09 Nsk Ltd. Exposure apparatus and exposure method
JP5184808B2 (en) * 2007-04-03 2013-04-17 Ｎｓｋテクノロジー株式会社 Exposure method and exposure apparatus
JP4799575B2 (en) 2008-03-06 2011-10-26 株式会社東芝 Imprint method
CN111258172A (en) * 2020-01-21 2020-06-09 中国科学院微电子研究所 Novel mask for manufacturing display panel and parameter determination method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5486896A (en) * 1993-02-19 1996-01-23 Nikon Corporation Exposure apparatus
JPH07135166A (en) * 1993-11-11 1995-05-23 Nikon Corp Aligner
JP3427132B2 (en) * 1994-02-22 2003-07-14 株式会社ニコン Exposure equipment
JPH10256140A (en) * 1997-03-07 1998-09-25 Canon Inc Device aligner and method thereof

Also Published As

Publication number Publication date
KR20010112286A (en) 2001-12-20
WO2000059012A1 (en) 2000-10-05

Similar Documents

Publication Publication Date Title
AU1078700A (en) Exposure method and exposure apparatus
AU1160801A (en) Apparatus and method
AU3543400A (en) Application apparatus and method
AU7484500A (en) Cargo-transfer apparatus and method
AU4653999A (en) Exposure method and system
AU1179200A (en) Exposure method and device
AU1555001A (en) Exposure method and apparatus
AU4810800A (en) Prosthetic apparatus and method
AU6097200A (en) Chlorination apparatus and method
SG83810A1 (en) Exposure method and exposure apparatus
AU2002253574A1 (en) Exposure method and apparatus
AU2076099A (en) Exposure method and device
AU1576901A (en) Method and apparatus for film anti-piracy
AU3970899A (en) Ferrographic method and apparatus
AU4143000A (en) Exposure method and apparatus
AU4949900A (en) Exposure method and apparatus
AU2327800A (en) Exposure method and apparatus
AU1554901A (en) Exposure method and exposure apparatus
AUPP855599A0 (en) Apparatus and method
AU1689899A (en) Exposure method and exposure apparatus
AU5876000A (en) Dosimeter apparatus and method
AU4395099A (en) Exposure method and device
AU4061099A (en) Exposure method and exposure apparatus
AU3729999A (en) Exposure method and apparatus
AU2940600A (en) Exposure method and apparatus

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase