KR100351009B1 - 박막트랜지스터를포함하는장치및박막트랜지스터제조방법 - Google Patents
박막트랜지스터를포함하는장치및박막트랜지스터제조방법 Download PDFInfo
- Publication number
- KR100351009B1 KR100351009B1 KR1019950049121A KR19950049121A KR100351009B1 KR 100351009 B1 KR100351009 B1 KR 100351009B1 KR 1019950049121 A KR1019950049121 A KR 1019950049121A KR 19950049121 A KR19950049121 A KR 19950049121A KR 100351009 B1 KR100351009 B1 KR 100351009B1
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- layer
- organic
- film transistor
- contact means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000010409 thin film Substances 0.000 title claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 title description 9
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000004065 semiconductor Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 125000001544 thienyl group Chemical group 0.000 claims description 7
- 239000011368 organic material Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 4
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- 238000000151 deposition Methods 0.000 claims description 2
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- 239000004973 liquid crystal related substance Substances 0.000 abstract description 6
- 238000004151 rapid thermal annealing Methods 0.000 abstract description 6
- 230000015654 memory Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000009835 boiling Methods 0.000 description 8
- KXSFECAJUBPPFE-UHFFFAOYSA-N 2,2':5',2''-terthiophene Chemical group C1=CSC(C=2SC(=CC=2)C=2SC=CC=2)=C1 KXSFECAJUBPPFE-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 5
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
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- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 3
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
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- 238000000859 sublimation Methods 0.000 description 3
- 230000008022 sublimation Effects 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
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- 239000012442 inert solvent Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- SHXHPUAKLCCLDV-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione Chemical compound CC(=O)CC(=O)C(F)(F)F SHXHPUAKLCCLDV-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
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- 239000002775 capsule Substances 0.000 description 1
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- 238000004587 chromatography analysis Methods 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- AASUFOVSZUIILF-UHFFFAOYSA-N diphenylmethanone;sodium Chemical compound [Na].C=1C=CC=CC=1C(=O)C1=CC=CC=C1 AASUFOVSZUIILF-UHFFFAOYSA-N 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- AMIQXMHDLJIUBQ-UHFFFAOYSA-N manganese(3+) pentane-2,4-dione Chemical compound C(C)(=O)CC(C)=O.[Mn+3] AMIQXMHDLJIUBQ-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
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- 229910002027 silica gel Inorganic materials 0.000 description 1
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- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
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- 238000003786 synthesis reaction Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- -1 α- 5T Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/353,032 US5574291A (en) | 1994-12-09 | 1994-12-09 | Article comprising a thin film transistor with low conductivity organic layer |
| US353,032 | 1994-12-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960026961A KR960026961A (ko) | 1996-07-22 |
| KR100351009B1 true KR100351009B1 (ko) | 2003-01-29 |
Family
ID=23387469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950049121A Expired - Lifetime KR100351009B1 (ko) | 1994-12-09 | 1995-12-09 | 박막트랜지스터를포함하는장치및박막트랜지스터제조방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5574291A (enExample) |
| EP (1) | EP0716458B1 (enExample) |
| JP (1) | JP3145294B2 (enExample) |
| KR (1) | KR100351009B1 (enExample) |
| CA (1) | CA2160394C (enExample) |
| DE (1) | DE69532794T2 (enExample) |
| MX (1) | MX9505068A (enExample) |
| TW (1) | TW279260B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7838872B2 (en) | 2005-03-09 | 2010-11-23 | Samsung Electronics Co., Ltd. | Organic thin film transistor array panel |
Families Citing this family (120)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5663077A (en) | 1993-07-27 | 1997-09-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films |
| US6278127B1 (en) * | 1994-12-09 | 2001-08-21 | Agere Systems Guardian Corp. | Article comprising an organic thin film transistor adapted for biasing to form a N-type or a P-type transistor |
| US7167155B1 (en) | 1995-07-20 | 2007-01-23 | E Ink Corporation | Color electrophoretic displays |
| US6107117A (en) * | 1996-12-20 | 2000-08-22 | Lucent Technologies Inc. | Method of making an organic thin film transistor |
| US6194167B1 (en) * | 1997-02-18 | 2001-02-27 | Washington State University Research Foundation | ω-3 fatty acid desaturase |
| US5796121A (en) * | 1997-03-25 | 1998-08-18 | International Business Machines Corporation | Thin film transistors fabricated on plastic substrates |
| US6839158B2 (en) | 1997-08-28 | 2005-01-04 | E Ink Corporation | Encapsulated electrophoretic displays having a monolayer of capsules and materials and methods for making the same |
| US7242513B2 (en) | 1997-08-28 | 2007-07-10 | E Ink Corporation | Encapsulated electrophoretic displays having a monolayer of capsules and materials and methods for making the same |
| US5936259A (en) * | 1997-10-16 | 1999-08-10 | Lucent Technologies Inc. | Thin film transistor and organic semiconductor material thereof |
| US6704133B2 (en) | 1998-03-18 | 2004-03-09 | E-Ink Corporation | Electro-optic display overlays and systems for addressing such displays |
| US7075502B1 (en) | 1998-04-10 | 2006-07-11 | E Ink Corporation | Full color reflective display with multichromatic sub-pixels |
| DE69918308T2 (de) * | 1998-04-10 | 2004-10-21 | E Ink Corp | Elektronische anzeige basierend auf organischen feldeffekt-transistoren |
| US6215130B1 (en) * | 1998-08-20 | 2001-04-10 | Lucent Technologies Inc. | Thin film transistors |
| US6384804B1 (en) | 1998-11-25 | 2002-05-07 | Lucent Techonologies Inc. | Display comprising organic smart pixels |
| US6498114B1 (en) | 1999-04-09 | 2002-12-24 | E Ink Corporation | Method for forming a patterned semiconductor film |
| US6842657B1 (en) | 1999-04-09 | 2005-01-11 | E Ink Corporation | Reactive formation of dielectric layers and protection of organic layers in organic semiconductor device fabrication |
| US6736985B1 (en) * | 1999-05-05 | 2004-05-18 | Agere Systems Inc. | High-resolution method for patterning a substrate with micro-printing |
| US6312971B1 (en) | 1999-08-31 | 2001-11-06 | E Ink Corporation | Solvent annealing process for forming a thin semiconductor film with advantageous properties |
| US6545291B1 (en) | 1999-08-31 | 2003-04-08 | E Ink Corporation | Transistor design for use in the construction of an electronically driven display |
| US6593690B1 (en) * | 1999-09-03 | 2003-07-15 | 3M Innovative Properties Company | Large area organic electronic devices having conducting polymer buffer layers and methods of making same |
| US6611096B1 (en) | 1999-09-03 | 2003-08-26 | 3M Innovative Properties Company | Organic electronic devices having conducting self-doped polymer buffer layers |
| DE10034873B4 (de) * | 2000-07-18 | 2005-10-13 | Pacifica Group Technologies Pty Ltd | Verfahren und Bremsanlage zum Regeln des Bremsvorgangs bei einem Kraftfahrzeug |
| US20040029310A1 (en) * | 2000-08-18 | 2004-02-12 | Adoft Bernds | Organic field-effect transistor (ofet), a production method therefor, an integrated circut constructed from the same and their uses |
| JP2004506985A (ja) * | 2000-08-18 | 2004-03-04 | シーメンス アクチエンゲゼルシヤフト | 封入された有機電子構成素子、その製造方法および使用 |
| DE10043204A1 (de) * | 2000-09-01 | 2002-04-04 | Siemens Ag | Organischer Feld-Effekt-Transistor, Verfahren zur Strukturierung eines OFETs und integrierte Schaltung |
| DE10044842A1 (de) * | 2000-09-11 | 2002-04-04 | Siemens Ag | Organischer Gleichrichter, Schaltung, RFID-Tag und Verwendung eines organischen Gleichrichters |
| DE10045192A1 (de) * | 2000-09-13 | 2002-04-04 | Siemens Ag | Organischer Datenspeicher, RFID-Tag mit organischem Datenspeicher, Verwendung eines organischen Datenspeichers |
| US20040026121A1 (en) * | 2000-09-22 | 2004-02-12 | Adolf Bernds | Electrode and/or conductor track for organic components and production method thereof |
| DE10061299A1 (de) * | 2000-12-08 | 2002-06-27 | Siemens Ag | Vorrichtung zur Feststellung und/oder Weiterleitung zumindest eines Umwelteinflusses, Herstellungsverfahren und Verwendung dazu |
| DE10061297C2 (de) * | 2000-12-08 | 2003-05-28 | Siemens Ag | Verfahren zur Sturkturierung eines OFETs |
| DE10063721A1 (de) * | 2000-12-20 | 2002-07-11 | Merck Patent Gmbh | Organischer Halbleiter, Herstellungsverfahren dazu und Verwendungen |
| DE10105914C1 (de) | 2001-02-09 | 2002-10-10 | Siemens Ag | Organischer Feldeffekt-Transistor mit fotostrukturiertem Gate-Dielektrikum und ein Verfahren zu dessen Erzeugung |
| JP2005509200A (ja) * | 2001-03-26 | 2005-04-07 | シーメンス アクチエンゲゼルシヤフト | 少なくとも２つの有機電子構成エレメントを有する装置、および該装置のための製造方法 |
| DE10126860C2 (de) * | 2001-06-01 | 2003-05-28 | Siemens Ag | Organischer Feldeffekt-Transistor, Verfahren zu seiner Herstellung und Verwendung zum Aufbau integrierter Schaltungen |
| JP4841751B2 (ja) * | 2001-06-01 | 2011-12-21 | 株式会社半導体エネルギー研究所 | 有機半導体装置及びその作製方法 |
| CN100407472C (zh) * | 2001-10-01 | 2008-07-30 | 皇家飞利浦电子股份有限公司 | 电子器件 |
| JP3856202B2 (ja) | 2001-10-05 | 2006-12-13 | 日本電気株式会社 | 有機薄膜トランジスタ |
| DE10151036A1 (de) * | 2001-10-16 | 2003-05-08 | Siemens Ag | Isolator für ein organisches Elektronikbauteil |
| JP3823312B2 (ja) | 2001-10-18 | 2006-09-20 | 日本電気株式会社 | 有機薄膜トランジスタ |
| DE10151440C1 (de) * | 2001-10-18 | 2003-02-06 | Siemens Ag | Organisches Elektronikbauteil, Verfahren zu seiner Herstellung und seine Verwendung |
| DE10153563A1 (de) * | 2001-10-30 | 2003-05-15 | Infineon Technologies Ag | Verringerung des Kontaktwiderstandes in organischen Feldeffekttransistoren durch Einbettung von Nanopartikeln zur Erzeugung von Feldüberhöhungen |
| DE10160732A1 (de) * | 2001-12-11 | 2003-06-26 | Siemens Ag | Organischer Feld-Effekt-Transistor mit verschobener Schwellwertspannung und Verwendung dazu |
| US6885146B2 (en) | 2002-03-14 | 2005-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device comprising substrates, contrast medium and barrier layers between contrast medium and each of substrates |
| DE10212639A1 (de) * | 2002-03-21 | 2003-10-16 | Siemens Ag | Vorrichtung und Verfahren zur Laserstrukturierung von Funktionspolymeren und Verwendungen |
| DE10212640B4 (de) * | 2002-03-21 | 2004-02-05 | Siemens Ag | Logische Bauteile aus organischen Feldeffekttransistoren |
| DE10226370B4 (de) * | 2002-06-13 | 2008-12-11 | Polyic Gmbh & Co. Kg | Substrat für ein elektronisches Bauteil, Verwendung des Substrates, Verfahren zur Erhöhung der Ladungsträgermobilität und Organischer Feld-Effekt Transistor (OFET) |
| JP4136482B2 (ja) * | 2002-06-20 | 2008-08-20 | キヤノン株式会社 | 有機半導体素子、その製造方法および有機半導体装置 |
| US7078702B2 (en) * | 2002-07-25 | 2006-07-18 | General Electric Company | Imager |
| EP1525630A2 (de) | 2002-07-29 | 2005-04-27 | Siemens Aktiengesellschaft | Elektronisches bauteil mit vorwiegend organischen funktionsmaterialien und herstellungsverfahren dazu |
| US6821811B2 (en) * | 2002-08-02 | 2004-11-23 | Semiconductor Energy Laboratory Co., Ltd. | Organic thin film transistor and method of manufacturing the same, and semiconductor device having the organic thin film transistor |
| DE50309888D1 (de) * | 2002-08-08 | 2008-07-03 | Polyic Gmbh & Co Kg | Elektronisches gerät |
| US6784017B2 (en) | 2002-08-12 | 2004-08-31 | Precision Dynamics Corporation | Method of creating a high performance organic semiconductor device |
| JP2005537637A (ja) | 2002-08-23 | 2005-12-08 | ジーメンス アクツィエンゲゼルシャフト | 過電圧保護用の有機構成部品および関連する回路 |
| WO2004042837A2 (de) * | 2002-11-05 | 2004-05-21 | Siemens Aktiengesellschaft | Organisches elektronisches bauteil mit hochaufgelöster strukturierung und herstellungsverfahren dazu |
| DE10253154A1 (de) | 2002-11-14 | 2004-05-27 | Siemens Ag | Messgerät zur Bestimmung eines Analyten in einer Flüssigkeitsprobe |
| US20060035423A1 (en) * | 2002-11-19 | 2006-02-16 | Walter Fix | Organic electronic component comprising the same organic material for at least two functional layers |
| WO2004047144A2 (de) * | 2002-11-19 | 2004-06-03 | Polyic Gmbh & Co.Kg | Organisches elektronisches bauelement mit stukturierter halbleitender funktionsschicht und herstellungsverfahren dazu |
| DE10300521A1 (de) * | 2003-01-09 | 2004-07-22 | Siemens Ag | Organoresistiver Speicher |
| EP1586127B1 (de) * | 2003-01-21 | 2007-05-02 | PolyIC GmbH & Co. KG | Organisches elektronikbauteil und verfahren zur herstellung organischer elektronik |
| DE10302149A1 (de) * | 2003-01-21 | 2005-08-25 | Siemens Ag | Verwendung leitfähiger Carbon-black/Graphit-Mischungen für die Herstellung von low-cost Elektronik |
| KR20050096162A (ko) * | 2003-01-28 | 2005-10-05 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 전자 디바이스 |
| ATE476739T1 (de) * | 2003-01-29 | 2010-08-15 | Polyic Gmbh & Co Kg | Organisches speicherbauelement |
| US7166689B2 (en) | 2003-02-13 | 2007-01-23 | Ricoh Company, Ltd. | Aryl amine polymer, thin film transistor using the aryl amine polymer, and method of manufacturing the thin film transistor |
| US7820999B2 (en) * | 2003-03-07 | 2010-10-26 | Polymer Vision Limited | Electronic arrangement including a thin film transistor having active and protective layers structured in a same two-dimensional pattern |
| WO2004093180A1 (en) | 2003-04-15 | 2004-10-28 | California Institute Of Technology | Flexible carbon-based ohmic contacts for organic transistors |
| DE10330064B3 (de) * | 2003-07-03 | 2004-12-09 | Siemens Ag | Logikgatter mit potentialfreier Gate-Elektrode für organische integrierte Schaltungen |
| DE10330062A1 (de) * | 2003-07-03 | 2005-01-27 | Siemens Ag | Verfahren und Vorrichtung zur Strukturierung von organischen Schichten |
| DE10338277A1 (de) * | 2003-08-20 | 2005-03-17 | Siemens Ag | Organischer Kondensator mit spannungsgesteuerter Kapazität |
| DE10339036A1 (de) | 2003-08-25 | 2005-03-31 | Siemens Ag | Organisches elektronisches Bauteil mit hochaufgelöster Strukturierung und Herstellungsverfahren dazu |
| KR100973811B1 (ko) * | 2003-08-28 | 2010-08-03 | 삼성전자주식회사 | 유기 반도체를 사용한 박막 트랜지스터 표시판 및 그 제조방법 |
| DE10340644B4 (de) * | 2003-09-03 | 2010-10-07 | Polyic Gmbh & Co. Kg | Mechanische Steuerelemente für organische Polymerelektronik |
| DE10340643B4 (de) * | 2003-09-03 | 2009-04-16 | Polyic Gmbh & Co. Kg | Druckverfahren zur Herstellung einer Doppelschicht für Polymerelektronik-Schaltungen, sowie dadurch hergestelltes elektronisches Bauelement mit Doppelschicht |
| KR100692448B1 (ko) | 2003-11-17 | 2007-03-09 | 후지제롯쿠스 가부시끼가이샤 | 유기 반도체 트랜지스터 소자, 이것을 사용한 반도체 장치및 그 반도체 장치의 제조 방법 |
| US7767998B2 (en) * | 2003-12-04 | 2010-08-03 | Alcatel-Lucent Usa Inc. | OFETs with active channels formed of densified layers |
| KR100576719B1 (ko) * | 2003-12-24 | 2006-05-03 | 한국전자통신연구원 | 하부 게이트형 유기박막 트랜지스터의 제조방법 |
| US7659138B2 (en) * | 2003-12-26 | 2010-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing an organic semiconductor element |
| US7554121B2 (en) * | 2003-12-26 | 2009-06-30 | Semiconductor Energy Laboratory Co., Ltd. | Organic semiconductor device |
| JP4877869B2 (ja) * | 2003-12-26 | 2012-02-15 | 株式会社半導体エネルギー研究所 | 有機半導体素子の作製方法 |
| DE102004002024A1 (de) * | 2004-01-14 | 2005-08-11 | Siemens Ag | Organischer Transistor mit selbstjustierender Gate-Elektrode und Verfahren zu dessen Herstellung |
| JP4100351B2 (ja) * | 2004-02-09 | 2008-06-11 | セイコーエプソン株式会社 | 薄膜トランジスタの製造方法 |
| JP2005268550A (ja) * | 2004-03-18 | 2005-09-29 | Japan Science & Technology Agency | 有機半導体及びそれを用いた半導体装置並びにそれらの製造方法 |
| US20050211973A1 (en) * | 2004-03-23 | 2005-09-29 | Kiyotaka Mori | Stressed organic semiconductor |
| JP4449549B2 (ja) | 2004-04-15 | 2010-04-14 | 日本電気株式会社 | 有橋環式炭化水素ラクトン構造を有する材料を用いた有機薄膜トランジスタとその製造方法 |
| US20050275056A1 (en) * | 2004-05-26 | 2005-12-15 | Stephen Forrest | Organic heterojunction bipolar transistor |
| DE102004040831A1 (de) * | 2004-08-23 | 2006-03-09 | Polyic Gmbh & Co. Kg | Funketikettfähige Umverpackung |
| US7291522B2 (en) * | 2004-10-28 | 2007-11-06 | Hewlett-Packard Development Company, L.P. | Semiconductor devices and methods of making |
| DE102004059465A1 (de) * | 2004-12-10 | 2006-06-14 | Polyic Gmbh & Co. Kg | Erkennungssystem |
| DE102004059464A1 (de) * | 2004-12-10 | 2006-06-29 | Polyic Gmbh & Co. Kg | Elektronikbauteil mit Modulator |
| DE102004059467A1 (de) * | 2004-12-10 | 2006-07-20 | Polyic Gmbh & Co. Kg | Gatter aus organischen Feldeffekttransistoren |
| DE102004063435A1 (de) | 2004-12-23 | 2006-07-27 | Polyic Gmbh & Co. Kg | Organischer Gleichrichter |
| DE102005009820A1 (de) * | 2005-03-01 | 2006-09-07 | Polyic Gmbh & Co. Kg | Elektronikbaugruppe mit organischen Logik-Schaltelementen |
| DE102005009819A1 (de) | 2005-03-01 | 2006-09-07 | Polyic Gmbh & Co. Kg | Elektronikbaugruppe |
| JP4632034B2 (ja) * | 2005-03-10 | 2011-02-16 | セイコーエプソン株式会社 | 有機強誘電体メモリの製造方法 |
| JP4667096B2 (ja) * | 2005-03-25 | 2011-04-06 | 株式会社半導体エネルギー研究所 | 有機半導体装置及びその作製方法 |
| DE102005017655B4 (de) | 2005-04-15 | 2008-12-11 | Polyic Gmbh & Co. Kg | Mehrschichtiger Verbundkörper mit elektronischer Funktion |
| DE102005031448A1 (de) | 2005-07-04 | 2007-01-11 | Polyic Gmbh & Co. Kg | Aktivierbare optische Schicht |
| DE102005035589A1 (de) | 2005-07-29 | 2007-02-01 | Polyic Gmbh & Co. Kg | Verfahren zur Herstellung eines elektronischen Bauelements |
| DE102005044306A1 (de) | 2005-09-16 | 2007-03-22 | Polyic Gmbh & Co. Kg | Elektronische Schaltung und Verfahren zur Herstellung einer solchen |
| US7521710B2 (en) | 2006-02-16 | 2009-04-21 | Idemitsu Kosan Co., Ltd. | Organic thin film transistor |
| US20070215863A1 (en) * | 2006-03-15 | 2007-09-20 | Lucent Technologies Inc. | Fabricating apparatus with doped organic semiconductors |
| DE102006013605A1 (de) * | 2006-03-22 | 2007-10-11 | Polyic Gmbh & Co. Kg | Verfahren zum Programmieren einer elektronischen Schaltung sowie elektronische Schaltung |
| WO2007117668A2 (en) | 2006-04-07 | 2007-10-18 | Qd Vision, Inc. | Methods and articles including nanomaterial |
| JP2007287961A (ja) * | 2006-04-18 | 2007-11-01 | Konica Minolta Holdings Inc | 有機薄膜トランジスタ及びその製造方法 |
| WO2008111947A1 (en) | 2006-06-24 | 2008-09-18 | Qd Vision, Inc. | Methods and articles including nanomaterial |
| US8217389B2 (en) | 2006-10-12 | 2012-07-10 | Idemitsu Kosan, Co., Ltd. | Organic thin film transistor device and organic thin film light-emitting transistor |
| EP2083456B1 (en) | 2006-11-14 | 2013-01-02 | Idemitsu Kosan Co., Ltd. | Organic thin film transistor and organic thin film light-emitting transistor |
| KR20090080522A (ko) | 2006-11-14 | 2009-07-24 | 이데미쓰 고산 가부시키가이샤 | 유기 박막 트랜지스터 및 유기 박막 발광 트랜지스터 |
| JPWO2008062841A1 (ja) | 2006-11-24 | 2010-03-04 | 出光興産株式会社 | 有機薄膜トランジスタ及び有機薄膜発光トランジスタ |
| JP5308162B2 (ja) | 2006-11-24 | 2013-10-09 | 出光興産株式会社 | 有機薄膜トランジスタ及び有機薄膜発光トランジスタ |
| US8330147B2 (en) * | 2006-12-04 | 2012-12-11 | Idemitsu Kosan, Co., Ltd. | Organic thin film transistor and organic thin film light emitting transistor having organic semiconductor compound with divalent aromatic hydrocarbon group and divalent aromatic heterocyclic group |
| WO2008069061A1 (ja) * | 2006-12-04 | 2008-06-12 | Idemitsu Kosan Co., Ltd. | 有機薄膜トランジスタ及び有機薄膜発光トランジスタ |
| TW201002722A (en) | 2008-01-22 | 2010-01-16 | Ricoh Co Ltd | Benzobisthiazole compound, benzobisthiazole polymer, organic film including the compound or polymer and transistor including the organic film |
| US7821000B2 (en) * | 2008-02-01 | 2010-10-26 | Alcatel-Lucent Usa Inc. | Method of doping organic semiconductors |
| JP2010225758A (ja) * | 2009-03-23 | 2010-10-07 | Fuji Xerox Co Ltd | 有機半導体トランジスタ |
| JP4893767B2 (ja) * | 2009-03-24 | 2012-03-07 | 富士ゼロックス株式会社 | 有機半導体トランジスタ |
| JP5347690B2 (ja) * | 2009-04-30 | 2013-11-20 | 富士ゼロックス株式会社 | 有機電界発光素子、及び表示媒体 |
| US9011729B2 (en) | 2010-04-22 | 2015-04-21 | Idemitsu Kosan Co., Ltd. | Organic thin-film transistor |
| JP5659567B2 (ja) * | 2010-06-11 | 2015-01-28 | 富士ゼロックス株式会社 | 有機トランジスタ及び有機トランジスタの製造方法 |
| JP5966353B2 (ja) | 2011-12-26 | 2016-08-10 | 富士ゼロックス株式会社 | 有機半導体トランジスタ |
| KR101582991B1 (ko) * | 2014-05-23 | 2016-01-20 | 연세대학교 산학협력단 | 플렉서블 유기박막 트랜지스터 및 이를 포함한 센서 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8909011D0 (en) * | 1989-04-20 | 1989-06-07 | Friend Richard H | Electroluminescent devices |
| JPH03236286A (ja) * | 1990-02-14 | 1991-10-22 | Toshiba Corp | 有機膜素子 |
| US5315129A (en) * | 1990-08-20 | 1994-05-24 | University Of Southern California | Organic optoelectronic devices and methods |
| JP3224829B2 (ja) * | 1991-08-15 | 2001-11-05 | 株式会社東芝 | 有機電界効果型素子 |
-
1994
- 1994-12-09 US US08/353,032 patent/US5574291A/en not_active Expired - Lifetime
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1995
- 1995-02-14 TW TW084101308A patent/TW279260B/zh not_active IP Right Cessation
- 1995-10-12 CA CA002160394A patent/CA2160394C/en not_active Expired - Lifetime
- 1995-11-28 EP EP95308517A patent/EP0716458B1/en not_active Expired - Lifetime
- 1995-11-28 DE DE69532794T patent/DE69532794T2/de not_active Expired - Lifetime
- 1995-12-05 MX MX9505068A patent/MX9505068A/es not_active IP Right Cessation
- 1995-12-09 KR KR1019950049121A patent/KR100351009B1/ko not_active Expired - Lifetime
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7838872B2 (en) | 2005-03-09 | 2010-11-23 | Samsung Electronics Co., Ltd. | Organic thin film transistor array panel |
| US8039296B2 (en) | 2005-03-09 | 2011-10-18 | Samsung Electronics Co., Ltd. | Organic thin film transistor array panel and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69532794D1 (de) | 2004-05-06 |
| JPH08228035A (ja) | 1996-09-03 |
| TW279260B (enExample) | 1996-06-21 |
| JP3145294B2 (ja) | 2001-03-12 |
| KR960026961A (ko) | 1996-07-22 |
| US5574291A (en) | 1996-11-12 |
| CA2160394A1 (en) | 1996-06-10 |
| CA2160394C (en) | 1999-04-13 |
| EP0716458A3 (en) | 1997-11-26 |
| MX9505068A (es) | 1997-01-31 |
| EP0716458B1 (en) | 2004-03-31 |
| DE69532794T2 (de) | 2005-03-17 |
| EP0716458A2 (en) | 1996-06-12 |
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