JPS6118164A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS6118164A JPS6118164A JP59139820A JP13982084A JPS6118164A JP S6118164 A JPS6118164 A JP S6118164A JP 59139820 A JP59139820 A JP 59139820A JP 13982084 A JP13982084 A JP 13982084A JP S6118164 A JPS6118164 A JP S6118164A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- active region
- numeral
- shows
- heat dissipation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は、IC,)ランジスタワサイリスク等の放熱
効果および基板の重ね合わせにおける集積度の向上をも
友ら丁りめk、ポンディングバンド部7側面に設けた半
導体装置に関するものである。
効果および基板の重ね合わせにおける集積度の向上をも
友ら丁りめk、ポンディングバンド部7側面に設けた半
導体装置に関するものである。
従来のICやトランジスタな第1図に示す。
第1図において、1は半導体基板、2はPN接合領域お
よびその上に形成された配線部を含む能動領域、3は前
記能動領域2より外部に電気信号を出入するLめの接続
部である。通常、この接続部3はポンディングパッドと
呼ばハ、アルミニワム管で形成さn1第1図の部分斜視
図である第2図に示すよ5K、アルミ線や金線等の接続
線4を接続部3に圧着して基板外部と電気的に接続して
いる。通常、ICの場合、第3図に示すように半導体基
板1を外の雰囲気から保護するためにパッケージSVc
入れ、ビン6と接続線4y通じて電気的に外部と接続す
る。7は前記パッケージ5の蓋である。
よびその上に形成された配線部を含む能動領域、3は前
記能動領域2より外部に電気信号を出入するLめの接続
部である。通常、この接続部3はポンディングパッドと
呼ばハ、アルミニワム管で形成さn1第1図の部分斜視
図である第2図に示すよ5K、アルミ線や金線等の接続
線4を接続部3に圧着して基板外部と電気的に接続して
いる。通常、ICの場合、第3図に示すように半導体基
板1を外の雰囲気から保護するためにパッケージSVc
入れ、ビン6と接続線4y通じて電気的に外部と接続す
る。7は前記パッケージ5の蓋である。
従来の半導体装置の大部分は第3図のように構成さnて
いるので、半導体基板1の能動領域2を含む面と接続部
3が同一表面であり、ビン6等との接続のための間隙8
が必要である。パッケージ5がプラスチックの場合、こ
の間隙8はプラスチック充填剤で埋めらnている。
いるので、半導体基板1の能動領域2を含む面と接続部
3が同一表面であり、ビン6等との接続のための間隙8
が必要である。パッケージ5がプラスチックの場合、こ
の間隙8はプラスチック充填剤で埋めらnている。
半導体装置の集積度を上げるために基板を重ね合わせよ
うとした時、このような間隙8があるとスペースの点で
重ね合わせることが困難性であるという欠点がある。ま
た、この半導体基板1が、動作中に多量の熱ン放出てる
場合、通常、能動領域2を含む面に熱が発生するが1間
隙8が存在するためKiTを通じて外部との熱交換が容
−易にできない欠点がある。
うとした時、このような間隙8があるとスペースの点で
重ね合わせることが困難性であるという欠点がある。ま
た、この半導体基板1が、動作中に多量の熱ン放出てる
場合、通常、能動領域2を含む面に熱が発生するが1間
隙8が存在するためKiTを通じて外部との熱交換が容
−易にできない欠点がある。
この発明は、上記のような従来のものの欠点を除去する
ためKなさtty、−もので、能動領域を含む主面の側
面に接続部Y形成することにより間隙を除き、半導体基
板の重ね合わせ、または外部放熱−’に容易にする半導
体装置を提供するものである。
ためKなさtty、−もので、能動領域を含む主面の側
面に接続部Y形成することにより間隙を除き、半導体基
板の重ね合わせ、または外部放熱−’に容易にする半導
体装置を提供するものである。
以下、この発明ン図面について説明する。
第4図はこの発明の一実施例を示すもので、この図にお
いて、1,2.3は第1図と同様の部分である。この実
施例では接続部3ン能動領域2を含む主面の側面に形成
している。このように形成することにより、第5図に示
すように半導体基板1を複数枚重ね合わせることができ
る。第5図におい工、9は各半導体基板1間の放熱およ
び接着のkめの充填材である。
いて、1,2.3は第1図と同様の部分である。この実
施例では接続部3ン能動領域2を含む主面の側面に形成
している。このように形成することにより、第5図に示
すように半導体基板1を複数枚重ね合わせることができ
る。第5図におい工、9は各半導体基板1間の放熱およ
び接着のkめの充填材である。
一!た、第6図にこの発明の他の実施例を示す。
第6図では、放熱を良好忙するπめに間隙をつくらずに
、接続部3の外周面をパッケージ5で覆っている。この
ような構1;VCよって、上面の蓋7と、側面および底
面を形成するパッケージ5と匠よって外部との熱接触を
容易托し、放熱効果tあげている。
、接続部3の外周面をパッケージ5で覆っている。この
ような構1;VCよって、上面の蓋7と、側面および底
面を形成するパッケージ5と匠よって外部との熱接触を
容易托し、放熱効果tあげている。
また、第7図に示すように側面の各接続部3間を接続線
4で接続し、最終的に能動領域2を含む面の接続部3よ
り外部に接続することもできる。
4で接続し、最終的に能動領域2を含む面の接続部3よ
り外部に接続することもできる。
なお、上記各実施例ではICへの適用例を示し友が、ト
ランジスタやその他の半導体素子にも適用することがで
きる。また、接続部3を能動領域2からの配線部として
示したが、通常の半導体基板では、この能動領域2ン含
む面の反対側からも電気的に接続をもつものも多く、こ
の場合にも上記各実施例を適用することができる。
ランジスタやその他の半導体素子にも適用することがで
きる。また、接続部3を能動領域2からの配線部として
示したが、通常の半導体基板では、この能動領域2ン含
む面の反対側からも電気的に接続をもつものも多く、こ
の場合にも上記各実施例を適用することができる。
以上説明したように、この発明は、半導体基板の一表面
上KPN接合領域と、このPN接合領域忙電気的接続を
する配線部とからなる能動領域ン有する半導体装置忙お
いて、前記配線部の前記半導体基板外部との接続部を、
前記半導体基板の側面に設けることKより、より集積度
の高いICや、放熱性の良好なICv含む半導体装置が
得られるという効果がある。
上KPN接合領域と、このPN接合領域忙電気的接続を
する配線部とからなる能動領域ン有する半導体装置忙お
いて、前記配線部の前記半導体基板外部との接続部を、
前記半導体基板の側面に設けることKより、より集積度
の高いICや、放熱性の良好なICv含む半導体装置が
得られるという効果がある。
第1図は従来の半導体装置を説明するための斜視図、第
2図は第1図の部分斜視図、第3図は第1図の断面側面
図、第4図はこの発明の一実施例の半導体装置の斜視図
、第5図は第4図の半導体装置を複数個積重ねた斜視図
、第6図はこの発明の他の実施例の側断面図、第7図は
この発明の他の実施例の半導体装置の斜視図である。 図中、1は半導体基板、2は能動領域、3は接続部、4
は接続線、5はパッケージ、6はビン、7は蓋、9は充
填材である。 なお、図中の同一符号は同一または相当部分を示す。 代理人 大岩増雄 (外2名) 第1図 第2図 ム 第3図 第4図 第5図 第6図 I J b 第7図
2図は第1図の部分斜視図、第3図は第1図の断面側面
図、第4図はこの発明の一実施例の半導体装置の斜視図
、第5図は第4図の半導体装置を複数個積重ねた斜視図
、第6図はこの発明の他の実施例の側断面図、第7図は
この発明の他の実施例の半導体装置の斜視図である。 図中、1は半導体基板、2は能動領域、3は接続部、4
は接続線、5はパッケージ、6はビン、7は蓋、9は充
填材である。 なお、図中の同一符号は同一または相当部分を示す。 代理人 大岩増雄 (外2名) 第1図 第2図 ム 第3図 第4図 第5図 第6図 I J b 第7図
Claims (1)
- 半導体基板の一表面上にPN接合領域と、このPN接合
領域に電気的接続をする配線部とからなる能動領域を有
する半導体装置において、前記配線部の前記半導体基板
外部との接続部を、前記半導体基板の側面に設けたこと
を特徴とする半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59139820A JPS6118164A (ja) | 1984-07-04 | 1984-07-04 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59139820A JPS6118164A (ja) | 1984-07-04 | 1984-07-04 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6118164A true JPS6118164A (ja) | 1986-01-27 |
Family
ID=15254222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59139820A Pending JPS6118164A (ja) | 1984-07-04 | 1984-07-04 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6118164A (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63110740A (ja) * | 1986-10-29 | 1988-05-16 | Nec Corp | 半導体装置 |
JPH01168041A (ja) * | 1987-11-18 | 1989-07-03 | Grumman Aerospace Corp | 集積回路チップの製造方法 |
US5051865A (en) * | 1985-06-17 | 1991-09-24 | Fujitsu Limited | Multi-layer semiconductor device |
FR2666452A1 (fr) * | 1990-09-03 | 1992-03-06 | Mitsubishi Electric Corp | Module de circuit a semiconducteurs multicouche. |
EP0522518A2 (en) * | 1991-07-09 | 1993-01-13 | Hughes Aircraft Company | Stacked chip assembly and manufacturing method therefor |
EP0593666A1 (en) * | 1991-06-24 | 1994-04-27 | Irvine Sensors Corporation | Fabricating electronic circuitry unit containing stacked ic layers having lead rerouting |
WO2009025974A2 (en) * | 2007-08-16 | 2009-02-26 | Micron Technology, Inc. | Microelectronic die packages with leadframes, including leadframe-based interposer for stacked die packages, and associated systems and methods |
US7692931B2 (en) | 2006-07-17 | 2010-04-06 | Micron Technology, Inc. | Microelectronic packages with leadframes, including leadframes configured for stacked die packages, and associated systems and methods |
US7843050B2 (en) | 2007-07-24 | 2010-11-30 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
CN107994001A (zh) * | 2017-11-28 | 2018-05-04 | 信利光电股份有限公司 | 一种芯片封装和终端设备 |
JP2022047488A (ja) * | 2020-09-11 | 2022-03-24 | ウェスタン デジタル テクノロジーズ インコーポレーテッド | シリコンダイのストレートワイヤボンディング |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5655067A (en) * | 1979-10-11 | 1981-05-15 | Matsushita Electric Ind Co Ltd | Semiconductor integrated circuit device |
JPS5839030A (ja) * | 1981-08-31 | 1983-03-07 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JPS5856455A (ja) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | 半導体装置およびその製造方法 |
JPS5895862A (ja) * | 1981-11-30 | 1983-06-07 | Mitsubishi Electric Corp | 積層構造半導体装置 |
JPS58103149A (ja) * | 1981-12-15 | 1983-06-20 | Matsushita Electric Works Ltd | 半導体装置 |
JPS60121755A (ja) * | 1983-12-05 | 1985-06-29 | Toshiba Corp | 半導体装置 |
-
1984
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Publication number | Priority date | Publication date | Assignee | Title |
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JPS5655067A (en) * | 1979-10-11 | 1981-05-15 | Matsushita Electric Ind Co Ltd | Semiconductor integrated circuit device |
JPS5839030A (ja) * | 1981-08-31 | 1983-03-07 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JPS5856455A (ja) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | 半導体装置およびその製造方法 |
JPS5895862A (ja) * | 1981-11-30 | 1983-06-07 | Mitsubishi Electric Corp | 積層構造半導体装置 |
JPS58103149A (ja) * | 1981-12-15 | 1983-06-20 | Matsushita Electric Works Ltd | 半導体装置 |
JPS60121755A (ja) * | 1983-12-05 | 1985-06-29 | Toshiba Corp | 半導体装置 |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5051865A (en) * | 1985-06-17 | 1991-09-24 | Fujitsu Limited | Multi-layer semiconductor device |
JPS63110740A (ja) * | 1986-10-29 | 1988-05-16 | Nec Corp | 半導体装置 |
JPH01168041A (ja) * | 1987-11-18 | 1989-07-03 | Grumman Aerospace Corp | 集積回路チップの製造方法 |
FR2666452A1 (fr) * | 1990-09-03 | 1992-03-06 | Mitsubishi Electric Corp | Module de circuit a semiconducteurs multicouche. |
EP0593666A1 (en) * | 1991-06-24 | 1994-04-27 | Irvine Sensors Corporation | Fabricating electronic circuitry unit containing stacked ic layers having lead rerouting |
EP0593666A4 (en) * | 1991-06-24 | 1994-07-27 | Irvine Sensors Corp | Fabricating electronic circuitry unit containing stacked ic layers having lead rerouting |
EP0522518A2 (en) * | 1991-07-09 | 1993-01-13 | Hughes Aircraft Company | Stacked chip assembly and manufacturing method therefor |
EP0522518A3 (en) * | 1991-07-09 | 1994-11-30 | Hughes Aircraft Co | Stacked chip assembly and manufacturing method therefor |
US7692931B2 (en) | 2006-07-17 | 2010-04-06 | Micron Technology, Inc. | Microelectronic packages with leadframes, including leadframes configured for stacked die packages, and associated systems and methods |
US8869387B2 (en) | 2006-07-17 | 2014-10-28 | Micron Technology, Inc. | Methods for making microelectronic die systems |
US9653444B2 (en) | 2007-07-24 | 2017-05-16 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US10396059B2 (en) | 2007-07-24 | 2019-08-27 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US7843050B2 (en) | 2007-07-24 | 2010-11-30 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US10056359B2 (en) | 2007-07-24 | 2018-08-21 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US8198720B2 (en) | 2007-07-24 | 2012-06-12 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US8906744B2 (en) | 2007-07-24 | 2014-12-09 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US9165910B2 (en) | 2007-07-24 | 2015-10-20 | Micron Technology, Inc. | Microelectronic die packages with metal leads, including metal leads for stacked die packages, and associated systems and methods |
US7947529B2 (en) | 2007-08-16 | 2011-05-24 | Micron Technology, Inc. | Microelectronic die packages with leadframes, including leadframe-based interposer for stacked die packages, and associated systems and methods |
WO2009025974A3 (en) * | 2007-08-16 | 2009-05-07 | Micron Technology Inc | Microelectronic die packages with leadframes, including leadframe-based interposer for stacked die packages, and associated systems and methods |
WO2009025974A2 (en) * | 2007-08-16 | 2009-02-26 | Micron Technology, Inc. | Microelectronic die packages with leadframes, including leadframe-based interposer for stacked die packages, and associated systems and methods |
CN107994001A (zh) * | 2017-11-28 | 2018-05-04 | 信利光电股份有限公司 | 一种芯片封装和终端设备 |
JP2022047488A (ja) * | 2020-09-11 | 2022-03-24 | ウェスタン デジタル テクノロジーズ インコーポレーテッド | シリコンダイのストレートワイヤボンディング |
US11456272B2 (en) | 2020-09-11 | 2022-09-27 | Western Digital Technologies, Inc. | Straight wirebonding of silicon dies |
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