JPS5812577B2 - 光重合可能な複写材料 - Google Patents

光重合可能な複写材料

Info

Publication number
JPS5812577B2
JPS5812577B2 JP49146673A JP14667374A JPS5812577B2 JP S5812577 B2 JPS5812577 B2 JP S5812577B2 JP 49146673 A JP49146673 A JP 49146673A JP 14667374 A JP14667374 A JP 14667374A JP S5812577 B2 JPS5812577 B2 JP S5812577B2
Authority
JP
Japan
Prior art keywords
weight
parts
layer
copolymer
methacrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49146673A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5096305A (enExample
Inventor
ヨ−ゼフ フアウスト ライムント
バルタ− クリユツプフエル クルト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5096305A publication Critical patent/JPS5096305A/ja
Publication of JPS5812577B2 publication Critical patent/JPS5812577B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
JP49146673A 1973-12-21 1974-12-20 光重合可能な複写材料 Expired JPS5812577B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2363806 1973-12-21
DE2363806A DE2363806B2 (de) 1973-12-21 1973-12-21 Lichtempfindliches Gemisch

Publications (2)

Publication Number Publication Date
JPS5096305A JPS5096305A (enExample) 1975-07-31
JPS5812577B2 true JPS5812577B2 (ja) 1983-03-09

Family

ID=5901542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49146673A Expired JPS5812577B2 (ja) 1973-12-21 1974-12-20 光重合可能な複写材料

Country Status (10)

Country Link
US (1) US3930865A (enExample)
JP (1) JPS5812577B2 (enExample)
BE (1) BE823465R (enExample)
CA (1) CA1043619A (enExample)
CH (1) CH574121A5 (enExample)
DE (1) DE2363806B2 (enExample)
FR (1) FR2255632B2 (enExample)
GB (1) GB1493590A (enExample)
IT (1) IT1046755B (enExample)
SE (1) SE403195B (enExample)

Cited By (122)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0683434A1 (en) 1994-05-16 1995-11-22 Fuji Photo Film Co., Ltd. Photo-polymerizable composition, and image forming method and color filter using the composition
EP0695971A1 (en) 1994-08-03 1996-02-07 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP0726498A1 (en) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP1403042A2 (en) 2002-09-30 2004-03-31 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1445120A2 (en) 2003-02-06 2004-08-11 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1449650A2 (en) 2003-02-21 2004-08-25 Fuji Photo Film Co., Ltd. Photosensitive composition and planographic printing plate precursor using the same
EP1518704A1 (en) 2003-09-24 2005-03-30 Fuji Photo Film Co., Ltd. Photosensitive composition and lithographic printing plate precursor using the same
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1635219A1 (en) 2004-08-27 2006-03-15 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1703323A1 (en) 2005-03-18 2006-09-20 Fuji Photo Film Co., Ltd. Photosensitive composition, image-recording material and image-recording method
EP1703324A1 (en) 2005-03-18 2006-09-20 Fuji Photo Film Co., Ltd. Photosensitive composition and lithographic printing plate precursor
EP1705522A2 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Plate-making method of lithographic printing plate precursor
US7122293B2 (en) 2003-07-29 2006-10-17 Fuji Photo Film Co., Ltd. Alkali-soluble polymer and polymerizable composition thereof
WO2007108367A1 (ja) 2006-03-17 2007-09-27 Fujifilm Corporation 高分子化合物およびその製造方法、顔料分散剤、顔料分散組成物、光硬化性組成物、並びにカラーフィルタおよびその製造方法
US7291443B2 (en) 2003-07-29 2007-11-06 Fujifilm Corporation Polymerizable composition and image-recording material using the same
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US7303857B2 (en) 2003-09-24 2007-12-04 Fujifilm Corporation Photosensitive composition and planographic printing plate precursor
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GB1493590A (en) 1977-11-30
IT1046755B (it) 1980-07-31
FR2255632B2 (enExample) 1978-07-21
DE2363806A1 (de) 1975-06-26
SE7415751L (enExample) 1975-06-23
BE823465R (fr) 1975-06-17
DE2363806B2 (de) 1979-05-17
US3930865A (en) 1976-01-06
SE403195B (sv) 1978-07-31
FR2255632A2 (enExample) 1975-07-18
CH574121A5 (enExample) 1976-03-31
JPS5096305A (enExample) 1975-07-31
CA1043619A (en) 1978-12-05

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