JPS5640269A - Preparation of semiconductor device - Google Patents

Preparation of semiconductor device

Info

Publication number
JPS5640269A
JPS5640269A JP11568179A JP11568179A JPS5640269A JP S5640269 A JPS5640269 A JP S5640269A JP 11568179 A JP11568179 A JP 11568179A JP 11568179 A JP11568179 A JP 11568179A JP S5640269 A JPS5640269 A JP S5640269A
Authority
JP
Japan
Prior art keywords
layer
film
region
opening
polycrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11568179A
Other languages
English (en)
Inventor
Hisakazu Iizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11568179A priority Critical patent/JPS5640269A/ja
Priority to US06/184,883 priority patent/US4406051A/en
Publication of JPS5640269A publication Critical patent/JPS5640269A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20—Resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3215—Doping the layers
    • H01L21/32155—Doping polycristalline - or amorphous silicon layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B10/00—Static random access memory [SRAM] devices
    • H10B10/15—Static random access memory [SRAM] devices comprising a resistor load element

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP11568179A 1979-09-11 1979-09-11 Preparation of semiconductor device Pending JPS5640269A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP11568179A JPS5640269A (en) 1979-09-11 1979-09-11 Preparation of semiconductor device
US06/184,883 US4406051A (en) 1979-09-11 1980-09-08 Method for manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11568179A JPS5640269A (en) 1979-09-11 1979-09-11 Preparation of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5640269A true JPS5640269A (en) 1981-04-16

Family

ID=14668632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11568179A Pending JPS5640269A (en) 1979-09-11 1979-09-11 Preparation of semiconductor device

Country Status (2)

Country Link
US (1) US4406051A (ja)
JP (1) JPS5640269A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0116702A2 (en) * 1983-02-18 1984-08-29 International Business Machines Corporation Method for forming polycrystalline silicon resistors having reproducible and controllable resistivities
EP0122659A2 (en) * 1983-04-06 1984-10-24 Koninklijke Philips Electronics N.V. Method of manufacturing a high resistance layer having a low temperature coefficient of resistance and semiconductor device having such high resistance layer
JPS6242522A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd 半導体装置の製造方法
JPH01149420A (ja) * 1987-12-07 1989-06-12 Hitachi Ltd 薄膜形成方法及び半導体装置の製造方法
US5214497A (en) * 1988-05-25 1993-05-25 Hitachi, Ltd. Polycrystalline silicon resistor for use in a semiconductor integrated circuit having a memory device
US6777763B1 (en) * 1993-10-01 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for fabricating the same

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2085224B (en) * 1980-10-07 1984-08-15 Itt Ind Ltd Isolating sc device using oxygen duping
US4807013A (en) * 1984-10-17 1989-02-21 American Telephone And Telegraph Company At&T Bell Laboratories Polysilicon fillet
JPS61134055A (ja) * 1984-12-04 1986-06-21 Sony Corp 半導体装置の製造方法
JPS61145868A (ja) * 1984-12-20 1986-07-03 Toshiba Corp 半導体装置の製造方法
US4814285A (en) * 1985-09-23 1989-03-21 Harris Corp. Method for forming planarized interconnect level using selective deposition and ion implantation
GB2182488A (en) * 1985-11-02 1987-05-13 Stc Plc Integrated circuit resistors
US4682407A (en) * 1986-01-21 1987-07-28 Motorola, Inc. Means and method for stabilizing polycrystalline semiconductor layers
US4786612A (en) * 1986-02-03 1988-11-22 Intel Corporation Plasma enhanced chemical vapor deposited vertical silicon nitride resistor
US4755480A (en) * 1986-02-03 1988-07-05 Intel Corporation Method of making a silicon nitride resistor using plasma enhanced chemical vapor deposition
US4812419A (en) * 1987-04-30 1989-03-14 Hewlett-Packard Company Via connection with thin resistivity layer
KR920002350B1 (ko) * 1987-05-21 1992-03-21 마쯔시다덴기산교 가부시기가이샤 반도체장치의 제조방법
JP2786196B2 (ja) * 1987-07-21 1998-08-13 株式会社デンソー 絶縁ゲート型半導体装置
KR900005038B1 (ko) * 1987-07-31 1990-07-18 삼성전자 주식회사 고저항 다결정 실리콘의 제조방법
US4843027A (en) * 1987-08-21 1989-06-27 Siliconix Incorporated Method of fabricating a high value semiconductor resistor
JPH01143252A (ja) * 1987-11-27 1989-06-05 Nec Corp 半導体装置
JPH0727980B2 (ja) * 1988-07-19 1995-03-29 三菱電機株式会社 高抵抗層を有する半導体装置
US4950620A (en) * 1988-09-30 1990-08-21 Dallas Semiconductor Corp. Process for making integrated circuit with doped silicon dioxide load elements
US5037766A (en) * 1988-12-06 1991-08-06 Industrial Technology Research Institute Method of fabricating a thin film polysilicon thin film transistor or resistor
JPH0541378A (ja) * 1991-03-15 1993-02-19 Mitsubishi Electric Corp 半導体装置およびその製造方法
US5159430A (en) * 1991-07-24 1992-10-27 Micron Technology, Inc. Vertically integrated oxygen-implanted polysilicon resistor
US5232865A (en) * 1991-07-24 1993-08-03 Micron Technology, Inc. Method of fabricating vertically integrated oxygen-implanted polysilicon resistor
US5192707A (en) * 1991-07-31 1993-03-09 Sgs-Thomson Microelectronics, Inc. Method of forming isolated regions of oxide
EP0541122B1 (en) * 1991-11-08 1997-09-24 Nec Corporation Method of fabricating a semiconductor device with a polycrystalline silicon resistive layer
US5867087A (en) * 1995-08-24 1999-02-02 Taiwan Semiconductor Manufacturing Company, Ltd. Three dimensional polysilicon resistor for integrated circuits
US5567644A (en) * 1995-09-14 1996-10-22 Micron Technology, Inc. Method of making a resistor
US6008082A (en) * 1995-09-14 1999-12-28 Micron Technology, Inc. Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry
US5705441A (en) * 1996-03-19 1998-01-06 Taiwan Semiconductor Manufacturing Company, Ltd. Ion implant silicon nitride mask for a silicide free contact region in a self aligned silicide process
US6068928A (en) * 1998-02-25 2000-05-30 Siemens Aktiengesellschaft Method for producing a polycrystalline silicon structure and polycrystalline silicon layer to be produced by the method
US6090656A (en) * 1998-05-08 2000-07-18 Lsi Logic Linear capacitor and process for making same
US6902867B2 (en) * 2002-10-02 2005-06-07 Lexmark International, Inc. Ink jet printheads and methods therefor
US8969151B2 (en) * 2008-02-29 2015-03-03 Globalfoundries Singapore Pte. Ltd. Integrated circuit system employing resistance altering techniques
CN105826163B (zh) * 2015-01-07 2019-08-27 中芯国际集成电路制造(上海)有限公司 Hrp电阻的制备方法及改变其阻值的方法
JP7242285B2 (ja) * 2018-12-19 2023-03-20 キオクシア株式会社 半導体装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3460007A (en) * 1967-07-03 1969-08-05 Rca Corp Semiconductor junction device
US3519901A (en) * 1968-01-29 1970-07-07 Texas Instruments Inc Bi-layer insulation structure including polycrystalline semiconductor material for integrated circuit isolation
US3622382A (en) * 1969-05-05 1971-11-23 Ibm Semiconductor isolation structure and method of producing
US3576478A (en) * 1969-07-22 1971-04-27 Philco Ford Corp Igfet comprising n-type silicon substrate, silicon oxide gate insulator and p-type polycrystalline silicon gate electrode
US3897274A (en) * 1971-06-01 1975-07-29 Texas Instruments Inc Method of fabricating dielectrically isolated semiconductor structures
US3902188A (en) * 1973-08-15 1975-08-26 Rca Corp High frequency transistor
US3982262A (en) * 1974-04-17 1976-09-21 Karatsjuba Anatoly Prokofievic Semiconductor indicating instrument
US4074304A (en) * 1974-10-04 1978-02-14 Nippon Electric Company, Ltd. Semiconductor device having a miniature junction area and process for fabricating same
JPS5193874A (en) * 1975-02-15 1976-08-17 Handotaisochino seizohoho
JPS6041458B2 (ja) * 1975-04-21 1985-09-17 ソニー株式会社 半導体装置の製造方法
JPS5950113B2 (ja) * 1975-11-05 1984-12-06 株式会社東芝 半導体装置
US4085499A (en) * 1975-12-29 1978-04-25 Matsushita Electric Industrial Co., Ltd. Method of making a MOS-type semiconductor device
US4208781A (en) * 1976-09-27 1980-06-24 Texas Instruments Incorporated Semiconductor integrated circuit with implanted resistor element in polycrystalline silicon layer
US4266985A (en) * 1979-05-18 1981-05-12 Fujitsu Limited Process for producing a semiconductor device including an ion implantation step in combination with direct thermal nitridation of the silicon substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0116702A2 (en) * 1983-02-18 1984-08-29 International Business Machines Corporation Method for forming polycrystalline silicon resistors having reproducible and controllable resistivities
EP0122659A2 (en) * 1983-04-06 1984-10-24 Koninklijke Philips Electronics N.V. Method of manufacturing a high resistance layer having a low temperature coefficient of resistance and semiconductor device having such high resistance layer
JPS6242522A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd 半導体装置の製造方法
JPH01149420A (ja) * 1987-12-07 1989-06-12 Hitachi Ltd 薄膜形成方法及び半導体装置の製造方法
US5214497A (en) * 1988-05-25 1993-05-25 Hitachi, Ltd. Polycrystalline silicon resistor for use in a semiconductor integrated circuit having a memory device
US6777763B1 (en) * 1993-10-01 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for fabricating the same
US7166503B2 (en) 1993-10-01 2007-01-23 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a TFT with laser irradiation

Also Published As

Publication number Publication date
US4406051A (en) 1983-09-27

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