JPS5342576A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5342576A
JPS5342576A JP11758776A JP11758776A JPS5342576A JP S5342576 A JPS5342576 A JP S5342576A JP 11758776 A JP11758776 A JP 11758776A JP 11758776 A JP11758776 A JP 11758776A JP S5342576 A JPS5342576 A JP S5342576A
Authority
JP
Japan
Prior art keywords
high resistance
production
semiconductor device
forming
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11758776A
Other languages
Japanese (ja)
Inventor
Akihiro Kanamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11758776A priority Critical patent/JPS5342576A/en
Publication of JPS5342576A publication Critical patent/JPS5342576A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To obtain resistance regions of two kinds of varying layer resistances with less processes by depositing an insulation film over a semiconductor substrate, providing openings for forming electrodes and forming a high resistance region in active regions,amd diffusing a low concentration impurity of the conductivity type opposite from that of the region formed with the high resistance region within the substrate using these as a mask.
COPYRIGHT: (C)1978,JPO&Japio
JP11758776A 1976-09-29 1976-09-29 Production of semiconductor device Pending JPS5342576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11758776A JPS5342576A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11758776A JPS5342576A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5342576A true JPS5342576A (en) 1978-04-18

Family

ID=14715500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11758776A Pending JPS5342576A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5342576A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780753A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Integrated circuit
JPS5780754A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Integrated circuit
JPS57142011A (en) * 1981-02-27 1982-09-02 Hitachi Ltd Integrated circuit for low power consumption amplification circuit
US5729024A (en) * 1995-05-08 1998-03-17 Ricoh Company, Ltd. Original edge detecting system and optical sensor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780753A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Integrated circuit
JPS5780754A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Integrated circuit
JPS57142011A (en) * 1981-02-27 1982-09-02 Hitachi Ltd Integrated circuit for low power consumption amplification circuit
US5729024A (en) * 1995-05-08 1998-03-17 Ricoh Company, Ltd. Original edge detecting system and optical sensor
US5818062A (en) * 1995-05-08 1998-10-06 Ricoh Company, Ltd. Original edge detecting system and optical sensor using distance detecting light-receiving means
US5929436A (en) * 1995-05-08 1999-07-27 Ricoh Company, Ltd. Optical sensor including a first and second converging optical system for edge detection

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