JPS5423483A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS5423483A
JPS5423483A JP8836277A JP8836277A JPS5423483A JP S5423483 A JPS5423483 A JP S5423483A JP 8836277 A JP8836277 A JP 8836277A JP 8836277 A JP8836277 A JP 8836277A JP S5423483 A JPS5423483 A JP S5423483A
Authority
JP
Japan
Prior art keywords
substrate
manufacture
semiconductor device
mask
occurrence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8836277A
Other languages
Japanese (ja)
Inventor
Kazuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8836277A priority Critical patent/JPS5423483A/en
Publication of JPS5423483A publication Critical patent/JPS5423483A/en
Pending legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To block the occurrence of parasitic channel in forming a device in the substrate afterward, by coating electrical insulation film on the semiconductor substrate surface and by providing the high impurity concentration layer of the same conduction type as the substrate on the surface layer of the substrate by ion injection through taking this as a mask.
COPYRIGHT: (C)1979,JPO&Japio
JP8836277A 1977-07-25 1977-07-25 Manufacture for semiconductor device Pending JPS5423483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8836277A JPS5423483A (en) 1977-07-25 1977-07-25 Manufacture for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8836277A JPS5423483A (en) 1977-07-25 1977-07-25 Manufacture for semiconductor device

Publications (1)

Publication Number Publication Date
JPS5423483A true JPS5423483A (en) 1979-02-22

Family

ID=13940689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8836277A Pending JPS5423483A (en) 1977-07-25 1977-07-25 Manufacture for semiconductor device

Country Status (1)

Country Link
JP (1) JPS5423483A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7665473B1 (en) 1999-07-21 2010-02-23 L'oreal Comb for applying a product on keratinous fibers, application set equipped therewith and use of said set

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7665473B1 (en) 1999-07-21 2010-02-23 L'oreal Comb for applying a product on keratinous fibers, application set equipped therewith and use of said set

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