JPS5425957B2 - - Google Patents
Info
- Publication number
- JPS5425957B2 JPS5425957B2 JP994776A JP994776A JPS5425957B2 JP S5425957 B2 JPS5425957 B2 JP S5425957B2 JP 994776 A JP994776 A JP 994776A JP 994776 A JP994776 A JP 994776A JP S5425957 B2 JPS5425957 B2 JP S5425957B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ZA00757984A ZA757984B (en) | 1974-10-04 | 1975-12-23 | Polymers for aqueous processed photoresists |
SE7600431A SE7600431L (sv) | 1974-10-04 | 1976-01-16 | Polymer for fotoresist for behandling i vattenlosningar |
DE2602410A DE2602410C2 (de) | 1974-10-04 | 1976-01-23 | Photopolymerisierbares Material |
FR7602048A FR2339185B1 (fr) | 1974-10-04 | 1976-01-26 | Composition photoresistante |
NL7600794.A NL160004C (nl) | 1974-10-04 | 1976-01-27 | Droge filmfotoresist. |
GB3624/76A GB1521372A (en) | 1974-10-04 | 1976-01-29 | Photopolymerisable compositions for aqueous processed photoresists |
BE163988A BE838135A (fr) | 1974-10-04 | 1976-01-30 | Polymeres pour masques photographiques developpes en milieu aqueux |
JP994776A JPS5294388A (en) | 1974-10-04 | 1976-01-31 | Photopolymerizable composition and preparation thereof |
DD191055A DD125491A5 (US06265458-20010724-C00049.png) | 1974-10-04 | 1976-02-02 | |
BR7601434A BR7601434A (pt) | 1974-10-04 | 1976-03-10 | Composicao fotopolimerizavel,laminado,processo para preparar um fotoprotetor e produto obtido pela exposicao da composicao fotopolimerizavel a luz actinica |
JP59257283A JPS61134756A (ja) | 1974-10-04 | 1984-12-05 | フオトレジストの製法 |
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51192974A | 1974-10-04 | 1974-10-04 | |
ZA00757984A ZA757984B (en) | 1974-10-04 | 1975-12-23 | Polymers for aqueous processed photoresists |
SE7600431A SE7600431L (sv) | 1974-10-04 | 1976-01-16 | Polymer for fotoresist for behandling i vattenlosningar |
DE2602410A DE2602410C2 (de) | 1974-10-04 | 1976-01-23 | Photopolymerisierbares Material |
FR7602048A FR2339185B1 (fr) | 1974-10-04 | 1976-01-26 | Composition photoresistante |
NL7600794.A NL160004C (nl) | 1974-10-04 | 1976-01-27 | Droge filmfotoresist. |
GB3624/76A GB1521372A (en) | 1974-10-04 | 1976-01-29 | Photopolymerisable compositions for aqueous processed photoresists |
BE163988A BE838135A (fr) | 1974-10-04 | 1976-01-30 | Polymeres pour masques photographiques developpes en milieu aqueux |
JP994776A JPS5294388A (en) | 1974-10-04 | 1976-01-31 | Photopolymerizable composition and preparation thereof |
DD191055A DD125491A5 (US06265458-20010724-C00049.png) | 1974-10-04 | 1976-02-02 | |
BR7601434A BR7601434A (pt) | 1974-10-04 | 1976-03-10 | Composicao fotopolimerizavel,laminado,processo para preparar um fotoprotetor e produto obtido pela exposicao da composicao fotopolimerizavel a luz actinica |
JP59257283A JPS61134756A (ja) | 1974-10-04 | 1984-12-05 | フオトレジストの製法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5294388A JPS5294388A (en) | 1977-08-08 |
JPS5425957B2 true JPS5425957B2 (US06265458-20010724-C00049.png) | 1979-08-31 |
Family
ID=27582848
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP994776A Granted JPS5294388A (en) | 1974-10-04 | 1976-01-31 | Photopolymerizable composition and preparation thereof |
JP59257283A Granted JPS61134756A (ja) | 1974-10-04 | 1984-12-05 | フオトレジストの製法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59257283A Granted JPS61134756A (ja) | 1974-10-04 | 1984-12-05 | フオトレジストの製法 |
Country Status (10)
Cited By (115)
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---|---|---|---|---|
EP0683434A1 (en) | 1994-05-16 | 1995-11-22 | Fuji Photo Film Co., Ltd. | Photo-polymerizable composition, and image forming method and color filter using the composition |
EP0695971A1 (en) | 1994-08-03 | 1996-02-07 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
EP1403042A2 (en) | 2002-09-30 | 2004-03-31 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1449650A2 (en) | 2003-02-21 | 2004-08-25 | Fuji Photo Film Co., Ltd. | Photosensitive composition and planographic printing plate precursor using the same |
EP1564589A1 (en) | 2004-02-13 | 2005-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate precursor |
EP1615073A1 (en) | 2004-07-06 | 2006-01-11 | Fuji Photo Film Co., Ltd. | Photosensitive composition and image recording method using the same |
EP1635219A1 (en) | 2004-08-27 | 2006-03-15 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
EP1662318A1 (en) | 1999-03-09 | 2006-05-31 | Fuji Photo Film Co., Ltd. | 1,3-dihydro-1-oxo-2H-indene derivative |
EP1701213A2 (en) | 2005-03-08 | 2006-09-13 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
EP1703324A1 (en) | 2005-03-18 | 2006-09-20 | Fuji Photo Film Co., Ltd. | Photosensitive composition and lithographic printing plate precursor |
EP1703323A1 (en) | 2005-03-18 | 2006-09-20 | Fuji Photo Film Co., Ltd. | Photosensitive composition, image-recording material and image-recording method |
EP1705522A2 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Plate-making method of lithographic printing plate precursor |
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Also Published As
Publication number | Publication date |
---|---|
SE7600431L (sv) | 1977-07-17 |
DE2602410C2 (de) | 1985-11-21 |
GB1521372A (en) | 1978-08-16 |
FR2339185B1 (fr) | 1980-03-14 |
NL160004B (nl) | 1979-04-17 |
JPS5294388A (en) | 1977-08-08 |
NL160004C (nl) | 1979-09-17 |
DD125491A5 (US06265458-20010724-C00049.png) | 1977-04-20 |
DE2602410A1 (de) | 1977-07-28 |
JPH0359416B2 (US06265458-20010724-C00049.png) | 1991-09-10 |
JPS61134756A (ja) | 1986-06-21 |
BR7601434A (pt) | 1977-09-06 |
NL7600794A (nl) | 1977-07-29 |
ZA757984B (en) | 1976-12-29 |
FR2339185A1 (fr) | 1977-08-19 |
BE838135A (fr) | 1976-05-14 |