JPH0315176B2 - - Google Patents

Info

Publication number
JPH0315176B2
JPH0315176B2 JP60046116A JP4611685A JPH0315176B2 JP H0315176 B2 JPH0315176 B2 JP H0315176B2 JP 60046116 A JP60046116 A JP 60046116A JP 4611685 A JP4611685 A JP 4611685A JP H0315176 B2 JPH0315176 B2 JP H0315176B2
Authority
JP
Japan
Prior art keywords
resin
photosensitive
cresol
lithographic printing
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60046116A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61205933A (ja
Inventor
Takeshi Yamamoto
Nobumasa Sasa
Tooru Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP4611685A priority Critical patent/JPS61205933A/ja
Priority to GB8605272A priority patent/GB2172117B/en
Priority to DE19863607598 priority patent/DE3607598A1/de
Publication of JPS61205933A publication Critical patent/JPS61205933A/ja
Publication of JPH0315176B2 publication Critical patent/JPH0315176B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP4611685A 1985-03-08 1985-03-08 感光性平版印刷版 Granted JPS61205933A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4611685A JPS61205933A (ja) 1985-03-08 1985-03-08 感光性平版印刷版
GB8605272A GB2172117B (en) 1985-03-08 1986-03-04 Photosensitive composition
DE19863607598 DE3607598A1 (de) 1985-03-08 1986-03-07 Lichtempfindliche zusammensetzung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4611685A JPS61205933A (ja) 1985-03-08 1985-03-08 感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS61205933A JPS61205933A (ja) 1986-09-12
JPH0315176B2 true JPH0315176B2 (en, 2012) 1991-02-28

Family

ID=12738025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4611685A Granted JPS61205933A (ja) 1985-03-08 1985-03-08 感光性平版印刷版

Country Status (3)

Country Link
JP (1) JPS61205933A (en, 2012)
DE (1) DE3607598A1 (en, 2012)
GB (1) GB2172117B (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0778157B2 (ja) * 1985-11-21 1995-08-23 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物の製造方法
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
US4996122A (en) * 1988-03-31 1991-02-26 Morton International, Inc. Method of forming resist pattern and thermally stable and highly resolved resist pattern
JPH0296164A (ja) * 1988-10-03 1990-04-06 Konica Corp 感光性組成物
JP2623778B2 (ja) * 1988-10-18 1997-06-25 日本合成ゴム株式会社 感放射線性樹脂組成物
DE69129955T2 (de) * 1990-05-02 1998-12-24 Mitsubishi Chemical Corp., Tokio/Tokyo Photolackzusammensetzung
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH05257277A (ja) * 1992-03-16 1993-10-08 Pioneer Electron Corp 光ディスク用フォトレジスト
DE69602211T2 (de) * 1995-01-12 1999-08-19 Fuji Photo Film Co. Lichtempfindliche Flachdruckplatte
JPH09160233A (ja) * 1995-11-17 1997-06-20 Hoechst Ag 平版印刷板製造用感放射線記録材料
CN1306337C (zh) 1998-12-10 2007-03-21 Az电子材料日本株式会社 正性敏射线的树脂组合物
WO2001025853A1 (fr) 1999-10-07 2001-04-12 Clariant International Ltd. Composition photosensible
JP4153912B2 (ja) 2002-10-23 2008-09-24 Ａｚエレクトロニックマテリアルズ株式会社 化学増幅ポジ型感光性樹脂組成物
US7314810B2 (en) 2006-05-09 2008-01-01 Hynix Semiconductor Inc. Method for forming fine pattern of semiconductor device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5654621A (en) * 1979-10-05 1981-05-14 Nec Corp Thin-film magnetic head
JPH0256653A (ja) * 1988-08-23 1990-02-26 Toshiba Corp 階層化メモリ管理方式

Also Published As

Publication number Publication date
DE3607598A1 (de) 1986-09-18
GB2172117B (en) 1989-06-21
GB2172117A (en) 1986-09-10
JPS61205933A (ja) 1986-09-12
GB8605272D0 (en) 1986-04-09

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