GB2172117B - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- GB2172117B GB2172117B GB8605272A GB8605272A GB2172117B GB 2172117 B GB2172117 B GB 2172117B GB 8605272 A GB8605272 A GB 8605272A GB 8605272 A GB8605272 A GB 8605272A GB 2172117 B GB2172117 B GB 2172117B
- Authority
- GB
- United Kingdom
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4611685A JPS61205933A (en) | 1985-03-08 | 1985-03-08 | Photosensitive composition |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8605272D0 GB8605272D0 (en) | 1986-04-09 |
GB2172117A GB2172117A (en) | 1986-09-10 |
GB2172117B true GB2172117B (en) | 1989-06-21 |
Family
ID=12738025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8605272A Expired GB2172117B (en) | 1985-03-08 | 1986-03-04 | Photosensitive composition |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS61205933A (en) |
DE (1) | DE3607598A1 (en) |
GB (1) | GB2172117B (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0778157B2 (en) * | 1985-11-21 | 1995-08-23 | 日本合成ゴム株式会社 | Method for producing positive type radiation sensitive resin composition |
EP0227487B1 (en) * | 1985-12-27 | 1992-07-15 | Japan Synthetic Rubber Co., Ltd. | Positive type radiation-sensitive resin composition |
JP2590342B2 (en) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | Novolak resin for positive photoresist and positive photoresist composition containing the same |
JPS63198046A (en) * | 1987-02-13 | 1988-08-16 | Konica Corp | Photosensitive composition having excellent treating chemical resistant and ink forming properties |
US4996122A (en) * | 1988-03-31 | 1991-02-26 | Morton International, Inc. | Method of forming resist pattern and thermally stable and highly resolved resist pattern |
JPH0296164A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
JP2623778B2 (en) * | 1988-10-18 | 1997-06-25 | 日本合成ゴム株式会社 | Radiation-sensitive resin composition |
EP0455228B1 (en) * | 1990-05-02 | 1998-08-12 | Mitsubishi Chemical Corporation | Photoresist composition |
JP2711590B2 (en) * | 1990-09-13 | 1998-02-10 | 富士写真フイルム株式会社 | Positive photoresist composition |
JPH05257277A (en) * | 1992-03-16 | 1993-10-08 | Pioneer Electron Corp | Photoresist for optical disk |
DE69602211T2 (en) * | 1995-01-12 | 1999-08-19 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH09160233A (en) * | 1995-11-17 | 1997-06-20 | Hoechst Ag | Radiation-sensitive recording material for manufacture of planographic printing plate |
EP1055969A4 (en) | 1998-12-10 | 2002-01-16 | Clariant Finance Bvi Ltd | Positively photosensitive resin composition |
US6737212B1 (en) | 1999-10-07 | 2004-05-18 | Clariant Finance (Bvi) Limited | Photosensitive composition |
EP1562077B1 (en) | 2002-10-23 | 2018-01-17 | Merck Patent GmbH | Chemically amplified positive photosensitive resin composition |
US7314810B2 (en) | 2006-05-09 | 2008-01-01 | Hynix Semiconductor Inc. | Method for forming fine pattern of semiconductor device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5654621A (en) * | 1979-10-05 | 1981-05-14 | Nec Corp | Thin-film magnetic head |
JPH0256653A (en) * | 1988-08-23 | 1990-02-26 | Toshiba Corp | Hierarchization memory managing system |
-
1985
- 1985-03-08 JP JP4611685A patent/JPS61205933A/en active Granted
-
1986
- 1986-03-04 GB GB8605272A patent/GB2172117B/en not_active Expired
- 1986-03-07 DE DE19863607598 patent/DE3607598A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
JPS61205933A (en) | 1986-09-12 |
GB2172117A (en) | 1986-09-10 |
GB8605272D0 (en) | 1986-04-09 |
DE3607598A1 (en) | 1986-09-18 |
JPH0315176B2 (en) | 1991-02-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19950304 |