GB2171107B - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- GB2171107B GB2171107B GB8603366A GB8603366A GB2171107B GB 2171107 B GB2171107 B GB 2171107B GB 8603366 A GB8603366 A GB 8603366A GB 8603366 A GB8603366 A GB 8603366A GB 2171107 B GB2171107 B GB 2171107B
- Authority
- GB
- United Kingdom
- Prior art keywords
- resin composition
- photosensitive resin
- photosensitive
- composition
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
- C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
- A63F9/00—Games not otherwise provided for
- A63F9/24—Electric games; Games using electronic circuits not otherwise provided for
- A63F2009/2448—Output devices
- A63F2009/247—Output devices audible, e.g. using a loudspeaker
- A63F2009/2476—Speech or voice synthesisers, e.g. using a speech chip
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70064985A | 1985-02-12 | 1985-02-12 |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8603366D0 GB8603366D0 (en) | 1986-03-19 |
GB2171107A GB2171107A (en) | 1986-08-20 |
GB2171107B true GB2171107B (en) | 1989-08-02 |
Family
ID=24814355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8603366A Expired GB2171107B (en) | 1985-02-12 | 1986-02-11 | Photosensitive resin composition |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH06100828B2 (en) |
AU (1) | AU582628B2 (en) |
CA (1) | CA1271870A (en) |
DE (1) | DE3604402C2 (en) |
GB (1) | GB2171107B (en) |
NZ (1) | NZ215095A (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5344747A (en) * | 1988-04-15 | 1994-09-06 | Tokyo Ohka Kogyo Co., Ltd. | Photopolymerizable compositions |
JPH01263645A (en) * | 1988-04-15 | 1989-10-20 | Tokyo Ohka Kogyo Co Ltd | Photopolymerizing composition |
DE3837324A1 (en) * | 1988-11-03 | 1990-05-10 | Basf Ag | LIGHT-SENSITIVE RECORDING MATERIAL |
AU634214B2 (en) * | 1989-03-14 | 1993-02-18 | Robert Koch | Procaine double salt complexes |
JP2639728B2 (en) * | 1989-04-27 | 1997-08-13 | 富士写真フイルム株式会社 | Photosensitive lithographic printing plate |
US5143819A (en) * | 1991-01-25 | 1992-09-01 | W. R. Grace & Co.-Conn. | Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles |
DE4211390A1 (en) * | 1992-04-04 | 1993-10-07 | Hoechst Ag | Light-curable elastomeric mixture and recording material obtained therefrom for the production of relief printing plates |
US5736298A (en) * | 1992-10-02 | 1998-04-07 | Japan Synthetic Rubber Co., Ltd. | Water developable photosensitive resin composition |
WO1994023341A1 (en) * | 1993-03-31 | 1994-10-13 | Toyo Ink Manufacturing Co., Ltd. | Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material |
JP3415260B2 (en) * | 1993-05-12 | 2003-06-09 | セイコーエプソン株式会社 | Ink jet recording head and method of manufacturing the same |
JP3011864B2 (en) * | 1994-12-09 | 2000-02-21 | 日本ペイント株式会社 | Water developable photosensitive resin composition |
JP2000305267A (en) | 1999-04-22 | 2000-11-02 | Jsr Corp | Photosensitive resin composition |
EP1788434B2 (en) | 2005-11-18 | 2019-01-02 | Agfa Nv | Method of making a lithographic printing plate |
JP5206434B2 (en) * | 2009-01-14 | 2013-06-12 | 星光Pmc株式会社 | Photosensitive resin composition for letterpress production |
CN116199822B (en) * | 2023-04-24 | 2023-08-15 | 有研工程技术研究院有限公司 | Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5190603A (en) | 1975-01-31 | 1976-08-09 | HIKARIKAYOGATAKANKOSEIJUSHISOSEIBUTSU | |
JPS5310648A (en) * | 1976-07-19 | 1978-01-31 | Japan Synthetic Rubber Co Ltd | Photosensitive resin compositions |
GB1599281A (en) * | 1977-01-10 | 1981-09-30 | Ici Ltd | Photopolymerisable composition |
DE3215513C3 (en) * | 1981-04-27 | 1994-07-14 | Hitachi Chemical Co Ltd | Photosensitive resin composition |
JPS57190045A (en) * | 1981-05-19 | 1982-11-22 | Toyobo Co Ltd | Photosensitive resin composition |
JPS57192461A (en) * | 1981-05-22 | 1982-11-26 | Toyobo Co Ltd | Photosensitive resin composition |
US4440850A (en) * | 1981-07-23 | 1984-04-03 | Ciba-Geigy Corporation | Photopolymerisation process with two exposures of a single layer |
JPS5868740A (en) * | 1981-10-21 | 1983-04-23 | Japan Synthetic Rubber Co Ltd | Photoresist laminate of heat resistant film |
JPS58102230A (en) | 1981-12-15 | 1983-06-17 | Hitachi Chem Co Ltd | Photosensitive resin compositon |
CA1203107A (en) * | 1982-08-31 | 1986-04-15 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent |
JPS6051833A (en) * | 1983-07-01 | 1985-03-23 | Toray Ind Inc | Photosensitive resin composition |
JPS61128243A (en) * | 1984-11-28 | 1986-06-16 | Asahi Chem Ind Co Ltd | Photosensitive resin composition |
-
1986
- 1986-02-11 AU AU53377/86A patent/AU582628B2/en not_active Ceased
- 1986-02-11 NZ NZ21509586A patent/NZ215095A/en unknown
- 1986-02-11 GB GB8603366A patent/GB2171107B/en not_active Expired
- 1986-02-12 CA CA000501675A patent/CA1271870A/en not_active Expired
- 1986-02-12 DE DE19863604402 patent/DE3604402C2/en not_active Expired - Fee Related
- 1986-02-12 JP JP61029835A patent/JPH06100828B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU5337786A (en) | 1986-08-21 |
AU582628B2 (en) | 1989-04-06 |
DE3604402A1 (en) | 1986-08-28 |
GB2171107A (en) | 1986-08-20 |
CA1271870A (en) | 1990-07-17 |
DE3604402C2 (en) | 1994-12-01 |
JPS61246742A (en) | 1986-11-04 |
GB8603366D0 (en) | 1986-03-19 |
NZ215095A (en) | 1989-04-26 |
JPH06100828B2 (en) | 1994-12-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19980211 |