GB8603366D0 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
GB8603366D0
GB8603366D0 GB868603366A GB8603366A GB8603366D0 GB 8603366 D0 GB8603366 D0 GB 8603366D0 GB 868603366 A GB868603366 A GB 868603366A GB 8603366 A GB8603366 A GB 8603366A GB 8603366 D0 GB8603366 D0 GB 8603366D0
Authority
GB
United Kingdom
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB868603366A
Other versions
GB2171107B (en
GB2171107A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Napp Systems USA Inc
Original Assignee
Napp Systems Inc
Napp Systems USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc, Napp Systems USA Inc filed Critical Napp Systems Inc
Publication of GB8603366D0 publication Critical patent/GB8603366D0/en
Publication of GB2171107A publication Critical patent/GB2171107A/en
Application granted granted Critical
Publication of GB2171107B publication Critical patent/GB2171107B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • C08F290/126Polymers of unsaturated carboxylic acids or derivatives thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • AHUMAN NECESSITIES
    • A63SPORTS; GAMES; AMUSEMENTS
    • A63FCARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F9/00Games not otherwise provided for
    • A63F9/24Electric games; Games using electronic circuits not otherwise provided for
    • A63F2009/2448Output devices
    • A63F2009/247Output devices audible, e.g. using a loudspeaker
    • A63F2009/2476Speech or voice synthesisers, e.g. using a speech chip
GB8603366A 1985-02-12 1986-02-11 Photosensitive resin composition Expired GB2171107B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70064985A 1985-02-12 1985-02-12

Publications (3)

Publication Number Publication Date
GB8603366D0 true GB8603366D0 (en) 1986-03-19
GB2171107A GB2171107A (en) 1986-08-20
GB2171107B GB2171107B (en) 1989-08-02

Family

ID=24814355

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8603366A Expired GB2171107B (en) 1985-02-12 1986-02-11 Photosensitive resin composition

Country Status (6)

Country Link
JP (1) JPH06100828B2 (en)
AU (1) AU582628B2 (en)
CA (1) CA1271870A (en)
DE (1) DE3604402C2 (en)
GB (1) GB2171107B (en)
NZ (1) NZ215095A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116199822A (en) * 2023-04-24 2023-06-02 有研工程技术研究院有限公司 Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263645A (en) * 1988-04-15 1989-10-20 Tokyo Ohka Kogyo Co Ltd Photopolymerizing composition
US5344747A (en) * 1988-04-15 1994-09-06 Tokyo Ohka Kogyo Co., Ltd. Photopolymerizable compositions
DE3837324A1 (en) * 1988-11-03 1990-05-10 Basf Ag LIGHT-SENSITIVE RECORDING MATERIAL
AU634214B2 (en) * 1989-03-14 1993-02-18 Robert Koch Procaine double salt complexes
JP2639728B2 (en) * 1989-04-27 1997-08-13 富士写真フイルム株式会社 Photosensitive lithographic printing plate
US5143819A (en) * 1991-01-25 1992-09-01 W. R. Grace & Co.-Conn. Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles
DE4211390A1 (en) * 1992-04-04 1993-10-07 Hoechst Ag Light-curable elastomeric mixture and recording material obtained therefrom for the production of relief printing plates
US5736298A (en) * 1992-10-02 1998-04-07 Japan Synthetic Rubber Co., Ltd. Water developable photosensitive resin composition
WO1994023341A1 (en) * 1993-03-31 1994-10-13 Toyo Ink Manufacturing Co., Ltd. Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material
JP3415260B2 (en) * 1993-05-12 2003-06-09 セイコーエプソン株式会社 Ink jet recording head and method of manufacturing the same
JP3011864B2 (en) * 1994-12-09 2000-02-21 日本ペイント株式会社 Water developable photosensitive resin composition
JP2000305267A (en) 1999-04-22 2000-11-02 Jsr Corp Photosensitive resin composition
ES2322655T5 (en) 2005-11-18 2019-06-27 Agfa Nv Method for manufacturing a lithographic printing plate
JP5206434B2 (en) * 2009-01-14 2013-06-12 星光Pmc株式会社 Photosensitive resin composition for letterpress production

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5190603A (en) 1975-01-31 1976-08-09 HIKARIKAYOGATAKANKOSEIJUSHISOSEIBUTSU
JPS5310648A (en) * 1976-07-19 1978-01-31 Japan Synthetic Rubber Co Ltd Photosensitive resin compositions
GB1599281A (en) * 1977-01-10 1981-09-30 Ici Ltd Photopolymerisable composition
DE3215513C3 (en) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photosensitive resin composition
JPS57190045A (en) * 1981-05-19 1982-11-22 Toyobo Co Ltd Photosensitive resin composition
JPS57192461A (en) * 1981-05-22 1982-11-26 Toyobo Co Ltd Photosensitive resin composition
US4440850A (en) * 1981-07-23 1984-04-03 Ciba-Geigy Corporation Photopolymerisation process with two exposures of a single layer
JPS5868740A (en) * 1981-10-21 1983-04-23 Japan Synthetic Rubber Co Ltd Photoresist laminate of heat resistant film
JPS58102230A (en) 1981-12-15 1983-06-17 Hitachi Chem Co Ltd Photosensitive resin compositon
CA1203107A (en) * 1982-08-31 1986-04-15 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent
JPS6051833A (en) * 1983-07-01 1985-03-23 Toray Ind Inc Photosensitive resin composition
JPS61128243A (en) * 1984-11-28 1986-06-16 Asahi Chem Ind Co Ltd Photosensitive resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116199822A (en) * 2023-04-24 2023-06-02 有研工程技术研究院有限公司 Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof
CN116199822B (en) * 2023-04-24 2023-08-15 有研工程技术研究院有限公司 Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof

Also Published As

Publication number Publication date
GB2171107B (en) 1989-08-02
CA1271870A (en) 1990-07-17
AU5337786A (en) 1986-08-21
DE3604402A1 (en) 1986-08-28
DE3604402C2 (en) 1994-12-01
JPS61246742A (en) 1986-11-04
JPH06100828B2 (en) 1994-12-12
GB2171107A (en) 1986-08-20
AU582628B2 (en) 1989-04-06
NZ215095A (en) 1989-04-26

Similar Documents

Publication Publication Date Title
EP0211667A3 (en) Radiation-sensitive resin composition
EP0222157A3 (en) Resin composition
GB8606596D0 (en) Resin compositions
DE3476703D1 (en) Photosensitive resin composition
GB8606595D0 (en) Resin compositions
EP0227487A3 (en) Positive type radiation-sensitive resin composition
GB8619367D0 (en) Photoresist composition
GB8603636D0 (en) Fluorine-containing resin composition
GB8529665D0 (en) Photosensitive composition
EP0307951A3 (en) Light-sensitive resin composition
GB2174997B (en) Photosensitive resin composition
GB2185120B (en) Photosensitive composition
GB8504528D0 (en) Resin composition
EP0208145A3 (en) Light-sensitive composition
GB8619820D0 (en) Resin
GB8608077D0 (en) Photosensitive member
GB8612969D0 (en) Moulding composition
EP0261981A3 (en) Photosensitive resin composition
EP0229629A3 (en) Photosensitive resin composition
GB2173506B (en) Dental resin composition
GB2171107B (en) Photosensitive resin composition
GB2172117B (en) Photosensitive composition
EP0205328A3 (en) One-pack curing type composition
DE3662054D1 (en) Epoxy resin composition
DE3473654D1 (en) Photosensitive resin composition

Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19980211