JPS57192461A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57192461A
JPS57192461A JP7831681A JP7831681A JPS57192461A JP S57192461 A JPS57192461 A JP S57192461A JP 7831681 A JP7831681 A JP 7831681A JP 7831681 A JP7831681 A JP 7831681A JP S57192461 A JPS57192461 A JP S57192461A
Authority
JP
Japan
Prior art keywords
printing
monomer
compound
group
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7831681A
Other languages
Japanese (ja)
Other versions
JPS6367176B2 (en
Inventor
Kohei Umetani
Toshiaki Fujimura
Akira Tomita
Shinichi Tanaka
Hisashi Uhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP7831681A priority Critical patent/JPS57192461A/en
Publication of JPS57192461A publication Critical patent/JPS57192461A/en
Publication of JPS6367176B2 publication Critical patent/JPS6367176B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To provide the titled composition excellent in moisture resistance, solvent resistance and abrasion resistance, further developable with water, by compounding a basic nitrogen containing polyamide, a monomer having photopolymerizable unsaturated bonds wherein part or the whole of the monomer being a specified compound, and a photopolymerization initiator.
CONSTITUTION: A basic nitrogen containing polyamide (a) (e.g. a polymer of N, N'-bis(γ-aminopropyl)piperazine), a monomer (B) having photopolymerizable unsaturated bonds, and a photopolymerization initiator (C) are blended, wherein part or the whole of component B is a compound of formulaI(where X is a divalent 1W24C hydrocarbon group or one having therein an -O-, -COO- or -NHCO- group; Y is a group of formula II, III or IV; R is a 1W10C alkyl or phenyl) (e.g. a compound of the formula V or VI). The cured product obtained therefrom is soft and no uneveness of printing is observed when the product is used in high speed printing or printing for a coarse paper, and excellent mechanical strength and printing abrasion resistance are attained.
COPYRIGHT: (C)1982,JPO&Japio
JP7831681A 1981-05-22 1981-05-22 Photosensitive resin composition Granted JPS57192461A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7831681A JPS57192461A (en) 1981-05-22 1981-05-22 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7831681A JPS57192461A (en) 1981-05-22 1981-05-22 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57192461A true JPS57192461A (en) 1982-11-26
JPS6367176B2 JPS6367176B2 (en) 1988-12-23

Family

ID=13658526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7831681A Granted JPS57192461A (en) 1981-05-22 1981-05-22 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57192461A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61246742A (en) * 1985-02-12 1986-11-04 日本ペイント株式会社 Photosensitive resin composition
JPS6392618A (en) * 1986-10-07 1988-04-23 Sumitomo Chem Co Ltd Photocurable composition containing phosphoric ester
JPH02285353A (en) * 1989-04-27 1990-11-22 Fuji Photo Film Co Ltd Photosensitive composition
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition
JP2001253916A (en) * 2000-03-10 2001-09-18 Nippon Chem Ind Co Ltd Fluoroalkyl group-containing phosphonic acid oligomers, method of producing the same and their use

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61246742A (en) * 1985-02-12 1986-11-04 日本ペイント株式会社 Photosensitive resin composition
JPS6392618A (en) * 1986-10-07 1988-04-23 Sumitomo Chem Co Ltd Photocurable composition containing phosphoric ester
JPH02285353A (en) * 1989-04-27 1990-11-22 Fuji Photo Film Co Ltd Photosensitive composition
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition
JP2001253916A (en) * 2000-03-10 2001-09-18 Nippon Chem Ind Co Ltd Fluoroalkyl group-containing phosphonic acid oligomers, method of producing the same and their use

Also Published As

Publication number Publication date
JPS6367176B2 (en) 1988-12-23

Similar Documents

Publication Publication Date Title
EP0646845A4 (en) Color filter, material thereof and resin.
IE802293L (en) Encapsulating electronic components
EP0125862A3 (en) Photopolymerizable laminate
JPS57192461A (en) Photosensitive resin composition
ES2000126A6 (en) Heat-curable adhesive sheet.
JPS56100817A (en) Photosetting resin composition
JPS5699216A (en) Highly adherent resin composition
JPS57190045A (en) Photosensitive resin composition
JPS6448059A (en) Photoresist composition
JPS55116731A (en) Coating composition for molded polycarbonate article
JPS56166276A (en) Printing ink
JPS5736140A (en) Polybutene-1 resin composition
JPS64186A (en) Ultraviolet-curing silicone release agent
JPS5649756A (en) Modifier for moldable resin
JPS5467000A (en) Transparent thermosetting resin composition
JPS57198747A (en) Photosensitive resin composition
JPS55165973A (en) Hot-melt adhesive composition
JPS5755921A (en) Water-resistant epoxy resin composition
JPS55118911A (en) Photosensitive resin composition
JPS55717A (en) Photo-setting resin composition
JPS54107999A (en) Transparent thermosetting resin composition
JPS56155214A (en) Thermosetting resin composition
JPS5462267A (en) Coating composition for polycarbonate resin
JPS57113A (en) Production of high-molecular novolak type substituted phenol resin
JPS54144500A (en) Heat-curable resin composition