AU582628B2 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
AU582628B2
AU582628B2 AU53377/86A AU5337786A AU582628B2 AU 582628 B2 AU582628 B2 AU 582628B2 AU 53377/86 A AU53377/86 A AU 53377/86A AU 5337786 A AU5337786 A AU 5337786A AU 582628 B2 AU582628 B2 AU 582628B2
Authority
AU
Australia
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU53377/86A
Other versions
AU5337786A (en
Inventor
Masami Kawabata
Hidefumi Kusuda
Seio Mamoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Napp Systems USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems USA Inc filed Critical Napp Systems USA Inc
Publication of AU5337786A publication Critical patent/AU5337786A/en
Application granted granted Critical
Publication of AU582628B2 publication Critical patent/AU582628B2/en
Assigned to NIPPON PAINT CO., LTD. reassignment NIPPON PAINT CO., LTD. Alteration of Name(s) in Register under S187 Assignors: NAPP SYSTEMS (U.S.A.) INC.
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F9/00—Games not otherwise provided for
    • A63F9/24—Electric games; Games using electronic circuits not otherwise provided for
    • A63F2009/2448—Output devices
    • A63F2009/247—Output devices audible, e.g. using a loudspeaker
    • A63F2009/2476—Speech or voice synthesisers, e.g. using a speech chip

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
AU53377/86A 1985-02-12 1986-02-11 Photosensitive resin composition Ceased AU582628B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70064985A 1985-02-12 1985-02-12
US700649 1985-02-12

Publications (2)

Publication Number Publication Date
AU5337786A AU5337786A (en) 1986-08-21
AU582628B2 true AU582628B2 (en) 1989-04-06

Family

ID=24814355

Family Applications (1)

Application Number Title Priority Date Filing Date
AU53377/86A Ceased AU582628B2 (en) 1985-02-12 1986-02-11 Photosensitive resin composition

Country Status (6)

Country Link
JP (1) JPH06100828B2 (en)
AU (1) AU582628B2 (en)
CA (1) CA1271870A (en)
DE (1) DE3604402C2 (en)
GB (1) GB2171107B (en)
NZ (1) NZ215095A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5344747A (en) * 1988-04-15 1994-09-06 Tokyo Ohka Kogyo Co., Ltd. Photopolymerizable compositions
JPH01263645A (en) * 1988-04-15 1989-10-20 Tokyo Ohka Kogyo Co Ltd Photopolymerizing composition
DE3837324A1 (en) * 1988-11-03 1990-05-10 Basf Ag LIGHT-SENSITIVE RECORDING MATERIAL
AU634214B2 (en) * 1989-03-14 1993-02-18 Robert Koch Procaine double salt complexes
JP2639728B2 (en) * 1989-04-27 1997-08-13 富士写真フイルム株式会社 Photosensitive lithographic printing plate
US5143819A (en) * 1991-01-25 1992-09-01 W. R. Grace & Co.-Conn. Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles
DE4211390A1 (en) * 1992-04-04 1993-10-07 Hoechst Ag Light-curable elastomeric mixture and recording material obtained therefrom for the production of relief printing plates
US5736298A (en) * 1992-10-02 1998-04-07 Japan Synthetic Rubber Co., Ltd. Water developable photosensitive resin composition
WO1994023341A1 (en) * 1993-03-31 1994-10-13 Toyo Ink Manufacturing Co., Ltd. Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material
JP3415260B2 (en) * 1993-05-12 2003-06-09 セイコーエプソン株式会社 Ink jet recording head and method of manufacturing the same
JP3011864B2 (en) 1994-12-09 2000-02-21 日本ペイント株式会社 Water developable photosensitive resin composition
JP2000305267A (en) 1999-04-22 2000-11-02 Jsr Corp Photosensitive resin composition
DE602005013536D1 (en) 2005-11-18 2009-05-07 Agfa Graphics Nv Process for producing a lithographic printing plate
JP5206434B2 (en) * 2009-01-14 2013-06-12 星光Ｐｍｃ株式会社 Photosensitive resin composition for letterpress production
CN116199822B (en) * 2023-04-24 2023-08-15 有研工程技术研究院有限公司 Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2959684A (en) * 1983-07-01 1985-01-03 Toray Industries, Inc. Photosensitive resin compositions
AU5040985A (en) * 1984-11-28 1986-06-05 Asahi Kasei Kogyo Kabushiki Kaisha A photopolymerizable composition
AU564036B2 (en) * 1982-08-31 1987-07-30 Pt Sub, Inc. Photosensitive composition for printing plates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5190603A (en) 1975-01-31 1976-08-09 HIKARIKAYOGATAKANKOSEIJUSHISOSEIBUTSU
JPS5310648A (en) * 1976-07-19 1978-01-31 Japan Synthetic Rubber Co Ltd Photosensitive resin compositions
GB1599281A (en) * 1977-01-10 1981-09-30 Ici Ltd Photopolymerisable composition
DE3215513C3 (en) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photosensitive resin composition
JPS57190045A (en) * 1981-05-19 1982-11-22 Toyobo Co Ltd Photosensitive resin composition
JPS57192461A (en) * 1981-05-22 1982-11-26 Toyobo Co Ltd Photosensitive resin composition
US4440850A (en) * 1981-07-23 1984-04-03 Ciba-Geigy Corporation Photopolymerisation process with two exposures of a single layer
JPS5868740A (en) * 1981-10-21 1983-04-23 Japan Synthetic Rubber Co Ltd Photoresist laminate of heat resistant film
JPS58102230A (en) 1981-12-15 1983-06-17 Hitachi Chem Co Ltd Photosensitive resin compositon

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU564036B2 (en) * 1982-08-31 1987-07-30 Pt Sub, Inc. Photosensitive composition for printing plates
AU2959684A (en) * 1983-07-01 1985-01-03 Toray Industries, Inc. Photosensitive resin compositions
AU5040985A (en) * 1984-11-28 1986-06-05 Asahi Kasei Kogyo Kabushiki Kaisha A photopolymerizable composition

Also Published As

Publication number Publication date
AU5337786A (en) 1986-08-21
GB2171107A (en) 1986-08-20
GB2171107B (en) 1989-08-02
GB8603366D0 (en) 1986-03-19
DE3604402A1 (en) 1986-08-28
DE3604402C2 (en) 1994-12-01
JPH06100828B2 (en) 1994-12-12
CA1271870A (en) 1990-07-17
NZ215095A (en) 1989-04-26
JPS61246742A (en) 1986-11-04

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