AU556611B2 - Photosensitive resin compositions - Google Patents

Photosensitive resin compositions

Info

Publication number
AU556611B2
AU556611B2 AU23716/84A AU2371684A AU556611B2 AU 556611 B2 AU556611 B2 AU 556611B2 AU 23716/84 A AU23716/84 A AU 23716/84A AU 2371684 A AU2371684 A AU 2371684A AU 556611 B2 AU556611 B2 AU 556611B2
Authority
AU
Australia
Prior art keywords
photosensitive resin
resin compositions
compositions
photosensitive
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU23716/84A
Other versions
AU2371684A (en
Inventor
Takeo Kuramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace KK
Original Assignee
WR Grace KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace KK filed Critical WR Grace KK
Publication of AU2371684A publication Critical patent/AU2371684A/en
Application granted granted Critical
Publication of AU556611B2 publication Critical patent/AU556611B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
AU23716/84A 1983-01-28 1984-01-24 Photosensitive resin compositions Ceased AU556611B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58-11249 1983-01-28
JP58011249A JPS59137943A (en) 1983-01-28 1983-01-28 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
AU2371684A AU2371684A (en) 1984-08-02
AU556611B2 true AU556611B2 (en) 1986-11-13

Family

ID=11772662

Family Applications (1)

Application Number Title Priority Date Filing Date
AU23716/84A Ceased AU556611B2 (en) 1983-01-28 1984-01-24 Photosensitive resin compositions

Country Status (7)

Country Link
JP (1) JPS59137943A (en)
AU (1) AU556611B2 (en)
CA (1) CA1232915A (en)
DE (1) DE3402465A1 (en)
GB (1) GB2134275B (en)
IT (1) IT1206696B (en)
NL (1) NL8400257A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226746A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPS61226745A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPH0721626B2 (en) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 Resist composition for semiconductor fine processing
JPH083630B2 (en) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 Photosensitive composition
JPH06105351B2 (en) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 Photosensitive composition
JPH0762761B2 (en) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 Image forming material
JPH06105350B2 (en) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 Photosensitive composition for lithographic printing plate
JP2878150B2 (en) * 1994-04-27 1999-04-05 東京応化工業株式会社 Coating solution for resist and resist material using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347676A (en) * 1964-04-30 1967-10-17 Du Pont Photopolymerizable compositions and process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
DE3022362A1 (en) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt LIGHT-SENSITIVE COPYING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF

Also Published As

Publication number Publication date
IT8419349A0 (en) 1984-01-27
JPS59137943A (en) 1984-08-08
GB2134275B (en) 1987-05-13
GB2134275A (en) 1984-08-08
AU2371684A (en) 1984-08-02
IT1206696B (en) 1989-04-27
CA1232915A (en) 1988-02-16
GB8401661D0 (en) 1984-02-22
DE3402465A1 (en) 1984-08-02
NL8400257A (en) 1984-08-16

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