GB2134275B - Photosensitive resin compositions - Google Patents

Photosensitive resin compositions

Info

Publication number
GB2134275B
GB2134275B GB08401661A GB8401661A GB2134275B GB 2134275 B GB2134275 B GB 2134275B GB 08401661 A GB08401661 A GB 08401661A GB 8401661 A GB8401661 A GB 8401661A GB 2134275 B GB2134275 B GB 2134275B
Authority
GB
United Kingdom
Prior art keywords
photosensitive resin
resin compositions
compositions
photosensitive
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08401661A
Other versions
GB2134275A (en
GB8401661D0 (en
Inventor
Takeo Kuramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace KK
Original Assignee
WR Grace KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace KK filed Critical WR Grace KK
Publication of GB8401661D0 publication Critical patent/GB8401661D0/en
Publication of GB2134275A publication Critical patent/GB2134275A/en
Application granted granted Critical
Publication of GB2134275B publication Critical patent/GB2134275B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Detergent Compositions (AREA)
GB08401661A 1983-01-28 1984-01-23 Photosensitive resin compositions Expired GB2134275B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58011249A JPS59137943A (en) 1983-01-28 1983-01-28 Photosensitive resin composition

Publications (3)

Publication Number Publication Date
GB8401661D0 GB8401661D0 (en) 1984-02-22
GB2134275A GB2134275A (en) 1984-08-08
GB2134275B true GB2134275B (en) 1987-05-13

Family

ID=11772662

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08401661A Expired GB2134275B (en) 1983-01-28 1984-01-23 Photosensitive resin compositions

Country Status (7)

Country Link
JP (1) JPS59137943A (en)
AU (1) AU556611B2 (en)
CA (1) CA1232915A (en)
DE (1) DE3402465A1 (en)
GB (1) GB2134275B (en)
IT (1) IT1206696B (en)
NL (1) NL8400257A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226745A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPS61226746A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPH0721626B2 (en) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 Resist composition for semiconductor fine processing
JPH083630B2 (en) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 Photosensitive composition
JPH06105351B2 (en) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 Photosensitive composition
JPH0762761B2 (en) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 Image forming material
JPH06105350B2 (en) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 Photosensitive composition for lithographic printing plate
JP2878150B2 (en) * 1994-04-27 1999-04-05 東京応化工業株式会社 Coating solution for resist and resist material using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347676A (en) * 1964-04-30 1967-10-17 Du Pont Photopolymerizable compositions and process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
DE3022362A1 (en) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt LIGHT-SENSITIVE COPYING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF

Also Published As

Publication number Publication date
AU2371684A (en) 1984-08-02
JPS59137943A (en) 1984-08-08
IT1206696B (en) 1989-04-27
CA1232915A (en) 1988-02-16
AU556611B2 (en) 1986-11-13
IT8419349A0 (en) 1984-01-27
NL8400257A (en) 1984-08-16
DE3402465A1 (en) 1984-08-02
GB2134275A (en) 1984-08-08
GB8401661D0 (en) 1984-02-22

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee