IT8419349A0 - SURFACTANT FOR PHOTOSENSITIVE RESIN COMPOSITIONS AND RELATED COMPOSITIONS. - Google Patents
SURFACTANT FOR PHOTOSENSITIVE RESIN COMPOSITIONS AND RELATED COMPOSITIONS.Info
- Publication number
- IT8419349A0 IT8419349A0 IT8419349A IT1934984A IT8419349A0 IT 8419349 A0 IT8419349 A0 IT 8419349A0 IT 8419349 A IT8419349 A IT 8419349A IT 1934984 A IT1934984 A IT 1934984A IT 8419349 A0 IT8419349 A0 IT 8419349A0
- Authority
- IT
- Italy
- Prior art keywords
- compositions
- surfactant
- photosensitive resin
- resin compositions
- related compositions
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title 1
- 239000011342 resin composition Substances 0.000 title 1
- 239000004094 surface-active agent Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58011249A JPS59137943A (en) | 1983-01-28 | 1983-01-28 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8419349A0 true IT8419349A0 (en) | 1984-01-27 |
IT1206696B IT1206696B (en) | 1989-04-27 |
Family
ID=11772662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT8419349A IT1206696B (en) | 1983-01-28 | 1984-01-27 | SURFACE FOR PHOTOSENSITIVE DIRESINE COMPOSITIONS AND RELATED COMPOSITIONS. |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS59137943A (en) |
AU (1) | AU556611B2 (en) |
CA (1) | CA1232915A (en) |
DE (1) | DE3402465A1 (en) |
GB (1) | GB2134275B (en) |
IT (1) | IT1206696B (en) |
NL (1) | NL8400257A (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226745A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
JPS61226746A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
JPH0721626B2 (en) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | Resist composition for semiconductor fine processing |
JPH083630B2 (en) * | 1986-01-23 | 1996-01-17 | 富士写真フイルム株式会社 | Photosensitive composition |
JPH06105351B2 (en) * | 1986-03-27 | 1994-12-21 | 富士写真フイルム株式会社 | Photosensitive composition |
JPH0762761B2 (en) * | 1986-03-28 | 1995-07-05 | 富士写真フイルム株式会社 | Image forming material |
JPH06105350B2 (en) * | 1987-07-13 | 1994-12-21 | 富士写真フイルム株式会社 | Photosensitive composition for lithographic printing plate |
JP2878150B2 (en) * | 1994-04-27 | 1999-04-05 | 東京応化工業株式会社 | Coating solution for resist and resist material using the same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3347676A (en) * | 1964-04-30 | 1967-10-17 | Du Pont | Photopolymerizable compositions and process |
JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
US4252887A (en) * | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
DE3022362A1 (en) * | 1980-06-14 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | LIGHT-SENSITIVE COPYING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF |
-
1983
- 1983-01-28 JP JP58011249A patent/JPS59137943A/en active Pending
-
1984
- 1984-01-11 CA CA000445119A patent/CA1232915A/en not_active Expired
- 1984-01-23 GB GB08401661A patent/GB2134275B/en not_active Expired
- 1984-01-24 AU AU23716/84A patent/AU556611B2/en not_active Ceased
- 1984-01-25 DE DE19843402465 patent/DE3402465A1/en not_active Withdrawn
- 1984-01-27 IT IT8419349A patent/IT1206696B/en active
- 1984-01-27 NL NL8400257A patent/NL8400257A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU2371684A (en) | 1984-08-02 |
GB2134275B (en) | 1987-05-13 |
CA1232915A (en) | 1988-02-16 |
GB8401661D0 (en) | 1984-02-22 |
GB2134275A (en) | 1984-08-08 |
NL8400257A (en) | 1984-08-16 |
JPS59137943A (en) | 1984-08-08 |
AU556611B2 (en) | 1986-11-13 |
IT1206696B (en) | 1989-04-27 |
DE3402465A1 (en) | 1984-08-02 |
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