IT8419349A0 - SURFACTANT FOR PHOTOSENSITIVE RESIN COMPOSITIONS AND RELATED COMPOSITIONS. - Google Patents

SURFACTANT FOR PHOTOSENSITIVE RESIN COMPOSITIONS AND RELATED COMPOSITIONS.

Info

Publication number
IT8419349A0
IT8419349A0 IT8419349A IT1934984A IT8419349A0 IT 8419349 A0 IT8419349 A0 IT 8419349A0 IT 8419349 A IT8419349 A IT 8419349A IT 1934984 A IT1934984 A IT 1934984A IT 8419349 A0 IT8419349 A0 IT 8419349A0
Authority
IT
Italy
Prior art keywords
compositions
surfactant
photosensitive resin
resin compositions
related compositions
Prior art date
Application number
IT8419349A
Other languages
Italian (it)
Other versions
IT1206696B (en
Inventor
Takeo Kuramoto
Original Assignee
Grace W R Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R Kk filed Critical Grace W R Kk
Publication of IT8419349A0 publication Critical patent/IT8419349A0/en
Application granted granted Critical
Publication of IT1206696B publication Critical patent/IT1206696B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Detergent Compositions (AREA)
IT8419349A 1983-01-28 1984-01-27 SURFACE FOR PHOTOSENSITIVE DIRESINE COMPOSITIONS AND RELATED COMPOSITIONS. IT1206696B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58011249A JPS59137943A (en) 1983-01-28 1983-01-28 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
IT8419349A0 true IT8419349A0 (en) 1984-01-27
IT1206696B IT1206696B (en) 1989-04-27

Family

ID=11772662

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8419349A IT1206696B (en) 1983-01-28 1984-01-27 SURFACE FOR PHOTOSENSITIVE DIRESINE COMPOSITIONS AND RELATED COMPOSITIONS.

Country Status (7)

Country Link
JP (1) JPS59137943A (en)
AU (1) AU556611B2 (en)
CA (1) CA1232915A (en)
DE (1) DE3402465A1 (en)
GB (1) GB2134275B (en)
IT (1) IT1206696B (en)
NL (1) NL8400257A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226745A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPS61226746A (en) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
JPH0721626B2 (en) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 Resist composition for semiconductor fine processing
JPH083630B2 (en) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 Photosensitive composition
JPH06105351B2 (en) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 Photosensitive composition
JPH0762761B2 (en) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 Image forming material
JPH06105350B2 (en) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 Photosensitive composition for lithographic printing plate
JP2878150B2 (en) * 1994-04-27 1999-04-05 東京応化工業株式会社 Coating solution for resist and resist material using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347676A (en) * 1964-04-30 1967-10-17 Du Pont Photopolymerizable compositions and process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
DE3022362A1 (en) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt LIGHT-SENSITIVE COPYING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF

Also Published As

Publication number Publication date
AU2371684A (en) 1984-08-02
GB2134275B (en) 1987-05-13
CA1232915A (en) 1988-02-16
GB8401661D0 (en) 1984-02-22
GB2134275A (en) 1984-08-08
NL8400257A (en) 1984-08-16
JPS59137943A (en) 1984-08-08
AU556611B2 (en) 1986-11-13
IT1206696B (en) 1989-04-27
DE3402465A1 (en) 1984-08-02

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