GB8605272D0 - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
GB8605272D0
GB8605272D0 GB868605272A GB8605272A GB8605272D0 GB 8605272 D0 GB8605272 D0 GB 8605272D0 GB 868605272 A GB868605272 A GB 868605272A GB 8605272 A GB8605272 A GB 8605272A GB 8605272 D0 GB8605272 D0 GB 8605272D0
Authority
GB
United Kingdom
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB868605272A
Other versions
GB2172117B (en
GB2172117A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of GB8605272D0 publication Critical patent/GB8605272D0/en
Publication of GB2172117A publication Critical patent/GB2172117A/en
Application granted granted Critical
Publication of GB2172117B publication Critical patent/GB2172117B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
GB8605272A 1985-03-08 1986-03-04 Photosensitive composition Expired GB2172117B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4611685A JPS61205933A (en) 1985-03-08 1985-03-08 Photosensitive composition

Publications (3)

Publication Number Publication Date
GB8605272D0 true GB8605272D0 (en) 1986-04-09
GB2172117A GB2172117A (en) 1986-09-10
GB2172117B GB2172117B (en) 1989-06-21

Family

ID=12738025

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8605272A Expired GB2172117B (en) 1985-03-08 1986-03-04 Photosensitive composition

Country Status (3)

Country Link
JP (1) JPS61205933A (en)
DE (1) DE3607598A1 (en)
GB (1) GB2172117B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0778157B2 (en) * 1985-11-21 1995-08-23 日本合成ゴム株式会社 Method for producing positive type radiation sensitive resin composition
EP0227487B1 (en) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
JP2590342B2 (en) * 1986-11-08 1997-03-12 住友化学工業株式会社 Novolak resin for positive photoresist and positive photoresist composition containing the same
JPS63198046A (en) * 1987-02-13 1988-08-16 Konica Corp Photosensitive composition having excellent treating chemical resistant and ink forming properties
US4996122A (en) * 1988-03-31 1991-02-26 Morton International, Inc. Method of forming resist pattern and thermally stable and highly resolved resist pattern
JPH0296164A (en) * 1988-10-03 1990-04-06 Konica Corp Photosensitive composition
JP2623778B2 (en) * 1988-10-18 1997-06-25 日本合成ゴム株式会社 Radiation-sensitive resin composition
US5279918A (en) * 1990-05-02 1994-01-18 Mitsubishi Kasei Corporation Photoresist composition comprising a quinone diazide sulfonate of a novolac resin
JP2711590B2 (en) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 Positive photoresist composition
JPH05257277A (en) * 1992-03-16 1993-10-08 Pioneer Electron Corp Photoresist for optical disk
EP0722121B1 (en) * 1995-01-12 1999-04-28 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
JPH09160233A (en) * 1995-11-17 1997-06-20 Hoechst Ag Radiation-sensitive recording material for manufacture of planographic printing plate
EP1055969A4 (en) 1998-12-10 2002-01-16 Clariant Finance Bvi Ltd Positively photosensitive resin composition
EP1143298A1 (en) 1999-10-07 2001-10-10 Clariant International Ltd. Photosensitive composition
JP4153912B2 (en) 2002-10-23 2008-09-24 Ａｚエレクトロニックマテリアルズ株式会社 Chemically amplified positive photosensitive resin composition
US7314810B2 (en) 2006-05-09 2008-01-01 Hynix Semiconductor Inc. Method for forming fine pattern of semiconductor device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5654621A (en) * 1979-10-05 1981-05-14 Nec Corp Thin-film magnetic head
JPH0256653A (en) * 1988-08-23 1990-02-26 Toshiba Corp Hierarchization memory managing system

Also Published As

Publication number Publication date
JPS61205933A (en) 1986-09-12
JPH0315176B2 (en) 1991-02-28
DE3607598A1 (en) 1986-09-18
GB2172117B (en) 1989-06-21
GB2172117A (en) 1986-09-10

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950304