JP7460912B2 - 1,1,1-トリフルオロ-2,2-ビスアリールエタンの製造方法、および1,1,1-トリフルオロ-2,2-ビスアリールエタン - Google Patents
1,1,1-トリフルオロ-2,2-ビスアリールエタンの製造方法、および1,1,1-トリフルオロ-2,2-ビスアリールエタン Download PDFInfo
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- JP7460912B2 JP7460912B2 JP2020571190A JP2020571190A JP7460912B2 JP 7460912 B2 JP7460912 B2 JP 7460912B2 JP 2020571190 A JP2020571190 A JP 2020571190A JP 2020571190 A JP2020571190 A JP 2020571190A JP 7460912 B2 JP7460912 B2 JP 7460912B2
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- trifluoro
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- acid
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- 238000004519 manufacturing process Methods 0.000 title claims description 25
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 121
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 121
- JVTSHOJDBRTPHD-UHFFFAOYSA-N 2,2,2-trifluoroacetaldehyde Chemical compound FC(F)(F)C=O JVTSHOJDBRTPHD-UHFFFAOYSA-N 0.000 claims description 106
- 238000006243 chemical reaction Methods 0.000 claims description 81
- 239000000203 mixture Substances 0.000 claims description 55
- -1 aryl compound Chemical class 0.000 claims description 48
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 41
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 41
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 39
- 239000004642 Polyimide Substances 0.000 claims description 35
- 229920001721 polyimide Polymers 0.000 claims description 35
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 23
- 229920005575 poly(amic acid) Polymers 0.000 claims description 21
- 125000000962 organic group Chemical group 0.000 claims description 20
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 14
- 150000004984 aromatic diamines Chemical class 0.000 claims description 14
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 14
- 239000007848 Bronsted acid Substances 0.000 claims description 13
- 150000007517 lewis acids Chemical class 0.000 claims description 13
- 239000002841 Lewis acid Substances 0.000 claims description 12
- 229910001507 metal halide Inorganic materials 0.000 claims description 12
- 150000005309 metal halides Chemical class 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 10
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- 230000000996 additive effect Effects 0.000 claims description 9
- 238000006482 condensation reaction Methods 0.000 claims description 7
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 6
- 150000007522 mineralic acids Chemical class 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 150000007524 organic acids Chemical class 0.000 claims description 6
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 claims description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 6
- ZCOMUWSYVCXOPM-UHFFFAOYSA-N 2-amino-4-[1-(3-amino-4-hydroxyphenyl)-2,2,2-trifluoroethyl]phenol Chemical compound FC(C(C1=CC(=C(C=C1)O)N)C1=CC(=C(C=C1)O)N)(F)F ZCOMUWSYVCXOPM-UHFFFAOYSA-N 0.000 claims description 5
- BPBNMWDFXWDRAR-UHFFFAOYSA-N 4-[1-(4-amino-2,5-dimethylphenyl)-2,2,2-trifluoroethyl]-2,5-dimethylaniline Chemical compound FC(C(C1=C(C=C(C(=C1)C)N)C)C1=C(C=C(C(=C1)C)N)C)(F)F BPBNMWDFXWDRAR-UHFFFAOYSA-N 0.000 claims description 5
- OOHONKQNZZDJPX-UHFFFAOYSA-N 4-[1-(4-amino-2-methylphenyl)-2,2,2-trifluoroethyl]-3-methylaniline Chemical compound FC(C(C1=C(C=C(C=C1)N)C)C1=C(C=C(C=C1)N)C)(F)F OOHONKQNZZDJPX-UHFFFAOYSA-N 0.000 claims description 5
- BDTAGYJIJFELQQ-UHFFFAOYSA-N 4-[1-(4-amino-3-methylphenyl)-2,2,2-trifluoroethyl]-2-methylaniline Chemical compound FC(C(C1=CC(=C(C=C1)N)C)C1=CC(=C(C=C1)N)C)(F)F BDTAGYJIJFELQQ-UHFFFAOYSA-N 0.000 claims description 5
- 229910015900 BF3 Inorganic materials 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000012643 polycondensation polymerization Methods 0.000 claims description 5
- SYWCQLZCWGGTKG-UHFFFAOYSA-N 4-[1-(4-amino-3,5-dimethylphenyl)-2,2,2-trifluoroethyl]-2,6-dimethylaniline Chemical compound FC(C(C1=CC(=C(C(=C1)C)N)C)C1=CC(=C(C(=C1)C)N)C)(F)F SYWCQLZCWGGTKG-UHFFFAOYSA-N 0.000 claims description 4
- QKKAGLHOWNYWEJ-UHFFFAOYSA-N FC(C(C1=C(C(=C(C=C1)N)C)C)C1=C(C(=C(C=C1)N)C)C)(F)F Chemical compound FC(C(C1=C(C(=C(C=C1)N)C)C)C1=C(C(=C(C=C1)N)C)C)(F)F QKKAGLHOWNYWEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 3
- 239000005711 Benzoic acid Substances 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 claims description 3
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims description 3
- TXTQARDVRPFFHL-UHFFFAOYSA-N [Sb].[H][H] Chemical compound [Sb].[H][H] TXTQARDVRPFFHL-UHFFFAOYSA-N 0.000 claims description 3
- 235000011054 acetic acid Nutrition 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 3
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 claims description 3
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 claims description 3
- 235000010233 benzoic acid Nutrition 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 235000019253 formic acid Nutrition 0.000 claims description 3
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 3
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 3
- 235000005985 organic acids Nutrition 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 3
- 239000011592 zinc chloride Substances 0.000 claims description 3
- 235000005074 zinc chloride Nutrition 0.000 claims description 3
- 239000012044 organic layer Substances 0.000 description 99
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 87
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 58
- 239000005416 organic matter Substances 0.000 description 53
- 238000005481 NMR spectroscopy Methods 0.000 description 46
- 239000000243 solution Substances 0.000 description 40
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 32
- 230000000704 physical effect Effects 0.000 description 32
- 238000002360 preparation method Methods 0.000 description 32
- 238000004817 gas chromatography Methods 0.000 description 30
- 239000007788 liquid Substances 0.000 description 25
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 24
- 238000000926 separation method Methods 0.000 description 23
- 238000000605 extraction Methods 0.000 description 19
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 13
- 229910001220 stainless steel Inorganic materials 0.000 description 13
- 239000010935 stainless steel Substances 0.000 description 13
- 238000003756 stirring Methods 0.000 description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- 239000012295 chemical reaction liquid Substances 0.000 description 12
- 238000003780 insertion Methods 0.000 description 12
- 230000037431 insertion Effects 0.000 description 12
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 238000005160 1H NMR spectroscopy Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 239000002994 raw material Substances 0.000 description 9
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical class [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 150000002373 hemiacetals Chemical class 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000005457 ice water Substances 0.000 description 6
- KXBKTRIYEOEIHJ-UHFFFAOYSA-N 4-[2,2,2-trifluoro-1-(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)C1=CC=C(O)C=C1 KXBKTRIYEOEIHJ-UHFFFAOYSA-N 0.000 description 5
- QMVVMBDAYHMDIS-UHFFFAOYSA-N 4-[2,2,2-trifluoro-1-[4-hydroxy-3-(trifluoromethyl)phenyl]ethyl]-2-(trifluoromethyl)phenol Chemical compound FC(C(C1=CC(=C(C=C1)O)C(F)(F)F)C1=CC(=C(C=C1)O)C(F)(F)F)(F)F QMVVMBDAYHMDIS-UHFFFAOYSA-N 0.000 description 5
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000003682 fluorination reaction Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- CNRPKWSJHKEVPD-UHFFFAOYSA-N (2,2,2-trifluoro-1-phenylethyl)benzene Chemical compound C=1C=CC=CC=1C(C(F)(F)F)C1=CC=CC=C1 CNRPKWSJHKEVPD-UHFFFAOYSA-N 0.000 description 4
- YXQBLRACMQTNQR-UHFFFAOYSA-N 1,2,2,2-tetrafluoroethanol Chemical compound OC(F)C(F)(F)F YXQBLRACMQTNQR-UHFFFAOYSA-N 0.000 description 4
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 4
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 4
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 4
- YATQNCJEZQOGQU-UHFFFAOYSA-N 2-fluoro-4-[2,2,2-trifluoro-1-(3-fluoro-4-hydroxyphenyl)ethyl]phenol Chemical compound FC(C(C1=CC(=C(C=C1)O)F)C1=CC(=C(C=C1)O)F)(F)F YATQNCJEZQOGQU-UHFFFAOYSA-N 0.000 description 4
- PMLBLWFTABEJJL-UHFFFAOYSA-N 4-[1-(3,4-dimethylphenyl)-2,2,2-trifluoroethyl]-1,2-dimethylbenzene Chemical compound C1=C(C)C(C)=CC=C1C(C(F)(F)F)C1=CC=C(C)C(C)=C1 PMLBLWFTABEJJL-UHFFFAOYSA-N 0.000 description 4
- WJMJCOITBFLOTC-UHFFFAOYSA-N 4-[1-(4-amino-2-fluorophenyl)-2,2,2-trifluoroethyl]-3-fluoroaniline Chemical compound FC(C(C1=C(C=C(C=C1)N)F)C1=C(C=C(C=C1)N)F)(F)F WJMJCOITBFLOTC-UHFFFAOYSA-N 0.000 description 4
- NCZVZRMPSYTJEZ-UHFFFAOYSA-N 4-[1-(4-amino-3-fluorophenyl)-2,2,2-trifluoroethyl]-2-fluoroaniline Chemical compound FC(C(C1=CC(=C(C=C1)N)F)C1=CC(=C(C=C1)N)F)(F)F NCZVZRMPSYTJEZ-UHFFFAOYSA-N 0.000 description 4
- HVENXUFNTYJKJQ-UHFFFAOYSA-N 4-[1-[4-amino-3-(trifluoromethyl)phenyl]-2,2,2-trifluoroethyl]-2-(trifluoromethyl)aniline Chemical compound FC(C(C1=CC(=C(C=C1)N)C(F)(F)F)C1=CC(=C(C=C1)N)C(F)(F)F)(F)F HVENXUFNTYJKJQ-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 230000003472 neutralizing effect Effects 0.000 description 4
- HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 description 4
- UAAFQJWWFCXJCR-UHFFFAOYSA-N 2,5-dimethyl-4-[2,2,2-trifluoro-1-(4-hydroxy-2,5-dimethylphenyl)ethyl]phenol Chemical compound FC(C(C1=C(C=C(C(=C1)C)O)C)C1=C(C=C(C(=C1)C)O)C)(F)F UAAFQJWWFCXJCR-UHFFFAOYSA-N 0.000 description 3
- FTZQXOJYPFINKJ-UHFFFAOYSA-N 2-fluoroaniline Chemical compound NC1=CC=CC=C1F FTZQXOJYPFINKJ-UHFFFAOYSA-N 0.000 description 3
- NFEJJAQRDAQKPW-UHFFFAOYSA-N 2-methoxy-4-[2,2,2-trifluoro-1-(4-hydroxy-3-methoxyphenyl)ethyl]phenol Chemical compound FC(C(C1=CC(=C(C=C1)O)OC)C1=CC(=C(C=C1)O)OC)(F)F NFEJJAQRDAQKPW-UHFFFAOYSA-N 0.000 description 3
- VJTSOAZZCYYOJC-UHFFFAOYSA-N 2-nitro-4-[2,2,2-trifluoro-1-(4-hydroxy-3-nitrophenyl)ethyl]phenol Chemical compound FC(C(C1=CC(=C(C=C1)O)[N+](=O)[O-])C1=CC(=C(C=C1)O)[N+](=O)[O-])(F)F VJTSOAZZCYYOJC-UHFFFAOYSA-N 0.000 description 3
- RNBWYKOYPKCZRK-UHFFFAOYSA-N 4-[1-(4-aminophenyl)-2,2,2-trifluoroethyl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)C1=CC=C(N)C=C1 RNBWYKOYPKCZRK-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
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- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
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Description
一方、本発明にて開示する、フッ化水素中で安定化された無水のフルオラールから1,1,1-トリフルオロ-2,2-ビスアリールエタンを製造する方法は報告されていない。
で表されるアリール化合物を縮合反応させることにより、一般式[2]:
で表される、1,1,1-トリフルオロ-2,2-ビスアリールエタンを選択的に得る知見を得た。
無水条件下、フルオラールとフッ化水素との混合物に、下記一般式[1]:
で表されるアリール化合物を縮合反応させることにより、下記一般式[2]:
で表される1,1,1-トリフルオロ-2,2-ビスアリールエタンを得る製造方法。
前記反応に、添加剤として、ルイス酸またはブレンステッド酸を添加する、発明1に記載の製造方法。
前記ルイス酸または前記ブレンステッド酸が、無機酸、有機酸および金属ハロゲン化物からなる群より選ばれる少なくとも1種である、発明2に記載の製造方法。
前記無機酸が、リン酸、塩化水素、臭化水素、濃硝酸、濃硫酸、発煙硝酸及び発煙硫酸からなる群より選ばれる少なくとも1種であり、前記有機酸が、ギ酸、酢酸、シュウ酸、安息香酸、メタンスルホン酸、ベンゼンスルホン酸、パラトルエンスルホン酸及びトリフルオロメタンスルホン酸からなる群より選ばれる少なくとも1種である、発明3に記載の製造方法。
前記金属ハロゲン化物が、ホウ素(III)、スズ(II)、スズ(IV)、チタン(IV)、亜鉛(II)、アルミニウム(III)、アンチモン(III)及びアンチモン(V)からなる群より選ばれる少なくとも1種の金属を含む金属ハロゲン化物である、発明2に記載の製造方法。
前記金属ハロゲン化物が、三フッ化ホウ素(III)、三塩化アルミニウム(III)、二塩化亜鉛(II)、四塩化チタン(IV)、四塩化スズ(IV)、五塩化アンチモン(V)からなる群より選ばれる少なくとも1種である、発明2に記載の製造方法。
前記反応を、有機溶媒を用いることなく行う、発明1乃至6の何れかに記載の製造方法。
前記反応を、-20℃~+200℃の温度範囲で、かつ、0.1MPa~4.0MPa(絶対圧)の圧力範囲で行う、発明1乃至発明7の何れかに記載の製造方法。
で表される2価の有機基であり、R2は4価の有機基である]
で表される繰り返し単位を有するポリイミドを得る製造方法。
R1が、以下から選択される少なくとも1つの2価の有機基である、発明9に記載の製造方法。
R2が、以下から選択される少なくとも1つの4価の有機基である、発明9または10に記載の製造方法。
ポリイミドの重量平均分子量が、1000以上、1000000以下である、発明9乃至11のいずれかに記載の製造方法。
一般式[2A]で表される前記芳香族ジアミンと、一般式[17]で表される前記テトラカルボン酸二無水物とを縮重合して、一般式[18]で表されるポリイミドを得る前記工程が、一般式[2A]で表される前記芳香族ジアミンと、一般式[17]で表される前記テトラカルボン酸二無水物とを反応させて、一般式[19]:
で表される繰り返し単位を有するポリアミド酸を得る工程と、
一般式[19]で表される前記ポリアミド酸を脱水閉環して、一般式[18]で表されるポリイミドに変換する工程と、を含む、発明9乃至12の何れかに記載の製造方法。
式[3]:
式[3a]:
で表される1,1,1-トリフルオロ-2,2-ビス(3-メチル-4-アミノフェニル)エタンである、発明14に記載の1,1,1-トリフルオロ-2,2-ビスアリールエタン。
式[3b]:
で表される1,1,1-トリフルオロ-2,2-ビス(2-メチル-4-アミノフェニル)エタンである、発明14に記載の1,1,1-トリフルオロ-2,2-ビスアリールエタン。
式[4a]:
で表される1,1,1-トリフルオロ-2,2-ビス(3,5-ジメチル-4-アミノフェニル)エタンである、発明14に記載の1,1,1-トリフルオロ-2,2-ビスアリールエタン。
式[4b]:
で表される1,1,1-トリフルオロ-2,2-ビス(2,3-ジメチル-4-アミノフェニル)エタンである、発明14に記載の1,1,1-トリフルオロ-2,2-ビスアリールエタン。
式[4c]:
で表される1,1,1-トリフルオロ-2,2-ビス(2,5-ジメチル-4-アミノフェニル)エタンである、発明14に記載の1,1,1-トリフルオロ-2,-ビスアリールエタン。
式[5]:
式[5a]:
式[6]:
式[6a]:
式[7]:
式[7a]:
で表される1,1,1-トリフルオロ-2,2-ビス(2,5-ジメチル-4-ヒドロキシフェニル)エタンである、発明24に記載の1,1,1-トリフルオロ-2,2-ビスアリールエタン。
式[8]:
式[11]
式[11a]:
式[11b]:
式[12]:
式[12a]:
式[13]
式[13a]:
式[14]:
式[14a]:
式[15]:
式[16]:
これらの金属を用いた金属ハロゲン化物のうち、三フッ化ホウ素(III)、三塩化アルミニウム(III)、二塩化亜鉛(II)、四塩化チタン(IV)、四塩化スズ(IV)、五塩化アンチモン(V)が特に好ましい。
ブレンステッド酸を添加剤として機能させるには、その使用量は、フルオラール1モルに対し、0.001モル以上、通常は0.01~2.0モル用いるのが良い。但し、ブレンステッド酸は、2.0当量を超える量を用いた場合、経済的に好ましくない。
本実施形態の方法により得られる一般式[2]で表される1,1,1-トリフルオロ-2,2-ビスアリールエタンのうち、下記一般式[2A]:
で表されるテトラカルボン酸二無水物で表されるテトラカルボン酸二無水物との反応により、透明性や耐熱性に優れるとともに、成膜加工性に優れた、一般式[18]:
で表される2価の有機基であり、R2は4価の有機基である]
で表される繰り返し単位を有するポリイミドが得られる。
さらに、その他の製造例として、上記芳香族ジアミンとテトラカルボン酸二無水物を有機溶媒中で縮重合させ、得られる下記一般式[19]:
で表されるポリアミド酸を脱水閉環することで、本実施形態に係るポリイミドを製造する方法が挙げられる。この縮重合反応は-20~80℃で行い、前記ジアミンと前記テトラカルボン酸二無水物とをモル比で表して1対1で反応させることが好ましい。
896gの特級試薬CrCl3・6H2Oを純水に溶かして3.0Lとした。この溶液に粒状アルミナ400gを浸漬し、一昼夜放置した。次に濾過してアルミナを取り出し、熱風循環式乾燥器中で100℃に保ち、さらに一昼夜乾燥した。得られたクロム担持アルミナは、電気炉を備えた直径4.2cm長さ60cmの円筒形SUS316L製反応管に充填し、窒素ガスを約20mL/分の流量で流しながら300℃まで昇温し、水の流出が見られなくなった時点で、窒素ガスにフッ化水素を同伴させ、その濃度を徐々に高めた。充填されたクロム担持アルミナのフッ素化によるホットスポットが反応管出口端に達したところで反応器温度を350℃に上げ、その状態を5時間保ち触媒の調製を行った。
ここで得たフルオラール含有の484.8gの捕集液に関して滴定により、フッ化水素含量、塩化水素含量、そして有機物含量を算出すると、フッ化水素40重量%、塩化水素11重量%、そして有機物含有量49重量%であり、有機物の回収率は88%(供給原料クロラールモル数基準)であった。また、回収した有機物の一部を樹脂製のNMRチューブに採取し、19F-NMRにてフッ素化度を確認すると、低次フッ素化物はほぼ未検出であり、定量的にフッ素化が進行していることを確認した。
[物性データ]
1,2,2,2-テトラフルオロエタノール:
19F-NMR(400MHz,CFCl3)δ(ppm):-85.82(3F,s),-137.95(1F,d,J=54.9Hz)
フッ化水素:
19F-NMR(400MHz,CFCl3)δ(ppm):-193.37(1F,s)
[物性データ]
1,1,1-トリフルオロ-2,2-ジフェニルエタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.68(1H,q,J=10.0Hz),7.30-7.40(10H,m)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-65.7(3F,d,J=8.7Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(4-メチルフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.31(6H,s),4.60(1H,q,J=10.0Hz),7.14(4H,q,J=8.4Hz),7.25(4H,q,J=7.9Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.5(3F,d, J=8.7Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3,4-ジメチルフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.31(12H,s),4.53(1H,q,J=10.2Hz),7.03-7.15(6H,m)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.4(3F,d,J=11.5Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(ナフト-1-イル)エタン:
1H-NMR(400MHz,DMSO-d6)δ(ppm):6.29(1H,q,J=10.1Hz),7.40-8.00(14H,m)
19F-NMR(400MHz,DMSO-d6,CFCl3)δ(ppm):-63.0(3F,d,J=8.6Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.55(1H,q,J=9.9Hz),5.10(2H,s),6.80(4H,d,J=8.6Hz),7.22(4H,d,J=8.83Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.9(3F,d,J=8.6Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3-メチル-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.21(6H,s),4.47(1H,q,J=10.1Hz),6.76(2H,d,J=8.3Hz),7.05(2H,d,J=8.3Hz),7.08(2H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.7(3F,d,J=11.5Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3,5-ジメチル-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CD3CN)δ(ppm):2.18(12H,s),4.53(1H,q,J=10.6Hz),6.13(2H,s),7.00(4H,s)
19F-NMR(400MHz,CD3CN,CFCl3)δ(ppm):-66.5(3F,d,J=11.5Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(2,5-ジメチル-4-ヒドロキシフェニル):
1H-NMR(400MHz,CD3CN)δ(ppm):2.08(6H,s),2.16(6H,s),4.93(1H,q,J=10.0Hz),6.58(2H,s),6.71(2H,s),7.05(2H,s)
19F-NMR(400MHz,CD3CN,CFCl3)δ(ppm):-65.5(3F,d,J=8.7Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(4-アミノフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):3.42(4H,s),4.45(1H,q,J=10.1Hz),6.62(4H,d,J=8.3Hz),7.12(4H,d,J=8.3Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.9(3F,d,J=11.5Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3-メチル-4-アミノフェニル)エタン:1H-NMR(400MHz,CDCl3)δ(ppm):2.13(6H,s),3.14(4H,s),4.41(1H,q,J=10.4Hz),6.62(2H,d,J=10.4Hz),7.01(2H,s),7.02(2H,d, J=8.3Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.7(3F,d,J=11.5Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3,5-ジメチル-4-アミノフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.15(12H,s),3.55(4H,s),4.36(1H,q,J=10.4Hz),6.62(2H,d,J=10.4Hz),6.93(4H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.6(3F,d,J=8.6Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(2-メチル-4-アミノフェニル)エタン:1H-NMR(400MHz,CDCl3)δ(ppm):2.21(6H,s),3.58(4H,bs),4.83(1H,q,J=9.6Hz),6.48(2H,s),6.50(2H,d,J=9.4Hz),7.17(2H,d,J=8.7Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-65.6(3F,d,J=11.6Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(2,5-ジメチル-4-アミノフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.12(6H,s),2.19(6H,s),3.53(4H,bs),4.80(1H,q,J=9.6Hz),6.45(2H,s),7.04(2H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-65.5(3F,d,J=8.7Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3-アミノ-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CD3OD)δ(ppm):4.41(1H,q,J=10.42Hz),4.88(6H、s),6.60-6.80(6H,m)
19F-NMR(400MHz,CD3OD,CFCl3)δ(ppm):-66.8(3F,d,J=11.6Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(4-フルオロフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.66(1H,q,J=9.7Hz),7.02-7.06(4H,m),7.30(2H,d,J=8.8Hz),7.32(2H,d,J=8.8Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.3(3F,d,J=8.7Hz),-113.8(2F,s)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(4-トリフルオロメトキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.72(1H,q,J=9.7Hz),7.21(4H,d,J=8.6Hz),7.38(4H,d,J=8.6Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-57.3(6F,s),-66.1(3F,d,J=8.7Hz)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(3-メトキシ-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):3.81-3.84(6H,s),4.47-4.57(1H,m),6.78-6.96(6H,m)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.1(3F,d,J=8.7)
[物性データ]
1,1,1-トリフルオロ-2,2-ビス(2,3-ジメチル-4-アミノフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):2.10(6H,s),2.18(6H,s),4.19(4H,bs),5.01(1H,q,J=9.6Hz),6.59(2H,d,J=8.4Hz),7.07(2H,d,J=8.4Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-64.6(3F,d,J=9.2Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-フルオロ-4-アミノフェニル)エタン
1H-NMR(400MHz,CDCl3)δ(ppm):3.71(4H,br-s),4.43(1H,q,J=9.6Hz),6.71(2H,dd、J=12.0,8.0Hz),6.90(2H,d,J=8.0Hz),6.97(2H,d,J=12.0Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-134.3(2F,br-s),-66.4(3F,d,J=8.7Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(2-フルオロ-4-アミノフェニル)エタン
1H-NMR(400MHz,CDCl3)δ(ppm):3.70(4H,br-s),5.20(1H,q,J=9.6Hz),6.34(2H,d,J=11.6Hz),6.39(2H,d,J=8.4Hz),7.20(2H,dd,J=11.6,8.4Hz)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-1116.5(2F,br-s),-66.5(3F,d,J=8.7Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-イソプロピル-4-アミノフェニル)エタン
1H-NMR(400MHz,CDCl3)δ(ppm):1.23(12H,d,J=6.8Hz)2.87(2H,qq,J=6.8,6.8Hz),3.64(4H,br-s),4.44(1H,q,J=10.0Hz),6.61(2H,d,J=8.4Hz),7.02(2H,d,J=8.4Hz),7.14(2H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.3(3F,d,J=8.7Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-トリフルオロメチル-4-アミノフェニル)エタン
1H-NMR(400MHz,CDCl3)δ(ppm):4.20(4H,br-s)4.47(1H,q,J=9.5Hz),6.71(2H,d,J=8.9Hz),7.25(2H,d,J=8.9Hz),7.35(2H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.6(3F,d,J=8.7Hz),-62.8(6F,s)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-ニトロ-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.69(1H,q,J=9.4Hz),7.20(2H,d,J=8.9Hz),7.55(2H,dd,J=8.7,2.3Hz),8.09(2H,d,J=2.3Hz),10.57(2H,s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-66.9(3F,d,J=8.7Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-フルオロ-4-ヒドロキシフェニル)エタン:
1H-NMR(400MHz,CDCl3)δ(ppm):4.74(1H,q),6.93(2H,t,J=8.7Hz),7.03(2H,d,J=8.5Hz),7.12(2H,d,J=12.1Hz),7.22(2H,br-s)
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-136.3(2F,t,J=11.5Hz),-66.0(3F,d,J=8.7Hz)
[物性データ]1,1,1-トリフルオロ-2,2-ビス(3-トリフルオロメチル-4-ヒドロキシフェニル)エタン:
19F-NMR(400MHz,CDCl3,CFCl3)δ(ppm):-67.1(3F,d,J=8.7Hz),-62.7(6F,s)
Claims (21)
- 前記反応に、添加剤として、ルイス酸またはブレンステッド酸を添加する、請求項1に記載の製造方法。
- 前記ルイス酸または前記ブレンステッド酸が、無機酸、有機酸および金属ハロゲン化物からなる群より選ばれる少なくとも1種である、請求項2に記載の製造方法。
- 前記無機酸が、リン酸、塩化水素、臭化水素、濃硝酸、濃硫酸、発煙硝酸及び発煙硫酸からなる群より選ばれる少なくとも1種であり、前記有機酸が、ギ酸、酢酸、シュウ酸、安息香酸、メタンスルホン酸、ベンゼンスルホン酸、パラトルエンスルホン酸及びトリフルオロメタンスルホン酸からなる群より選ばれる少なくとも1種である、請求項3に記載の製造方法。
- 前記金属ハロゲン化物が、ホウ素(III)、スズ(II)、スズ(IV)、チタン(IV)、亜鉛(II)、アルミニウム(III)、アンチモン(III)及びアンチモン(V)からなる群より選ばれる少なくとも1種の金属を含む金属ハロゲン化物である、請求項3に記載の製造方法。
- 前記金属ハロゲン化物が、三フッ化ホウ素(III)、三塩化アルミニウム(III)、二塩化亜鉛(II)、四塩化チタン(IV)、四塩化スズ(IV)、五塩化アンチモン(V)からなる群より選ばれる少なくとも1種である、請求項5に記載の製造方法。
- 前記反応を、有機溶媒を用いることなく行う、請求項1乃至6の何れかに記載の製造方法。
- 前記反応を、-20℃~+200℃の温度範囲で、かつ、0.1MPa~4.0MPa(絶対圧)の圧力範囲で行う、請求項1乃至7の何れかに記載の製造方法。
- 請求項1乃至8の何れかに記載の方法で一般式[2A]:
で表される芳香族ジアミンを得る工程と、
前記芳香族ジアミンと、一般式[17]:
で表されるテトラカルボン酸二無水物とを重縮合して、一般式[18]:
で表される2価の有機基であり、R2は4価の有機基である]
で表される繰り返し単位を有するポリイミドを得る製造方法。 - ポリイミドの重量平均分子量が、1000以上、1000000以下である、請求項9乃至11のいずれかに記載の製造方法。
- 一般式[2A]で表される前記芳香族ジアミンと、一般式[17]で表される前記テトラカルボン酸二無水物とを縮重合して、一般式[18]で表されるポリイミドを得る前記工程が、一般式[2A]で表される前記芳香族ジアミンと、一般式[17]で表される前記テトラカルボン酸二無水物とを反応させて、一般式[19]:
で表される繰り返し単位を有するポリアミド酸を得る工程と、
一般式[19]で表される前記ポリアミド酸を脱水閉環して、一般式[18]で表されるポリイミドに変換する工程と、
を含む、請求項9乃至12の何れかに記載の製造方法。
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CN118043368A (zh) * | 2021-11-02 | 2024-05-14 | 中央硝子株式会社 | 芳烷基树脂、环氧树脂的稀释剂、固化性树脂组合物、光敏性树脂组合物、固化物、电子装置、芳烷基树脂的制备方法 |
WO2023182141A1 (ja) * | 2022-03-25 | 2023-09-28 | セントラル硝子株式会社 | エポキシ化合物、エポキシ樹脂、エポキシ樹脂組成物、硬化物、プリプレグ、繊維強化複合材料、およびこれらの製造方法、封止材、半導体装置、半導体素子を封止する方法、並びに封止材として使用する方法 |
WO2023190187A1 (ja) * | 2022-03-28 | 2023-10-05 | セントラル硝子株式会社 | マレイミド化合物、マレアミック酸化合物、硬化性組成物、硬化物、電子デバイス、マレイミド化合物の製造方法およびマレアミック酸化合物の製造方法 |
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