JP7378210B2 - セラミック部材の製造方法 - Google Patents
セラミック部材の製造方法 Download PDFInfo
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- JP7378210B2 JP7378210B2 JP2019006355A JP2019006355A JP7378210B2 JP 7378210 B2 JP7378210 B2 JP 7378210B2 JP 2019006355 A JP2019006355 A JP 2019006355A JP 2019006355 A JP2019006355 A JP 2019006355A JP 7378210 B2 JP7378210 B2 JP 7378210B2
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- 239000000919 ceramic Substances 0.000 title claims description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 229910052782 aluminium Inorganic materials 0.000 claims description 33
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 33
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 238000010304 firing Methods 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 26
- 229910000838 Al alloy Inorganic materials 0.000 claims description 23
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 14
- 230000008018 melting Effects 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 8
- 239000011800 void material Substances 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 239000004020 conductor Substances 0.000 description 12
- 229910052721 tungsten Inorganic materials 0.000 description 10
- 239000010937 tungsten Substances 0.000 description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 9
- 238000002474 experimental method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- HHIQWSQEUZDONT-UHFFFAOYSA-N tungsten Chemical compound [W].[W].[W] HHIQWSQEUZDONT-UHFFFAOYSA-N 0.000 description 7
- 238000005238 degreasing Methods 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
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Description
先ず、第1の実施形態について説明する。第1の実施形態はセラミック部材に関する。図1は、第1の実施形態に係るセラミック部材を示す図である。図1(a)は平面図であり、図1(b)は図1(a)中のI-I線に沿った断面図であり、図1(c)は図1(a)中のII-II線に沿った断面図である。
次に、第2の実施形態について説明する。第2の実施形態はセラミック部材を含む静電チャックに関する。図11は、第2の実施形態に係る静電チャックを示す断面図である。
次に、第3の実施形態について説明する。第3の実施形態はセラミック部材を含むインダクタに関する。図12は、第3の実施形態に係るインダクタを示す平面図である。
2、102 第2のグリーンシート
2A、102A 孔
3、103 第3のグリーンシート
10、110 焼結体
11、111 導電部材
11A アルミニウム箔
111A 金属膜
200 静電チャック
300 インダクタ
Claims (6)
- アルミニウム又はアルミニウム合金の金属膜を第1のグリーンシートと第2のグリーンシートとで挟み込む工程と、
前記金属膜の融点以上の温度で前記第1のグリーンシート及び前記第2のグリーンシートの焼成を行ってセラミックの焼結体を得る工程と、
を有し、
前記第1のグリーンシートを構成するセラミックのうち96質量%以上が酸化アルミニウムであり、
前記第2のグリーンシートを構成するセラミックのうち96質量%以上が酸化アルミニウムであり、
前記焼結体を構成するセラミックのうち96質量%以上が酸化アルミニウムであり、
前記焼結体の相対密度が90%以上であり、
前記第1のグリーンシート若しくは前記第2のグリーンシート又はこれらの両方の前記金属膜と接する面の一部に空隙が設けられており、
前記焼結体を得る工程において、溶融した前記金属膜の一部が前記空隙に入り込んで凝固することを特徴とするセラミック部材の製造方法。 - 前記焼成を酸化性雰囲気中で行うことを特徴とする請求項1に記載のセラミック部材の製造方法。
- 前記焼成を大気雰囲気中で行うことを特徴とする請求項2に記載のセラミック部材の製造方法。
- 前記焼成を700℃以上1600℃以下の温度で行うことを特徴とする請求項1乃至3のいずれか1項に記載のセラミック部材の製造方法。
- 前記焼成を1300℃以上1600℃以下の温度で行うことを特徴とする請求項4に記載のセラミック部材の製造方法。
- 前記空隙の直径は3mmであることを特徴とする請求項1乃至5のいずれか1項に記載のセラミック部材の製造方法。
Priority Applications (5)
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KR20200089614A (ko) | 2020-07-27 |
TW202045456A (zh) | 2020-12-16 |
JP2020114789A (ja) | 2020-07-30 |
US11370709B2 (en) | 2022-06-28 |
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