JP7190527B2 - 金属粉末コアからなる集積チップインダクタの製造方法 - Google Patents
金属粉末コアからなる集積チップインダクタの製造方法 Download PDFInfo
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- 239000000843 powder Substances 0.000 title claims description 25
- 229910052751 metal Inorganic materials 0.000 title claims description 22
- 239000002184 metal Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000000034 method Methods 0.000 claims description 43
- 238000004804 winding Methods 0.000 claims description 36
- 238000005498 polishing Methods 0.000 claims description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 34
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- 229910052802 copper Inorganic materials 0.000 claims description 28
- 239000010949 copper Substances 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 27
- 239000011248 coating agent Substances 0.000 claims description 26
- 238000007747 plating Methods 0.000 claims description 26
- 238000009413 insulation Methods 0.000 claims description 25
- 238000009713 electroplating Methods 0.000 claims description 18
- 238000000465 moulding Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- 238000007731 hot pressing Methods 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 10
- 239000004642 Polyimide Substances 0.000 claims description 8
- 238000004806 packaging method and process Methods 0.000 claims description 8
- 229920001721 polyimide Polymers 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 6
- 229920000647 polyepoxide Polymers 0.000 claims description 6
- 238000001771 vacuum deposition Methods 0.000 claims description 5
- 230000002950 deficient Effects 0.000 claims description 4
- AGXUVMPSUKZYDT-UHFFFAOYSA-L barium(2+);octadecanoate Chemical compound [Ba+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AGXUVMPSUKZYDT-UHFFFAOYSA-L 0.000 claims description 3
- 239000011230 binding agent Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 3
- 239000008187 granular material Substances 0.000 claims description 3
- 238000005469 granulation Methods 0.000 claims description 3
- 230000003179 granulation Effects 0.000 claims description 3
- 239000000314 lubricant Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 3
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 claims description 3
- 229910000859 α-Fe Inorganic materials 0.000 claims description 3
- 239000002086 nanomaterial Substances 0.000 claims description 2
- 239000000047 product Substances 0.000 description 97
- 239000002245 particle Substances 0.000 description 30
- 239000010410 layer Substances 0.000 description 27
- 238000012360 testing method Methods 0.000 description 16
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 230000001186 cumulative effect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 229910052718 tin Inorganic materials 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEVZIAVUCQDJFL-UHFFFAOYSA-N [Cr].[Fe].[Si] Chemical compound [Cr].[Fe].[Si] XEVZIAVUCQDJFL-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000013065 commercial product Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 2
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 2
- -1 iron-silicon-aluminum Chemical compound 0.000 description 2
- 239000010985 leather Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 239000002159 nanocrystal Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000007619 statistical method Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0206—Manufacturing of magnetic cores by mechanical means
- H01F41/0246—Manufacturing of magnetic circuits by moulding or by pressing powder
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- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/001—Magnets
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
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- H01F17/04—Fixed inductances of the signal type with magnetic core
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- H01F27/00—Details of transformers or inductances, in general
- H01F27/02—Casings
- H01F27/022—Encapsulation
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- H01F27/00—Details of transformers or inductances, in general
- H01F27/24—Magnetic cores
- H01F27/255—Magnetic cores made from particles
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- H01F27/28—Coils; Windings; Conductive connections
- H01F27/29—Terminals; Tapping arrangements for signal inductances
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- H01F3/00—Cores, Yokes, or armatures
- H01F3/08—Cores, Yokes, or armatures made from powder
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- H01F41/005—Impregnating or encapsulating
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- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/06—Coil winding
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- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
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- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/06—Coil winding
- H01F41/064—Winding non-flat conductive wires, e.g. rods, cables or cords
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Description
1)本発明の技術的な利点は、底面電極又は「L」型電極のみを保留し、絶縁材料を採用して製品本体を覆う金属粉末コアからなる集積チップインダクタを提供し、スラリー末端封鎖からなる電気めっき型の一体成型インダクタ、銅シート端子からなる電極型の一体成型インダクタのサイドのスズ積層サイズを節約することにより、回路基板における製品の設置サイズを縮小し、集積回路PCBボードの設置スペースを増やし、生産コストを大幅に削減し、製品が高い信頼性、高いコストパフォーマンスを備え、集積回路産業の高度の集積化開発に有利な条件を作り出すことである。同じサイズの場合、製品の総合的な性能が大幅に向上できる。
空芯コイルに巻き取るステップと、プレス成形ステップと、グリーン(未加熱)素体(Green sheet)面取りステップと、熱圧硬化ステップと、仕上体(加熱済み)面取りステップと、絶縁被覆ステップと、研磨ステップと、電極へのニッケルめっきステップと、電極への銅めっきステップと、二次絶縁被覆ステップと、二次研磨ステップと、電気めっきによる電極の金属化ステップと、検出及びパッケージングステップとを含む、金属粉末コアからなる集積チップインダクタの製造方法である。
空芯コイルに巻き取るステップと、プレス成形ステップと、グリーン素体面取りステップと、熱圧硬化ステップと、仕上体面取りステップと、絶縁被覆ステップと、研磨ステップと、電気めっきステップと、検出及びパッケージングステップとを含む、金属粉末コアからなる集積チップインダクタの製造方法である。
Claims (1)
- 下記の第1のステップ~第13のステップを順に行う、金属粉末コアからなる集積チップインダクタの製造方法であって、
第1のステップにおいて、空芯コイルに巻き取り、即ち、製品仕様設定の要件によって空芯コイルを制作し、巻き取り方法は巻線治具による多軸巻き取りを採用し、
第2のステップにおいて、プレス成形し、即ち、カルボニル鉄粉又は合金材料を採用して成形し、カルボニル基鉄粉/合金材料/フェライト材料:エポキシ樹脂:アセトンを100:≦7:≦20の重量比でよく混合した後、温度≦80℃の条件下で1-3時間保温した後、研磨して造粒し、製造された粉末は、球形度≧60%を満し、且つ粉末の粒径はD50≦30μm、D90≦90μm、D10≦20μmを満たし、エポキシ樹脂をバインダとし、粉末造粒を完成した後、ステアリン酸亜鉛、ステアリン酸バリウム、又はその他の離型潤滑剤を添加し、その後、空芯コイルを含む巻線治具を成形機の金型に入れた後、コイルを金型キャビティの定点にインプラントし、金属粉末を金型キャビティ内に充填し、成型密度が3g/cm 3 以上になるように製品をプレス成形し、
第3のステップにおいて、素体の面取りを行い、即ち、プレス成形された製品を製品重量に応じて1000分の1以上の面取り媒体を添加した後、面取り装置に入れ、面取り作業を完成し、
第4のステップにおいて、熱圧硬化し、即ち、製品を整然にレイアウトして熱圧装置のキャビティ内に入れ、熱圧装置のキャビティの温度を100℃以上に制御し、0.5MPa以上の圧力で5分間以上の保圧を行い、熱圧硬化作業を完成し、
第5のステップにおいて、仕上面取りを行い、即ち、熱圧後の製品を製品の重量に応じて製品の重量よりも大きい面取り媒体を添加した後、面取り装置に入れ、仕上体面取り作業を完成し、ここで、面取り時間は5分間以上であり、前記面取り媒体は、専用面取り向け石であり、
第6のステップにおいて、絶縁被覆を行い、即ち、ポリイミド系材料を使用して絶縁層の厚さが3μm以上になるように製品の表面について絶縁被覆処理を行い、製品を被覆した後、絶縁層が硬化されるように100℃以上で0.5時間以上ベーキングし、
第7のステップにおいて、研磨を行い、即ち、製品を治具内に整然に配列し、高精度の研磨機を使用して、製品の片側研磨量が3μm以上でありかつ研磨後の製品端部のエナメル銅線の断面が露出するように製品について研磨作業を行い、
第8のステップにおいて、電極へのニッケルめっきを行い、即ち、研磨後の製品に0.3μm以上のニッケル層を電気めっきし、
第9のステップにおいて、電極への銅めっきを行い、即ち、ニッケルめっき後の製品に1μm以上の銅層を電気めっきし、
第10のステップにおいて、二次絶縁被覆を行い、即ち、ポリイミド系ナノ材料を使用して絶縁層の厚さが3μm以上になるように製品の表面について絶縁被覆処理を行い、製品を被覆した後、絶縁層が硬化されるように100℃以上で0.5時間以上ベーキングし、
第11のステップにおいて、二次研磨を行い、即ち、製品を治具内に整然に配列し、高精度の研磨機を使用して、製品の片側研磨量が3μm以上でありかつ製品底部の銅導体めっき層を露出するように製品について研磨作業を行い、
第12のステップにおいて、電気めっきによって電極を金属化し、即ち、真空コーティング工程又は従来の電気めっき工程の一方又は両方の組み合わせを採用し、ニッケルめっきされたうえに銅めっきされた製品の表面に、必要な金属及び合金材料のめっき層をさらに追加し、
第13のステップにおいて、検出及びパッケージングを行い、即ち、製品について検出を行い、サイズ、外観及び特性の不良品を排除した後、製品をパッケージングすることを特徴とする、金属粉末コアからなる集積チップインダクタの製造方法。
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