JP7166871B2 - 垂直共振器型発光素子 - Google Patents

垂直共振器型発光素子 Download PDF

Info

Publication number
JP7166871B2
JP7166871B2 JP2018196394A JP2018196394A JP7166871B2 JP 7166871 B2 JP7166871 B2 JP 7166871B2 JP 2018196394 A JP2018196394 A JP 2018196394A JP 2018196394 A JP2018196394 A JP 2018196394A JP 7166871 B2 JP7166871 B2 JP 7166871B2
Authority
JP
Japan
Prior art keywords
region
semiconductor layer
resistance region
layer
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018196394A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020064994A5 (enExample
JP2020064994A (ja
Inventor
大 倉本
静一郎 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2018196394A priority Critical patent/JP7166871B2/ja
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to PCT/JP2019/039456 priority patent/WO2020080161A1/ja
Priority to US17/285,635 priority patent/US12218486B2/en
Priority to CN201980068567.3A priority patent/CN112913093B/zh
Priority to EP19872622.6A priority patent/EP3869642B1/en
Publication of JP2020064994A publication Critical patent/JP2020064994A/ja
Publication of JP2020064994A5 publication Critical patent/JP2020064994A5/ja
Application granted granted Critical
Publication of JP7166871B2 publication Critical patent/JP7166871B2/ja
Priority to US19/006,794 priority patent/US20250158360A1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • H01S5/18369Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0425Electrodes, e.g. characterised by the structure
    • H01S5/04252Electrodes, e.g. characterised by the structure characterised by the material
    • H01S5/04253Electrodes, e.g. characterised by the structure characterised by the material having specific optical properties, e.g. transparent electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1071Ring-lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18341Intra-cavity contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34346Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser characterised by the materials of the barrier layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/16Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
    • H01S2301/166Single transverse or lateral mode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/18Semiconductor lasers with special structural design for influencing the near- or far-field
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18305Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18344Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004Confining in the direction perpendicular to the layer structure
    • H01S5/2009Confining in the direction perpendicular to the layer structure by using electron barrier layers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP2018196394A 2018-10-18 2018-10-18 垂直共振器型発光素子 Active JP7166871B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2018196394A JP7166871B2 (ja) 2018-10-18 2018-10-18 垂直共振器型発光素子
US17/285,635 US12218486B2 (en) 2018-10-18 2019-10-07 Vertical cavity surface emitting device
CN201980068567.3A CN112913093B (zh) 2018-10-18 2019-10-07 垂直谐振器式发光元件
EP19872622.6A EP3869642B1 (en) 2018-10-18 2019-10-07 Vertical resonator-type light-emitting element
PCT/JP2019/039456 WO2020080161A1 (ja) 2018-10-18 2019-10-07 垂直共振器型発光素子
US19/006,794 US20250158360A1 (en) 2018-10-18 2024-12-31 Vertical cavity surface emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018196394A JP7166871B2 (ja) 2018-10-18 2018-10-18 垂直共振器型発光素子

Publications (3)

Publication Number Publication Date
JP2020064994A JP2020064994A (ja) 2020-04-23
JP2020064994A5 JP2020064994A5 (enExample) 2021-10-21
JP7166871B2 true JP7166871B2 (ja) 2022-11-08

Family

ID=70284329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018196394A Active JP7166871B2 (ja) 2018-10-18 2018-10-18 垂直共振器型発光素子

Country Status (5)

Country Link
US (2) US12218486B2 (enExample)
EP (1) EP3869642B1 (enExample)
JP (1) JP7166871B2 (enExample)
CN (1) CN112913093B (enExample)
WO (1) WO2020080161A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7190865B2 (ja) * 2018-10-18 2022-12-16 スタンレー電気株式会社 垂直共振器型発光素子
JP7166871B2 (ja) 2018-10-18 2022-11-08 スタンレー電気株式会社 垂直共振器型発光素子
JP7227469B2 (ja) * 2019-01-29 2023-02-22 日亜化学工業株式会社 垂直共振器面発光レーザ素子
JP7288360B2 (ja) 2019-07-01 2023-06-07 スタンレー電気株式会社 垂直共振器型発光素子
JP7523258B2 (ja) * 2020-06-12 2024-07-26 スタンレー電気株式会社 垂直共振器型発光素子
JP7623563B2 (ja) * 2020-07-27 2025-01-29 日亜化学工業株式会社 垂直共振器面発光レーザ素子
DE112022002708T5 (de) * 2021-05-21 2024-03-07 Ams-Osram International Gmbh Verfahren zur herstellung eines halbleiterbauelements und halbleiterbauelement
WO2025131591A1 (en) * 2023-12-21 2025-06-26 Ams-Osram International Gmbh OPTICAL APERTURES FOR InGaN VCSEL

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000196189A (ja) 1998-12-24 2000-07-14 Toshiba Corp 面発光型半導体レーザ
JP2003163373A (ja) 2001-11-26 2003-06-06 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体発光素子
US6751245B1 (en) 1999-06-02 2004-06-15 Optical Communication Products, Inc. Single mode vertical cavity surface emitting laser
JP2005197426A (ja) 2004-01-07 2005-07-21 Yokogawa Electric Corp 面発光レーザ
JP2011205006A (ja) 2010-03-26 2011-10-13 Furukawa Electric Co Ltd:The 半導体レーザ素子およびその製造方法
JP2012517705A (ja) 2009-02-11 2012-08-02 ダンマークス テクニスク ユニバーシテット ハイブリッド垂直キャビティレーザー
WO2017018017A1 (ja) 2015-07-28 2017-02-02 ソニー株式会社 発光素子
WO2018083877A1 (ja) 2016-11-02 2018-05-11 ソニー株式会社 発光素子及びその製造方法
JP6369613B1 (ja) 2017-09-21 2018-08-08 富士ゼロックス株式会社 発光部品、プリントヘッド及び画像形成装置
WO2018180450A1 (ja) 2017-03-27 2018-10-04 学校法人 名城大学 半導体多層膜反射鏡及び垂直共振器型発光素子

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53140883A (en) 1977-05-16 1978-12-08 Terumo Corp Urinary output monitor
US5058120A (en) * 1990-02-28 1991-10-15 Kabushiki Kaisha Toshiba Visible light emitting semiconductor laser with inverse mesa-shaped groove section
JP3395194B2 (ja) 1990-09-12 2003-04-07 セイコーエプソン株式会社 面発光型半導体レーザ
US5625637A (en) 1991-03-28 1997-04-29 Seiko Epson Corporation Surface emitting semiconductor laser and its manufacturing process
JPH0918084A (ja) 1995-06-26 1997-01-17 Seiko Epson Corp 面発光型半導体レーザ及びその製造方法
US5594751A (en) * 1995-06-26 1997-01-14 Optical Concepts, Inc. Current-apertured vertical cavity laser
DE69633203T2 (de) 1995-09-18 2005-09-01 Hitachi, Ltd. Halbleiterlaservorrichtungen
JPH11121864A (ja) 1997-10-08 1999-04-30 Seiko Epson Corp 面発光レーザ及びその製造方法
US5915165A (en) 1997-12-15 1999-06-22 Xerox Corporation Method of manufacturing vertical cavity surface emitting semiconductor lasers using intermixing and oxidation
US6376269B1 (en) 1999-02-02 2002-04-23 Agilent Technologies, Inc. Vertical cavity surface emitting laser (VCSEL) using buried Bragg reflectors and method for producing same
JP2000299492A (ja) 1999-04-15 2000-10-24 Daido Steel Co Ltd 量子井戸型発光ダイオード
US6507595B1 (en) 1999-11-22 2003-01-14 Avalon Photonics Vertical-cavity surface-emitting laser comprised of single laser elements arranged on a common substrate
US6396865B1 (en) 2000-10-27 2002-05-28 Wisconsin Alumni Research Foundation Vertical-cavity surface-emitting lasers with antiresonant reflecting optical waveguides
KR100384598B1 (ko) 2000-11-29 2003-05-22 주식회사 옵토웰 질화물반도체 수직공진 표면발광 레이저
KR100345452B1 (ko) * 2000-12-14 2002-07-26 한국전자통신연구원 상부거울층 양단부에 확산영역을 구비하는 장파장표면방출 레이저 소자 및 그 제조 방법
US6546029B2 (en) * 2001-03-15 2003-04-08 Ecole Polytechnique Federale De Lausanne Micro-electromechanically tunable vertical cavity photonic device and a method of fabrication thereof
US6589805B2 (en) * 2001-03-26 2003-07-08 Gazillion Bits, Inc. Current confinement structure for vertical cavity surface emitting laser
AU2003256382A1 (en) 2002-07-06 2004-01-23 Optical Communication Products, Inc. Method of self-aligning an oxide aperture with an annular intra-cavity contact in a long wavelength vcsel
JP3857632B2 (ja) 2002-09-27 2006-12-13 株式会社東芝 垂直共振器型面発光レーザ素子
US20040179566A1 (en) * 2003-03-11 2004-09-16 Aharon El-Bahar Multi-color stacked semiconductor lasers
JP2004288674A (ja) 2003-03-19 2004-10-14 Fuji Xerox Co Ltd 面発光型半導体レーザおよびそれを用いた光通信システム
JP4641736B2 (ja) 2003-10-28 2011-03-02 ソニー株式会社 面発光半導体レーザーとその製造方法及び光学装置
US7542499B2 (en) 2003-11-27 2009-06-02 Ricoh Company, Ltd. Surface-emission laser diode and surface-emission laser array, optical interconnection system, optical communication system, electrophotographic system, and optical disk system
JP4602685B2 (ja) 2004-04-14 2010-12-22 株式会社リコー 垂直共振器型面発光半導体レーザ素子および発光装置および光伝送システム
JP4602692B2 (ja) 2004-04-23 2010-12-22 株式会社リコー 面発光レーザ及び光伝送システム
US20190245318A1 (en) 2004-10-29 2019-08-08 Ronald LaComb Concentric Cylindrical Circumferential Laser
US7693203B2 (en) 2004-11-29 2010-04-06 Alight Photonics Aps Single-mode photonic-crystal VCSELs
JP2006245379A (ja) 2005-03-04 2006-09-14 Stanley Electric Co Ltd 半導体発光素子
US20070025407A1 (en) * 2005-07-29 2007-02-01 Koelle Bernhard U Long-wavelength VCSEL system with heat sink
JP4548329B2 (ja) 2005-12-19 2010-09-22 セイコーエプソン株式会社 面発光型半導体レーザ
JP4548345B2 (ja) 2006-01-12 2010-09-22 セイコーエプソン株式会社 面発光型半導体レーザ
JPWO2007116659A1 (ja) 2006-03-23 2009-08-20 日本電気株式会社 面発光レーザ
JP5082344B2 (ja) 2006-08-31 2012-11-28 富士ゼロックス株式会社 面発光型半導体レーザおよびその製造方法
JP5228363B2 (ja) 2007-04-18 2013-07-03 ソニー株式会社 発光素子
JP2009038310A (ja) 2007-08-03 2009-02-19 Sumitomo Electric Ind Ltd 面発光型半導体光デバイス
JP2009170508A (ja) 2008-01-11 2009-07-30 Furukawa Electric Co Ltd:The 面発光半導体レーザ及びその製造方法
JP4479804B2 (ja) * 2008-02-13 2010-06-09 富士ゼロックス株式会社 面発光型半導体レーザ
WO2009119172A1 (ja) 2008-03-28 2009-10-01 日本電気株式会社 面発光レーザ
JP5006242B2 (ja) 2008-03-31 2012-08-22 古河電気工業株式会社 面発光半導体レーザ素子
US8030666B2 (en) * 2008-04-16 2011-10-04 Taiwan Semiconductor Manufacturing Company, Ltd. Group-III nitride epitaxial layer on silicon substrate
JP2009266919A (ja) 2008-04-23 2009-11-12 Sony Corp 面発光型半導体レーザおよびその製造方法
GB0817786D0 (en) 2008-09-30 2008-11-05 Bookham Technology Plc Improved vertical cavity surface emitting laser
JP5521478B2 (ja) * 2008-10-22 2014-06-11 日亜化学工業株式会社 窒化物半導体発光素子の製造方法及び窒化物半導体発光素子
JP2010114214A (ja) * 2008-11-05 2010-05-20 Fuji Xerox Co Ltd 面発光型半導体レーザ素子、面発光型半導体レーザ素子の製造方法、および光送信装置
US8488644B2 (en) * 2008-12-10 2013-07-16 Furukawa Electric Co., Ltd. Semiconductor laser element and manufacturing method thereof
JP5707742B2 (ja) 2009-06-30 2015-04-30 日亜化学工業株式会社 垂直共振器型面発光レーザ
JP4934705B2 (ja) * 2009-07-28 2012-05-16 キヤノン株式会社 面発光レーザ、面発光レーザの製造方法、画像形成装置
JP5754624B2 (ja) * 2010-05-25 2015-07-29 株式会社リコー 面発光レーザ素子、面発光レーザアレイ、光走査装置、画像形成装置及び面発光レーザ素子の製造方法
JP5633435B2 (ja) * 2011-03-09 2014-12-03 日亜化学工業株式会社 面発光レーザ素子
EP2533380B8 (en) 2011-06-06 2017-08-30 Mellanox Technologies, Ltd. High speed lasing device
US8731012B2 (en) 2012-01-24 2014-05-20 Fuji Xerox Co., Ltd. Surface emitting semiconductor laser and its manufacturing method, surface emitting semiconductor laser device, optical transmitter, and information processor
EP2878045B1 (en) 2012-07-27 2020-01-08 Thorlabs, Inc. Polarization stable widely tunable short cavity laser
JP6240429B2 (ja) * 2013-08-07 2017-11-29 国立大学法人東京工業大学 面発光型半導体レーザおよび光伝送装置
US20170093128A1 (en) * 2014-03-04 2017-03-30 Hewlett Packard Enterprise Development Lp Vertical-cavity surface-emitting lasers
US11095096B2 (en) * 2014-04-16 2021-08-17 Yale University Method for a GaN vertical microcavity surface emitting laser (VCSEL)
JP6664688B2 (ja) * 2015-11-19 2020-03-13 学校法人 名城大学 垂直共振器型発光素子
JP6700027B2 (ja) 2015-11-20 2020-05-27 スタンレー電気株式会社 垂直共振器型発光素子
JP6990499B2 (ja) 2016-04-18 2022-01-12 スタンレー電気株式会社 垂直共振器型発光素子及び垂直共振型発光素子の製造方法
JP2018073853A (ja) * 2016-10-24 2018-05-10 スタンレー電気株式会社 反射鏡、垂直共振器型発光装置及びその製造方法
JP6966843B2 (ja) 2017-02-08 2021-11-17 スタンレー電気株式会社 垂直共振器型発光素子
CN106848838B (zh) 2017-04-06 2019-11-29 中国科学院半导体研究所 基于多孔DBR的GaN基VCSEL芯片及制备方法
US10681474B2 (en) * 2017-09-19 2020-06-09 Vocalzoom Systems Ltd. Laser-based devices utilizing improved self-mix sensing
JP7039905B2 (ja) * 2017-09-21 2022-03-23 富士フイルムビジネスイノベーション株式会社 発光部品の製造方法
EP3496216A1 (en) 2017-12-08 2019-06-12 Koninklijke Philips N.V. Segmented vertical cavity surface emitting laser
US10892601B2 (en) 2018-05-24 2021-01-12 Stanley Electric Co., Ltd. Vertical cavity light-emitting element
JP7212882B2 (ja) 2018-05-24 2023-01-26 スタンレー電気株式会社 垂直共振器型発光素子
JP7166871B2 (ja) 2018-10-18 2022-11-08 スタンレー電気株式会社 垂直共振器型発光素子
JP7190865B2 (ja) 2018-10-18 2022-12-16 スタンレー電気株式会社 垂直共振器型発光素子
JP7291497B2 (ja) 2019-02-21 2023-06-15 スタンレー電気株式会社 垂直共振器型発光素子
JP7258591B2 (ja) 2019-02-21 2023-04-17 スタンレー電気株式会社 垂直共振器型発光素子
JP7288360B2 (ja) 2019-07-01 2023-06-07 スタンレー電気株式会社 垂直共振器型発光素子
JPWO2022185766A1 (enExample) 2021-03-03 2022-09-09

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000196189A (ja) 1998-12-24 2000-07-14 Toshiba Corp 面発光型半導体レーザ
US6751245B1 (en) 1999-06-02 2004-06-15 Optical Communication Products, Inc. Single mode vertical cavity surface emitting laser
JP2003163373A (ja) 2001-11-26 2003-06-06 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体発光素子
JP2005197426A (ja) 2004-01-07 2005-07-21 Yokogawa Electric Corp 面発光レーザ
JP2012517705A (ja) 2009-02-11 2012-08-02 ダンマークス テクニスク ユニバーシテット ハイブリッド垂直キャビティレーザー
JP2011205006A (ja) 2010-03-26 2011-10-13 Furukawa Electric Co Ltd:The 半導体レーザ素子およびその製造方法
WO2017018017A1 (ja) 2015-07-28 2017-02-02 ソニー株式会社 発光素子
WO2018083877A1 (ja) 2016-11-02 2018-05-11 ソニー株式会社 発光素子及びその製造方法
WO2018180450A1 (ja) 2017-03-27 2018-10-04 学校法人 名城大学 半導体多層膜反射鏡及び垂直共振器型発光素子
JP6369613B1 (ja) 2017-09-21 2018-08-08 富士ゼロックス株式会社 発光部品、プリントヘッド及び画像形成装置

Also Published As

Publication number Publication date
CN112913093A (zh) 2021-06-04
EP3869642B1 (en) 2024-03-06
US20210384706A1 (en) 2021-12-09
CN112913093B (zh) 2024-09-13
US12218486B2 (en) 2025-02-04
WO2020080161A1 (ja) 2020-04-23
EP3869642A1 (en) 2021-08-25
EP3869642A4 (en) 2022-07-20
JP2020064994A (ja) 2020-04-23
US20250158360A1 (en) 2025-05-15

Similar Documents

Publication Publication Date Title
JP7166871B2 (ja) 垂直共振器型発光素子
JP7586446B2 (ja) 垂直共振器型発光素子
JP7212882B2 (ja) 垂直共振器型発光素子
JP7291497B2 (ja) 垂直共振器型発光素子
JP7190865B2 (ja) 垂直共振器型発光素子
US12272927B2 (en) Vertical cavity surface emitting device
US12266906B2 (en) Vertical cavity surface emitting device
JP2025004105A (ja) 垂直共振器型発光素子
JP7406365B2 (ja) 垂直共振器型発光素子
JP2024121885A (ja) 垂直共振器型発光素子及び垂直共振器型発光素子の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210913

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210913

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20221004

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20221026

R150 Certificate of patent or registration of utility model

Ref document number: 7166871

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250