JP6585724B2 - 炭素ドープケイ素含有膜のための組成物及びそれを使用する方法 - Google Patents

炭素ドープケイ素含有膜のための組成物及びそれを使用する方法 Download PDF

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JP6585724B2
JP6585724B2 JP2017541257A JP2017541257A JP6585724B2 JP 6585724 B2 JP6585724 B2 JP 6585724B2 JP 2017541257 A JP2017541257 A JP 2017541257A JP 2017541257 A JP2017541257 A JP 2017541257A JP 6585724 B2 JP6585724 B2 JP 6585724B2
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disilacyclobutane
film
carbon
plasma
bis
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JP2018506185A5 (https=
JP2018506185A (ja
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チャンドラ ハリピン
チャンドラ ハリピン
スコット カットヒル カーク
スコット カットヒル カーク
マリカジュナン アヌパマ
マリカジュナン アヌパマ
レイ シンジエン
レイ シンジエン
アール．マクドナルド マシュー
アール．マクドナルド マシュー
シヤオ マンチャオ
シヤオ マンチャオ
バスカーラ ラオ マドゥカー
バスカーラ ラオ マドゥカー
ジエンホゥオン リー
ジエンホゥオン リー
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バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
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Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11549181B2 (en) * 2013-11-22 2023-01-10 Applied Materials, Inc. Methods for atomic layer deposition of SiCO(N) using halogenated silylamides
KR102058595B1 (ko) * 2015-02-06 2019-12-23 버슘머트리얼즈 유에스, 엘엘씨 탄소 도핑된 규소 함유 필름을 위한 조성물 및 이의 사용 방법
TWI716333B (zh) * 2015-03-30 2021-01-11 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 碳矽烷與氨、胺類及脒類之觸媒去氫耦合
US20180033614A1 (en) * 2016-07-27 2018-02-01 Versum Materials Us, Llc Compositions and Methods Using Same for Carbon Doped Silicon Containing Films
US10224224B2 (en) 2017-03-10 2019-03-05 Micromaterials, LLC High pressure wafer processing systems and related methods
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
US10847360B2 (en) 2017-05-25 2020-11-24 Applied Materials, Inc. High pressure treatment of silicon nitride film
JP6947914B2 (ja) 2017-08-18 2021-10-13 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 高圧高温下のアニールチャンバ
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
SG11202001450UA (en) 2017-09-12 2020-03-30 Applied Materials Inc Apparatus and methods for manufacturing semiconductor structures using protective barrier layer
WO2019058477A1 (ja) * 2017-09-21 2019-03-28 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置およびプログラム
US10483372B2 (en) 2017-09-29 2019-11-19 Taiwan Semiconductor Manufacturing Co., Ltd. Spacer structure with high plasma resistance for semiconductor devices
EP4321649B1 (en) 2017-11-11 2025-08-20 Micromaterials LLC Gas delivery system for high pressure processing chamber
JP7330181B2 (ja) 2017-11-16 2023-08-21 アプライド マテリアルズ インコーポレイテッド 高圧蒸気アニール処理装置
JP2021503714A (ja) 2017-11-17 2021-02-12 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 高圧処理システムのためのコンデンサシステム
US10510852B2 (en) * 2017-11-28 2019-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Low-k feature formation processes and structures formed thereby
JP6806719B2 (ja) * 2018-01-17 2021-01-06 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置およびプログラム
KR102649241B1 (ko) 2018-01-24 2024-03-18 어플라이드 머티어리얼스, 인코포레이티드 고압 어닐링을 사용한 심 힐링
SG11202008256WA (en) 2018-03-09 2020-09-29 Applied Materials Inc High pressure annealing process for metal containing materials
US10714331B2 (en) * 2018-04-04 2020-07-14 Applied Materials, Inc. Method to fabricate thermally stable low K-FinFET spacer
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10704141B2 (en) 2018-06-01 2020-07-07 Applied Materials, Inc. In-situ CVD and ALD coating of chamber to control metal contamination
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
US20200071819A1 (en) * 2018-08-29 2020-03-05 Versum Materials Us, Llc Methods For Making Silicon Containing Films That Have High Carbon Content
US10985010B2 (en) * 2018-08-29 2021-04-20 Versum Materials Us, Llc Methods for making silicon and nitrogen containing films
JP6980624B2 (ja) * 2018-09-13 2021-12-15 株式会社Kokusai Electric 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム
CN112753090A (zh) * 2018-09-21 2021-05-04 朗姆研究公司 低介电常数原子层沉积间隙填充方法和材料
TWI728478B (zh) * 2018-09-24 2021-05-21 美商慧盛材料美國責任有限公司 含矽及氮膜的製造方法
EP3844318B1 (en) * 2018-10-03 2025-12-10 Versum Materials US, LLC Methods for making silicon and nitrogen containing films
JP7256263B2 (ja) * 2018-10-05 2023-04-11 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー ケイ素含有膜の高温原子層堆積
KR102528076B1 (ko) 2018-10-30 2023-05-03 어플라이드 머티어리얼스, 인코포레이티드 반도체 응용들을 위한 구조를 식각하기 위한 방법들
WO2020101935A1 (en) 2018-11-16 2020-05-22 Applied Materials, Inc. Film deposition using enhanced diffusion process
CN113166937A (zh) * 2018-11-27 2021-07-23 弗萨姆材料美国有限责任公司 1-甲基-1-异丙氧基-硅杂环烷烃和由其制备的致密有机硅膜
JP6957442B2 (ja) 2018-11-30 2021-11-02 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理方法、基板処理装置、およびプログラム
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
TWI764068B (zh) 2019-01-11 2022-05-11 日商國際電氣股份有限公司 半導體裝置之製造方法、基板處理方法、基板處理裝置及程式
US11756786B2 (en) 2019-01-18 2023-09-12 International Business Machines Corporation Forming high carbon content flowable dielectric film with low processing damage
EP3902939A4 (en) * 2019-02-05 2022-09-28 Versum Materials US, LLC CARBON DOPED SILICON OXIDE DEPOSIT
TWI910974B (zh) 2019-06-26 2026-01-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
US12264258B2 (en) 2019-07-25 2025-04-01 Versum Materials Us, Llc Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing film
US11186909B2 (en) * 2019-08-26 2021-11-30 Applied Materials, Inc. Methods of depositing low-K films
KR102844501B1 (ko) * 2020-01-31 2025-08-11 주식회사 유피케미칼 실리콘 전구체 화합물, 이를 포함하는 실리콘-함유 막 형성용 조성물 및 실리콘-함유 막 형성 방법
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film
CN111681943B (zh) * 2020-04-27 2025-10-31 全球能源互联网研究院有限公司 一种碳化硅表面的处理方法
CN115867689A (zh) * 2020-06-23 2023-03-28 恩特格里斯公司 硅前体化合物及形成含硅膜的方法
CN115803474A (zh) 2020-07-23 2023-03-14 朗姆研究公司 具有受控膜性质和高沉积速率的保形热cvd
WO2022103764A1 (en) 2020-11-13 2022-05-19 Lam Research Corporation Process tool for dry removal of photoresist
JP2023550351A (ja) * 2020-11-16 2023-12-01 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー ケイ素及び酸素を含有する誘電体膜の誘電体への選択的堆積
US12577466B2 (en) 2020-12-08 2026-03-17 Lam Research Corporation Photoresist development with organic vapor
US20220342302A1 (en) * 2021-03-24 2022-10-27 Applied Materials, Inc. Dual tone photoresists
US20220308453A1 (en) * 2021-03-24 2022-09-29 Applied Materials, Inc. Oxidation treatment for positive tone photoresist films
US12550643B2 (en) * 2021-06-22 2026-02-10 Applied Materials, Inc. Oxidants and strained-ring precursors
TW202400826A (zh) * 2021-12-20 2024-01-01 美商蘭姆研究公司 使用胺基矽烷及氯矽烷前驅物的保形矽氧化物沉積
KR102725782B1 (ko) 2022-07-01 2024-11-05 램 리써치 코포레이션 에칭 정지 억제 (etch stop deterrence) 를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상
KR20250034989A (ko) * 2022-07-11 2025-03-11 어플라이드 머티어리얼스, 인코포레이티드 이중 톤 포토레지스트들
JP2024077324A (ja) * 2022-11-28 2024-06-07 東京エレクトロン株式会社 成膜方法及び成膜装置
WO2024196643A1 (en) 2023-03-17 2024-09-26 Lam Research Corporation Integration of dry development and etch processes for euv patterning in a single process chamber
CN121311621A (zh) * 2023-06-13 2026-01-09 朗姆研究公司 用于低介电膜沉积的前体
KR20250034920A (ko) 2023-07-27 2025-03-11 램 리써치 코포레이션 금속-함유 포토레지스트에 대한 올-인-원 건식 현상
JP2025167351A (ja) * 2024-04-25 2025-11-07 東京エレクトロン株式会社 成膜方法及び成膜装置

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW302063U (en) * 1992-09-24 1997-04-01 Honda Motor Co Ltd Pipe joint
US5415126A (en) * 1993-08-16 1995-05-16 Dow Corning Corporation Method of forming crystalline silicon carbide coatings at low temperatures
US20080268177A1 (en) * 2002-05-17 2008-10-30 Air Products And Chemicals, Inc. Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
JP5218765B2 (ja) * 2006-03-29 2013-06-26 Ｊｓｒ株式会社 ポリマーの製造方法、ポリマー、ポリマー膜形成用組成物、ポリマー膜の形成方法およびポリマー膜
US7998536B2 (en) * 2007-07-12 2011-08-16 Applied Materials, Inc. Silicon precursors to make ultra low-K films of K<2.2 with high mechanical properties by plasma enhanced chemical vapor deposition
KR100923775B1 (ko) * 2007-11-30 2009-10-27 한국과학기술연구원 폴리염화카보실란의 제조방법
CN101978008A (zh) * 2008-04-02 2011-02-16 Jsr株式会社 含有含硅聚合物的组合物及其固化物
US8241624B2 (en) 2008-04-18 2012-08-14 Ecolab Usa Inc. Method of disinfecting packages with composition containing peracid and catalase
US8298628B2 (en) * 2008-06-02 2012-10-30 Air Products And Chemicals, Inc. Low temperature deposition of silicon-containing films
WO2010047869A1 (en) * 2008-10-20 2010-04-29 Dow Corning Corporation Cvd precursors
US8703624B2 (en) * 2009-03-13 2014-04-22 Air Products And Chemicals, Inc. Dielectric films comprising silicon and methods for making same
US8703625B2 (en) 2010-02-04 2014-04-22 Air Products And Chemicals, Inc. Methods to prepare silicon-containing films
KR101366002B1 (ko) * 2010-04-09 2014-02-21 가부시키가이샤 히다치 고쿠사이 덴키 반도체 장치의 제조 방법, 기판 처리 방법 및 기판 처리 장치
KR20130135261A (ko) * 2010-11-03 2013-12-10 어플라이드 머티어리얼스, 인코포레이티드 실리콘 카바이드 및 실리콘 카보나이트라이드 막들을 증착하기 위한 장치 및 방법들
WO2013039881A2 (en) 2011-09-13 2013-03-21 Applied Materials, Inc. Carbosilane precursors for low temperature film deposition
US8993072B2 (en) * 2011-09-27 2015-03-31 Air Products And Chemicals, Inc. Halogenated organoaminosilane precursors and methods for depositing films comprising same
JP6043546B2 (ja) * 2011-10-21 2016-12-14 株式会社日立国際電気 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム
US20130224964A1 (en) 2012-02-28 2013-08-29 Asm Ip Holding B.V. Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bond
US8871656B2 (en) 2012-03-05 2014-10-28 Applied Materials, Inc. Flowable films using alternative silicon precursors
US20130288485A1 (en) * 2012-04-30 2013-10-31 Applied Materials, Inc. Densification for flowable films
US9337018B2 (en) * 2012-06-01 2016-05-10 Air Products And Chemicals, Inc. Methods for depositing films with organoaminodisilane precursors
US9243324B2 (en) 2012-07-30 2016-01-26 Air Products And Chemicals, Inc. Methods of forming non-oxygen containing silicon-based films
KR20150121217A (ko) 2013-03-01 2015-10-28 어플라이드 머티어리얼스, 인코포레이티드 ＳｉＣＮ 또는 ＳｉＣＯＮ을 포함하는 필름의 저온 원자층 증착
US20140302690A1 (en) 2013-04-04 2014-10-09 Applied Materials, Inc. Chemical linkers to impart improved mechanical strength to flowable films
US9343293B2 (en) 2013-04-04 2016-05-17 Applied Materials, Inc. Flowable silicon—carbon—oxygen layers for semiconductor processing
KR102058595B1 (ko) * 2015-02-06 2019-12-23 버슘머트리얼즈 유에스, 엘엘씨 탄소 도핑된 규소 함유 필름을 위한 조성물 및 이의 사용 방법

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EP3254303A2 (en) 2017-12-13
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US20180023192A1 (en) 2018-01-25
CN107406978B (zh) 2019-12-03
EP3254303B1 (en) 2018-12-05
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JP7048548B2 (ja) 2022-04-05
CN107406978A (zh) 2017-11-28
SG11201706257YA (en) 2017-08-30
KR20240042186A (ko) 2024-04-01
IL253746B (en) 2021-10-31
TWI585230B (zh) 2017-06-01
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