JP6585724B2 - 炭素ドープケイ素含有膜のための組成物及びそれを使用する方法 - Google Patents

炭素ドープケイ素含有膜のための組成物及びそれを使用する方法 Download PDF

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JP6585724B2
JP6585724B2 JP2017541257A JP2017541257A JP6585724B2 JP 6585724 B2 JP6585724 B2 JP 6585724B2 JP 2017541257 A JP2017541257 A JP 2017541257A JP 2017541257 A JP2017541257 A JP 2017541257A JP 6585724 B2 JP6585724 B2 JP 6585724B2
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disilacyclobutane
film
carbon
plasma
bis
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JP2018506185A (ja
JP2018506185A5 (https=
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チャンドラ ハリピン
チャンドラ ハリピン
スコット カットヒル カーク
スコット カットヒル カーク
マリカジュナン アヌパマ
マリカジュナン アヌパマ
レイ シンジエン
レイ シンジエン
アール．マクドナルド マシュー
アール．マクドナルド マシュー
シヤオ マンチャオ
シヤオ マンチャオ
バスカーラ ラオ マドゥカー
バスカーラ ラオ マドゥカー
ジエンホゥオン リー
ジエンホゥオン リー
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バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
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EP3460827B1 (en) 2022-05-25
KR102058595B1 (ko) 2019-12-23
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WO2016126911A3 (en) 2016-11-24
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IL253746A0 (en) 2017-09-28
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JP2018506185A (ja) 2018-03-01
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US20180023192A1 (en) 2018-01-25
IL253746B (en) 2021-10-31
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