JP6556735B2 - 反応性ポリエステル化合物、それを用いた活性エネルギー線硬化型樹脂組成物 - Google Patents
反応性ポリエステル化合物、それを用いた活性エネルギー線硬化型樹脂組成物 Download PDFInfo
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- JP6556735B2 JP6556735B2 JP2016545456A JP2016545456A JP6556735B2 JP 6556735 B2 JP6556735 B2 JP 6556735B2 JP 2016545456 A JP2016545456 A JP 2016545456A JP 2016545456 A JP2016545456 A JP 2016545456A JP 6556735 B2 JP6556735 B2 JP 6556735B2
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- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
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- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
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- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
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- FVXBCDWMKCEPCL-UHFFFAOYSA-N nonane-1,1-diol Chemical compound CCCCCCCCC(O)O FVXBCDWMKCEPCL-UHFFFAOYSA-N 0.000 description 1
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- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
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- 230000008569 process Effects 0.000 description 1
- VPMTUQQBSUTFJT-UHFFFAOYSA-N propan-2-amine;dihydrochloride Chemical compound Cl.Cl.CC(C)N VPMTUQQBSUTFJT-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
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- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
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- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
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- 239000000454 talc Substances 0.000 description 1
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- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
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| JP2014171375 | 2014-08-26 | ||
| JP2014171375 | 2014-08-26 | ||
| PCT/JP2015/073218 WO2016031643A1 (ja) | 2014-08-26 | 2015-08-19 | 反応性ポリエステル化合物、それを用いた活性エネルギー線硬化型樹脂組成物 |
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| JPWO2016031643A1 JPWO2016031643A1 (ja) | 2017-06-08 |
| JP6556735B2 true JP6556735B2 (ja) | 2019-08-07 |
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| JP2016545456A Active JP6556735B2 (ja) | 2014-08-26 | 2015-08-19 | 反応性ポリエステル化合物、それを用いた活性エネルギー線硬化型樹脂組成物 |
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| JP (1) | JP6556735B2 (ko) |
| KR (1) | KR102228850B1 (ko) |
| CN (1) | CN106604947B (ko) |
| TW (1) | TWI662054B (ko) |
| WO (1) | WO2016031643A1 (ko) |
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| WO2022009948A1 (ja) * | 2020-07-08 | 2022-01-13 | 三菱瓦斯化学株式会社 | リソグラフィー膜形成用組成物、レジストパターン形成方法、及び回路パターン形成方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020026439A (ja) * | 2016-12-22 | 2020-02-20 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物および硬化物 |
| US10487077B1 (en) | 2018-06-14 | 2019-11-26 | Sabic Global Technologies B.V. | Bis(benzoxazinyl)phthalimidine and associated curable composition and composite |
| CN110951047B (zh) * | 2019-11-22 | 2022-06-10 | 张家港康得新光电材料有限公司 | 改性环氧丙烯酸酯树脂及其制备方法 |
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| CH496021A (de) * | 1966-03-10 | 1970-09-15 | Ciba Geigy | Verfahren zur Herstellung von neuen Polyglycidyläthern |
| JPS4512131B1 (ko) * | 1967-03-10 | 1970-05-02 | ||
| JPS5640329A (en) | 1979-09-12 | 1981-04-16 | Sharp Corp | Control unit |
| JPS5745795A (en) | 1980-09-01 | 1982-03-15 | Fujitsu Ltd | Scanning device |
| JP2575572Y2 (ja) | 1992-08-27 | 1998-07-02 | 株式会社ミツバ | ワイパ装置 |
| JPH11140144A (ja) | 1997-11-04 | 1999-05-25 | Nippon Kayaku Co Ltd | 樹脂組成物及びその硬化物 |
| JP5273762B2 (ja) * | 2007-01-26 | 2013-08-28 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物およびその硬化物 |
| KR101482028B1 (ko) * | 2007-08-21 | 2015-01-13 | 니폰 가야꾸 가부시끼가이샤 | 반응성 카르복실레이트 화합물, 이를 이용한 활성 에너지선 경화형 수지 조성물 및 그 용도 |
| JPWO2011114687A1 (ja) * | 2010-03-15 | 2013-06-27 | 住友ベークライト株式会社 | 半導体封止用樹脂組成物およびこれを用いた半導体装置 |
| JPWO2011142466A1 (ja) * | 2010-05-14 | 2013-08-29 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物およびその硬化物 |
| KR101323562B1 (ko) * | 2011-03-10 | 2013-10-29 | 롬엔드하스전자재료코리아유한회사 | 감광성 수지 조성물, 이를 이용한 저유전율 차광층 및 액정 디스플레이 장치 |
| KR101349622B1 (ko) * | 2011-08-26 | 2014-01-10 | 롬엔드하스전자재료코리아유한회사 | 광중합성 불포화 수지, 이를 포함하는 감광성 수지 조성물 및 이로부터 형성되는 차광성 스페이서와 액정 디스플레이 장치 |
| WO2013183736A1 (ja) * | 2012-06-07 | 2013-12-12 | 日本化薬株式会社 | エポキシ樹脂組成物、およびその硬化物、並びに、硬化性樹脂組成物 |
| CN104470965B9 (zh) | 2012-06-07 | 2019-01-01 | 日本化药株式会社 | 环氧树脂、环氧树脂组合物及固化物 |
| CN103497287A (zh) * | 2013-09-09 | 2014-01-08 | 华东理工大学华昌聚合物有限公司 | 一种smc/bmc用环氧乙烯基酯树脂的合成工艺 |
| KR20160053907A (ko) * | 2013-09-10 | 2016-05-13 | 닛뽄 가야쿠 가부시키가이샤 | 에폭시 수지 혼합물, 에폭시 수지 조성물, 경화물 및 반도체 장치 |
| CN103616798B (zh) * | 2013-11-20 | 2016-03-30 | 盐城艾肯科技有限公司 | 一种具有阻燃性能的感光树脂及其在生产感光油墨的应用 |
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| WO2022009948A1 (ja) * | 2020-07-08 | 2022-01-13 | 三菱瓦斯化学株式会社 | リソグラフィー膜形成用組成物、レジストパターン形成方法、及び回路パターン形成方法 |
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| CN106604947A (zh) | 2017-04-26 |
| TW201609850A (zh) | 2016-03-16 |
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