JP6239156B2 - 太陽電池の製造方法 - Google Patents
太陽電池の製造方法 Download PDFInfo
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- JP6239156B2 JP6239156B2 JP2016570415A JP2016570415A JP6239156B2 JP 6239156 B2 JP6239156 B2 JP 6239156B2 JP 2016570415 A JP2016570415 A JP 2016570415A JP 2016570415 A JP2016570415 A JP 2016570415A JP 6239156 B2 JP6239156 B2 JP 6239156B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims description 92
- 238000009792 diffusion process Methods 0.000 claims description 69
- 235000012431 wafers Nutrition 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 239000010703 silicon Substances 0.000 claims description 18
- 230000003647 oxidation Effects 0.000 claims description 17
- 238000007254 oxidation reaction Methods 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000012535 impurity Substances 0.000 claims description 13
- 239000010453 quartz Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 48
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/074—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a heterojunction with an element of Group IV of the Periodic System, e.g. ITO/Si, GaAs/Si or CdTe/Si solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Description
図1は、本発明にかかる太陽電池の製造方法の実施の形態1を示す太陽電池の製造工程で形成された太陽電池を示す図、図2は、その表面の一部拡大断面図、図3および図4(a)から(f)は、実施の形態1の太陽電池の製造工程を示す図、図5は実施の形態1の太陽電池の製造工程を示すフローチャートである。
前記実施の形態1では、p型単結晶シリコン基板1の両面にダミーウエハDを2枚張り合わせて熱酸化させることで、p型単結晶シリコン基板1端部1Cに酸化膜10を形成させる製造方法を示したが、ダミーウエハDである必要はなく、石英基板20を用いてもよい。図7(a)から(c)は、石英基板20を用いた太陽電池の製造方法の要部を示す製造工程図である。
前記実施の形態1では、p型単結晶シリコン基板1の両面にダミーウエハDを2枚張り合わせて熱酸化させることで、p型単結晶シリコン基板1端部1Cに酸化膜10を形成させる製造方法を示したが、また、シリコンウエハを複数枚張り合わせることで、生産性が改善される。例えば5枚のシリコンウエハを張り合わせて熱酸化させることにより、熱酸化工程の生産性を5倍に改善することができる。図8(a)から(c)は、5枚のp型単結晶シリコン基板1を重ね合わせて熱処理をする場合の太陽電池の製造方法の要部を示す製造工程図である。
Claims (7)
- 第1および第2主面を有する第1導電型の半導体基板の側面に選択的に酸化膜を形成する工程と、
前記酸化膜の形成された前記半導体基板の前記第1および第2主面に第2導電型の不純物拡散層を形成する工程と、
前記第2導電型の不純物拡散層の形成された前記半導体基板の前記第1または第2主面に前記第2導電型の不純物拡散層よりも高濃度の第1導電型の拡散層を形成する工程とを含み、
前記酸化膜を形成する工程は、
前記半導体基板の両面を別部材で覆った状態で、熱酸化を行う工程であることを特徴とする太陽電池の製造方法。 - 前記酸化膜を形成する工程は、
前記半導体基板の両面をダミーウエハで挟持した状態で、熱酸化を行う工程であることを特徴とする請求項1に記載の太陽電池の製造方法。 - 前記ダミーウエハは、前記半導体基板と同一材料で形成された半導体基板であることを特徴とする請求項2に記載の太陽電池の製造方法。
- 前記酸化膜を形成する工程は、
前記半導体基板の両面を石英板で挟持した状態で、熱酸化を行う工程であることを特徴とする請求項1に記載の太陽電池の製造方法。 - 前記酸化膜を形成する工程は、
前記半導体基板を複数枚重ねた状態で、熱酸化を行う工程であることを特徴とする請求項1に記載の太陽電池の製造方法。 - 前記酸化膜を形成する工程は、
第1導電型のシリコン基板を複数枚張り合わせた状態で、熱酸化を行う工程を含むことを特徴とする請求項1に記載の太陽電池の製造方法。 - 前記酸化膜を形成する工程で、張り合わせた前記複数枚のシリコン基板のうち、両端に配され、第2主面に酸化膜が形成された第1導電型のシリコンウエハの第1主面に第2導電型の拡散層を形成する工程と、
前記第2主面の酸化膜を除去し、第2主面に第1導電型の拡散層を形成して太陽電池を形成する工程を含むことを特徴とする請求項6に記載の太陽電池の製造方法。
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PCT/JP2015/051649 WO2016117073A1 (ja) | 2015-01-22 | 2015-01-22 | 太陽電池の製造方法および太陽電池 |
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CN111710748B (zh) * | 2020-05-11 | 2022-09-20 | 中威新能源(成都)有限公司 | 一种用热处理的n型单晶硅片制作shj太阳电池的方法 |
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JP2989373B2 (ja) * | 1992-05-08 | 1999-12-13 | シャープ株式会社 | 光電変換装置の製造方法 |
JP2958203B2 (ja) * | 1992-12-15 | 1999-10-06 | 京セラ株式会社 | 太陽電池素子の製造方法 |
US5972784A (en) * | 1997-04-24 | 1999-10-26 | Georgia Tech Research Corporation | Arrangement, dopant source, and method for making solar cells |
JP4812147B2 (ja) * | 1999-09-07 | 2011-11-09 | 株式会社日立製作所 | 太陽電池の製造方法 |
JP2005056875A (ja) * | 2003-08-01 | 2005-03-03 | Sharp Corp | 太陽電池およびその製造方法 |
JP2005150231A (ja) * | 2003-11-12 | 2005-06-09 | Sharp Corp | 太陽電池の製造方法 |
JP2006210385A (ja) * | 2005-01-25 | 2006-08-10 | Sharp Corp | 太陽電池の製造方法 |
JP2010092961A (ja) * | 2008-10-06 | 2010-04-22 | Sharp Corp | 太陽電池の製造方法 |
JP2010123859A (ja) * | 2008-11-21 | 2010-06-03 | Kyocera Corp | 太陽電池素子および太陽電池素子の製造方法 |
US20100230771A1 (en) * | 2009-03-13 | 2010-09-16 | Palo Alto Research Center Incorporated | Methods and arrangement for diffusing dopants into silicon |
JP5408009B2 (ja) * | 2010-04-08 | 2014-02-05 | 信越化学工業株式会社 | 太陽電池の製造方法 |
JP5861604B2 (ja) * | 2012-09-21 | 2016-02-16 | 信越化学工業株式会社 | 太陽電池の製造方法 |
JP2014072292A (ja) * | 2012-09-28 | 2014-04-21 | Sharp Corp | 太陽電池の製造方法及び太陽電池 |
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