JP5958092B2 - 成膜装置及び成膜方法 - Google Patents

成膜装置及び成膜方法 Download PDF

Info

Publication number
JP5958092B2
JP5958092B2 JP2012124321A JP2012124321A JP5958092B2 JP 5958092 B2 JP5958092 B2 JP 5958092B2 JP 2012124321 A JP2012124321 A JP 2012124321A JP 2012124321 A JP2012124321 A JP 2012124321A JP 5958092 B2 JP5958092 B2 JP 5958092B2
Authority
JP
Japan
Prior art keywords
roll
film
film formation
film forming
tension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012124321A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013249505A5 (enExample
JP2013249505A (ja
Inventor
小林　俊之
俊之 小林
圭輔 清水
圭輔 清水
角野　宏治
宏治 角野
由紀子 水口
由紀子 水口
村上　洋介
洋介 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2012124321A priority Critical patent/JP5958092B2/ja
Application filed by Sony Corp filed Critical Sony Corp
Priority to PCT/JP2013/002772 priority patent/WO2013179561A1/en
Priority to CN201380026913.4A priority patent/CN104603326B/zh
Priority to US14/402,244 priority patent/US9738969B2/en
Priority to KR1020147032168A priority patent/KR102204795B1/ko
Publication of JP2013249505A publication Critical patent/JP2013249505A/ja
Publication of JP2013249505A5 publication Critical patent/JP2013249505A5/ja
Application granted granted Critical
Publication of JP5958092B2 publication Critical patent/JP5958092B2/ja
Priority to US15/342,338 priority patent/US20170058398A1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H20/00—Advancing webs
    • B65H20/02—Advancing webs by friction roller
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
    • B65H2301/51145—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating by vapour deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/514—Modifying physical properties
    • B65H2301/5143—Warming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2404/00—Parts for transporting or guiding the handled material
    • B65H2404/10—Rollers
    • B65H2404/14—Roller pairs
    • B65H2404/143—Roller pairs driving roller and idler roller arrangement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2511/00—Dimensions; Position; Numbers; Identification; Occurrences
    • B65H2511/10—Size; Dimensions
    • B65H2511/11—Length
    • B65H2511/112—Length of a loop, e.g. a free loop or a loop of dancer rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2513/00—Dynamic entities; Timing aspects
    • B65H2513/10—Speed
    • B65H2513/11—Speed angular
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2515/00—Physical entities not provided for in groups B65H2511/00 or B65H2513/00
    • B65H2515/30—Forces; Stresses
    • B65H2515/31—Tensile forces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2553/00—Sensing or detecting means
    • B65H2553/40—Sensing or detecting means using optical, e.g. photographic, elements
    • B65H2553/41—Photoelectric detectors
    • B65H2553/412—Photoelectric detectors in barrier arrangements, i.e. emitter facing a receptor element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2701/00—Handled material; Storage means
    • B65H2701/10—Handled articles or webs
    • B65H2701/17—Nature of material
    • B65H2701/173—Metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2012124321A 2012-05-31 2012-05-31 成膜装置及び成膜方法 Expired - Fee Related JP5958092B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012124321A JP5958092B2 (ja) 2012-05-31 2012-05-31 成膜装置及び成膜方法
CN201380026913.4A CN104603326B (zh) 2012-05-31 2013-04-24 成膜装置和成膜方法
US14/402,244 US9738969B2 (en) 2012-05-31 2013-04-24 Film-forming apparatus and film-forming method
KR1020147032168A KR102204795B1 (ko) 2012-05-31 2013-04-24 성막 장치와 성막 방법
PCT/JP2013/002772 WO2013179561A1 (en) 2012-05-31 2013-04-24 Film-forming apparatus and film-forming method
US15/342,338 US20170058398A1 (en) 2012-05-31 2016-11-03 Film-forming apparatus and film-forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012124321A JP5958092B2 (ja) 2012-05-31 2012-05-31 成膜装置及び成膜方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016120840A Division JP6132055B2 (ja) 2016-06-17 2016-06-17 グラフェン膜の製造方法

Publications (3)

Publication Number Publication Date
JP2013249505A JP2013249505A (ja) 2013-12-12
JP2013249505A5 JP2013249505A5 (enExample) 2015-04-09
JP5958092B2 true JP5958092B2 (ja) 2016-07-27

Family

ID=48446570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012124321A Expired - Fee Related JP5958092B2 (ja) 2012-05-31 2012-05-31 成膜装置及び成膜方法

Country Status (5)

Country Link
US (2) US9738969B2 (enExample)
JP (1) JP5958092B2 (enExample)
KR (1) KR102204795B1 (enExample)
CN (1) CN104603326B (enExample)
WO (1) WO2013179561A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101760653B1 (ko) 2015-05-28 2017-07-25 세종대학교산학협력단 그래핀 제조장치 및 그래핀 제조방법
JP6957022B2 (ja) * 2016-02-01 2021-11-02 国立大学法人北海道大学 支持体上に単原子が分散した構造体、支持体上に単原子が分散した構造体を製造する方法およびスパッタ装置
US11396696B2 (en) 2016-03-18 2022-07-26 Honda Motor Co., Ltd. Method for continuous coating of metal foils and wires by high-quality graphene
US10273574B2 (en) 2016-03-18 2019-04-30 Honda Motor Co., Ltd. Method for continuous production of high quality graphene
TWI720181B (zh) * 2016-05-30 2021-03-01 日商新力股份有限公司 薄膜製造方法、薄膜製造裝置、光電轉換元件之製造方法、邏輯電路之製造方法、發光元件之製造方法及調光元件之製造方法
CN107902486A (zh) * 2017-11-14 2018-04-13 东莞市联洲知识产权运营管理有限公司 一种彩钢板印刷生产线上的检测装置
JP2019112656A (ja) * 2017-12-21 2019-07-11 株式会社アルバック 炭素ナノ構造体成長用ｃｖｄ装置及び炭素ナノ構造体の製造方法
CN114347427A (zh) * 2021-12-09 2022-04-15 惠州市广麟材耀科技有限公司 一种铝塑膜生产工艺
CN117403202A (zh) * 2023-10-25 2024-01-16 甚磁科技(上海)有限公司 一种真空镀膜系统的卷对卷式传动加热结构

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2691007B2 (ja) * 1989-03-20 1997-12-17 株式会社日立製作所 真空連続処理装置
US5130170A (en) * 1989-06-28 1992-07-14 Canon Kabushiki Kaisha Microwave pcvd method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation
US5273911A (en) * 1991-03-07 1993-12-28 Mitsubishi Denki Kabushiki Kaisha Method of producing a thin-film solar cell
JP3787410B2 (ja) * 1997-05-13 2006-06-21 キヤノン株式会社 堆積膜製造方法及び光起電力素子の製造方法
JPH11292264A (ja) * 1998-04-03 1999-10-26 Nec Corp 表面処理装置
US6054018A (en) * 1998-08-28 2000-04-25 Wisconsin Alumni Research Foundation Outside chamber sealing roller system for surface treatment gas reactors
JP2000204478A (ja) * 1998-11-11 2000-07-25 Canon Inc 基板処理装置及び基板処理方法
US6206973B1 (en) * 1999-04-23 2001-03-27 Silicon Valley Group Thermal System Llc Chemical vapor deposition system and method
EP1149932A3 (en) * 2000-01-26 2003-09-10 Iljin Nanotech Co., Ltd. Thermal chemical vapor deposition apparatus and method of synthesizing carbon nanotubes using the same
JP2003133230A (ja) * 2001-10-29 2003-05-09 Mitsubishi Heavy Ind Ltd フレキシブル基板の半導体処理装置
CH696013A5 (de) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess.
JP2005000958A (ja) * 2003-06-12 2005-01-06 Kobe Steel Ltd 金属板の製造方法とそれに用いる矯正装置
CN1276123C (zh) * 2004-04-14 2006-09-20 李毅 二氧化锡透明导电膜的制造设备
TWI328050B (en) 2005-05-10 2010-08-01 Ulvac Inc Reeling type plasma cvd device
JP4811108B2 (ja) * 2006-05-10 2011-11-09 住友電気工業株式会社 被覆層の厚み計量機構およびそれを用いた被覆層形成装置
JP4954014B2 (ja) * 2006-10-23 2012-06-13 キヤノン株式会社 堆積膜形成方法及び光起電力素子の形成方法
DE602007005973D1 (de) * 2007-02-28 2010-06-02 Applied Materials Inc Netzführungssteuerung, Netzverarbeitungsvorrichtung und Betriebsverfahren dafür
JP2010077508A (ja) * 2008-09-26 2010-04-08 Tokyo Electron Ltd 成膜装置及び基板処理装置
JP2011037587A (ja) * 2009-08-11 2011-02-24 Fuji Electric Holdings Co Ltd 基板搬送位置制御装置
CN101705477B (zh) * 2009-12-09 2012-08-22 新奥光伏能源有限公司 一种在线检测与在线修补薄膜产品晶化率的系统及方法
EP2354272B1 (en) * 2010-02-08 2016-08-24 Graphene Square Inc. Roll-to-roll apparatus for coating simultaneously internal and external surfaces of a pipe and graphene coating method using the same
JP2011184738A (ja) * 2010-03-09 2011-09-22 Fujifilm Corp ガスバリアフィルムの製造方法
JP5692794B2 (ja) 2010-03-17 2015-04-01 独立行政法人産業技術総合研究所 透明導電性炭素膜の製造方法
US9777365B2 (en) * 2011-11-29 2017-10-03 Itn Energy Systems, Inc. Multi-zone modular coater

Also Published As

Publication number Publication date
KR102204795B1 (ko) 2021-01-18
US9738969B2 (en) 2017-08-22
CN104603326B (zh) 2017-07-18
US20170058398A1 (en) 2017-03-02
WO2013179561A1 (en) 2013-12-05
US20150140212A1 (en) 2015-05-21
KR20150022767A (ko) 2015-03-04
CN104603326A (zh) 2015-05-06
JP2013249505A (ja) 2013-12-12

Similar Documents

Publication Publication Date Title
JP2013249505A (ja) 成膜装置及び成膜方法
JP6158839B2 (ja) フレキシブル基板上に光電池を形成するシステム
US20230114347A1 (en) Method of forming transition metal dichalcogenide thin film
KR101806917B1 (ko) 그래핀의 제조 방법
US9738057B2 (en) Substrate assembly, method of forming the same, and electronic device including the same
JP6132055B2 (ja) グラフェン膜の製造方法
JP5741522B2 (ja) 長尺体の表面処理装置と表面処理方法および銅張積層樹脂フィルム基板の製造方法
CN101849033B (zh) 薄膜形成装置和薄膜的形成方法
WO2018199169A1 (ja) 成膜装置及び成膜方法
CN106232868A (zh) 薄膜形成装置
US20190252182A1 (en) Thin-film manufacturing method, thin-film manufacturing apparatus, manufacturing method for a photoelectric conversion element, manufacturing method for a logic circuit, manufacturing method for a light-emitting element, and manufacturing method for a light control element
JP2015520092A (ja) 連続的なリールツーリール装置
CN103232034A (zh) 一种连续制备大面积石墨烯薄膜的方法及装置
JP6376685B2 (ja) 薄膜形成装置および薄膜形成方法
JP2014181350A (ja) 金属層付きアルミニウム箔及びその製造方法
JP2016017198A (ja) 薄膜形成装置および薄膜形成方法
JP2017155298A (ja) 薄膜形成装置
JP2017101270A (ja) 薄膜形成装置および薄膜形成方法
JP2020152954A (ja) 成膜装置
JP6587384B2 (ja) 封止膜の形成方法および封止膜
JP2020125515A (ja) 薄膜形成方法および成膜基材
JP6689642B2 (ja) 薄膜形成装置
JP6544249B2 (ja) キャンロールと真空成膜装置および長尺体の成膜方法
JP6127771B2 (ja) コアアダプタ及びこれを有する巻取装置並びに該装置を備えたロールツーロール表面処理装置
JP2019157276A (ja) キャンロールと真空成膜装置および長尺体の成膜方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150218

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151104

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151222

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160524

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160606

R151 Written notification of patent or utility model registration

Ref document number: 5958092

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees