JP5617476B2 - シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法 - Google Patents

シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法 Download PDF

Info

Publication number
JP5617476B2
JP5617476B2 JP2010212868A JP2010212868A JP5617476B2 JP 5617476 B2 JP5617476 B2 JP 5617476B2 JP 2010212868 A JP2010212868 A JP 2010212868A JP 2010212868 A JP2010212868 A JP 2010212868A JP 5617476 B2 JP5617476 B2 JP 5617476B2
Authority
JP
Japan
Prior art keywords
siloxane polymer
group
polymer composition
mass
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010212868A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012068417A (ja
Inventor
二朗 上田
二朗 上田
大吾 一戸
大吾 一戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Priority to JP2010212868A priority Critical patent/JP5617476B2/ja
Priority to KR1020110090658A priority patent/KR101287089B1/ko
Priority to CN201110288607.0A priority patent/CN102566278B/zh
Priority to TW100133856A priority patent/TWI506092B/zh
Publication of JP2012068417A publication Critical patent/JP2012068417A/ja
Application granted granted Critical
Publication of JP5617476B2 publication Critical patent/JP5617476B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials For Photolithography (AREA)
JP2010212868A 2010-09-22 2010-09-22 シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法 Active JP5617476B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010212868A JP5617476B2 (ja) 2010-09-22 2010-09-22 シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法
KR1020110090658A KR101287089B1 (ko) 2010-09-22 2011-09-07 실록산 폴리머 조성물, 경화막 및 경화막의 형성 방법
CN201110288607.0A CN102566278B (zh) 2010-09-22 2011-09-19 硅氧烷聚合物组合物、固化膜以及固化膜的形成方法
TW100133856A TWI506092B (zh) 2010-09-22 2011-09-21 矽氧烷聚合物組成物、硬化膜及硬化膜之形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010212868A JP5617476B2 (ja) 2010-09-22 2010-09-22 シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法

Publications (2)

Publication Number Publication Date
JP2012068417A JP2012068417A (ja) 2012-04-05
JP5617476B2 true JP5617476B2 (ja) 2014-11-05

Family

ID=46134773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010212868A Active JP5617476B2 (ja) 2010-09-22 2010-09-22 シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法

Country Status (4)

Country Link
JP (1) JP5617476B2 (zh)
KR (1) KR101287089B1 (zh)
CN (1) CN102566278B (zh)
TW (1) TWI506092B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101710319B1 (ko) * 2011-03-07 2017-02-24 산요가세이고교 가부시키가이샤 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법
KR101401601B1 (ko) * 2012-08-17 2014-06-02 한국과학기술원 ｉＣＶＤ 공정을 이용한 절연막 형성 방법
JP2014056122A (ja) * 2012-09-12 2014-03-27 Sanyo Chem Ind Ltd 感光性組成物
JP2014055241A (ja) * 2012-09-12 2014-03-27 Sanyo Chem Ind Ltd 感光性組成物
JP6127497B2 (ja) * 2012-12-19 2017-05-17 Jsr株式会社 着色組成物、カラーフィルタ、表示素子及びポリシロキサン
KR101492251B1 (ko) * 2013-05-31 2015-02-16 이근수 개질된 폴리실록산계 공중합체, 이 공중합체를 포함하는 코팅 조성물, 이를 이용하여 얻을 수 있는 코팅 플라스틱 기판과 이의 제조 방법, 및 상기 개질된 폴리실록산계 공중합체의 제조방법
KR101631075B1 (ko) * 2014-06-12 2016-06-16 주식회사 켐트로닉스 실록산 폴리머 조성물
JP2016121311A (ja) * 2014-12-25 2016-07-07 Jsr株式会社 硬化膜形成用組成物、硬化膜、表示素子及び硬化膜の形成方法
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
CN108027561B (zh) * 2015-09-30 2021-10-08 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法
JP6973925B2 (ja) * 2017-10-05 2021-12-01 日本化薬株式会社 感光性樹脂組成物
CN107814971A (zh) * 2017-11-10 2018-03-20 安徽龙川橡塑科技有限公司 一种涉水epdm橡胶表面处理剂及表面处理epdm橡胶
JP7306264B2 (ja) * 2018-03-14 2023-07-11 東レ株式会社 ネガ型感光性着色組成物、硬化膜、それを用いたタッチパネル
EP3768730A4 (en) * 2018-03-22 2021-12-29 Aleo BME, Inc. Compositions and methods of making a thin film applications thereof
JP7026009B2 (ja) * 2018-06-28 2022-02-25 大日本塗料株式会社 構造物の塗装方法
JP2020084105A (ja) * 2018-11-29 2020-06-04 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ アクリル重合化ポリシロキサン、これを含んでなる組成物、およびこれを用いた硬化膜
CN111218002B (zh) * 2020-02-24 2021-06-08 华南理工大学 一种高折射率含硼和环氧基团的有机硅增粘剂及其制备方法与应用
JP7463821B2 (ja) * 2020-04-22 2024-04-09 信越化学工業株式会社 オルガノポリシロキサンを含有する組成物の製造方法、硬化膜の製造方法および被覆物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60021476T2 (de) 1999-06-04 2006-05-24 Jsr Corp. Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten
JP4195773B2 (ja) * 2000-04-10 2008-12-10 Ｊｓｒ株式会社 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜
JP2002285086A (ja) * 2001-03-26 2002-10-03 Jsr Corp 膜形成用組成物、膜の形成方法およびシリカ系膜
JP2003066600A (ja) * 2001-06-12 2003-03-05 Canon Inc フォトレジスト、これを用いた基板の加工方法、及びフォトレジストの製造方法
JP4333243B2 (ja) * 2002-08-09 2009-09-16 住友化学株式会社 着色感光性樹脂組成物
JP4627617B2 (ja) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
JP2005255753A (ja) * 2004-03-10 2005-09-22 Mitsubishi Chemicals Corp 硬化性樹脂組成物、カラーフィルタ、および液晶表示装置
TWI405036B (zh) * 2005-09-29 2013-08-11 Jnc Corp 含氟光固性聚合物組成物
JP2008020898A (ja) * 2006-06-12 2008-01-31 Toray Ind Inc 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
JP4912058B2 (ja) * 2006-06-29 2012-04-04 旭化成イーマテリアルズ株式会社 ハイブリッド感光性樹脂組成物
JP2008122750A (ja) * 2006-11-14 2008-05-29 Toray Ind Inc カラーフィルター用感光性レジスト組成物およびカラーフィルター

Also Published As

Publication number Publication date
CN102566278B (zh) 2015-01-21
JP2012068417A (ja) 2012-04-05
KR101287089B1 (ko) 2013-07-17
TWI506092B (zh) 2015-11-01
CN102566278A (zh) 2012-07-11
TW201213445A (en) 2012-04-01
KR20120031126A (ko) 2012-03-30

Similar Documents

Publication Publication Date Title
JP5617476B2 (ja) シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法
JP4631594B2 (ja) 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP6607109B2 (ja) 硬化膜、表示素子、硬化膜形成用材料及び硬化膜の形成方法
JP5636869B2 (ja) 感放射線性組成物、硬化膜、及びそれらの形成方法
JP5051365B2 (ja) 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
TWI437365B (zh) Sensitive radiation linear resin composition, interlayer insulating film and microlens, and the like
JP2008233518A (ja) 感放射線性樹脂組成物および液晶表示素子用スペーサー
TWI405038B (zh) A radiation-sensitive resin composition, an interlayer insulating film and a microlens, and a method for manufacturing the same
TWI442177B (zh) 感放射線性樹脂組合物及液晶顯示元件用間隔物
WO2011135947A1 (ja) 吐出ノズル式塗布法用ポジ型感放射線性組成物、表示素子用層間絶縁膜及びその形成方法
JP4947300B2 (ja) 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法
WO2011136073A1 (ja) ポジ型感放射線性組成物、表示素子用層間絶縁膜及びその形成方法
TWI444433B (zh) 聚矽氧烷組成物、聚矽氧烷組成物之製造方法、顯示元件之硬化膜及顯示元件之硬化膜之形成方法
TWI719070B (zh) 感光性樹脂組成物及自其製備之固化膜
TWI755757B (zh) 感光性樹脂組合物及由其製備之固化膜
JPWO2009104680A1 (ja) 感放射線性樹脂組成物、その硬化物及び該組成物を用いた層間絶縁膜及び光学用デバイス
TW201534628A (zh) 硬化性樹脂組成物、顯示元件用硬化膜、顯示元件用硬化膜的形成方法及顯示元件
JP4419736B2 (ja) 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
KR20120030012A (ko) 폴리실록산 조성물과 그의 제조 방법 및, 경화막과 그의 형성 방법
JP2010085929A (ja) 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
KR20140049722A (ko) 포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
JP2009053667A (ja) 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズとそれらの製造方法
JP4581810B2 (ja) 層間絶縁膜形成用感放射線性樹脂組成物およびマイクロレンズ形成用感放射線性組成物
JP5056301B2 (ja) 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
JP4666163B2 (ja) 感放射線性樹脂組成物、スペーサーおよび液晶表示素子

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130206

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140129

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140204

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140328

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140819

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140901

R150 Certificate of patent or registration of utility model

Ref document number: 5617476

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250