JP5441005B2 - 磁壁移動素子及び磁気ランダムアクセスメモリ - Google Patents
磁壁移動素子及び磁気ランダムアクセスメモリ Download PDFInfo
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- 230000005294 ferromagnetic effect Effects 0.000 claims description 14
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- 229910019222 CoCrPt Inorganic materials 0.000 description 5
- 229910003321 CoFe Inorganic materials 0.000 description 5
- 229910019233 CoFeNi Inorganic materials 0.000 description 5
- 229910018936 CoPd Inorganic materials 0.000 description 5
- 229910018979 CoPt Inorganic materials 0.000 description 5
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 5
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- 229910015187 FePd Inorganic materials 0.000 description 4
- 229910005335 FePt Inorganic materials 0.000 description 4
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- 229910018516 Al—O Inorganic materials 0.000 description 3
- 229910019041 PtMn Inorganic materials 0.000 description 3
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- G11C19/0808—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
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- G—PHYSICS
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- G11C27/00—Electric analogue stores, e.g. for storing instantaneous values
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- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Mram Or Spin Memory Techniques (AREA)
Description
図1は、本実施の形態に係る磁壁移動素子1の原理を説明するための概念図である。磁壁移動素子1は、強磁性体膜で形成される磁化記録層10を備えている。この磁化記録層10は磁壁DWを有しており、磁化記録層10中で磁壁DWは移動する。
以下、本実施の形態に係る磁壁移動素子(磁壁移動型の磁気抵抗素子)1の例を更に詳しく説明する。
図10は、本実施の形態に係る磁壁移動素子1の一例を示している。図10で示される磁壁移動素子1は、既出の図6で示されたものと同様の構造を有しており、磁化記録層10、トンネルバリア層20及び磁化固定層30を備えている。磁化記録層10の中央領域12、トンネルバリア層20及び磁化固定層30が、読み出し部(MTJ)を形成している。
図13は、本実施の形態に係る磁壁移動素子1の他の例を示している。図13で示される磁壁移動素子1は、既出の図7で示されたものと同様の構造を有しており、磁化記録層10、導電層40、磁化自由層50、トンネルバリア層60、及び磁化固定層70を備えている。磁化自由層50、トンネルバリア層60及び磁化固定層70が、読み出し部(MTJ)を形成している。
図14は、本実施の形態に係る磁壁移動素子1の更に例を示している。図14で示される磁壁移動素子1は、既出の第1の例(図10)と同様の構造を有している。但し、磁化記録層10及び磁化固定層30は、面内磁気異方性を有する面内磁化膜で形成される。
本実施の形態に係る磁壁移動型のMRAMは、上述の磁壁移動素子1をメモリセルとして用い、多値動作が可能である。図17は、本実施の形態に係るMRAM100の構成の一例を示している。図18は、図17で示されるMRAM100に対するデータ書き込み/読み出しを要約的に示している。
Claims (13)
- 強磁性体膜で形成され磁壁を有する磁化記録層を備え、
前記磁化記録層は、
磁化方向が固定された一組の端部領域と、
前記一組の端部領域の間に挟まれ前記磁壁が移動する中央領域と
を含み、
前記端部領域と前記中央領域との境界に、前記磁壁がトラップされる第1トラップサイトが形成され、
前記中央領域内に、前記磁壁がトラップされる第2トラップサイトが少なくとも1つ形成され、
前記磁化記録層の前記中央領域の磁化状態に応じて抵抗値が変化する磁気抵抗素子を更に備え、
前記磁気抵抗素子は、
強磁性層である磁化自由層と、
磁化方向が固定された強磁性層である磁化固定層と、
前記磁化自由層と前記磁化固定層とに挟まれた非磁性層と
を有し、
前記磁化自由層は、前記磁化記録層の前記中央領域と磁気的に結合しており、
前記磁化自由層の磁化状態は、前記中央領域の磁化状態に依存して変化する
磁壁移動素子。 - 請求項1に記載の磁壁移動素子であって、
前記中央領域内の前記第2トラップサイトの数は複数である
磁壁移動素子。 - 請求項1又は2に記載の磁壁移動素子であって、
前記第1トラップサイトにおいて前記磁壁をトラップするためのポテンシャル差は、第1ポテンシャル差であり、
前記第2トラップサイトにおいて前記磁壁をトラップするためのポテンシャル差は、前記第1ポテンシャル差より小さい第2ポテンシャル差である
磁壁移動素子。 - 請求項1乃至3のいずれか一項に記載の磁壁移動素子であって、
前記第2トラップサイトは、前記中央領域の側面に形成された凹凸である
磁壁移動素子。 - 請求項1乃至3のいずれか一項に記載の磁壁移動素子であって、
前記第2トラップサイトは、前記中央領域の表面に形成された凹凸である
磁壁移動素子。 - 請求項1乃至3のいずれか一項に記載の磁壁移動素子であって、
前記第2トラップサイトは、前記中央領域における前記強磁性体膜中の結晶粒界である
磁壁移動素子。 - 請求項1乃至6のいずれか一項に記載の磁壁移動素子であって、
前記第1トラップサイトにおける前記磁化記録層の膜厚は、前記中央領域側よりも前記端部領域側の方が大きい
磁壁移動素子。 - 請求項1乃至6のいずれか一項に記載の磁壁移動素子であって、
前記第1トラップサイトにおける前記磁化記録層の平面幅は、前記中央領域側よりも前記端部領域側の方が大きい
磁壁移動素子。 - 請求項1乃至6のいずれか一項に記載の磁壁移動素子であって、
前記一組の端部領域のそれぞれに隣接する第1磁性体膜と第2磁性体膜を更に備え、
前記第1磁性体膜及び前記第2磁性体膜の飽和磁化あるいは結晶磁気異方性は、前記磁化記録層のものと異なる
磁壁移動素子。 - 請求項1乃至9のいずれか一項に記載の磁壁移動素子であって、
前記一組の端部領域の間に電流を流すことにより、前記磁壁が、前記少なくとも1つの第2トラップサイトのいずれかあるいは前記第1トラップサイトに移動する
磁壁移動素子。 - 請求項10に記載の磁壁移動素子であって、
前記電流のパルス数に依存して、前記磁壁の移動量が変化する
磁壁移動素子。 - 請求項10に記載の磁壁移動素子であって、
前記電流のパルス幅に依存して、前記磁壁の移動量が変化する
磁壁移動素子。 - アレイ状に配置された複数のメモリセルを備える磁壁移動型の磁気ランダムアクセスメモリであって、
前記複数のメモリセルの各々は磁壁移動素子を備え、
前記磁壁移動素子は、強磁性体膜で形成され磁壁を有する磁化記録層を備え、
前記磁化記録層は、
磁化方向が固定された一組の端部領域と、
前記一組の端部領域の間に挟まれ前記磁壁が移動する中央領域と
を含み、
前記端部領域と前記中央領域との境界に、前記磁壁がトラップされる第1トラップサイトが形成され、
前記中央領域内に、前記磁壁がトラップされる第2トラップサイトが少なくとも1つ形成され、
前記磁壁移動素子は、前記磁化記録層の前記中央領域の磁化状態に応じて抵抗値が変化する磁気抵抗素子を更に備え、
前記磁気抵抗素子は、
強磁性層である磁化自由層と、
磁化方向が固定された強磁性層である磁化固定層と、
前記磁化自由層と前記磁化固定層とに挟まれた非磁性層と
を有し、
前記磁化自由層は、前記磁化記録層の前記中央領域と磁気的に結合しており、
前記磁化自由層の磁化状態は、前記中央領域の磁化状態に依存して変化する
磁気ランダムアクセスメモリ。
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11337527A (ja) * | 1998-05-28 | 1999-12-10 | Nippon Steel Corp | バルクハウゼンノイズの検出方法 |
JP2005191032A (ja) * | 2003-12-24 | 2005-07-14 | Toshiba Corp | 磁気記憶装置及び磁気情報の書込み方法 |
WO2005069368A1 (ja) * | 2004-01-15 | 2005-07-28 | Japan Science And Technology Agency | 電流注入磁壁移動素子 |
WO2006046591A1 (ja) * | 2004-10-27 | 2006-05-04 | Keio University | 磁気抵抗効果素子及び磁気メモリ装置 |
WO2007015474A1 (ja) * | 2005-08-01 | 2007-02-08 | Japan Science And Technology Agency | 磁気メモリー |
WO2007020823A1 (ja) * | 2005-08-15 | 2007-02-22 | Nec Corporation | 磁気メモリセル、磁気ランダムアクセスメモリ、及び磁気ランダムアクセスメモリへのデータ読み書き方法 |
JP2007123640A (ja) * | 2005-10-28 | 2007-05-17 | Sharp Corp | 磁気メモリ、情報記録/再生方法、情報再生方法、情報記録方法 |
JP2007227923A (ja) * | 2006-02-23 | 2007-09-06 | Samsung Electronics Co Ltd | マグネチックドメインドラッギングを利用する磁性メモリ素子 |
JP2007317895A (ja) * | 2006-05-26 | 2007-12-06 | Fujitsu Ltd | 磁気抵抗メモリ装置 |
JP2009054715A (ja) * | 2007-08-24 | 2009-03-12 | Nec Corp | 磁壁ランダムアクセスメモリ |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3369225A (en) * | 1964-05-05 | 1968-02-13 | Lab For Electronics Inc | Thin film shift register |
KR100450794B1 (ko) * | 2001-12-13 | 2004-10-01 | 삼성전자주식회사 | 마그네틱 랜덤 엑세스 메모리 및 그 작동 방법 |
US6970379B2 (en) | 2003-10-14 | 2005-11-29 | International Business Machines Corporation | System and method for storing data in an unpatterned, continuous magnetic layer |
JP4143020B2 (ja) | 2003-11-13 | 2008-09-03 | 株式会社東芝 | 磁気抵抗効果素子および磁気メモリ |
US7042036B2 (en) * | 2004-08-05 | 2006-05-09 | The University Of Chicago | Magnetic memory using single domain switching by direct current |
JP2007005664A (ja) * | 2005-06-27 | 2007-01-11 | Fuji Electric Holdings Co Ltd | スピン注入磁化反転素子 |
US7626856B2 (en) * | 2006-03-20 | 2009-12-01 | Fuji Electric Device Technology Co., Ltd. | Magnetic recording element |
US7869266B2 (en) * | 2007-10-31 | 2011-01-11 | Avalanche Technology, Inc. | Low current switching magnetic tunnel junction design for magnetic memory using domain wall motion |
US7825445B2 (en) * | 2007-11-29 | 2010-11-02 | Seagate Technology Llc | Magnetoresistive memory elements with separate read and write current paths |
US7876595B2 (en) * | 2008-09-19 | 2011-01-25 | Seagate Technology Llc | Magnetic shift register as counter and data storage device |
-
2009
- 2009-01-13 JP JP2009553377A patent/JP5441005B2/ja active Active
- 2009-01-13 US US12/864,056 patent/US8379429B2/en active Active
- 2009-01-13 WO PCT/JP2009/050287 patent/WO2009101827A1/ja active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11337527A (ja) * | 1998-05-28 | 1999-12-10 | Nippon Steel Corp | バルクハウゼンノイズの検出方法 |
JP2005191032A (ja) * | 2003-12-24 | 2005-07-14 | Toshiba Corp | 磁気記憶装置及び磁気情報の書込み方法 |
WO2005069368A1 (ja) * | 2004-01-15 | 2005-07-28 | Japan Science And Technology Agency | 電流注入磁壁移動素子 |
WO2006046591A1 (ja) * | 2004-10-27 | 2006-05-04 | Keio University | 磁気抵抗効果素子及び磁気メモリ装置 |
WO2007015474A1 (ja) * | 2005-08-01 | 2007-02-08 | Japan Science And Technology Agency | 磁気メモリー |
WO2007020823A1 (ja) * | 2005-08-15 | 2007-02-22 | Nec Corporation | 磁気メモリセル、磁気ランダムアクセスメモリ、及び磁気ランダムアクセスメモリへのデータ読み書き方法 |
JP2007123640A (ja) * | 2005-10-28 | 2007-05-17 | Sharp Corp | 磁気メモリ、情報記録/再生方法、情報再生方法、情報記録方法 |
JP2007227923A (ja) * | 2006-02-23 | 2007-09-06 | Samsung Electronics Co Ltd | マグネチックドメインドラッギングを利用する磁性メモリ素子 |
JP2007317895A (ja) * | 2006-05-26 | 2007-12-06 | Fujitsu Ltd | 磁気抵抗メモリ装置 |
JP2009054715A (ja) * | 2007-08-24 | 2009-03-12 | Nec Corp | 磁壁ランダムアクセスメモリ |
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US20110129691A1 (en) | 2011-06-02 |
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