JP5289996B2 - 補強材付き配線基板 - Google Patents
補強材付き配線基板 Download PDFInfo
- Publication number
- JP5289996B2 JP5289996B2 JP2009033314A JP2009033314A JP5289996B2 JP 5289996 B2 JP5289996 B2 JP 5289996B2 JP 2009033314 A JP2009033314 A JP 2009033314A JP 2009033314 A JP2009033314 A JP 2009033314A JP 5289996 B2 JP5289996 B2 JP 5289996B2
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- JP
- Japan
- Prior art keywords
- wiring board
- stiffener
- substrate
- reinforcing material
- main surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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- H05K1/00—Printed circuits
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/146—Mixed devices
- H01L2924/1461—MEMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15153—Shape the die mounting substrate comprising a recess for hosting the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15172—Fan-out arrangement of the internal vias
- H01L2924/15174—Fan-out arrangement of the internal vias in different layers of the multilayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/20—Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
- H05K2201/2009—Reinforced areas, e.g. for a specific part of a flexible printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/20—Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
- H05K2201/2018—Presence of a frame in a printed circuit or printed circuit assembly
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structure Of Printed Boards (AREA)
Description
また、上記課題を解決するための別の手段(手段2)としては、基板主面及び基板裏面を有し、コア基板を含まずに複数の樹脂絶縁層及び複数の導体層を積層してなる構造を有し、チップ部品の端子を面接続するための複数の主面側接続端子が前記基板主面上に配設された矩形板状の配線基板と、前記基板主面側にのみ接合され、前記複数の主面側接続端子を露出させる開口部が貫通形成された矩形枠状体からなる補強材とを備える補強材付き配線基板であって、前記補強材は、枠内面から枠外面にわたって延びるスリットを介して分割された複数の分割片からなり、前記配線基板において前記スリットが形成された箇所に対応する位置には、複数層にわたりプレーン状導体層が配置されていることを特徴とする補強材付き配線基板がある。
以下、本発明を補強材付き配線基板に具体化した第1の実施の形態を図面に基づき詳細に説明する。
[第2の実施の形態]
21…チップ部品としてのICチップ
31,31A〜31G…補強材としてのスティフナ
32…接合面
33…非接合面
35…開口部
36,36A〜36H…分割片
37…枠内面
38…枠外面
39,39A〜39E…スリット
40,40A…配線基板
41…基板主面
42…基板裏面
43〜46…樹脂絶縁層
51…導体層
51A…プレーン状導体層
52…主面側接続端子としての端子パッド
Claims (5)
- 基板主面及び基板裏面を有し、コア基板を含まずに複数の樹脂絶縁層及び複数の導体層を積層してなる構造を有し、チップ部品の端子を面接続するための複数の主面側接続端子が前記基板主面上に配設された矩形板状の配線基板と、
前記基板主面側にのみ接合され、前記複数の主面側接続端子を露出させる開口部が貫通形成された矩形枠状体からなる補強材と
を備える補強材付き配線基板であって、
前記補強材は、枠内面から枠外面にわたって延びるスリットを介して分割された複数の分割片からなり、前記配線基板に接合される接合面とその反対側に位置する非接合面とを有するとともに、前記非接合面側のスリット幅のほうが前記接合面側のスリット幅よりも大きくなるように設定されている
ことを特徴とする補強材付き配線基板。 - 基板主面及び基板裏面を有し、コア基板を含まずに複数の樹脂絶縁層及び複数の導体層を積層してなる構造を有し、チップ部品の端子を面接続するための複数の主面側接続端子が前記基板主面上に配設された矩形板状の配線基板と、
前記基板主面側にのみ接合され、前記複数の主面側接続端子を露出させる開口部が貫通形成された矩形枠状体からなる補強材と
を備える補強材付き配線基板であって、
前記補強材は、枠内面から枠外面にわたって延びるスリットを介して分割された複数の分割片からなり、
前記配線基板において前記スリットが形成された箇所に対応する位置には、複数層にわたりプレーン状導体層が配置されている
ことを特徴とする補強材付き配線基板。 - 前記スリットは非直線的な形状であることを特徴とする請求項1または2に記載の補強材付き配線基板。
- 前記スリットはクランク形状であることを特徴とする請求項1または2に記載の補強材付き配線基板。
- 前記補強材は、前記配線基板に接合される接合面とその反対側に位置する非接合面とを有するとともに、前記非接合面側のスリット幅のほうが前記接合面側のスリット幅よりも大きくなるように設定されていることを特徴とする請求項2乃至4のいずれか1項に記載の補強材付き配線基板。
Priority Applications (2)
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JP2009033314A JP5289996B2 (ja) | 2009-02-16 | 2009-02-16 | 補強材付き配線基板 |
US12/705,776 US8362364B2 (en) | 2009-02-16 | 2010-02-15 | Wiring board assembly and manufacturing method thereof |
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JP2009033314A JP5289996B2 (ja) | 2009-02-16 | 2009-02-16 | 補強材付き配線基板 |
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JP5289996B2 true JP5289996B2 (ja) | 2013-09-11 |
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JP (1) | JP5289996B2 (ja) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI246760B (en) * | 2004-12-22 | 2006-01-01 | Siliconware Precision Industries Co Ltd | Heat dissipating semiconductor package and fabrication method thereof |
JP5566720B2 (ja) * | 2010-02-16 | 2014-08-06 | 日本特殊陶業株式会社 | 多層配線基板及びその製造方法 |
US8217500B1 (en) * | 2010-05-07 | 2012-07-10 | Altera Corporation | Semiconductor device package |
US8284561B2 (en) * | 2010-08-05 | 2012-10-09 | Advanced Semiconductor Engineering, Inc. | Embedded component package structure |
EP2427034A1 (en) * | 2010-09-03 | 2012-03-07 | Long Jing International Technology Enterprise Co., Ltd. | Anti-deflection structure for flexible circuit board |
JP2013214568A (ja) * | 2012-03-30 | 2013-10-17 | Fujitsu Ltd | 配線基板及び配線基板の製造方法 |
CN103429013B (zh) * | 2012-05-16 | 2016-05-18 | 北大方正集团有限公司 | 多层印制线路板及其制作方法 |
TWI586230B (zh) * | 2012-07-18 | 2017-06-01 | 鐘化股份有限公司 | 補強板一體型軟性印刷基板 |
CN103700656A (zh) * | 2012-09-27 | 2014-04-02 | 国碁电子(中山)有限公司 | 厚膜混合电路结构及制造方法 |
TWI473552B (zh) * | 2012-11-21 | 2015-02-11 | Unimicron Technology Corp | 具有元件設置區之基板結構及其製程 |
US9202782B2 (en) | 2013-01-07 | 2015-12-01 | Intel Corporation | Embedded package in PCB build up |
JP2014229761A (ja) * | 2013-05-23 | 2014-12-08 | 株式会社東芝 | 電子機器 |
EP3065514A4 (en) * | 2013-10-30 | 2017-04-26 | Kyocera Corporation | Wiring board and mounting structure using same |
JP2015211162A (ja) * | 2014-04-28 | 2015-11-24 | 旭硝子株式会社 | ガラス部材の製造方法、ガラス部材、およびガラスインターポーザ |
US20160073493A1 (en) * | 2014-09-05 | 2016-03-10 | Andrew KW Leung | Stiffener ring for circuit board |
JP2016082163A (ja) * | 2014-10-21 | 2016-05-16 | イビデン株式会社 | プリント配線板 |
US9818682B2 (en) * | 2014-12-03 | 2017-11-14 | International Business Machines Corporation | Laminate substrates having radial cut metallic planes |
WO2018131189A1 (ja) * | 2017-01-16 | 2018-07-19 | シャープ株式会社 | 配線基板及びこれを用いた固体撮像装置 |
JP6815880B2 (ja) * | 2017-01-25 | 2021-01-20 | 株式会社ディスコ | 半導体パッケージの製造方法 |
US10629545B2 (en) * | 2017-03-09 | 2020-04-21 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor device |
US10950535B2 (en) * | 2017-05-09 | 2021-03-16 | Unimicron Technology Corp. | Package structure and method of manufacturing the same |
US10685922B2 (en) * | 2017-05-09 | 2020-06-16 | Unimicron Technology Corp. | Package structure with structure reinforcing element and manufacturing method thereof |
JP7173728B2 (ja) * | 2017-10-26 | 2022-11-16 | 日東電工株式会社 | 撮像素子実装基板 |
JP2019121763A (ja) * | 2018-01-11 | 2019-07-22 | イビデン株式会社 | プリント配線板およびその製造方法 |
US10636746B2 (en) * | 2018-02-26 | 2020-04-28 | International Business Machines Corporation | Method of forming an electronic package |
US11227841B2 (en) * | 2018-06-28 | 2022-01-18 | Intel Corporation | Stiffener build-up layer package |
CN111599687B (zh) * | 2019-02-21 | 2022-11-15 | 奥特斯科技(重庆)有限公司 | 具有高刚度的超薄部件承载件及其制造方法 |
US20220069489A1 (en) * | 2020-08-28 | 2022-03-03 | Unimicron Technology Corp. | Circuit board structure and manufacturing method thereof |
CN113035813B (zh) * | 2021-03-02 | 2022-07-19 | 华进半导体封装先导技术研发中心有限公司 | 一种芯片封装结构及芯片封装方法 |
US12035475B2 (en) * | 2021-05-07 | 2024-07-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package with stress reduction design and method for forming the same |
JP2023069417A (ja) * | 2021-11-05 | 2023-05-18 | 日東電工株式会社 | 再配線基板およびその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5778523A (en) * | 1996-11-08 | 1998-07-14 | W. L. Gore & Associates, Inc. | Method for controlling warp of electronic assemblies by use of package stiffener |
JP2924840B2 (ja) | 1997-02-13 | 1999-07-26 | 日本電気株式会社 | Tape−BGAタイプの半導体装置 |
JPH11345890A (ja) * | 1998-06-03 | 1999-12-14 | Fujitsu Ltd | 半導体装置 |
JP2002026500A (ja) | 2000-07-05 | 2002-01-25 | Ngk Spark Plug Co Ltd | 配線基板 |
JP4427874B2 (ja) | 2000-07-06 | 2010-03-10 | 住友ベークライト株式会社 | 多層配線板の製造方法および多層配線板 |
US7482686B2 (en) * | 2004-06-21 | 2009-01-27 | Braodcom Corporation | Multipiece apparatus for thermal and electromagnetic interference (EMI) shielding enhancement in die-up array packages and method of making the same |
JP4894347B2 (ja) * | 2006-04-28 | 2012-03-14 | 凸版印刷株式会社 | 半導体集積回路素子搭載用基板および半導体装置 |
JP5280032B2 (ja) * | 2007-09-27 | 2013-09-04 | 新光電気工業株式会社 | 配線基板 |
US7619308B1 (en) * | 2008-05-02 | 2009-11-17 | Sun Microsystems, Inc. | Multi-lid semiconductor package |
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