JP5152249B2 - プラズマディスプレイパネルの製造方法 - Google Patents
プラズマディスプレイパネルの製造方法 Download PDFInfo
- Publication number
- JP5152249B2 JP5152249B2 JP2010103404A JP2010103404A JP5152249B2 JP 5152249 B2 JP5152249 B2 JP 5152249B2 JP 2010103404 A JP2010103404 A JP 2010103404A JP 2010103404 A JP2010103404 A JP 2010103404A JP 5152249 B2 JP5152249 B2 JP 5152249B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- chamber
- gas
- mgo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/50—Filling, e.g. selection of gas mixture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
Description
20 成膜装置
21 蒸着室(成膜室)
22 基板投入室
23 基板取出室
24a,24b,24c 真空排気系
25 搬送手段
26a,26b,26c,26d 仕切壁
27a,27b 加熱ランプ
28a 蒸着源
28b ハース
28c 電子銃
28d 電子ビーム
28e 蒸気流
28f シャッタ
29a ガス導入手段
29b 真空度検出手段
Claims (1)
- プラズマディスプレイパネルの基板へ金属酸化膜を成膜する工程を有するプラズマディスプレイパネルの製造方法において、
水、水素、一酸化炭素、二酸化炭素の中から選ばれる少なくとも一つのガスと、
酸素、または酸素を含むガスと、
を各々、成膜室に導入するにあたり、
いずれか一方のガスの導入量を一定とし、他方のガスの導入量を調整し排気と平衡させることで、
成膜室における真空度を1×10-1Pa〜1×10-2Paの範囲とすることを特徴とするプラズマディスプレイパネルの製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010103404A JP5152249B2 (ja) | 2003-07-15 | 2010-04-28 | プラズマディスプレイパネルの製造方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003197158 | 2003-07-15 | ||
JP2003197158 | 2003-07-15 | ||
JP2010103404A JP5152249B2 (ja) | 2003-07-15 | 2010-04-28 | プラズマディスプレイパネルの製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004205674A Division JP4543797B2 (ja) | 2003-07-15 | 2004-07-13 | プラズマディスプレイパネルの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010192461A JP2010192461A (ja) | 2010-09-02 |
JP5152249B2 true JP5152249B2 (ja) | 2013-02-27 |
Family
ID=34055844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010103404A Expired - Fee Related JP5152249B2 (ja) | 2003-07-15 | 2010-04-28 | プラズマディスプレイパネルの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060003086A1 (ja) |
JP (1) | JP5152249B2 (ja) |
KR (2) | KR20050071683A (ja) |
CN (1) | CN1717765A (ja) |
WO (1) | WO2005006381A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5040217B2 (ja) * | 2005-09-13 | 2012-10-03 | パナソニック株式会社 | 保護膜形成方法および保護膜形成装置 |
WO2015159309A1 (en) | 2014-04-18 | 2015-10-22 | Cadila Healthcare Limited | Novel purification process of gonadotropin |
DE102014215380B4 (de) | 2014-08-05 | 2022-04-28 | Evonik Operations Gmbh | Stickstoffhaltige Verbindungen, geeignet zur Verwendung bei der Herstellung von Polyurethanen |
DE102014215387B4 (de) | 2014-08-05 | 2020-06-10 | Evonik Operations Gmbh | Stickstoffhaltige Verbindungen, geeignet zur Verwendung bei der Herstellung von Polyurethanen |
US11735643B2 (en) * | 2019-10-28 | 2023-08-22 | Ramot At Tel-Aviv University Ltd. | Heterogeneous structures comprising III-V semiconductors and metal oxide dielectrics, and a method of fabrication thereof |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3836184B2 (ja) * | 1996-05-01 | 2006-10-18 | 中外炉工業株式会社 | 酸化マグネシウム膜の製造方法 |
JPH10204625A (ja) * | 1997-01-14 | 1998-08-04 | Sumitomo Heavy Ind Ltd | MgO膜成膜方法及び成膜装置 |
JP4197204B2 (ja) * | 1998-10-23 | 2008-12-17 | キヤノンアネルバ株式会社 | 酸化マグネシウムの作製装置 |
ATE394521T1 (de) * | 2000-02-09 | 2008-05-15 | Fujikura Ltd | Verfahren zur herstellung dünner polykristalliner mgo filme |
JP2001243886A (ja) * | 2000-03-01 | 2001-09-07 | Toray Ind Inc | プラズマディスプレイ用部材およびプラズマディスプレイならびにその製造方法 |
KR100798986B1 (ko) * | 2000-03-31 | 2008-01-28 | 마츠시타 덴끼 산교 가부시키가이샤 | 플라즈마 디스플레이 패널의 제조방법 |
JP4153983B2 (ja) * | 2000-07-17 | 2008-09-24 | パイオニア株式会社 | 保護膜、その成膜方法、プラズマディスプレイパネル及びその製造方法 |
JP2002056773A (ja) * | 2000-08-08 | 2002-02-22 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル用膜形成方法及びプラズマディスプレイパネル用膜形成装置 |
JP4698077B2 (ja) * | 2001-07-18 | 2011-06-08 | パナソニック株式会社 | プラズマディスプレイパネルおよびその製造方法 |
EP2249369A2 (en) * | 2001-12-25 | 2010-11-10 | Panasonic Corporation | Plasma display panel and its manufacturing method |
JP2005050804A (ja) * | 2003-07-15 | 2005-02-24 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルの製造方法およびその製造装置 |
-
2004
- 2004-07-14 US US10/532,672 patent/US20060003086A1/en not_active Abandoned
- 2004-07-14 KR KR1020057008408A patent/KR20050071683A/ko not_active IP Right Cessation
- 2004-07-14 CN CNA2004800014668A patent/CN1717765A/zh active Pending
- 2004-07-14 KR KR1020077013482A patent/KR20070070261A/ko not_active Application Discontinuation
- 2004-07-14 WO PCT/JP2004/010365 patent/WO2005006381A1/ja active Application Filing
-
2010
- 2010-04-28 JP JP2010103404A patent/JP5152249B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20060003086A1 (en) | 2006-01-05 |
JP2010192461A (ja) | 2010-09-02 |
WO2005006381A1 (ja) | 2005-01-20 |
KR20050071683A (ko) | 2005-07-07 |
KR20070070261A (ko) | 2007-07-03 |
CN1717765A (zh) | 2006-01-04 |
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