JP5034836B2 - 充填装置 - Google Patents
充填装置 Download PDFInfo
- Publication number
- JP5034836B2 JP5034836B2 JP2007254315A JP2007254315A JP5034836B2 JP 5034836 B2 JP5034836 B2 JP 5034836B2 JP 2007254315 A JP2007254315 A JP 2007254315A JP 2007254315 A JP2007254315 A JP 2007254315A JP 5034836 B2 JP5034836 B2 JP 5034836B2
- Authority
- JP
- Japan
- Prior art keywords
- filling
- valve
- filling liquid
- passage
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D37/00—Processes of filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67C—CLEANING, FILLING WITH LIQUIDS OR SEMILIQUIDS, OR EMPTYING, OF BOTTLES, JARS, CANS, CASKS, BARRELS, OR SIMILAR CONTAINERS, NOT OTHERWISE PROVIDED FOR; FUNNELS
- B67C3/00—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus; Filling casks or barrels with liquids or semiliquids
- B67C3/02—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus
- B67C3/22—Details
- B67C3/28—Flow-control devices, e.g. using valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67C—CLEANING, FILLING WITH LIQUIDS OR SEMILIQUIDS, OR EMPTYING, OF BOTTLES, JARS, CANS, CASKS, BARRELS, OR SIMILAR CONTAINERS, NOT OTHERWISE PROVIDED FOR; FUNNELS
- B67C3/00—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus; Filling casks or barrels with liquids or semiliquids
- B67C3/02—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus
- B67C3/22—Details
- B67C3/28—Flow-control devices, e.g. using valves
- B67C3/286—Flow-control devices, e.g. using valves related to flow rate control, i.e. controlling slow and fast filling phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Description
前記制御手段は、充填動作中に前記フィルタの上流側の圧力と下流側の圧力が前記充填バルブの開閉動作により変動しないように前記回収バルブの開度を制御することを特徴とするものである。
4 充填液通路
4A 充填液通路の上流側(上流部)
4B 充填液通路の下流側(下流部)
8 充填ノズル
10 供給ポンプ
12 充填バルブ
14 フィルタ
16 回収通路
18 分岐部
20 回収バルブ
24 制御手段(制御装置)
26 圧力検出手段(圧力計)
28 圧力検出手段(圧力計)
Claims (3)
- 充填液が貯留された充填液タンクと、この充填液タンクと充填ノズルとを連通する充填液通路と、この充填液通路から分岐され、充填液を前記充填液タンクへ還流させる回収通路と、前記充填液通路の回収通路との分岐部よりも下流側に設けられた充填バルブと、前記回収通路に設けられた回収バルブと、充填液通路に設けられ、充填液タンク内の充填液を送液する供給ポンプと、充填液通路の供給ポンプと前記分岐部との間に設けられたフィルタと、前記充填バルブと回収バルブにそれぞれ設けられ、各バルブの開度を調整する駆動手段と、これら駆動手段を制御する制御手段とを備え、
前記制御手段は、充填動作中に前記フィルタの上流側の圧力と下流側の圧力が前記充填バルブの開閉動作により変動しないように前記回収バルブの開度を制御することを特徴とする充填装置。 - 充填バルブの開度と回収バルブの開度との関係を記憶する記憶手段を設け、この関係に基づいて充填バルブと回収バルブの開度を制御することを特徴とする請求項1に記載の充填装置。
- 前記フィルタの上流側および下流側に圧力検出手段を設け、検出された圧力に応じて回収バルブの開度を制御することをことを特徴とする請求項1に記載の充填装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007254315A JP5034836B2 (ja) | 2007-09-28 | 2007-09-28 | 充填装置 |
CN2008801094719A CN101903284B (zh) | 2007-09-28 | 2008-09-25 | 填充装置 |
PCT/JP2008/067287 WO2009041490A1 (ja) | 2007-09-28 | 2008-09-25 | 充填装置 |
US12/678,108 US8409431B2 (en) | 2007-09-28 | 2008-09-25 | Charging apparatus |
KR1020107006309A KR101523402B1 (ko) | 2007-09-28 | 2008-09-25 | 충전 장치 |
TW097137224A TWI452005B (zh) | 2007-09-28 | 2008-09-26 | 填充裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007254315A JP5034836B2 (ja) | 2007-09-28 | 2007-09-28 | 充填装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009083882A JP2009083882A (ja) | 2009-04-23 |
JP5034836B2 true JP5034836B2 (ja) | 2012-09-26 |
Family
ID=40511373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007254315A Active JP5034836B2 (ja) | 2007-09-28 | 2007-09-28 | 充填装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8409431B2 (ja) |
JP (1) | JP5034836B2 (ja) |
KR (1) | KR101523402B1 (ja) |
CN (1) | CN101903284B (ja) |
TW (1) | TWI452005B (ja) |
WO (1) | WO2009041490A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5136216B2 (ja) * | 2008-05-29 | 2013-02-06 | Jsr株式会社 | 調製装置 |
JP5365139B2 (ja) * | 2008-10-30 | 2013-12-11 | Jsr株式会社 | 樹脂組成物溶液の製造方法、及び製造装置 |
JP5428800B2 (ja) * | 2009-11-25 | 2014-02-26 | Jsr株式会社 | リソグラフィ組成物の充填装置、及びリソグラフィ組成物の充填方法 |
CA2913469C (en) | 2013-03-22 | 2018-05-15 | Pepsico, Inc. | Container filling system and valve for same |
WO2016148326A1 (ko) * | 2015-03-19 | 2016-09-22 | 디에스플랜트(주) | 압력센서를 구비한 고속 유체 회전 충진시스템 |
JP6942497B2 (ja) * | 2016-09-08 | 2021-09-29 | 東京エレクトロン株式会社 | 処理液供給装置 |
CN111232268A (zh) * | 2020-03-06 | 2020-06-05 | 河北科技大学 | 液体药罐灌装控制方法及液体药罐灌装系统 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1235631B (it) * | 1989-07-04 | 1992-09-12 | Effedi Di Favaro Orfeo E Crosa | Dispositivo elettroidraulico per comandare l'innesto della frizione in autoveicoli e simili. |
JPH05346186A (ja) * | 1992-06-12 | 1993-12-27 | Toshiba Corp | 低脈動式開閉バルブ装置 |
JP3362878B2 (ja) * | 1992-10-29 | 2003-01-07 | 日本板硝子株式会社 | 液状流体搬送装置 |
KR0141059B1 (ko) * | 1993-09-20 | 1998-06-01 | 코사이 아키오 | 액체공급시스템 액체공급방법 |
JP3335481B2 (ja) * | 1994-08-17 | 2002-10-15 | 東邦化成株式会社 | 処理液循環システム |
JPH0994421A (ja) | 1995-10-03 | 1997-04-08 | Nkk Corp | 集塵システムの運転方法 |
JPH10172881A (ja) | 1996-12-06 | 1998-06-26 | Sony Corp | フォトレジスト塗布装置 |
JP2001108789A (ja) | 1999-10-08 | 2001-04-20 | Ngk Insulators Ltd | 放射性排水のろ過方法 |
JP2002062667A (ja) | 2000-08-23 | 2002-02-28 | Sumitomo Chem Co Ltd | 微粒子量の低減されたフォトレジスト組成物の製造方法 |
JP3952872B2 (ja) * | 2001-10-10 | 2007-08-01 | 株式会社デンソー | 流動状物質の充填装置および充填方法 |
TW200706824A (en) * | 2005-08-11 | 2007-02-16 | Zheng-Tong Chen | Treatment system for cooling and circulating water |
DE102006024011A1 (de) * | 2006-05-23 | 2007-11-29 | Zf Friedrichshafen Ag | Verfahren und Vorrichtung zur Einstellung und Ansteuerung eines hydrodynamischen Retarders eines Kraftfahrzeuges |
-
2007
- 2007-09-28 JP JP2007254315A patent/JP5034836B2/ja active Active
-
2008
- 2008-09-25 CN CN2008801094719A patent/CN101903284B/zh active Active
- 2008-09-25 US US12/678,108 patent/US8409431B2/en active Active
- 2008-09-25 KR KR1020107006309A patent/KR101523402B1/ko active IP Right Grant
- 2008-09-25 WO PCT/JP2008/067287 patent/WO2009041490A1/ja active Application Filing
- 2008-09-26 TW TW097137224A patent/TWI452005B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20100063085A (ko) | 2010-06-10 |
CN101903284B (zh) | 2012-09-19 |
TW200936486A (en) | 2009-09-01 |
JP2009083882A (ja) | 2009-04-23 |
US20100236998A1 (en) | 2010-09-23 |
US8409431B2 (en) | 2013-04-02 |
TWI452005B (zh) | 2014-09-11 |
WO2009041490A1 (ja) | 2009-04-02 |
KR101523402B1 (ko) | 2015-05-27 |
CN101903284A (zh) | 2010-12-01 |
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