JP5016789B2 - 駆動回路部一体型の液晶表示装置 - Google Patents
駆動回路部一体型の液晶表示装置 Download PDFInfo
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- JP5016789B2 JP5016789B2 JP2005148581A JP2005148581A JP5016789B2 JP 5016789 B2 JP5016789 B2 JP 5016789B2 JP 2005148581 A JP2005148581 A JP 2005148581A JP 2005148581 A JP2005148581 A JP 2005148581A JP 5016789 B2 JP5016789 B2 JP 5016789B2
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13454—Drivers integrated on the active matrix substrate
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
- H01L29/78627—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile with a significant overlap between the lightly doped drain and the gate electrode, e.g. GOLDD
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
Description
図4Aに示すように、ガラスのような透明な物質からなる基板101上にバッファ層102を形成した後、バッファ層102の上にシリコンのような非晶質半導体を積層してエッチングすることで半導体層を形成する。次に、前記半導体層の上にフォトレジストパターンを形成して半導体層の一部領域をブロックした状態で、前記半導体層の一部領域に低濃度の不純物(即ち、n−イオン)を注入してそれぞれチャネル層103a及びn−層103bを形成する。
液晶パネルは、単位画素がマトリックス状に配列されるアレイ基板と、前記アレイ基板と対向するカラーフィルター基板とから構成され、前記アレイ基板とカラーフィルター基板間に液晶が充填される。また、前記アレイ基板は、単位画素が形成される画面表示部と、前記画面表示部に駆動信号を印加する駆動回路部とから構成される。
特に、現在、ポリシリコンを利用した高速動作の液晶表示装置が開発されるのに従って、高速動作特性を必要とする駆動回路部を画面表示部が形成された基板に一緒に形成するSOG技術が開発され、これにより、液晶パネルの製造工程の短縮及び液晶パネルの小型化が可能になった。前記ポリシリコンは、前記液晶パネルの製造工程の短縮及び小型化を可能にするもので、非晶質シリコンに比べて非常に優れた電気伝導度も有する。従って、本発明は、液晶パネルのアレイ基板の形成に際して、ポリシリコンをチャネルとして採用するポリシリコンTFTを使用して駆動回路部及び画面表示部のスイッチング素子を形成する。
本発明の駆動回路部にはNMOS及びPMOSが1対をなすCMOSと、GOLDD構造のTFT及びPMOSが1対をなすCMOSが備えられるが、説明の便宜のためにNMOS、GOLDD構造のTFT及びPMOSの製造工程を中心に説明する。
前記工程の結果、LDD構造のNMOS、GOLDD構造のTFT及びPMOSが構成される。
Claims (9)
- 基板上に単位画素がマトリックス状に配列される画面表示部と、
前記画面表示部の外郭に形成された駆動回路部と
を含み、
前記駆動回路部には、LDD構造のNMOSとPMOSが一対をなすCMOSと、GOLDD構造のTFTとPMOSが一対をなすCMOSとが備えられ、
前記駆動回路の薄膜トランジスタは、モビリティ変化量が7%以下であるときはLDD構造を選択し、モビリティ変化量が7%を超えるときはGOLDD構造を選択する
ことを特徴とする駆動回路部一体型の液晶表示装置。 - 前記駆動回路部は、
外部入力信号を受信してゲートドライバー及びデータドライバーを制御する制御信号を生成するタイミングコントローラと、
外部から入力される直流電圧を前記画面表示部内部の駆動に必要な直流電圧に変換するDC−DCコンバータと、
前記タイミングコントローラから入力される制御信号を利用して前記画面表示部のデータラインに特定電圧を出力するデータドライバーと、
前記タイミングコントローラから入力される制御信号を利用して前記画面表示部のゲートラインに特定電圧を出力するゲートドライバーと、
前記画面表示部に形成される画素電極と共に液晶に電界を形成する共通電極の電圧を駆動する共通電圧ドライブと
を備えることを特徴とする請求項1に記載の駆動回路部一体型の液晶表示装置。 - 前記タイミングコントローラ、DC−DCコンバータ及び共通電圧ドライバーに使用されるCMOSは、LDD構造であることを特徴とする請求項2に記載の駆動回路部一体型の液晶表示装置。
- 前記データドライバーは、
前記タイミングコントローラから入力される制御信号を貯蔵するシフトレジスタと、前記シフトレジスタから入力される制御信号を前記画面表示部に必要なアナログ信号に変換するデジタル−アナログコンバータと、前記デジタル−アナログコンバータから入力される信号をデータラインに印加する出力バッファブロックとを備え、
前記ゲートドライバーは、
シフトレジスタと、前記シフトレジスタから入力される制御信号を特定レベルに移動させるレベルシフターと、前記レベルシフターから入力される制御信号を前記画面表示部のゲートラインに印加する出力バッファブロックとを備え、
前記ゲートドライバー及びデータドライバーの内部の出力バッファブロック及びレベルシフターは、GOLDD構造の薄膜トランジスタを含むCMOSを備え、
前記データドライバー及びゲートドライバーの内部のシフトレジスタは、LDD構造の薄膜トランジスタを含むCMOSを備える
ことを特徴とする請求項2に記載の駆動回路部一体型の液晶表示装置。 - 前記画面表示部に形成されるスイッチング素子は、駆動電圧によってGOLDD構造の薄膜トランジスタ、LDD構造の薄膜トランジスタまたはPMOSのうちから選択されて形成されることを特徴とする請求項1に記載の駆動回路部一体型の液晶表示装置。
- 前記駆動回路の薄膜トランジスタは、チャネルの幅と長さがそれぞれ4μmであり、LDD領域の長さが1.5μmであるポリシリコン薄膜トランジスタである
ことを特徴とする請求項1に記載の駆動回路部一体型の液晶表示装置。 - 基板上に単位画素がマトリックス状に配列される画面表示部と、
前記画面表示部の外郭に形成された駆動回路部と
を備え、
前記駆動回路部には、LDD構造のNMOSとPMOSが一対をなすCMOSと、GOLDD構造のTFTとPMOSが一対をなすCMOSとが備えられ、
前記駆動回路部の薄膜トランジスタは、チャネルの幅と長さがそれぞれ4μmであり、LDD領域の長さが1.5μmであるポリシリコン薄膜トランジスタであり、モビリティ変化量が7%以下であるときはLDD構造を選択し、モビリティ変化量が7%を超えるときはGOLDD構造を選択する
ことを特徴とする駆動回路部一体型の液晶表示装置。 - 前記駆動回路部は、
LDD構造の薄膜トランジスタを含むCMOSで構成されるタイミングコントローラ、データドライバー内のシフトレジスタ、デジタル−アナログコンバータ及び共通電圧ドライバーと、
GOLDD構造の薄膜トランジスタを含むCMOSで構成されるゲートドライバー内の出力バッファブロック及びレベルシフターと
を備えることを特徴とする請求項7に記載の駆動回路部一体型の液晶表示装置。 - 前記駆動電圧が10V以上の場合、GOLDD構造のTFTを含むCMOSで構成され、前記駆動電圧が10V以下の場合、LDD構造のTFTを含むCMOSで構成される
ことを特徴とする請求項5に記載の駆動回路部一体型の液晶表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040039340A KR100675636B1 (ko) | 2004-05-31 | 2004-05-31 | Goldd구조 및 ldd구조의 tft를 동시에포함하는 구동회로부 일체형 액정표시장치 |
KR10-2004-0039340 | 2004-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005346053A JP2005346053A (ja) | 2005-12-15 |
JP5016789B2 true JP5016789B2 (ja) | 2012-09-05 |
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KR101382557B1 (ko) | 2007-06-28 | 2014-04-08 | 삼성디스플레이 주식회사 | 표시 장치 |
WO2010050160A1 (ja) | 2008-10-27 | 2010-05-06 | シャープ株式会社 | 半導体装置及びその製造方法 |
TWI408471B (zh) * | 2009-11-23 | 2013-09-11 | Au Optronics Corp | 顯示裝置 |
CN201725288U (zh) * | 2010-05-27 | 2011-01-26 | 深圳富泰宏精密工业有限公司 | 触控笔 |
KR20120140474A (ko) | 2011-06-21 | 2012-12-31 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치와, 이의 제조 방법 |
CN103441128B (zh) * | 2013-05-27 | 2016-01-20 | 南京中电熊猫液晶显示科技有限公司 | 一种tft阵列基板及其制造方法 |
KR102235421B1 (ko) * | 2013-12-06 | 2021-04-01 | 엘지디스플레이 주식회사 | 어레이 기판 및 그 제조방법 |
KR102060377B1 (ko) * | 2014-01-27 | 2020-02-11 | 한국전자통신연구원 | 디스플레이 소자, 그 제조 방법, 및 이미지 센서 소자의 제조방법 |
CN103985716B (zh) * | 2014-05-06 | 2018-03-27 | 深圳市华星光电技术有限公司 | 薄膜晶体管阵列基板制造方法及薄膜晶体管阵列基板 |
CN112635571A (zh) * | 2019-09-24 | 2021-04-09 | 乐金显示有限公司 | 薄膜晶体管及其制造方法及包括该薄膜晶体管的显示设备 |
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JP3688548B2 (ja) * | 2000-03-14 | 2005-08-31 | シャープ株式会社 | 画像表示装置 |
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-
2004
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2005
- 2005-05-20 JP JP2005148581A patent/JP5016789B2/ja not_active Expired - Fee Related
- 2005-05-31 US US11/139,980 patent/US8692750B2/en not_active Expired - Fee Related
- 2005-05-31 CN CNB2005100723942A patent/CN100381926C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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KR20050114126A (ko) | 2005-12-05 |
KR100675636B1 (ko) | 2007-02-02 |
US8692750B2 (en) | 2014-04-08 |
JP2005346053A (ja) | 2005-12-15 |
US20050266595A1 (en) | 2005-12-01 |
CN100381926C (zh) | 2008-04-16 |
CN1704827A (zh) | 2005-12-07 |
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