JP4817702B2 - 光学装置及びそれを備えた露光装置 - Google Patents

光学装置及びそれを備えた露光装置 Download PDF

Info

Publication number
JP4817702B2
JP4817702B2 JP2005116586A JP2005116586A JP4817702B2 JP 4817702 B2 JP4817702 B2 JP 4817702B2 JP 2005116586 A JP2005116586 A JP 2005116586A JP 2005116586 A JP2005116586 A JP 2005116586A JP 4817702 B2 JP4817702 B2 JP 4817702B2
Authority
JP
Japan
Prior art keywords
optical element
optical
optical system
mirror
deformation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005116586A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006295023A (ja
JP2006295023A5 (https=
Inventor
長植 崔
茂夫 崎野
博仁 伊藤
真司 内田
克巳 浅田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005116586A priority Critical patent/JP4817702B2/ja
Priority to EP06007718A priority patent/EP1712955B1/en
Priority to US11/402,059 priority patent/US7771065B2/en
Priority to KR1020060033401A priority patent/KR100791161B1/ko
Publication of JP2006295023A publication Critical patent/JP2006295023A/ja
Publication of JP2006295023A5 publication Critical patent/JP2006295023A5/ja
Application granted granted Critical
Publication of JP4817702B2 publication Critical patent/JP4817702B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2005116586A 2005-04-14 2005-04-14 光学装置及びそれを備えた露光装置 Expired - Fee Related JP4817702B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005116586A JP4817702B2 (ja) 2005-04-14 2005-04-14 光学装置及びそれを備えた露光装置
EP06007718A EP1712955B1 (en) 2005-04-14 2006-04-12 Optical unit and exposure apparatus having the same
US11/402,059 US7771065B2 (en) 2005-04-14 2006-04-12 Optical unit and exposure apparatus having the same
KR1020060033401A KR100791161B1 (ko) 2005-04-14 2006-04-13 광학장치 및 그것을 구비한 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005116586A JP4817702B2 (ja) 2005-04-14 2005-04-14 光学装置及びそれを備えた露光装置

Publications (3)

Publication Number Publication Date
JP2006295023A JP2006295023A (ja) 2006-10-26
JP2006295023A5 JP2006295023A5 (https=) 2008-05-15
JP4817702B2 true JP4817702B2 (ja) 2011-11-16

Family

ID=36744159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005116586A Expired - Fee Related JP4817702B2 (ja) 2005-04-14 2005-04-14 光学装置及びそれを備えた露光装置

Country Status (4)

Country Link
US (1) US7771065B2 (https=)
EP (1) EP1712955B1 (https=)
JP (1) JP4817702B2 (https=)
KR (1) KR100791161B1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI631430B (zh) 2016-01-19 2018-08-01 佳能股份有限公司 Optical device, projection optical system, exposure device, and article manufacturing method

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002277736A (ja) * 2001-03-21 2002-09-25 Olympus Optical Co Ltd 撮像装置
JP4817702B2 (ja) 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
US7633630B2 (en) * 2006-08-09 2009-12-15 Northrop Grumman Corporation Image amplifying, servo-loop controlled, point diffraction interometer
JP2008112756A (ja) * 2006-10-27 2008-05-15 Canon Inc 光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009004509A (ja) 2007-06-20 2009-01-08 Canon Inc 露光装置およびデバイス製造方法
US7664159B2 (en) * 2007-07-31 2010-02-16 Coherent, Inc. Thermal distortion compensation for laser mirrors
NL1036305A1 (nl) 2007-12-21 2009-06-23 Asml Netherlands Bv Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
NL1036543A1 (nl) * 2008-02-20 2009-08-24 Asml Netherlands Bv Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method.
DE102008049616B4 (de) * 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
DE102009009221A1 (de) 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem
JP5511199B2 (ja) 2009-02-25 2014-06-04 キヤノン株式会社 投影光学系、露光装置、およびデバイス製造方法
WO2010124903A1 (en) * 2009-04-27 2010-11-04 Asml Netherlands B.V. Lithographic apparatus and method
KR102390697B1 (ko) 2013-01-28 2022-04-26 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
TW201443479A (zh) * 2013-05-09 2014-11-16 Hon Hai Prec Ind Co Ltd 微機電系統鏡片及微機電系統反射裝置
JP6168957B2 (ja) * 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6293024B2 (ja) * 2014-09-10 2018-03-14 株式会社ニューフレアテクノロジー 試料高さ検出装置およびパターン検査システム
JP6365156B2 (ja) * 2014-09-11 2018-08-01 株式会社デンソー ３次元形状作成装置
DE102015106184B4 (de) * 2015-04-22 2021-09-02 Friedrich-Schiller-Universität Jena Verfahren zur Formgebung und/oder Formkorrektur mindestens eines optischen Elements
CN105093848B (zh) * 2015-08-06 2018-01-16 武汉华星光电技术有限公司 一种曝光设备
JP6742717B2 (ja) * 2015-12-10 2020-08-19 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
KR102720372B1 (ko) * 2015-12-15 2024-10-23 칼 짜이스 에스엠테 게엠베하 리소그래피 장치용 광학 디바이스 및 리소그래피 장치
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
DE102016219334A1 (de) * 2016-10-06 2017-08-17 Carl Zeiss Smt Gmbh Anordnung und lithographieanlage
JP6598827B2 (ja) * 2017-08-01 2019-10-30 キヤノン株式会社 光学装置、これを用いた露光装置、および物品の製造方法
US11143965B2 (en) * 2019-04-30 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Optical lithography system for patterning semiconductor devices and method of using the same
DE102020210026A1 (de) 2020-08-07 2022-02-10 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit Temperiervorrichtung
DE102020210773B4 (de) * 2020-08-26 2024-04-18 Carl Zeiss Smt Gmbh Optische Baugruppe, Verfahren zur Ansteuerung einer optischen Baugruppe und Projektionsbelichtungsanlage
DE102021205368A1 (de) 2021-05-27 2022-12-01 Carl Zeiss Smt Gmbh Komponente für eine Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Auslegung der Komponente
US12055788B2 (en) * 2021-06-28 2024-08-06 Coherent, Inc. Thermally actuated adaptive optics
JP7589188B2 (ja) * 2022-02-28 2024-11-25 キヤノン株式会社 計測装置、計測方法、リソグラフィ装置及び物品の製造方法
CN114859551B (zh) * 2022-05-19 2023-07-14 中国科学院长春光学精密机械与物理研究所 一种反射式色散系统主动像差校正系统及校正方法
DE102023204312A1 (de) * 2023-05-10 2024-11-14 Carl Zeiss Smt Gmbh Optische Baugruppe

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4744675A (en) * 1986-01-21 1988-05-17 Canon Kabushiki Kaisha Moving mechanism
US4844603A (en) * 1987-12-24 1989-07-04 United Technologies Corporation Cooled flexible mirror arrangement
US4993823A (en) * 1989-06-29 1991-02-19 Eastman Kodak Company Method for correction of distortions of an imaging device
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
US6028376A (en) * 1997-04-22 2000-02-22 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
US7112772B2 (en) * 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
JP4146952B2 (ja) * 1999-01-11 2008-09-10 キヤノン株式会社 露光装置およびデバイス製造方法
US6236490B1 (en) * 2000-01-05 2001-05-22 The B. F. Goodrich Company Dual stage deformable mirror
US6398373B1 (en) * 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
JP4612777B2 (ja) * 2001-03-09 2011-01-12 キヤノン株式会社 移動案内装置、それを用いた露光装置及び半導体デバイス製造方法
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
DE10219514A1 (de) * 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
US6989922B2 (en) * 2002-06-21 2006-01-24 Nikon Corporation Deformable mirror actuation system
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置
US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP4218278B2 (ja) 2002-07-31 2009-02-04 ソニー株式会社 情報処理システム、情報処理装置、情報処理方法、画像処理装置、画像処理方法、およびプログラム
JP2004103740A (ja) * 2002-09-06 2004-04-02 Canon Inc 露光装置
WO2004057407A1 (en) * 2002-12-23 2004-07-08 Bae Systems Plc Deformable mirror
JP4311711B2 (ja) * 2003-02-24 2009-08-12 キヤノン株式会社 露光装置及びデバイス製造方法
JP2004286823A (ja) * 2003-03-19 2004-10-14 Fuji Xerox Co Ltd 光偏向器及びこの光偏向器を備えた光走査装置
EP1513018A1 (en) * 2003-09-04 2005-03-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4817702B2 (ja) 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI631430B (zh) 2016-01-19 2018-08-01 佳能股份有限公司 Optical device, projection optical system, exposure device, and article manufacturing method

Also Published As

Publication number Publication date
EP1712955B1 (en) 2011-06-15
KR100791161B1 (ko) 2008-01-02
US7771065B2 (en) 2010-08-10
JP2006295023A (ja) 2006-10-26
EP1712955A2 (en) 2006-10-18
EP1712955A3 (en) 2007-12-19
US20060232866A1 (en) 2006-10-19
KR20060108523A (ko) 2006-10-18

Similar Documents

Publication Publication Date Title
JP4817702B2 (ja) 光学装置及びそれを備えた露光装置
US7800732B2 (en) Projection exposure method and projection exposure apparatus for microlithography
KR101428136B1 (ko) 마이크로리소그래피용 투사 대물렌즈, 투사 노광 장치, 투사 노광 방법 및 광학 보정 플레이트
KR100599932B1 (ko) 광학 결상 시스템에서의 수차 측정 방법
JP4552337B2 (ja) 投影光学系の製造方法及び露光装置の製造方法
US11181826B2 (en) Projection exposure method and projection exposure apparatus for microlithography
JP3805323B2 (ja) 露光装置、収差低減方法及び光学部材調整機構
JP5105474B2 (ja) 露光装置及びデバイス製造方法
CN102834776A (zh) 具有对由掩模引起的成像像差的校正的操作投射曝光设备的方法
JP4464166B2 (ja) 測定装置を搭載した露光装置
EP2502117A2 (en) Magnification control for lithographic imaging system
JP2005311020A (ja) 露光方法及びデバイス製造方法
JP2002206990A (ja) 波面収差測定方法及び投影露光装置
US6833906B1 (en) Projection exposure apparatus, and device manufacturing method using the same
JP4769448B2 (ja) 干渉計を備えた露光装置及びデバイス製造方法
JP4095598B2 (ja) 二次元波面収差の算出方法
JP4630611B2 (ja) 干渉計を備えた露光装置及び方法、並びに、デバイス製造方法
JP2006245157A (ja) 露光方法及び露光装置
JP2007180152A (ja) 測定方法及び装置、露光装置、並びに、デバイス製造方法
JP4912205B2 (ja) 露光装置及びデバイス製造方法
JP4724558B2 (ja) 測定方法及び装置、露光装置
JP2008112756A (ja) 光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
JP2006279029A (ja) 露光方法及び装置
JP2006196555A (ja) 収差計測方法及び装置、並びに露光方法及び装置
JP2006080444A (ja) 測定装置、テストレチクル、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080328

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080328

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100809

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100817

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101015

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110823

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110830

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140909

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4817702

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140909

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees