JP4788485B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP4788485B2
JP4788485B2 JP2006163197A JP2006163197A JP4788485B2 JP 4788485 B2 JP4788485 B2 JP 4788485B2 JP 2006163197 A JP2006163197 A JP 2006163197A JP 2006163197 A JP2006163197 A JP 2006163197A JP 4788485 B2 JP4788485 B2 JP 4788485B2
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Japan
Prior art keywords
group
acid
resin composition
photosensitive resin
formula
Prior art date
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Application number
JP2006163197A
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English (en)
Japanese (ja)
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JP2007333847A (ja
Inventor
貴清 寺川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2006163197A priority Critical patent/JP4788485B2/ja
Priority to TW96119893A priority patent/TWI468862B/zh
Priority to KR1020070056005A priority patent/KR20070118958A/ko
Priority to CN200710136273.9A priority patent/CN101100543B/zh
Publication of JP2007333847A publication Critical patent/JP2007333847A/ja
Application granted granted Critical
Publication of JP4788485B2 publication Critical patent/JP4788485B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2006163197A 2006-06-13 2006-06-13 着色感光性樹脂組成物 Active JP4788485B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006163197A JP4788485B2 (ja) 2006-06-13 2006-06-13 着色感光性樹脂組成物
TW96119893A TWI468862B (zh) 2006-06-13 2007-06-04 色彩化光敏性樹脂組成物
KR1020070056005A KR20070118958A (ko) 2006-06-13 2007-06-08 착색 감광성 수지 조성물
CN200710136273.9A CN101100543B (zh) 2006-06-13 2007-06-11 着色光敏树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006163197A JP4788485B2 (ja) 2006-06-13 2006-06-13 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2007333847A JP2007333847A (ja) 2007-12-27
JP4788485B2 true JP4788485B2 (ja) 2011-10-05

Family

ID=38933405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006163197A Active JP4788485B2 (ja) 2006-06-13 2006-06-13 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP4788485B2 (zh)
KR (1) KR20070118958A (zh)
CN (1) CN101100543B (zh)
TW (1) TWI468862B (zh)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101401763B1 (ko) * 2007-12-28 2014-05-30 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용한 컬러필터 및 상기 컬러필터를 포함하는 평판표시장치
JP5294698B2 (ja) * 2008-05-16 2013-09-18 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色感光性樹脂組成物およびカラーフィルタ
TWI455984B (zh) * 2008-05-30 2014-10-11 Sumitomo Chemical Co 著色硬化性組成物
JP2010039481A (ja) * 2008-07-11 2010-02-18 Sumitomo Chemical Co Ltd 感光性樹脂組成物
CN101625525B (zh) * 2008-07-11 2013-06-12 住友化学株式会社 感光性树脂组合物
TWI456346B (zh) * 2008-07-11 2014-10-11 Sumitomo Chemical Co 感光性樹脂組成物
TWI608294B (zh) * 2008-10-30 2017-12-11 住友化學股份有限公司 感光性樹脂組成物
TWI521300B (zh) * 2008-11-18 2016-02-11 Sumitomo Chemical Co Photosensitive resin composition and display device
JP5660774B2 (ja) * 2009-11-04 2015-01-28 住友化学株式会社 着色感光性樹脂組成物、塗膜、パターン及び表示装置
JP5526868B2 (ja) * 2010-03-03 2014-06-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、表示素子のスペーサーおよび保護膜ならびにそれらの形成方法
JP2011209594A (ja) * 2010-03-30 2011-10-20 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5765059B2 (ja) * 2010-08-16 2015-08-19 Jsr株式会社 着色組成物、着色組成物の製造方法、着色パターン、カラーフィルタ、カラー表示素子及びカラーフィルタの製造方法
TWI570509B (zh) * 2010-10-05 2017-02-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5771944B2 (ja) * 2010-10-18 2015-09-02 Jsr株式会社 カラーフィルタの製造方法
JP2012159566A (ja) * 2011-01-31 2012-08-23 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2012159567A (ja) * 2011-01-31 2012-08-23 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP5919830B2 (ja) * 2011-02-08 2016-05-18 住友化学株式会社 着色感光性樹脂組成物
JP6019596B2 (ja) * 2011-03-08 2016-11-02 住友化学株式会社 着色感光性樹脂組成物
JP6094050B2 (ja) * 2011-04-15 2017-03-15 住友化学株式会社 着色感光性樹脂組成物
WO2013187493A1 (ja) * 2012-06-11 2013-12-19 住友化学株式会社 着色感光性樹脂組成物
JP6158636B2 (ja) * 2012-08-10 2017-07-05 株式会社日本触媒 硬化性樹脂組成物及びその用途
TWI603983B (zh) 2012-08-10 2017-11-01 Nippon Shokubai Co Ltd Hardening resin composition and its use
KR101658374B1 (ko) * 2013-01-25 2016-09-22 롬엔드하스전자재료코리아유한회사 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물
KR101359470B1 (ko) * 2013-03-08 2014-02-12 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조된 스페이서
KR102352992B1 (ko) 2014-03-18 2022-01-19 제이에스알 가부시끼가이샤 감방사선성 조성물, 경화막, 표시 소자 및 착색제 분산액
JP6495769B2 (ja) 2014-07-18 2019-04-03 株式会社日本触媒 硬化性樹脂組成物及びその用途
CN104530313B (zh) * 2014-12-15 2018-12-25 京东方科技集团股份有限公司 染料化合物及其制备方法、着色剂、感光树脂组合物、滤光片
WO2019142415A1 (ja) * 2018-01-19 2019-07-25 昭和電工株式会社 カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
WO2021182232A1 (ja) 2020-03-09 2021-09-16 株式会社ダイセル 感光性樹脂組成物、硬化物、カラーフィルタ、表示装置用部材、及び表示装置
WO2022210596A1 (ja) 2021-04-02 2022-10-06 株式会社ダイセル 感光性樹脂組成物、硬化物、カラーフィルタ、及び表示装置用部材又は表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63221123A (ja) * 1987-03-09 1988-09-14 Kansai Paint Co Ltd 低温硬化性樹脂組成物
GB2219591B (en) * 1988-05-17 1992-01-22 Kansai Paint Co Ltd Radiation curable unsaturated resin
JP3255042B2 (ja) * 1996-02-29 2002-02-12 三菱化学株式会社 感光性平版印刷版用光重合性組成物及びこれを用いた感光性平版印刷版
JPH10316721A (ja) * 1997-05-15 1998-12-02 Nippon Steel Chem Co Ltd アルカリ可溶性樹脂及びそれを用いた画像形成用材料
JP3055495B2 (ja) * 1997-06-23 2000-06-26 日本電気株式会社 感光性樹脂組成物およびそれを用いたパターン形成方法
JP2003149810A (ja) * 2001-08-28 2003-05-21 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
TW574613B (en) * 2001-08-28 2004-02-01 Sumitomo Chemical Co Colored photosensitive resin composition
JP4182887B2 (ja) * 2003-02-07 2008-11-19 三菱化学株式会社 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
WO2004081070A1 (ja) * 2003-02-07 2004-09-23 Mitsubishi Chemical Corporation 着色樹脂組成物、カラーフィルタ、および液晶表示装置
JP4501665B2 (ja) * 2004-12-14 2010-07-14 住友化学株式会社 感光性樹脂組成物
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP4710703B2 (ja) * 2006-04-21 2011-06-29 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Also Published As

Publication number Publication date
TW200809409A (en) 2008-02-16
JP2007333847A (ja) 2007-12-27
TWI468862B (zh) 2015-01-11
CN101100543B (zh) 2014-04-16
CN101100543A (zh) 2008-01-09
KR20070118958A (ko) 2007-12-18

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