JP4752766B2 - 酸無水物系エポキシ樹脂硬化剤の製造方法、酸無水物系エポキシ樹脂硬化剤、エポキシ樹脂組成物、その硬化物及び光半導体装置 - Google Patents
酸無水物系エポキシ樹脂硬化剤の製造方法、酸無水物系エポキシ樹脂硬化剤、エポキシ樹脂組成物、その硬化物及び光半導体装置 Download PDFInfo
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- JP4752766B2 JP4752766B2 JP2006548773A JP2006548773A JP4752766B2 JP 4752766 B2 JP4752766 B2 JP 4752766B2 JP 2006548773 A JP2006548773 A JP 2006548773A JP 2006548773 A JP2006548773 A JP 2006548773A JP 4752766 B2 JP4752766 B2 JP 4752766B2
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- epoxy resin
- acid anhydride
- curing agent
- polyester resin
- resin curing
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- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000004065 semiconductor Substances 0.000 title claims description 12
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- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
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- 229910052762 osmium Inorganic materials 0.000 description 1
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- 229910052763 palladium Inorganic materials 0.000 description 1
- WATYAKBWIQTPDE-UHFFFAOYSA-N pentane-2,4-dione;zinc Chemical compound [Zn].CC(=O)CC(C)=O WATYAKBWIQTPDE-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- XRVCFZPJAHWYTB-UHFFFAOYSA-N prenderol Chemical compound CCC(CC)(CO)CO XRVCFZPJAHWYTB-UHFFFAOYSA-N 0.000 description 1
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- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4215—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
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- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/91—Polymers modified by chemical after-treatment
- C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/916—Dicarboxylic acids and dihydroxy compounds
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H01L23/00—Details of semiconductor or other solid state devices
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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Description
また、本発明は、上記製造方法により得られる酸無水物系エポキシ樹脂硬化剤に関する。
また、本発明は、エポキシ樹脂及び上記製造方法により得られる酸無水物系エポキシ樹脂硬化剤を含むエポキシ樹脂組成物に関する。
また、本発明は、上記エポキシ樹脂組成物を硬化させた硬化物に関する。
さらに、本発明は、上記硬化物にて光半導体素子が封止された光半導体装置に関する。
本願の開示は、2004年12月21日に出願された特願2004−369323号に記載の主題と関連しており、それらの開示内容は引用によりここに援用される。
撹拌機、温度計及び還流冷却器を備えた反応容器に1,4−シクロヘキサンジカルボン酸172重量部、ネオペンチルグリコール208重量部、テトラブチルチタネート0.1重量部を仕込んで160℃になるまで加熱し、さらに160℃から250℃まで4時間かけて昇温した。次いで1時間かけて5mmHgまで減圧し、さらに0.3mmHg以下まで減圧してから250℃で1時間反応させ、ポリエステル樹脂(I)を得た。
撹拌機、温度計及びガス導入管を備えた容器にポリエステル樹脂(I)20重量部及び多価カルボン酸無水物として4−メチルヘキサヒドロ無水フタル酸(HN−7000:日立化成工業株式会社製)80重量部を仕込み、窒素ガスを吹き込みながら110℃で45分間撹拌して完全に均一に溶解させ、混合物(I)を得た。
誘導撹拌式オートクレーブに混合物(I)100重量部及び水素化触媒として5重量%パラジウム/炭素触媒0.3重量部を仕込み、オートクレーブ内を窒素で置換した。さらにオートクレーブ内を水素で置換した後、80℃/3MPaで9時間加熱した。加熱後、冷却し、次いで5C濾紙を用いて濾過することにより水素化触媒を除去して酸無水物系エポキシ樹脂硬化剤(I)を得た。
酸無水物系エポキシ樹脂硬化剤(I)140重量部に対して3’,4’−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P エポキシ当量138(g/eq):ダイセル化学工業株式会社製)100重量部、硬化促進剤としてテトラ−n−ブチルホスホニウムo,o−ジエチルホスホロジチオネート(ヒシコーリンPX−4ET:日本化学工業株式会社製)1重量部、安定剤として9,10−ジヒドロ−9−ホスファ−10−オキサフェナンスレン−9−オキシド(HCA:三光化学株式会社製)1重量部、可撓化剤としてエチレングリコール4重量部を加え、80℃に加熱して撹拌し、均一に溶解させてエポキシ樹脂組成物(I)を得た。
エポキシ樹脂組成物(I)を減圧下で十分に脱泡させてから、金属製のクリップを中央に置いた金属製シャーレに静かに注入し、120℃で1時間加熱した後にさらに150℃で4時間加熱して、直径60mm、厚さ10mmの円盤状の硬化物(I)を得た。
4−メチルヘキサヒドロ無水フタル酸(HN−7000:日立化成工業株式会社製)101重量部、テトラヒドロ無水フタル酸61重量部、ネオペンチルグリコール120重量部、エチレングリコール19重量部、テトラブチルチタネート0.06重量部を用いて実施例1と同様の方法にて合成を行い、ポリエステル樹脂(II)を得た。
撹拌機、温度計及びガス導入管を備えた容器にポリエステル樹脂(II)30重量部及び多価カルボン酸無水物としてメチルヘキサヒドロ無水フタル酸(HN−5500:日立化成工業株式会社製)70重量部を仕込み、窒素ガスを吹き込みながら110℃で1時間撹拌して完全に均一に溶解させ、混合物(II)を得た。
誘導撹拌式オートクレーブに混合物(II)100重量部及び水素化触媒として5重量%パラジウム/炭素触媒0.3重量部を仕込み、オートクレーブ内を窒素で置換した。さらにオートクレーブ内を水素で置換した後、110℃/5MPaで8時間加熱した。加熱後、冷却し、次いで5C濾紙を用いて濾過することにより水素化触媒を除去して酸無水物系エポキシ樹脂硬化剤(II)を得た。
以下、実施例1と同様にしてエポキシ樹脂組成物(II)及び硬化物(II)を得た。
1,2−シクロヘキサンジカルボン酸52重量部、イソフタル酸83重量部、セバシン酸40重量部、ネオペンチルグリコール120重量部、1,6−ヘキサンジオール12重量部、テトラブチルチタネート0.06重量部を用いて実施例1と同様の方法にて合成を行い、ポリエステル樹脂(III)を得た。
撹拌機、温度計及びガス導入管を備えた容器にポリエステル樹脂(III)30重量部及び多価カルボン酸無水物としてメチルヘキサヒドロ無水フタル酸(HN−5500:日立化成工業株式会社製)70重量部を仕込み、窒素ガスを吹き込みながら110℃で40分間撹拌して完全に均一に溶解させ、混合物(III)を得た。
誘導撹拌式オートクレーブに混合物(III)100重量部及び水素化触媒として5重量%ロジウム/炭素触媒0.5重量部を仕込み、オートクレーブ内を窒素で置換した。さらにオートクレーブ内を水素で置換した後、80℃/8MPaで8時間加熱した。加熱後、冷却し、次いで5C濾紙を用いて濾過することにより水素化触媒を除去して酸無水物系エポキシ樹脂硬化剤(III)を得た。
以下、実施例1と同様にしてエポキシ樹脂組成物(III)及び硬化物(III)を得た。
実施例1と同様にして混合物(I)を調製し、これを5C濾紙を用いて濾過して酸無水物系エポキシ樹脂硬化剤(IV)を得た。
以下、実施例1と同様にしてエポキシ樹脂組成物(IV)及び硬化物(IV)を得た。
4−メチルヘキサヒドロ無水フタル酸(HN−7000:日立化成工業株式会社製)をそのまま酸無水物系エポキシ樹脂硬化剤(V)とした。
以下、実施例1と同様にしてエポキシ樹脂組成物(V)及び硬化物(V)を得た。
酸成分組成及びジオール成分組成:1H−NMRにより分析した。
数平均分子量:ゲルパーミエーションクロマトグラフィー法により測定した。
カラム:ゲルパックGL−A100M(日立化成工業株式会社製)を2本直列に接続
溶離液:テトラヒドロフラン(流量1.0ml/分)
RI検出器:Shodex SE−61
標準ポリスチレン:PS706
色相:JIS K 0071−1に示されたハーゼン単位色数を用いる方法により測定した。
外観:目視により判定した。
クラック:硬化物を−30℃で20時間放置した後、室温で10時間放置し、クラック発生の有無を目視で確認した。
A:クラック無し
B:クラック有り
ガラス転移温度:硬化物から2mm×5mm×5mmの試料を切り出し、機械的熱分析(TMA)により測定した。
測定装置:SSC−5200(セイコー電子工業株式会社製)
測定条件:荷重20g/毎分5℃加熱
Claims (11)
- 多価カルボン酸無水物及びポリエステル樹脂を含む混合物を、水素ガス及び水素化触媒の存在下で加熱する工程を含むことを特徴とする酸無水物系エポキシ樹脂硬化剤の製造方法。
- ポリエステル樹脂が、下記の一般式(2)〜(4)のいずれかで表される構成単位を少なくとも一種類以上含む請求項1または請求項2に記載の酸無水物系エポキシ樹脂硬化剤の製造方法。
- ポリエステル樹脂が、一般式(2)〜(4)のいずれかで表される構成単位を、合計して20mol%以上含む請求項1ないし請求項3のいずれかに記載の酸無水物系エポキシ樹脂硬化剤の製造方法。
- ポリエステル樹脂の数平均分子量が、3,000〜100,000である請求項1ないし請求項4のいずれかに記載の酸無水物系エポキシ樹脂硬化剤の製造方法。
- ポリエステル樹脂の含有量が、多価カルボン酸無水物及びポリエステル樹脂を含む混合物全体に対して1〜60重量%である請求項1ないし請求項5のいずれかに記載の酸無水物系エポキシ樹脂硬化剤の製造方法。
- 水素化触媒が、鉄族元素または白金族元素を含む請求項1ないし請求項6のいずれかに記載の酸無水物系エポキシ樹脂硬化剤の製造方法。
- 請求項1ないし請求項7のいずれかに記載の方法により得られる酸無水物系エポキシ樹脂硬化剤。
- エポキシ樹脂及び請求項1ないし請求項7のいずれかに記載の方法により得られる酸無水物系エポキシ樹脂硬化剤を含むエポキシ樹脂組成物。
- 請求項9に記載のエポキシ樹脂組成物を硬化させた硬化物。
- 請求項10に記載の硬化物にて光半導体素子が封止された光半導体装置。
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CN101910239B (zh) * | 2008-01-09 | 2013-11-06 | 日立化成工业株式会社 | 热固化性树脂组合物、环氧树脂成形材料及多元羧酸缩合体 |
US8637593B2 (en) | 2008-01-09 | 2014-01-28 | Hitachi Chemical Company, Ltd. | Thermosetting resin composition, epoxy resin molding material, and polyvalent carboxylic acid condensate |
CN102206325B (zh) * | 2010-03-31 | 2012-09-05 | 朱瑞澄 | 一种耐热增韧甲基四氢苯酐的改性方法 |
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JP2015199904A (ja) * | 2014-04-03 | 2015-11-12 | 日本化薬株式会社 | 熱硬化性樹脂用硬化剤、それを用いた熱硬化性樹脂組成物、およびその熱硬化性樹脂組成物を封止材あるいは反射材として使用した光半導体装置 |
KR20180065162A (ko) * | 2016-12-07 | 2018-06-18 | 서울바이오시스 주식회사 | 디스플레이 장치 및 그의 전극 연결 방법 |
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MY141748A (en) | 2010-06-30 |
TW200628509A (en) | 2006-08-16 |
JPWO2006067955A1 (ja) | 2008-06-12 |
CN101072808B (zh) | 2010-08-11 |
CN101072808A (zh) | 2007-11-14 |
US20090250825A1 (en) | 2009-10-08 |
US7790812B2 (en) | 2010-09-07 |
KR100877281B1 (ko) | 2009-01-07 |
KR20070086046A (ko) | 2007-08-27 |
TWI369369B (en) | 2012-08-01 |
WO2006067955A1 (ja) | 2006-06-29 |
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