JP4750043B2 - 光学素子のための交換装置 - Google Patents
光学素子のための交換装置 Download PDFInfo
- Publication number
- JP4750043B2 JP4750043B2 JP2006545958A JP2006545958A JP4750043B2 JP 4750043 B2 JP4750043 B2 JP 4750043B2 JP 2006545958 A JP2006545958 A JP 2006545958A JP 2006545958 A JP2006545958 A JP 2006545958A JP 4750043 B2 JP4750043 B2 JP 4750043B2
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- objective
- lithographic
- lithography
- replaced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 128
- 238000001459 lithography Methods 0.000 claims description 43
- 230000003014 reinforcing effect Effects 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 210000001747 pupil Anatomy 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000011343 solid material Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Description
さらに、プロジェクションオブジェクティブにおいては、鏡筒が支持構造に支持され、鏡筒ごと交換されうる。これを実現するためには、オブジェクティブ全体の構造を解体することが必要になる。
リソグラフィオブジェクティブ内のレンズ、ミラー等の光学素子が時の経過と共に変質してリソグラフィオブジェクティブの性能を低下させ、リソグラフィオブジェクティブに見込まれた寿命を達成できなくなる場合には、リソグラフィオブジェクティブの中から適切に選ばれた1つの光学素子を取り外し、その代用として、適切に機械加工された、1つの新しい光学素子を挿入して、他の光学素子による結像誤差を補償できるとよい。この目的のために、最下位の光学素子を交換する従来の方法と装置は適さない。
図1は、ハウジング1aを備えたリソグラフィオブジェクティブに対して、複数の光学素子2、例えば、レンズ、プレート又はミラー、が、周知の方法で配置された状態を示している。図1に示されたリソグラフィオブジェクティブ1内における光学素子2の配置は、あくまで一例である。リソグラフィオブジェクティブ1は、任意のタイプのリソグラフィにも適していると共に、図には露光装置の全体像は示されていないが露光装置の一部とすることもできる。図示されているリソグラフィオブジェクティブ1を使用することで、下記に記載されているように、それぞれのマウント3によってリソグラフィオブジェクティブ1に交換されることなく持続的に取付けられた2つの隣接する光学素子2の間に設置又は保持された1つの光学素子2aを交換することが可能になる。同様にレンズ、プレート又はミラーであることが好ましい交換可能な光学素子2aは、図2の断面図で確認できるようにリソグラフィオブジェクティブ1の瞳孔領域(pupil region)に配置されていることが望ましい。その結果、交換可能な光学素子2aは他の光学素子2に比べて著しく小さい直径を有するように設計されている。しかし、交換可能な光学素子2aは、リソグラフィオブジェクティブ1に設置されている2つの隣接する光学素子2の間における他の場所に位置することもできる。
Claims (16)
- リソグラフィオブジェクティブであって、
複数の光学素子と、
2つの隣接する光学素子の間に取付けられる1つの光学素子のための少なくとも1つの交換装置と、
リソグラフィオブジェクティブにおけるハウジングの側面にある開口を通って、リソグラフィオブジェクティブ内に移動できる、光学素子を交換するためのホルダーと、
を有し、
交換される前記光学素子が、前記リソグラフィオブジェクティブ内における保持構造の上に3点支持により配置され、
前記保持構造が、前記光学素子を、前記リソグラフィオブジェクティブの光軸方向整列させるため、あるいは、前記光学素子を傾斜させるための少なくとも1つの作動装置を有することを特徴とする、リソグラフィオブジェクティブ。 - 交換される前記光学素子が2つの交換されない光学素子の間に配置されていることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 交換される前記光学素子が補強部材に接続され、前記補強部材は、交換される前記光学素子とともに移動可能なことを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記補強部材は、実質上、交換される前記光学素子と同一の光学材料で構成されていることを特徴とする、請求項3記載のリソグラフィオブジェクティブ。
- 前記補強部材が、リンギング(wringing)により、交換される前記光学素子に接続されることを特徴とする、請求項3記載のリソグラフィオブジェクティブ。
- 前記補強部材が、接着により、交換される前記光学素子に接続されることを特徴とする、請求項3記載のリソグラフィオブジェクティブ。
- 前記保持構造が前記リソグラフィオブジェクティブ内のマウントに保持されることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 交換される前記光学素子に対し光軸方向に作用する少なくとも1つのスプリング部材が前記リソグラフィオブジェクティブ内に配置されることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記ハウジングにある前記開口はシールによって閉じることが可能であることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記シールは固定物シール(solid material seal)又はガスケットであることを特徴とする、請求項9記載のリソグラフィオブジェクティブ。
- 前記シールはガスシールであることを特徴とする、請求項9記載のリソグラフィオブジェクティブ。
- 前記ホルダーは、交換される前記光学素子のためのガイドを有することを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記交換装置は、当該リソグラフィオブジェクティブの瞳孔領域(pupil region)に配置されることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記ホルダーは、交換される前記光学素子の交換の後も当該リソグラフィオブジェクティブ内に留まることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 前記ホルダーは、交換される前記光学素子が交換された後、当該リソグラフィオブジェクティブから取り出されることを特徴とする、請求項1記載のリソグラフィオブジェクティブ。
- 請求項1に記載のリソグラフィオブジェクティブを用いることによる微細構造部品の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10361441.9 | 2003-12-23 | ||
DE10361441 | 2003-12-23 | ||
PCT/EP2004/013576 WO2005064404A1 (en) | 2003-12-23 | 2004-11-30 | Replacement apparatus for an optical element |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007515797A JP2007515797A (ja) | 2007-06-14 |
JP2007515797A5 JP2007515797A5 (ja) | 2008-01-24 |
JP4750043B2 true JP4750043B2 (ja) | 2011-08-17 |
Family
ID=34673078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006545958A Expired - Fee Related JP4750043B2 (ja) | 2003-12-23 | 2004-11-30 | 光学素子のための交換装置 |
Country Status (8)
Country | Link |
---|---|
US (8) | US7265917B2 (ja) |
EP (1) | EP1700167B1 (ja) |
JP (1) | JP4750043B2 (ja) |
KR (1) | KR101116999B1 (ja) |
CN (2) | CN101614967B (ja) |
AT (1) | ATE405866T1 (ja) |
DE (1) | DE602004016048D1 (ja) |
WO (1) | WO2005064404A1 (ja) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005054953A2 (en) * | 2003-11-24 | 2005-06-16 | Carl-Zeiss Smt Ag | Holding device for an optical element in an objective |
US7265917B2 (en) * | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
US7986472B2 (en) * | 2005-05-31 | 2011-07-26 | Carl Zeiss SMT, AG. | Optical element module |
WO2007022922A2 (de) * | 2005-08-23 | 2007-03-01 | Carl Zeiss Smt Ag | Austauschvorrichtung für ein optisches element |
DE102005060622A1 (de) * | 2005-12-19 | 2007-04-19 | Carl Zeiss Smt Ag | Montagevorrichtung für eine optische Einrichtung |
US7724351B2 (en) | 2006-01-30 | 2010-05-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and exchangeable optical element |
EP2035897B1 (en) * | 2006-07-03 | 2015-10-28 | Carl Zeiss SMT GmbH | Method for revising or repairing a lithographic projection objective |
DE102006038455A1 (de) | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
DE102006046675A1 (de) * | 2006-09-29 | 2008-04-03 | Carl Zeiss Smt Ag | Mikrolithopraphische Projektionsbelichtungsanlage |
DE102006050835A1 (de) * | 2006-10-27 | 2008-05-08 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zum Austausch von Objetkivteilen |
JP5154564B2 (ja) * | 2006-12-01 | 2013-02-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 像収差を低減するための交換可能で操作可能な補正構成を有する光学システム |
DE102007009867A1 (de) * | 2007-02-28 | 2008-09-11 | Carl Zeiss Smt Ag | Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu |
WO2008113605A2 (de) * | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | Verfahren zum verbessern von abbildungseigenschaften eines optischen systems sowie derartiges optisches system |
JP5063224B2 (ja) * | 2007-07-03 | 2012-10-31 | キヤノン株式会社 | 投射レンズ及び画像投射装置 |
US8379334B2 (en) * | 2008-06-17 | 2013-02-19 | Konica Minolta Opto, Inc. | Lens driving device and camera unit |
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
JP2010097986A (ja) * | 2008-10-14 | 2010-04-30 | Nikon Corp | 投影光学系、露光装置、及びデバイス製造方法 |
EP2649478B1 (en) | 2010-12-10 | 2020-05-27 | 3M Innovative Properties Company | Glare reducing glazing articles |
NL2007392C2 (en) | 2011-09-12 | 2013-03-13 | Mapper Lithography Ip Bv | Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly. |
USD734471S1 (en) * | 2013-09-02 | 2015-07-14 | Ocuspecto Oy | Eye testing apparatus |
EP3041412A1 (en) | 2013-09-02 | 2016-07-13 | Ocuspecto OY | Testing and determining a threshold value |
USD738510S1 (en) * | 2014-10-02 | 2015-09-08 | Carl Zeiss Meditec, Inc. | Ophthalmic device |
CN105467548B (zh) * | 2015-12-04 | 2018-05-01 | 中国科学院长春光学精密机械与物理研究所 | 高定位精度的镜片可更换的光刻物镜镜框 |
US10811044B2 (en) * | 2018-07-19 | 2020-10-20 | Western Digital Technologies, Inc. | In-pivot stepper motor for ball screw cam elevator mechanism for cold storage data storage device |
US11031037B1 (en) | 2020-06-12 | 2021-06-08 | Western Digital Technologies, Inc. | System for disk-to-disk access for reduced-head data storage device |
CN114994852B (zh) * | 2022-06-21 | 2024-03-26 | 云从科技集团股份有限公司 | 镜头安装结构、摄像机及售货柜 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177008A (ja) * | 1992-12-01 | 1994-06-24 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
JPH06177007A (ja) * | 1992-12-01 | 1994-06-24 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
JPH07161622A (ja) * | 1993-12-10 | 1995-06-23 | Nikon Corp | 投影露光装置 |
JPH09199390A (ja) * | 1996-01-16 | 1997-07-31 | Hitachi Ltd | パターン形成方法、投影露光装置および半導体装置の製造方法 |
JP2001077003A (ja) * | 1999-09-02 | 2001-03-23 | Nikon Corp | 露光装置 |
Family Cites Families (136)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US658570A (en) * | 1900-04-16 | 1900-09-25 | Adams & Westlake Co | Pressure-regulator. |
US3077958A (en) | 1961-09-05 | 1963-02-19 | United Aircraft Corp | Zero thermal expansion device |
US3802781A (en) | 1972-08-15 | 1974-04-09 | D Wright | Extensometers |
US3837125A (en) | 1973-09-04 | 1974-09-24 | Celestron Pacific | Method and system for making schmidt corrector lenses |
US3917385A (en) | 1973-09-19 | 1975-11-04 | Rockwell International Corp | Simplified micropositioner |
US3879105A (en) | 1974-04-04 | 1975-04-22 | Jenoptik Jena Gmbh | Telescope with an image reversing system |
US4060315A (en) | 1975-07-07 | 1977-11-29 | Rockwell International Corporation | Precision mirror mount |
US4038971A (en) | 1975-10-22 | 1977-08-02 | Bezborodko Joseph A I B | Concave, mirrored solar collector |
DE2609312A1 (de) * | 1976-03-06 | 1977-09-15 | Basf Ag | Neue pyridyl-phosphorsaeurederivate |
US4092518A (en) | 1976-12-07 | 1978-05-30 | Laser Technique S.A. | Method of decorating a transparent plastics material article by means of a laser beam |
US4135778A (en) | 1976-12-15 | 1979-01-23 | Lincoln Associates, Inc. | Microscope lens system |
US4195913A (en) | 1977-11-09 | 1980-04-01 | Spawr Optical Research, Inc. | Optical integration with screw supports |
US4162120A (en) | 1977-12-02 | 1979-07-24 | Ford Aerospace & Communications Corp. | Thermal compensator linkage |
US4236296A (en) | 1978-10-13 | 1980-12-02 | Exxon Research & Engineering Co. | Etch method of cleaving semiconductor diode laser wafers |
US4277141A (en) | 1979-03-28 | 1981-07-07 | Tropel, Inc. | Multifaceted mirror and assembly fixture and method of making such mirror |
US4202605A (en) | 1979-04-05 | 1980-05-13 | Rockwell International Corporation | Active segmented mirror |
US4226507A (en) | 1979-07-09 | 1980-10-07 | The Perkin-Elmer Corporation | Three actuator deformable specimen |
US4295710A (en) | 1979-09-04 | 1981-10-20 | Rockwell International Corporation | Deformable mirror with dither |
JPS57624A (en) | 1980-06-03 | 1982-01-05 | Nippon Kogaku Kk <Nikon> | Albada type reverse-galilean finder |
US4380391A (en) | 1980-09-30 | 1983-04-19 | The United States Of America As Represented By The Secretary Of The Army | Short pulse CO2 laser for ranging and target identification |
US4403421A (en) | 1980-11-13 | 1983-09-13 | Shepherd Daniel R | Telescopic gun sight |
US4408874A (en) | 1981-05-07 | 1983-10-11 | Computervision Corporation | Projection aligner with specific means for bending mirror |
US4389115A (en) | 1981-08-06 | 1983-06-21 | Richter Thomas A | Optical system |
US4471454A (en) * | 1981-10-27 | 1984-09-11 | Ibm Corporation | Fast, efficient, small adder |
JPS60168625A (ja) * | 1984-02-13 | 1985-09-02 | Ekuseru Kk | 複合材質を備えた中空成形品の製造方法とその装置 |
DE3323828C2 (de) | 1983-07-01 | 1986-01-16 | Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn | Laserwarnsensor |
US4871237A (en) | 1983-07-27 | 1989-10-03 | Nikon Corporation | Method and apparatus for adjusting imaging performance of projection optical apparatus |
JPS60219744A (ja) | 1984-04-17 | 1985-11-02 | Canon Inc | 投影露光装置 |
JP2516194B2 (ja) | 1984-06-11 | 1996-07-10 | 株式会社日立製作所 | 投影露光方法 |
ATE75856T1 (de) | 1985-03-01 | 1992-05-15 | Night Vision General Partnersh | Kompakte nachtsichtbrille. |
US4969726A (en) | 1985-06-03 | 1990-11-13 | Northrop Corporation | Ring laser gyro path-length-control mechanism |
US4672439A (en) | 1985-09-04 | 1987-06-09 | Texas Instruments Incorporated | FLIR imager with hybrid optical/electronic processor |
DE3544429A1 (de) | 1985-12-16 | 1987-06-19 | Juwedor Gmbh | Verfahren zur galvanoplastischen herstellung von schmuckwaren |
US4953965A (en) | 1985-12-26 | 1990-09-04 | Toshiba Machine Company, Ltd. | High-accuracy traveling table apparatus |
US4705369A (en) | 1986-03-21 | 1987-11-10 | The United States Of America As Represented By The United States Department Of Energy | Mirror mount |
US4722592A (en) | 1986-12-29 | 1988-02-02 | The United States Of America As Represented By The Secretary Of The Army | Motorized-axis-angular fine adjustment prism mount |
US4740276A (en) | 1987-05-08 | 1988-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Fabrication of cooled faceplate segmented aperture mirrors (SAM) by electroforming |
US4849668A (en) | 1987-05-19 | 1989-07-18 | Massachusetts Institute Of Technology | Embedded piezoelectric structure and control |
AT393925B (de) | 1987-06-02 | 1992-01-10 | Ims Ionen Mikrofab Syst | Anordnung zur durchfuehrung eines verfahrens zum positionieren der abbildung der auf einer maske befindlichen struktur auf ein substrat, und verfahren zum ausrichten von auf einer maske angeordneten markierungen auf markierungen, die auf einem traeger angeordnet sind |
US4932778A (en) | 1987-06-22 | 1990-06-12 | Pioneer Data Processing, Inc. | Autokinesis free optical instrument |
US4865454A (en) | 1987-11-24 | 1989-09-12 | Kaman Aerospace Corporation | Adaptive optical system with synchronous detection of wavefront phase |
US4826304A (en) | 1988-04-11 | 1989-05-02 | Gte Government Systems Corporation | Adjustable optical mounting assembly |
US4932770A (en) | 1988-12-20 | 1990-06-12 | Caravaty Raymond D | Dual plane rear vision mirror |
US5026977A (en) | 1989-04-05 | 1991-06-25 | The Charles Stark Draper Laboratory, Inc. | Wavefront sensing and correction with deformable mirror |
US4959531A (en) | 1989-09-29 | 1990-09-25 | Eastman Kodak Company | Alignment sensing and correcting assembly for an optical element |
FR2656079B1 (fr) | 1989-12-20 | 1994-05-06 | Etat Francais Delegue Armement | Lunette episcopique modulable et reconfigurable. |
US5074654A (en) | 1990-08-22 | 1991-12-24 | Litton Systems, Inc. | Hydraulic actuators for optical systems |
US5079414A (en) | 1990-10-09 | 1992-01-07 | Gte Government Systems Corporation | Tracking telescope using an atomic resonance filter |
NL9100421A (nl) | 1991-03-08 | 1992-10-01 | Asm Lithography Bv | Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting. |
US5132979A (en) | 1991-08-16 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Laser frequency modulator for modulating a laser cavity |
US5428482A (en) | 1991-11-04 | 1995-06-27 | General Signal Corporation | Decoupled mount for optical element and stacked annuli assembly |
US5157555A (en) | 1991-12-04 | 1992-10-20 | General Electric Company | Apparatus for adjustable correction of spherical aberration |
NL9200418A (nl) | 1992-03-06 | 1993-10-01 | Lely Nv C Van Der | Inrichting voor het melken van dieren. |
US5210650A (en) | 1992-03-31 | 1993-05-11 | Eastman Kodak Company | Compact, passively athermalized optical assembly |
US5438451A (en) | 1992-09-25 | 1995-08-01 | Schweizer; Bruno | Linearly fine-adjustable stage |
US5400184A (en) | 1992-10-29 | 1995-03-21 | The United States Of America As Represented By The United States Department Of Energy | Kinematic high bandwidth mirror mount |
US5414557A (en) | 1992-11-30 | 1995-05-09 | Itt Corporation | Reticle apparatus for night vision devices |
US6252334B1 (en) | 1993-01-21 | 2001-06-26 | Trw Inc. | Digital control of smart structures |
JP3463335B2 (ja) * | 1994-02-17 | 2003-11-05 | 株式会社ニコン | 投影露光装置 |
JPH0786152A (ja) * | 1993-09-14 | 1995-03-31 | Nikon Corp | 投影露光装置 |
US5485053A (en) | 1993-10-15 | 1996-01-16 | Univ America Catholic | Method and device for active constrained layer damping for vibration and sound control |
US5537262A (en) | 1993-10-19 | 1996-07-16 | Asahi Kogaku Kogyo Kabushiki Kaisha | Rotational torque setting apparatus for screw mechanism |
JP2891074B2 (ja) | 1993-12-10 | 1999-05-17 | 三菱電機株式会社 | 反射鏡固定装置 |
US5484053A (en) * | 1994-06-22 | 1996-01-16 | Riverwood International Corporation | Basket-style clip carrier |
US6154000A (en) | 1994-09-07 | 2000-11-28 | Omnitek Research & Development, Inc. | Apparatus for providing a controlled deflection and/or actuator apparatus |
US5529277A (en) | 1994-09-20 | 1996-06-25 | Ball Corporation | Suspension system having two degrees of rotational freedom |
DE69529442T2 (de) | 1994-09-22 | 2003-11-20 | Ricoh Co., Ltd. | Informationsaufzeichnungsverfahren und -vorrichtung |
US6341006B1 (en) | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
US5870133A (en) | 1995-04-28 | 1999-02-09 | Minolta Co., Ltd. | Laser scanning device and light source thereof having temperature correction capability |
DE29507189U1 (de) | 1995-04-28 | 1995-06-29 | Precitec GmbH, 76571 Gaggenau | Anschlußkopf zur Bearbeitung eines Werkstücks mittels eines Laserstrahls |
US5724017A (en) | 1995-07-31 | 1998-03-03 | General Electric Company | Electrical transformer with reduced core noise |
JPH09152505A (ja) | 1995-11-30 | 1997-06-10 | Sharp Corp | 変形可能ミラー及びその製造方法及び光学装置並びに記録再生装置 |
IT1277080B1 (it) * | 1995-12-14 | 1997-11-04 | Salvagnini Italia Spa | Testa di focalizzazione di un fascio laser dotata di una lente di focalizzazione per una macchina di lavorazione di pezzi metallici |
US5694257A (en) | 1996-05-06 | 1997-12-02 | New Focus, Inc. | Rotary beamsplitter prism mount |
WO2004092799A1 (ja) | 1996-08-26 | 2004-10-28 | Hitoshi Umetsu | 光学系要素の固定装置 |
JP3695494B2 (ja) * | 1996-11-13 | 2005-09-14 | セイコーエプソン株式会社 | 光変調デバイス、その製造方法および表示装置 |
US5891317A (en) | 1997-02-04 | 1999-04-06 | Avon Products, Inc. | Electroformed hollow jewelry |
US6128122A (en) * | 1998-09-18 | 2000-10-03 | Seagate Technology, Inc. | Micromachined mirror with stretchable restoring force member |
EP0874283B1 (en) * | 1997-04-23 | 2003-09-03 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
US6268904B1 (en) * | 1997-04-23 | 2001-07-31 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
WO1999005708A1 (fr) | 1997-07-22 | 1999-02-04 | Nikon Corporation | Procede d'exposition pour projection, dispositif de cadrage pour projection, et procedes de fabrication et de nettoyage optique du dispositif de cadrage |
US6829041B2 (en) * | 1997-07-29 | 2004-12-07 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus having the same |
DE19735831A1 (de) | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Galvanoplastische Optik-Fassung |
DE19735760A1 (de) * | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Lötverfahren für optische Materialien an Metallfassungen und gefaßte Baugruppen |
US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
US6054784A (en) | 1997-12-29 | 2000-04-25 | Asm Lithography B.V. | Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
JPH11224839A (ja) | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
JP3278407B2 (ja) * | 1998-02-12 | 2002-04-30 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
DE19807120A1 (de) | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
US6108121A (en) | 1998-03-24 | 2000-08-22 | The Board Of Trustees Of The Leland Stanford Junior University | Micromachined high reflectance deformable mirror |
FR2776830B1 (fr) | 1998-03-26 | 2001-11-23 | Sgs Thomson Microelectronics | Cellule memoire electriquement programmable |
DE19823634A1 (de) * | 1998-05-27 | 1999-12-02 | Dystar Textilfarben Gmbh & Co | Wasserlösliche Monoazoverbindungen, Verfahren zu ihrer Herstellung und ihre Verwendung als Farbstoffe |
DE19825716A1 (de) | 1998-06-09 | 1999-12-16 | Zeiss Carl Fa | Baugruppe aus optischem Element und Fassung |
US5986795A (en) | 1998-06-15 | 1999-11-16 | Chapman; Henry N. | Deformable mirror for short wavelength applications |
US5986827A (en) | 1998-06-17 | 1999-11-16 | The Regents Of The University Of California | Precision tip-tilt-piston actuator that provides exact constraint |
AU4061099A (en) | 1998-06-17 | 2000-01-05 | Nikon Corporation | Exposure method and exposure apparatus |
TWI242113B (en) | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
FR2783055B1 (fr) | 1998-09-04 | 2000-11-24 | Essilor Int | Support pour lentille optique, et son procede de mise en oeuvre |
US6521892B2 (en) | 1998-10-09 | 2003-02-18 | Thomson-Csf Optronics Canada Inc. | Uncooled driver viewer enhancement system |
US6296811B1 (en) | 1998-12-10 | 2001-10-02 | Aurora Biosciences Corporation | Fluid dispenser and dispensing methods |
DE19859634A1 (de) | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
JP2001044116A (ja) | 1999-01-20 | 2001-02-16 | Asm Lithography Bv | 光学補正板、およびリソグラフィ投影装置でのその応用 |
DE19904152A1 (de) | 1999-02-03 | 2000-08-10 | Zeiss Carl Fa | Baugruppe aus einem optischen Element und einer Fassung |
JP2000234906A (ja) | 1999-02-15 | 2000-08-29 | Koji Masutani | 反射部材移動装置および前記反射部材移動装置を使用する光路長周期的増減装置 |
DE19908554A1 (de) | 1999-02-27 | 2000-08-31 | Zeiss Carl Fa | Verstellbare Baugruppe |
DE19910947A1 (de) | 1999-03-12 | 2000-09-14 | Zeiss Carl Fa | Vorrichtung zum Verschieben eines optischen Elementes entlang der optischen Achse |
DE69901596T2 (de) * | 1999-03-29 | 2003-01-16 | Abb T&D Technologies Ltd., Zuerich | Geräuscharmer Transformator |
US6594204B1 (en) | 1999-03-31 | 2003-07-15 | Sony Corporation | Lens holder, method for manufacturing lens holder, metal die for producing lens holder and objective lens device |
US6428173B1 (en) | 1999-05-03 | 2002-08-06 | Jds Uniphase, Inc. | Moveable microelectromechanical mirror structures and associated methods |
US6246822B1 (en) | 1999-05-18 | 2001-06-12 | The Boeing Company | Fiber-coupled receiver and associated method |
US6160628A (en) | 1999-06-29 | 2000-12-12 | Nikon Corporation | Interferometer system and method for lens column alignment |
DE19930643C2 (de) | 1999-07-02 | 2002-01-24 | Zeiss Carl | Baugruppe aus einem optischen Element und einer Fassung |
TW442783B (en) | 1999-07-09 | 2001-06-23 | Ind Tech Res Inst | Folding mirror |
JP2001110710A (ja) * | 1999-10-08 | 2001-04-20 | Nikon Corp | 露光装置、露光方法、および半導体デバイスの製造方法 |
US6478434B1 (en) | 1999-11-09 | 2002-11-12 | Ball Aerospace & Technologies Corp. | Cryo micropositioner |
JP4482990B2 (ja) | 1999-12-10 | 2010-06-16 | 株式会社ニコン | レンズ保持枠及びレンズ鏡筒 |
US6614504B2 (en) * | 2000-03-30 | 2003-09-02 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US6369999B1 (en) * | 2000-03-31 | 2002-04-09 | Fellowes Manufacturing Company | Portable surge protector |
US6411426B1 (en) | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
DE10026541A1 (de) * | 2000-05-27 | 2001-11-29 | Zeiss Carl | Vorrichtung zur präzisen Positionierung eines Bauteils, insbesondere eines optischen Bauteiles |
DE10030005A1 (de) | 2000-06-17 | 2001-12-20 | Zeiss Carl | Objektiv, insbesondere Projektionsobjektiv in der Halbleiter-Lithographie |
DE10031702A1 (de) | 2000-06-29 | 2002-01-10 | Hymmen Gmbh Maschinen & Anlage | Vorrichtung zum Abtrennen einer überstehenden Deckschicht und Verfahren zum Beschichten von Platten |
KR100493151B1 (ko) | 2000-07-19 | 2005-06-02 | 삼성전자주식회사 | 멀티폴디스 스프링을 이용한 다축 구동을 위한싱글스테이지 마이크로 구동기 |
US6449106B1 (en) * | 2000-08-10 | 2002-09-10 | Nikon Corporation | Catadioptric lens barrel structure having a support structure to maintain alignment of a plurality of sub-barrels |
US6566627B2 (en) * | 2000-08-11 | 2003-05-20 | Westar Photonics, Inc. | Laser method for shaping of optical lenses |
KR100775796B1 (ko) * | 2000-08-18 | 2007-11-12 | 가부시키가이샤 니콘 | 광학소자 유지장치 |
JP4019160B2 (ja) * | 2000-08-21 | 2007-12-12 | 富士フイルム株式会社 | 遠隔操作システム |
US6537479B1 (en) | 2000-08-24 | 2003-03-25 | Colbar Art, Inc. | Subsurface engraving of three-dimensional sculpture |
DE10048188A1 (de) * | 2000-09-28 | 2002-04-11 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Selbstverriegelnde Schaltungsanordnung |
DE10051706A1 (de) * | 2000-10-18 | 2002-05-02 | Zeiss Carl | Vorrichtung zur Lagerung eines optischen Elementes |
DE10053899A1 (de) | 2000-10-31 | 2002-05-08 | Zeiss Carl | Vorrichtung zur Lagerung eines optischen Elementes |
DE10115914A1 (de) * | 2001-03-30 | 2002-10-02 | Zeiss Carl | Vorrichtung zur Lagerung eines optischen Elementes in einer Optik |
DE10121346A1 (de) * | 2001-05-02 | 2002-11-07 | Zeiss Carl | Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie |
DE10200366A1 (de) * | 2002-01-08 | 2003-07-17 | Zeiss Optronik Gmbh | Mehrkanalempfängersystem für winkelaufgelöste Laserentfernungsmessung |
US6729062B2 (en) * | 2002-01-31 | 2004-05-04 | Richard L. Thomas | Mil.dot reticle and method for producing the same |
US7265917B2 (en) | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
-
2004
- 2004-10-15 US US10/966,388 patent/US7265917B2/en not_active Expired - Lifetime
- 2004-11-30 CN CN2009101618157A patent/CN101614967B/zh not_active Expired - Fee Related
- 2004-11-30 AT AT04820811T patent/ATE405866T1/de not_active IP Right Cessation
- 2004-11-30 EP EP04820811A patent/EP1700167B1/en not_active Not-in-force
- 2004-11-30 JP JP2006545958A patent/JP4750043B2/ja not_active Expired - Fee Related
- 2004-11-30 WO PCT/EP2004/013576 patent/WO2005064404A1/en active IP Right Grant
- 2004-11-30 KR KR1020067012405A patent/KR101116999B1/ko active IP Right Grant
- 2004-11-30 DE DE602004016048T patent/DE602004016048D1/de active Active
- 2004-11-30 CN CNB2004800388971A patent/CN100545754C/zh not_active Expired - Fee Related
-
2007
- 2007-08-28 US US11/895,990 patent/US7515363B2/en not_active Expired - Fee Related
-
2009
- 2009-03-10 US US12/400,965 patent/US7768723B2/en not_active Expired - Lifetime
-
2010
- 2010-07-06 US US12/830,913 patent/US7995296B2/en not_active Expired - Fee Related
-
2011
- 2011-06-28 US US13/170,951 patent/US8488261B2/en active Active
-
2013
- 2013-06-18 US US13/920,339 patent/US8902519B2/en not_active Expired - Fee Related
-
2014
- 2014-09-29 US US14/499,559 patent/US9081296B2/en not_active Expired - Fee Related
-
2015
- 2015-07-07 US US14/793,308 patent/US20160041475A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177008A (ja) * | 1992-12-01 | 1994-06-24 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
JPH06177007A (ja) * | 1992-12-01 | 1994-06-24 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
JPH07161622A (ja) * | 1993-12-10 | 1995-06-23 | Nikon Corp | 投影露光装置 |
JPH09199390A (ja) * | 1996-01-16 | 1997-07-31 | Hitachi Ltd | パターン形成方法、投影露光装置および半導体装置の製造方法 |
JP2001077003A (ja) * | 1999-09-02 | 2001-03-23 | Nikon Corp | 露光装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101116999B1 (ko) | 2012-03-15 |
JP2007515797A (ja) | 2007-06-14 |
US9081296B2 (en) | 2015-07-14 |
US7265917B2 (en) | 2007-09-04 |
CN101614967A (zh) | 2009-12-30 |
US20090168207A1 (en) | 2009-07-02 |
US20110255181A1 (en) | 2011-10-20 |
US20130279029A1 (en) | 2013-10-24 |
US7768723B2 (en) | 2010-08-03 |
DE602004016048D1 (de) | 2008-10-02 |
US20150070789A1 (en) | 2015-03-12 |
EP1700167A1 (en) | 2006-09-13 |
CN101614967B (zh) | 2011-11-30 |
US20070297074A1 (en) | 2007-12-27 |
US7995296B2 (en) | 2011-08-09 |
WO2005064404A1 (en) | 2005-07-14 |
US8488261B2 (en) | 2013-07-16 |
US20100271716A1 (en) | 2010-10-28 |
US7515363B2 (en) | 2009-04-07 |
EP1700167B1 (en) | 2008-08-20 |
US20160041475A1 (en) | 2016-02-11 |
ATE405866T1 (de) | 2008-09-15 |
KR20060111597A (ko) | 2006-10-27 |
US20050134972A1 (en) | 2005-06-23 |
CN100545754C (zh) | 2009-09-30 |
US8902519B2 (en) | 2014-12-02 |
CN1898610A (zh) | 2007-01-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4750043B2 (ja) | 光学素子のための交換装置 | |
KR101211451B1 (ko) | 노광 장치 및 디바이스 제조 방법 | |
JP4945845B2 (ja) | 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。 | |
EP1632799B1 (en) | Optical element holding device, lens barrel, exposing device, and device producing method | |
JP2009525599A (ja) | 結像欠陥の補正のための方法及び装置 | |
JP5251869B2 (ja) | 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 | |
KR20120115594A (ko) | 노광 장치 및 디바이스 제조 방법 | |
WO2007071353A1 (en) | Imaging device in a projection exposure machine | |
JP2007515797A5 (ja) | ||
JPWO2008146655A1 (ja) | 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 | |
JP5243957B2 (ja) | 液浸リソグラフィー用オブジェクティブ | |
JP2007017632A (ja) | 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071130 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071130 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20080917 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20081002 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101116 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110216 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20110216 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110223 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110325 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110426 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110518 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4750043 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140527 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |