JP4447280B2 - 表面保護用シートおよび半導体ウエハの研削方法 - Google Patents

表面保護用シートおよび半導体ウエハの研削方法 Download PDF

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Publication number
JP4447280B2
JP4447280B2 JP2003356280A JP2003356280A JP4447280B2 JP 4447280 B2 JP4447280 B2 JP 4447280B2 JP 2003356280 A JP2003356280 A JP 2003356280A JP 2003356280 A JP2003356280 A JP 2003356280A JP 4447280 B2 JP4447280 B2 JP 4447280B2
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JP
Japan
Prior art keywords
adhesive layer
pressure
sensitive adhesive
semiconductor wafer
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2003356280A
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English (en)
Japanese (ja)
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JP2005123382A (ja
JP2005123382A5 (cg-RX-API-DMAC7.html
Inventor
公市 永元
仁 大橋
和弘 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34463200&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP4447280(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Lintec Corp filed Critical Lintec Corp
Priority to JP2003356280A priority Critical patent/JP4447280B2/ja
Priority to KR1020067009385A priority patent/KR20060120113A/ko
Priority to US10/575,510 priority patent/US7438631B2/en
Priority to EP04792363A priority patent/EP1681713A4/en
Priority to PCT/JP2004/015131 priority patent/WO2005038894A1/ja
Priority to CNA2004800302222A priority patent/CN1868040A/zh
Priority to TW093131308A priority patent/TWI349315B/zh
Publication of JP2005123382A publication Critical patent/JP2005123382A/ja
Publication of JP2005123382A5 publication Critical patent/JP2005123382A5/ja
Publication of JP4447280B2 publication Critical patent/JP4447280B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/20—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
    • C09J2301/204—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive coating being discontinuous
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2003356280A 2003-10-16 2003-10-16 表面保護用シートおよび半導体ウエハの研削方法 Expired - Lifetime JP4447280B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2003356280A JP4447280B2 (ja) 2003-10-16 2003-10-16 表面保護用シートおよび半導体ウエハの研削方法
PCT/JP2004/015131 WO2005038894A1 (ja) 2003-10-16 2004-10-14 表面保護用シートおよび半導体ウエハの研削方法
US10/575,510 US7438631B2 (en) 2003-10-16 2004-10-14 Surface-protecting sheet and semiconductor wafer lapping method
EP04792363A EP1681713A4 (en) 2003-10-16 2004-10-14 SURFACE PROTECTION FILM AND SEMICONDUCTOR WAFER LAPPING METHOD
KR1020067009385A KR20060120113A (ko) 2003-10-16 2004-10-14 표면보호용 시트 및 반도체 웨이퍼의 연삭방법
CNA2004800302222A CN1868040A (zh) 2003-10-16 2004-10-14 表面保护用板以及半导体晶片的磨削方法
TW093131308A TWI349315B (en) 2003-10-16 2004-10-15 Surface protecting sheet and method of grinding semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003356280A JP4447280B2 (ja) 2003-10-16 2003-10-16 表面保護用シートおよび半導体ウエハの研削方法

Publications (3)

Publication Number Publication Date
JP2005123382A JP2005123382A (ja) 2005-05-12
JP2005123382A5 JP2005123382A5 (cg-RX-API-DMAC7.html) 2006-09-28
JP4447280B2 true JP4447280B2 (ja) 2010-04-07

Family

ID=34463200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003356280A Expired - Lifetime JP4447280B2 (ja) 2003-10-16 2003-10-16 表面保護用シートおよび半導体ウエハの研削方法

Country Status (7)

Country Link
US (1) US7438631B2 (cg-RX-API-DMAC7.html)
EP (1) EP1681713A4 (cg-RX-API-DMAC7.html)
JP (1) JP4447280B2 (cg-RX-API-DMAC7.html)
KR (1) KR20060120113A (cg-RX-API-DMAC7.html)
CN (1) CN1868040A (cg-RX-API-DMAC7.html)
TW (1) TWI349315B (cg-RX-API-DMAC7.html)
WO (1) WO2005038894A1 (cg-RX-API-DMAC7.html)

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JP6045817B2 (ja) * 2012-05-28 2016-12-14 株式会社ディスコ 貼着方法
JP6061590B2 (ja) * 2012-09-27 2017-01-18 株式会社ディスコ 表面保護部材および加工方法
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JP6850099B2 (ja) * 2016-09-23 2021-03-31 株式会社岡本工作機械製作所 半導体装置の製造方法及び半導体製造装置
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JP2020035918A (ja) * 2018-08-30 2020-03-05 株式会社ディスコ 被加工物の加工方法
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Also Published As

Publication number Publication date
TWI349315B (en) 2011-09-21
WO2005038894A1 (ja) 2005-04-28
US20070066184A1 (en) 2007-03-22
US7438631B2 (en) 2008-10-21
KR20060120113A (ko) 2006-11-24
EP1681713A4 (en) 2007-10-10
JP2005123382A (ja) 2005-05-12
TW200524057A (en) 2005-07-16
CN1868040A (zh) 2006-11-22
EP1681713A1 (en) 2006-07-19

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