JP4097613B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4097613B2 JP4097613B2 JP2004065341A JP2004065341A JP4097613B2 JP 4097613 B2 JP4097613 B2 JP 4097613B2 JP 2004065341 A JP2004065341 A JP 2004065341A JP 2004065341 A JP2004065341 A JP 2004065341A JP 4097613 B2 JP4097613 B2 JP 4097613B2
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- 239000004065 semiconductor Substances 0.000 title claims description 106
- 230000002093 peripheral effect Effects 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 19
- 229910000679 solder Inorganic materials 0.000 description 94
- 238000010586 diagram Methods 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 238000005336 cracking Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
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- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
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- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/45124—Aluminium (Al) as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L25/18—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
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- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12036—PN diode
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- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
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- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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- H01L2924/19107—Disposition of discrete passive components off-chip wires
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- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
図5を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態2について以下に説明する。実施の形態2のパワーモジュール2は、端部ダイオードDEと中央部ダイオードDCが直列に接続される点を除いて、実施の形態1のパワーモジュール1と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
こうして、構成された実施の形態2のパワーモジュール2は、実施の形態1と同様、上側半田層50の周辺端部に生じる半田クラックを的確に検出することができる。
図6を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態3について以下に説明する。実施の形態3のパワーモジュール3は、複数(図6では2つ)の端部ダイオードDEが半導体素子の周辺端部に配置される点を除いて、実施の形態1のパワーモジュール1と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図7を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態4について以下に説明する。実施の形態4のパワーモジュール4は、第1および第2の端部ダイオードDE1,DE2が直列に接続される点を除いて、実施の形態3のパワーモジュール3と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図8を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態5について以下に説明する。実施の形態5のパワーモジュール5は、第1および第2の端部ダイオードDE1,DE2が並列に接続される点を除いて、実施の形態4のパワーモジュール4と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図9を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態6について以下に説明する。実施の形態6のパワーモジュール6は、中央部ダイオードDCだけでなく、第2の端部ダイオードDE2が第1の端部ダイオードDE1に直列に接続された点を除いて、実施の形態2のパワーモジュール2と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図10を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態7について以下に説明する。実施の形態7のパワーモジュール7は、第1および第2の端部ダイオードDE1,DE2の間の電位(信号レベル)を検出するための電極パッド端子K3を新設した点を除いて、実施の形態4のパワーモジュール4と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
こうして、構成された実施の形態7のパワーモジュール7は、実施の形態3と同様、上側半田層50の周辺端部に生じる半田クラックを的確に検出することができる。
実施の形態1ないし7は、上側半田層50の周辺端部に生じる半田クラックを検出することを目的としたのに対し、実施の形態8ないし10は、同様の手法を用いて、主に下側半田層30の周辺端部に生じる半田クラックを検出することを目的とする。
ここで図2および図11を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態8について以下に説明する。先の実施の形態1のパワーモジュール1によれば、中央部ダイオードDCおよび端部ダイオードDEが1つの半導体素子40の中央部および周辺端部に配置されていたのに対し、実施の形態8のパワーモジュール8は、絶縁ゲート型バイポーラトランジスタ40aの中央部に配置された第1のダイオードD1と、フリーホイールダイオード40bの中央部に配置された第2のダイオードD2と、を有する。実施の形態8のパワーモジュール8は、その他の点においては、実施の形態1のパワーモジュール1と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図12を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態9について以下に説明する。実施の形態9のパワーモジュール9は、第1および第2のダイオードD1,D2が直列に接続される点を除いて、実施の形態8のパワーモジュール8と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
図13を参照しながら、本発明に係るパワーモジュール(半導体装置)の実施の形態10について以下に説明する。実施の形態10のパワーモジュール10は、第2のダイオードD2をFWD40bの周辺端部に配置し、第3のダイオードD3をIGBT40aの周辺端部に新設し、第2のダイオードD2と第3のダイオードD3を直列に接続した点を除いて、実施の形態8のパワーモジュール8と同様の構成を有するので、重複する部分に関する詳細な説明を省略する。
Claims (4)
- 半導体装置であって、
導電性接合層を介して絶縁基板上に実装される半導体素子と、
前記半導体素子の周辺端部に配置された少なくとも1つの端部温度検出素子と、
前記半導体素子の中央部に配置された少なくとも1つの中央部温度検出素子と、を備え、
前記端部温度検出素子と前記中央部温度検出素子は、直列に接続されることを特徴とする半導体装置。 - 請求項1に記載の半導体装置であって、
直列に接続される第1および第2の前記端部温度検出素子を有することを特徴とする半導体装置。 - 請求項1に記載の半導体装置であって、
並列に接続される第1および第2の前記端部温度検出素子を有することを特徴とする半導体装置。 - 半導体装置であって、
導電性接合層を介して絶縁基板上に実装される半導体素子と、
前記半導体素子の周辺端部に配置され、直列に接続される第1および第2の端部温度検出素子と、
前記半導体素子の中央部に配置された少なくとも1つの中央部温度検出素子と、を備え、
第1および第2の前記端部温度検出素子の間に電極パッドをさらに有することを特徴とする半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004065341A JP4097613B2 (ja) | 2004-03-09 | 2004-03-09 | 半導体装置 |
DE200510008346 DE102005008346A1 (de) | 2004-03-09 | 2005-02-23 | Halbleitervorrichtung |
US11/066,140 US20050199999A1 (en) | 2004-03-09 | 2005-02-25 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004065341A JP4097613B2 (ja) | 2004-03-09 | 2004-03-09 | 半導体装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007330531A Division JP4673360B2 (ja) | 2007-12-21 | 2007-12-21 | 半導体装置 |
Publications (3)
Publication Number | Publication Date |
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JP2005259753A JP2005259753A (ja) | 2005-09-22 |
JP2005259753A5 JP2005259753A5 (ja) | 2006-10-05 |
JP4097613B2 true JP4097613B2 (ja) | 2008-06-11 |
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Application Number | Title | Priority Date | Filing Date |
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JP2004065341A Expired - Lifetime JP4097613B2 (ja) | 2004-03-09 | 2004-03-09 | 半導体装置 |
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US (1) | US20050199999A1 (ja) |
JP (1) | JP4097613B2 (ja) |
DE (1) | DE102005008346A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5168866B2 (ja) * | 2006-09-28 | 2013-03-27 | 三菱電機株式会社 | パワー半導体モジュール |
US20080234953A1 (en) * | 2007-03-22 | 2008-09-25 | Ignowski James S | Power estimation for a semiconductor device |
JP5252819B2 (ja) * | 2007-03-26 | 2013-07-31 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
DE102007052630B4 (de) * | 2007-11-05 | 2019-08-14 | Infineon Technologies Ag | Leistungshalbleitermodul mit Temperatursensor |
US8057094B2 (en) * | 2007-11-16 | 2011-11-15 | Infineon Technologies Ag | Power semiconductor module with temperature measurement |
KR101013557B1 (ko) * | 2008-11-06 | 2011-02-14 | 주식회사 하이닉스반도체 | 플랙시블 반도체 패키지 및 이를 제조하기 위한 와이어 본딩 장치 |
JP5921055B2 (ja) * | 2010-03-08 | 2016-05-24 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP5223931B2 (ja) * | 2010-06-09 | 2013-06-26 | トヨタ自動車株式会社 | クラック特定装置と半導体装置 |
US9941242B2 (en) | 2012-04-24 | 2018-04-10 | Innogration (Suzhou) Co., Ltd. | Unpacked structure for power device of radio frequency power amplification module and assembly method therefor |
CN102623416B (zh) | 2012-04-24 | 2015-09-02 | 苏州远创达科技有限公司 | 一种射频功放模块的功率器件无封装结构及其组装方法 |
CN102956605B (zh) * | 2012-11-19 | 2016-03-23 | 苏州远创达科技有限公司 | 一种半导体部件及其制作方法 |
DE112013007670B4 (de) | 2013-12-04 | 2023-07-06 | Arigna Technology Ltd. | Halbleitervorrichtung |
JP6272213B2 (ja) * | 2014-11-26 | 2018-01-31 | 三菱電機株式会社 | 半導体装置 |
US10438865B2 (en) * | 2016-02-04 | 2019-10-08 | Mitsubishi Electric Corporation | Semiconductor device |
JP7037390B2 (ja) * | 2018-02-27 | 2022-03-16 | 新電元工業株式会社 | パワーモジュール |
EP3637461A1 (en) * | 2018-10-11 | 2020-04-15 | ABB Schweiz AG | Power electronic module |
JP7088048B2 (ja) * | 2019-01-30 | 2022-06-21 | 株式会社デンソー | 半導体装置 |
JP2021005692A (ja) | 2019-06-27 | 2021-01-14 | 株式会社デンソー | 半導体装置 |
KR102602641B1 (ko) * | 2023-02-15 | 2023-11-16 | (주)아인테크놀러지 | 기판 크랙 검사장치 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3168874B2 (ja) * | 1995-05-23 | 2001-05-21 | 富士電機株式会社 | 半導体装置 |
DE19534604C1 (de) * | 1995-09-18 | 1996-10-24 | Siemens Ag | Durch Feldeffekt steuerbares Halbleiterbauelement mit mehreren Temperatursensoren zum Schutz vor Überlastung |
JPH09148523A (ja) * | 1995-11-21 | 1997-06-06 | Toshiba Corp | 半導体装置 |
US6345238B1 (en) * | 1998-12-21 | 2002-02-05 | Airpax Corporation, Llc | Linear temperature sensor |
US6137165A (en) * | 1999-06-25 | 2000-10-24 | International Rectifier Corp. | Hybrid package including a power MOSFET die and a control and protection circuit die with a smaller sense MOSFET |
JP4089143B2 (ja) * | 2000-08-30 | 2008-05-28 | 三菱電機株式会社 | 電力用半導体装置 |
JP3668708B2 (ja) * | 2001-10-22 | 2005-07-06 | 株式会社日立製作所 | 故障検知システム |
JP3886793B2 (ja) * | 2001-12-03 | 2007-02-28 | 株式会社ルネサステクノロジ | 半導体集積回路装置 |
US6914764B2 (en) * | 2002-07-11 | 2005-07-05 | International Business Machines Corporation | On-chip thermal sensing circuit |
US6786639B2 (en) * | 2002-08-30 | 2004-09-07 | International Business Machines Corporation | Device for sensing temperature of an electronic chip |
-
2004
- 2004-03-09 JP JP2004065341A patent/JP4097613B2/ja not_active Expired - Lifetime
-
2005
- 2005-02-23 DE DE200510008346 patent/DE102005008346A1/de not_active Withdrawn
- 2005-02-25 US US11/066,140 patent/US20050199999A1/en not_active Abandoned
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DE102005008346A1 (de) | 2005-09-29 |
US20050199999A1 (en) | 2005-09-15 |
JP2005259753A (ja) | 2005-09-22 |
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