JP3940054B2 - ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置 - Google Patents
ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置 Download PDFInfo
- Publication number
- JP3940054B2 JP3940054B2 JP2002293302A JP2002293302A JP3940054B2 JP 3940054 B2 JP3940054 B2 JP 3940054B2 JP 2002293302 A JP2002293302 A JP 2002293302A JP 2002293302 A JP2002293302 A JP 2002293302A JP 3940054 B2 JP3940054 B2 JP 3940054B2
- Authority
- JP
- Japan
- Prior art keywords
- processing liquid
- liquid supply
- nozzle
- cleaning
- supply nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Coating Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Materials For Photolithography (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002293302A JP3940054B2 (ja) | 2002-10-07 | 2002-10-07 | ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置 |
TW092124338A TWI234797B (en) | 2002-10-07 | 2003-09-03 | Nozzle cleaning apparatus and substrate treating apparatus having the same |
CNB031326617A CN1252798C (zh) | 2002-10-07 | 2003-09-30 | 喷嘴清扫装置以及具备该喷嘴清扫装置的基板处理装置 |
KR1020030068555A KR100578392B1 (ko) | 2002-10-07 | 2003-10-02 | 노즐 청소장치 및 이 노즐 청소장치를 구비한 기판처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002293302A JP3940054B2 (ja) | 2002-10-07 | 2002-10-07 | ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004122067A JP2004122067A (ja) | 2004-04-22 |
JP3940054B2 true JP3940054B2 (ja) | 2007-07-04 |
Family
ID=32284253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002293302A Expired - Fee Related JP3940054B2 (ja) | 2002-10-07 | 2002-10-07 | ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3940054B2 (ko) |
KR (1) | KR100578392B1 (ko) |
CN (1) | CN1252798C (ko) |
TW (1) | TWI234797B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103567160A (zh) * | 2012-07-27 | 2014-02-12 | 北京京东方光电科技有限公司 | 一种自动清洁印刷电路板的装置及其使用方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4324538B2 (ja) * | 2004-10-04 | 2009-09-02 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
KR100945360B1 (ko) | 2005-12-29 | 2010-03-08 | 엘지디스플레이 주식회사 | 롤 스토커 및 이를 이용한 액정표시장치의 제조방법 |
KR100787908B1 (ko) | 2006-07-28 | 2007-12-27 | 주식회사 케이씨텍 | 예비 토출 장치와 이를 포함하는 기판 코팅 장치 및 기판 코팅 방법 |
JP4850680B2 (ja) * | 2006-12-15 | 2012-01-11 | 中外炉工業株式会社 | 吐出ノズルの清掃装置 |
KR200467097Y1 (ko) * | 2007-11-30 | 2013-05-27 | 주식회사 케이씨텍 | 슬릿코터의 예비토출장치 |
JP2010240550A (ja) * | 2009-04-03 | 2010-10-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP5138058B2 (ja) * | 2011-03-07 | 2013-02-06 | 東レ株式会社 | 清掃部材と塗布器の清掃方法及び清掃装置並びにディスプレイ用部材の製造方法 |
JP5537581B2 (ja) * | 2012-03-08 | 2014-07-02 | 株式会社東芝 | 塗布装置及び塗布体の製造方法 |
CN105436037B (zh) * | 2016-01-06 | 2018-10-30 | 苏州赛腾精密电子股份有限公司 | 一种针头清胶机构及点胶机 |
EP3524553B1 (en) * | 2016-11-02 | 2022-10-19 | Zuiko Corporation | Sheet-feeding system and sheet-feeding method |
JP2019018127A (ja) * | 2017-07-12 | 2019-02-07 | 株式会社 ハリーズ | 清掃システム、透明基板の清掃方法及び電子部品の製造方法 |
KR102000017B1 (ko) * | 2017-07-21 | 2019-07-18 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
JP6909854B2 (ja) * | 2017-07-27 | 2021-07-28 | 東京エレクトロン株式会社 | 塗布処理装置、塗布処理方法及びコンピュータ記憶媒体 |
JP7408676B2 (ja) * | 2019-10-28 | 2024-01-05 | 京セラ株式会社 | 塗装装置および払拭方法 |
-
2002
- 2002-10-07 JP JP2002293302A patent/JP3940054B2/ja not_active Expired - Fee Related
-
2003
- 2003-09-03 TW TW092124338A patent/TWI234797B/zh not_active IP Right Cessation
- 2003-09-30 CN CNB031326617A patent/CN1252798C/zh not_active Expired - Fee Related
- 2003-10-02 KR KR1020030068555A patent/KR100578392B1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103567160A (zh) * | 2012-07-27 | 2014-02-12 | 北京京东方光电科技有限公司 | 一种自动清洁印刷电路板的装置及其使用方法 |
CN103567160B (zh) * | 2012-07-27 | 2015-07-15 | 北京京东方光电科技有限公司 | 一种自动清洁印刷电路板的装置及其使用方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1497659A (zh) | 2004-05-19 |
KR20040032055A (ko) | 2004-04-14 |
TWI234797B (en) | 2005-06-21 |
KR100578392B1 (ko) | 2006-05-10 |
JP2004122067A (ja) | 2004-04-22 |
CN1252798C (zh) | 2006-04-19 |
TW200414277A (en) | 2004-08-01 |
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